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1. 发明专利

JP2000299265A CLEANING METHOD OF MICROELECTRONIC MANUFACTURING SYSTEM AND MICROELECTRONIC MANUFACTURING SYSTEM CLEANED USING THE SAME 失效
公开(公告)号：JP2000299265A
公开(公告)日：2000-10-24
申请号：JP29835899
申请日：1999-10-20
申请人： SAMSUNG ELECTRONICS CO LTD
发明人： SUNG WOO-DONG , HAN SAM-SOON , OH CHANG-WOOK , LEE KANG-SIK
IPC分类号： H01L21/027 , H01L21/00 , H01L21/02 , H01L21/304 , H01L21/677 , H01L21/68
摘要： PROBLEM TO BE SOLVED: To provide a method of cleaning an electronic manufacturing system so as to reduce its contamination and to improve a microelectronic element in yield and a microelectronic manufacturing system cleaned using the method. SOLUTION: A microelectronic manufacturing system is equipped with a service region 120, a wafer processing region 131 where microelectronic elements are processed, and a wafer transfer region 132 where wafers are transferred, where the wafer transfer region 132 is set lower in air pressure than the wafer processing region 131, by which particles are less moved from the wafer transfer region 132 to the wafer processing region 131, to keep the wafer processing region 131 clean. The pressure of the wafer processing region 131 is set higher than that of the wafer transfer region 132, by which particles are prevented from flowing from the wafer transfer region 132 to the wafer processing region 131.

2. 发明专利

JP2000286192A SEMICONDUCTOR WAFER PROCESSING SYSTEM 失效
公开(公告)号：JP2000286192A
公开(公告)日：2000-10-13
申请号：JP2000058974
申请日：2000-03-03
申请人： SAMSUNG ELECTRONICS CO LTD
发明人： SUNG WOO-DONG , HAN SAM-SOON , OH CHANG-WOOK , NAN TEIRIN
IPC分类号： G03F7/38 , H01L21/00 , H01L21/02 , H01L21/027
摘要： PROBLEM TO BE SOLVED: To provide a semiconductor wafer processing system for improving the manufacturing yield of a semiconductor by drastically making uniform the thickness distribution of a photoresist film on a wafer, for reducing the deviation of the line width of a pattern, and efficiently suppressing the contamination of the wafer in a housing by dust or the like. SOLUTION: An upper space 240b of a baking unit shelf 240a is packed by an air flow suppression dam consisting of a wall body 240c, thus preventing clean air from flowing into the upper space 240b of the bake unit shelf 240a. A lattice 280 is provided at the bottom of a housing 200, where a number of breathers are formed on the lattice 280 to exhaust clean air naturally.

3. 发明专利

JP2004286436A Air flow rate control device and clean room air conditioning system using the same 审中-公开
标题翻译：空气流量控制装置和使用该空气流量控制装置的清洁室内空调系统
公开(公告)号：JP2004286436A
公开(公告)日：2004-10-14
申请号：JP2004078797
申请日：2004-03-18
申请人： Samsung Electronics Co Ltd , 三星電子株式会社
发明人： KIM DONG-HYUN , SUNG WOO-DONG
IPC分类号： F24F5/00 , B01D46/42 , F24F3/16 , F24F13/10
CPC分类号： F24F3/161 , F24F13/10 , F24F2110/40
摘要： PROBLEM TO BE SOLVED: To provide an air flow rate control device capable of freely controlling a discharge flow rate of the cleaning air to an air filter of a clean room, and to provide a clean room air conditioning system utilizing the same. SOLUTION: This air flow rate control device comprises a plurality of first bars 162 fixed by a frame 170, a plurality of second bars 164 vertically moved to the plurality of first bars to be connected with each other, and mounted in a state of respectively intersecting with the corresponding first bar at a lower part of the first bar, a control member 165 for vertically driving the plurality of second bars to adjust the flow rate of the air, and a connecting member 168 for connecting the plurality of second bars and the control member. This air flow rate control device supplies the air into the clean room by the vertical motion of the plurality of second bars to the plurality of first bars at a controllable speed. COPYRIGHT: (C)2005,JPO&NCIPI
摘要翻译：要解决的问题：提供一种能够自由地控制清洁空气到洁净室的空气过滤器的排出流量的空气流量控制装置，并且提供一种利用该空气过滤器的洁净室空调系统。解决方案：该空气流量控制装置包括由框架170固定的多个第一杆162，垂直移动到多个第一杆的多个第二杆164，以彼此连接，并且以一种状态安装在第一杆的下部分别与相应的第一杆相交的控制构件165，用于垂直驱动多个第二杆以调节空气的流量;以及连接构件168，用于连接多个第二杆和控制构件。该空气流量控制装置以可控制的速度将多个第二杆的垂直运动提供给洁净室。版权所有（C）2005，JPO＆NCIPI

4. 发明专利

JP2003178939A FLUID SAMPLING DEVICE AND ANALYZER PROVIDED THEREWITH 审中-公开
公开(公告)号：JP2003178939A
公开(公告)日：2003-06-27
申请号：JP2002279705
申请日：2002-09-25
申请人： SAMSUNG ELECTRONICS CO LTD
发明人： KIN TOGEN , CHO DO-HYUN , SUNG WOO-DONG , KIM JIN-SUK , CHOI WON-SUK
IPC分类号： G01N1/00 , B01L99/00 , G01N1/14 , G01N1/16 , G01N1/18 , G01N35/10 , H01L21/02
摘要： PROBLEM TO BE SOLVED: To provide a sampling device that samples a step fluid used for a step for manufacturing a semiconductor device at a plurality of measuring points, and a fluid analyzer provided therewith. SOLUTION: This sampling device 100 is provided with a first nozzle assembly 102 comprising a plurality of flow-out nozzles 104. The flow-out nozzles 104 are connected with a line for providing a material fluid. A second nozzle assembly 112 arranged on the upper side of the first nozzle assembly 102 is provided with a flow-in nozzle 114 connected with a device for measuring the degree of contamination of the material fluid. A motor connected with the second nozzle assembly 112 matches the central axis of any one selected from the flow-out nozzles 104 with that of the flow-in nozzle 114. In addition, a pneumatic cylinder 158 connected with the first nozzle assembly 102 connects the flow-out nozzle 104 and flow-in nozzle 114 with each other whose central axes are aligned. Therefore, the degree of contamination of the material fluid obtained from a plurality of measuring points can be measured by one measuring device. COPYRIGHT: (C)2003,JPO

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