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    • 1. 发明专利
    • DETECTING METHOD FOR EMISSION POINT OF LIGHT EMITTING ELEMENT AND FIXATION DEVICE FOR OPTICAL ELEMENT
    • JP2000031583A
    • 2000-01-28
    • JP19476198
    • 1998-07-09
    • SHARP KK
    • MINAMI KOJIYOSHIDA YOSHIO
    • H01S5/00H01S5/30
    • PROBLEM TO BE SOLVED: To provide a detecting method, for the light emission point of a light emitting element in which the position of the light emission point of the light emitting element is three-dimensionally detected with high accuracy, and to provide a fixation device for an optical element to which the method is applied. SOLUTION: A luminous flux which is radiated from a light source 1 is passed through a first lens 2, a light branching means 3 and and second lens 4 so as to be condensed on the light emission face of a light emitting element 6. The luminous flux is reflected to the direction of light source 1 by the light emission face so as to be returned again in the same optical path. The quantity of the luminous flux which is returned to the light source 1 is changed due to a reflection state on the light emission face of the light emitting element 6. Then, a first luminous flux is detected, and the position of a light emission point in the direction of its optical axis is decided. In addition, by observing the overlap state of a second luminous flux which is radiated from the light source 1 so as to be reflected by the light emission face of the light emitting element 6 and which is reflected by the light branching means 3 so as to be incident on an observation means 6, with a third luminous flux which is radiated from the light emission point 13 of the light emitting element 6 so as to be reflected by the light branching means 3 which is incident on the observation means 5, the position of the light emission point on a face perpendicular to the direction of the optical axis is detected.
    • 2. 发明专利
    • WAVEGUIDE PHOTODETECTOR AND MANUFACTURE THEREOF
    • JPH10261809A
    • 1998-09-29
    • JP6361497
    • 1997-03-17
    • SHARP KK
    • MINAMI KOJIYAMAMOTO HIROYUKI
    • G02B6/122H01L31/0232H01L31/10
    • PROBLEM TO BE SOLVED: To enhance an optical coupling efficiency of a waveguide photodetector and to achieve the high-speed responsiveness of the photodetector and a high integration of the photodetector by a method wherein the tapered part of a light-receiving region and the front and rear parts of an optical waveguide are provided in a region encircled with a stepped part, which is formed at the formation of an impurity diffused region. SOLUTION: A silicon nitride film 2 is laminated on a semiconductor substrate 1 with an impurity diffused layer 5 formed in the surface layer part and a dielectric layer 3, which is used as a buffer layer, is formed on the film 2. The upper right side part of the layer 3 is formed into a tapered form, whose thickness is formed thin to the direction of propagation of light, and an optical waveguide 4 is laminated on the layer 3. A part that contributes to a photoelectric conversion of propagated light 10 in the P impurity diffused region 5 is used as a light-receiving part 9 and a light-receiving region 7, which functions as a waveguide detector by the formation of a tapered part 6 and can optically couple, is formed in this light-receiving part 9. Here, when the region 5 is formed in the substrate 1, a step 8 is generated, but the tapered part 6 and optical waveguides X and Y in front and rear of the tapered part 6 are formed in the inside of the step 8 generated by the formation of the region 5.
    • 3. 发明专利
    • MODE SPLITTER
    • JPH0682644A
    • 1994-03-25
    • JP23550292
    • 1992-09-03
    • SHARP KK
    • YAMAMOTO HIROYUKIKURATA YUKIOYOSHIDA YOSHIOMIKI RENZABUROUOKADA NORIAKIMINAMI KOJI
    • G02B6/126G02B6/12
    • PURPOSE:To perform mode separation by utilizing a difference in the refraction angle of each mode light. CONSTITUTION:Two divided waveguide parts A and B are formed with a tapered coupling part C which is gradually varied in thickness, as a border and when a light is made incident on the border part at a certain angle, the mode separation is carried out by utilizing the difference in the refraction angle of each mode light due to a difference in equivalent refractive index. Consequently, there are not border conditions of the light incidence angle like a mode splitter which utilizes the total reflection of one mode light and each mode light which is large in permissible quantity and passed through the border part is propagated while a difference in refraction angle becomes an opening angle, so the light is converged by one lens and guided to a small-sized photodetector. The lens and photodetector can be arranged concentrically at one place, so a difference in characteristics of the photodetector is hardly generated and a waveguide element 1 itself is reducible in size.
    • 4. 发明专利
    • OPTICAL WAVEGUIDE ELEMENT
    • JPH0675128A
    • 1994-03-18
    • JP22610492
    • 1992-08-25
    • SHARP KK
    • MINAMI KOJIOKADA NORIAKIMIKI RENZABUROUYAMAMOTO HIROYUKIYOSHIDA YOSHIOKURATA YUKIO
    • G02B6/122G02B6/12G02B6/132G02B6/26G02B6/42
    • PURPOSE:To provide the total transmission of light without generating connection loss by interposing a single mode flat optical waveguide provided with refractive index and length of specific condition to a connecting part between optical waveguides with different effective refractive indexes. CONSTITUTION:Light propagated on the optical waveguide are parallel rays, and they are propagated from the optical waveguide 5 to the optical waveguide 7, and are made incident on the connecting part 6 at an angle of thetai. Furthermore, since the optical waveguides 5, 7 are the single mode flat optical waveguides, the effective refractive indexes N5, N7 proper to the light propagated on the optical waveguides are decided respectively. When two waveguides 5, 7 are connected with the connecting part 6, reflected waves RA, RB are generated from a plane A and a plane B, however, those reflected waves are negated mutually by deciding the effective refractive index N6 and length l6 of the connecting part 6 as shown in equations I and II. Where, (lambda) shows the wavelength of free space in equation II. Therefore, the reflected wave to the optical waveguide 5 by connection can be eliminated essentially, which enables the total transmission of the light from the optical waveguide 5 to the optical waveguide 7 to be performed.
    • 5. 发明专利
    • OPTICAL PICKUP DEVICE AND ITS ASSEMBLING METHOD
    • JP2002150589A
    • 2002-05-24
    • JP2000338399
    • 2000-11-06
    • SHARP KK
    • MINAMI KOJI
    • G11B7/12G11B7/125
    • PROBLEM TO BE SOLVED: To improve the parallelism between the positional reference surface of a light receiving and emitting unit and that of a housing even when the light receiving and emitting unit is composed in a thin type. SOLUTION: The surface of the heat sink part 22 of the light receiving and emitting unit 20 is used as a first positional reference surface for positioning the light receiving and emitting unit 20 to a holder part 12, the end surface 12f in which the opening part of the holder part 12 of the housing 10 is provided is used as a second positional reference surface in the case of attaching the light receiving and emitting unit 20 to the inside of the holder part 12, and the first positional reference surface and the second positional reference surface are attached by butting them against a mount. Thus, respective areas of the first positional reference surface and the second positional reference surface are widely used and whereby parallelism between the light receiving and emitting unit 20 and the housing 10 is improved.
    • 8. 发明专利
    • MANUFACTURE OF DIFFRACTION GRATING
    • JPH0862412A
    • 1996-03-08
    • JP20052894
    • 1994-08-25
    • SHARP KK
    • YAMAMOTO HIROYUKIKURATA YUKIOYOSHIDA YOSHIOOKADA NORIAKIMINAMI KOJI
    • G02B5/18G03F7/20
    • PURPOSE: To enhance the optical characteristic of a diffraction grating to be obtained by carrying out development after the exposure by means of two luminus flux has been carried out from the opposite side of the resist-coated surface of a transparent base plate. CONSTITUTION: A positive type photoresist 11 is coated and dried on a transparent base plate 12 made of quartz glass. Making the front surface of the surface on which the photoresist 11 has been coated, the exposure by means of the two luminus flux interference method is carried out from the rear side of the transparent base plate 12. In this case, the opening of a photosensitive part 13 is made narrower as it is nearer to the front surface. Thereafter, development is carried out. Since the chemical reaction due to development advances from the front surface, the opening is widened wider as it is nearer to the front surface, so that the sectional shape of the photoresist pattern 14 becomes a rectangular shape by the offset of the two actions of exposure and development, and the duty factor approaches 0.5. By utilizing this photoresist pattern 14, the transparent base plate 12 is etched by the reactive etching due to, for instance, CF4 .