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    • 2. 发明专利
    • PRODUCTION OF OPTICAL COUPLER
    • JPH1164675A
    • 1999-03-05
    • JP23006697
    • 1997-08-26
    • SHARP KK
    • YAMAMOTO HIROYUKIYOSHIDA YOSHIO
    • G02B6/34G02B6/122
    • PROBLEM TO BE SOLVED: To make it possible to produce an optical coupler which is excellent in productivity and has a stable operating characteristic. SOLUTION: A dielectric block subjected to a plasma treatment on the adhesive surface is adhered by a photosetting adhesive 15 to a gap layer 13 on an optical waveguide layer 12 likewise subjected to the plasma treatment on the adhesive surface. The adhesive 15 is impregnated into the spacing between the optical waveguide layer 12 parted by a previously patterned photoresist layer 20 and the dielectric block layer and is then cured. The upper surface of the dielectric block is pressed and fixed by a metallic probe at the time of impregnation of the adhesive 15. The upper surface of the dielectric block is optically polished to allow the observation of the way of the impregnation of the adhesive 15. The photoresist layer 20 is thereafter removed by executing a dicing treatment, by which individual element chips are obtd.
    • 6. 发明专利
    • MANUFACTURE OF DIFFRACTION GRATING
    • JPH0862412A
    • 1996-03-08
    • JP20052894
    • 1994-08-25
    • SHARP KK
    • YAMAMOTO HIROYUKIKURATA YUKIOYOSHIDA YOSHIOOKADA NORIAKIMINAMI KOJI
    • G02B5/18G03F7/20
    • PURPOSE: To enhance the optical characteristic of a diffraction grating to be obtained by carrying out development after the exposure by means of two luminus flux has been carried out from the opposite side of the resist-coated surface of a transparent base plate. CONSTITUTION: A positive type photoresist 11 is coated and dried on a transparent base plate 12 made of quartz glass. Making the front surface of the surface on which the photoresist 11 has been coated, the exposure by means of the two luminus flux interference method is carried out from the rear side of the transparent base plate 12. In this case, the opening of a photosensitive part 13 is made narrower as it is nearer to the front surface. Thereafter, development is carried out. Since the chemical reaction due to development advances from the front surface, the opening is widened wider as it is nearer to the front surface, so that the sectional shape of the photoresist pattern 14 becomes a rectangular shape by the offset of the two actions of exposure and development, and the duty factor approaches 0.5. By utilizing this photoresist pattern 14, the transparent base plate 12 is etched by the reactive etching due to, for instance, CF4 .