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1. 发明专利

JP2004117343A Parallel x-ray beam extracting method and apparatus, and x-ray diffraction system 有权
$Parallel x-ray beam extracting method and apparatus, and x-ray diffraction system$
公开(公告)号：JP2004117343A
公开(公告)日：2004-04-15
申请号：JP2003308188
申请日：2003-09-01
申请人： Rigaku Corp , 理学電機株式会社
发明人： FUJINAWA TAKESHI , OKANDA HITOSHI
IPC分类号： G01N23/20 , G21K1/06 , G21K5/08 , H01J35/10
摘要： PROBLEM TO BE SOLVED: To extract a parallel X-ray beam of two wavelengths by using a single paraboloid multilayer film mirror. SOLUTION: A single paraboloid face 10 made for a CuKα ray is used for extracting the parallel X-ray beam of the CuKα ray and a CoKα ray. The CuKα ray emitted from a first X-ray focal point XF1, located at a focal point of the paraboloid 10 advances in a right direction as a parallel beam, after being reflected by a reflecting surface shown by the paraboloid 10 in a region of X=80 to 120 mm. When a second X-ray focal point XF2 is formed, at a point separated upward from the first focal point XF1 by 0.6765 mm, the CoKα ray emitted from the second X-ray focal point FX2 advances in the right direction as a parallel beam, because the beam can be reflected by the reflecting surface shown by the same paraboloid 10 in a region of X=80 to 120 mm. COPYRIGHT: (C)2004,JPO

2. 发明专利

JP2004093492A X-ray small angle scattering optical system 有权
公开(公告)号：JP2004093492A
公开(公告)日：2004-03-25
申请号：JP2002257825
申请日：2002-09-03
申请人： Rigaku Corp , 理学電機株式会社
发明人： FUJINAWA TAKESHI , OKANDA HITOSHI
IPC分类号： G01N23/201
CPC分类号： G01N23/201
摘要： PROBLEM TO BE SOLVED: To easily switch to the other X-ray incident optical system for analyzing X rays by using a paraboloid multilayer film mirror for an X-ray small angle scattering optical system. SOLUTION: The paraboloid multilayer film mirror 24, an optical path selection slit apparatus 26 and a small angle selection slit apparatus 30 are disposed between an X-ray source 22 and a sample side slit 23. An X-ray beam 60 passes through a first aperture 34 of an aperture slit plate 32 and is interrupted by the optical path selection slit apparatus 26. An X-ray beam 62 passes through a second aperture 36, is reflected by a reflection face of the multilayer film mirror 24 and converted into a collimated beam 40, and passes through an aperture 42 of the optical path selection slit apparatus 26. When the collimated beam passes through a thin bundle slit 48 of the small angle selection slit apparatus 28, a beam width is limited. The collimated beam passes through the sample side slit 23 which functions as a scattered beam prevention slit, and is converted into an X-ray beam 64 for small angle scattering measurement. The X-ray beam 64 enters a sample 66. COPYRIGHT: (C)2004,JPO

3. 发明专利

JP2009150911A Device for x-ray diffraction quantitative determination 有权
$Device for x-ray diffraction quantitative determination$
标题翻译： X射线衍射定量测定装置
公开(公告)号：JP2009150911A
公开(公告)日：2009-07-09
申请号：JP2009090741
申请日：2009-04-03
申请人： Rigaku Corp , 株式会社リガク
发明人： OMIYA SADAO , OKANDA HITOSHI , FUJINAWA TAKESHI
IPC分类号： G01N23/207
摘要： PROBLEM TO BE SOLVED: To provide a device for X-ray diffraction quantitative determination, capable of performing extremely accurate calibration, by enabling acquisition of accurate diffraction line intensity information from a base plate in a quantitation method by a base reference absorption diffraction spectroscopy.
SOLUTION: The device for X-ray diffraction quantitative determination for measuring the weight of a substance S using an X ray includes a filter 33 for holding the substance S in a substance-holding region As, an X-ray source F for generating the X ray applied to the substance S, an X-ray detector 20 for detecting diffracted X rays diffracted by the substance S, the base plate 31 which is provided on the opposite side of the X-ray irradiation surface in the filter 33, and which is smaller than the substance-holding region As, and a spatial region 41 provided at an area which is the rear side of the filter 33 in relation to the X-ray source F and which is also a surrounding area of the outer peripheral side surface of the base plate 31. By providing the spatial region 41 around the base plate 31, generation of an error variation in the diffraction lines from the base plate 31 caused by the diffraction lines from a specimen plate 29C forming the spatial region 41 is prevented.
COPYRIGHT: (C)2009,JPO&INPIT
摘要翻译：要解决的问题：为了提供能够进行极精确校准的X射线衍射定量测定装置，能够通过基准参考吸收衍射从定量方法获得来自基板的精确衍射线强度信息光谱学。解决方案：使用X射线测量物质S的重量的用于X射线衍射定量测定的装置包括用于将物质S保持在物质保持区域As中的过滤器33，用于产生施加到物质S的X射线，用于检测被物质S衍射的衍射X射线的X射线检测器20，设置在过滤器33的X射线照射面的相反侧的基板31，并且比物质保持区域As小，以及空间区域41，其设置在与X射线源F相关的作为过滤器33的后侧的区域，并且也是外周的周围区域通过在基板31周围设置空间区域41，由来自形成空间区域41的标本板29C的衍射线引起的与基板31的衍射线的误差变化的产生是防止了版权所有（C）2009，JPO＆INPIT

4. 发明专利

JP2008014958A X-ray diffraction determination apparatus 有权
$X-ray diffraction determination apparatus$
标题翻译： X射线衍射测定装置
公开(公告)号：JP2008014958A
公开(公告)日：2008-01-24
申请号：JP2007248522
申请日：2007-09-26
申请人： Rigaku Corp , 株式会社リガク
发明人： OMIYA SADAO , OKANDA HITOSHI , FUJINAWA TAKESHI
IPC分类号： G01N23/207
摘要： PROBLEM TO BE SOLVED: To provide an X-ray diffraction determination apparatus based on a base standard absorption diffraction method that can produce stable reproducible measurement data by improving a baseplate.
SOLUTION: The X-ray diffraction determination apparatus using a base standard absorption diffraction method computes the absorption of X-rays by a substance S from the intensity of diffracted rays diffracted by the baseplate 31 in the absence of the substance S and the intensity of diffracted rays diffracted by the baseplate 31 after transmission through the substance S, and corrects the weight of the substance S measured with X-rays in accordance with the computed X-ray absorption. The apparatus has a filter 33 for holding the substance S, an X-ray source F for generating X-rays radiated to the substance S, an X-ray detector 20 for detecting diffracted X-rays diffracted by the substance S, and the baseplate 31 arranged on the opposite side of the filter 33 to the X-radiation surface. The X-radiation surface of the baseplate 31 is subjected to treatment for reducing crystal orientation, such as sandblasting or shot peening.
COPYRIGHT: (C)2008,JPO&INPIT
摘要翻译：要解决的问题：提供一种基于能够通过改进基板产生稳定可重现的测量数据的基准标准吸收衍射方法的X射线衍射测定装置。解决方案：使用基准标准吸收衍射方法的X射线衍射测定装置，在不存在物质S的情况下，由基板31衍射的衍射光强度计算物质S对X射线的吸收，通过物质S透射后由基板31衍射的衍射光的强度，并且根据所计算的X射线吸收来校正用X射线测量的物质S的重量。该装置具有用于保持物质S的过滤器33，用于产生辐射到物质S的X射线的X射线源F，用于检测被物质S衍射的衍射X射线的X射线检测器20，以及基板 31布置在过滤器33的与X辐射表面相对的一侧。对基板31的X射线表面进行处理以减少晶体取向，例如喷砂或喷丸硬化。版权所有（C）2008，JPO＆INPIT

5. 发明专利

JP2007093563A X-ray diffraction quantifying device 有权
$X-ray diffraction quantifying device$
标题翻译： X射线衍射定量装置
公开(公告)号：JP2007093563A
公开(公告)日：2007-04-12
申请号：JP2005304340
申请日：2005-10-19
申请人： Rigaku Corp , 株式会社リガク
发明人： OMIYA SADAO , OKANDA HITOSHI , FUJINAWA TAKESHI
IPC分类号： G01N23/207
摘要： PROBLEM TO BE SOLVED: To provide an X-ray diffraction quantifying device capable of performing extremely accurate calibration, by obtaining accurate diffraction, ray strength information from a base plate in a quantitation method by a base reference absorption diffraction method.
SOLUTION: The X-ray diffraction quantifying device for measuring the weight of a substance S, by using X rays comprises a filter 33 for holding the substance S in a substance-holding region As; an X-ray source F for generating X rays applied to the object S; an X-ray detector 20 for detecting diffraction X rays diffracted by the substance S; the base plate 31, that is provided at a side opposite to the X-ray irradiation surface in the filter 33, and is smaller than a substance holding region As; and an amorphous member 30 that is provided at the rear side of the filter 33, when viewed from the X-ray source F and around the outer-periphery side of the base plate 31. No diffraction rays having strong peak waveform are generated from the amorphous member 30, thus preventing the diffraction rays from the base plate 31 from generating erroneous variations.
COPYRIGHT: (C)2007,JPO&INPIT
摘要翻译：要解决的问题：通过基准参考吸收衍射方法，通过定量方法从底板获得准确的衍射光线强度信息，提供能够进行极精确校准的X射线衍射量化装置。解决方案：通过使用X射线测量物质S的重量的X射线衍射定量装置包括用于将物质S保持在物质保持区域As中的过滤器33; 用于产生施加到对象S的X射线的X射线源F; 用于检测被物质S衍射的衍射X射线的X射线检测器20; 基板31设置在与过滤器33的X射线照射面相反的一侧，并且小于物质保持区域As; 以及设置在过滤器33的后侧的非晶构件30，当从X射线源F观察并且围绕基板31的外周侧时，不产生具有强峰值波形的衍射光线非晶构件30，从而防止来自基板31的衍射光产生错误的变化。版权所有（C）2007，JPO＆INPIT

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