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    • 7. 发明专利
    • MANUFACTURE OF FILM EL ELEMENT
    • JPH0745367A
    • 1995-02-14
    • JP19013593
    • 1993-07-30
    • SHARP KK
    • NOMA MIKIHIROTANAKA KOICHINAKAMURA NORIAKIYAMADA KIMIHIKO
    • G09F9/30H05B33/10H05B33/12H05B33/14
    • PURPOSE:To stabilize the light emitting properties in a short time without raising light emitting threshold voltage, and besides, improve the mass production and long-term reliability by setting the order of performing oxidation treatment and heat treatment, the condition, etc., optimally. CONSTITUTION:For the light emitting layer made in a substrate, the surface is oxidized in oxygen atmosphere or atmoshere including oxygen, and then heat treatment is performed for the light emitting layer in substrate temperature range of 400-500 deg.C. Moreover, in oxidation processing, in case that, for example, Zns is used as the light emitting layer, the composition rate of the light emitting layer is corrected by O atoms filling up the S defect on the surface of the light emitting layer, so the time required for the stabilization of light emitting properties is shortened. That is, the light emitting threshold voltage is lowered without marring the shortening effect of the initial aging time by oxidizing by setting the substrate temperature in heat treatment in the range of 400-500 deg.C, as result the mass producibility of a film EL element and the long-term reliability can be improved, and also the drive voltage can be reduced.