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1. 发明专利

JP2013214093A Pattern data creation method, mask creation method, manufacturing method of semiconductor device, pattern creation method and program 有权
标题翻译：图形数据创建方法，掩模创建方法，半导体器件的制造方法，图形创建方法和程序
公开(公告)号：JP2013214093A
公开(公告)日：2013-10-17
申请号：JP2013133621
申请日：2013-06-26
申请人： Nuflare Technology Inc , 株式会社ニューフレアテクノロジー
发明人： ABE TAKAYUKI , SHIBATA HAYATO , KATO YASUO , MATSUMOTO YASUSHI , YASHIMA JUN , IIJIMA TOMOHIRO
IPC分类号： G03F1/70 , H01L21/027
摘要： PROBLEM TO BE SOLVED: To provide a method of accurately correcting dimensional fluctuation even in a case where the size of a graphic pattern is the same degree as or sufficiently larger than the influence range of a phenomenon causing the dimensional fluctuation in the graphic pattern after drawing.SOLUTION: A pattern data creation method includes a step (S102) of setting a representative point on a side of a graphic pattern defined by a design dimension, a step (S104) of acquiring a correction amount of the representative point by solving an equation in which the correction amount of the representative point for correcting, using electronic beam, dimensional fluctuation generated in the graphic pattern after drawing the graphic pattern on a mask substrate for exposure is unknown; and a step (S106) of resizing the dimension of the graphic pattern so that the representative point in which the correction amount has been corrected is positioned on a corresponding side. According to this invention, even in a case where the size of a graphic is the same degree as or sufficiently larger than the influence range of a phenomenon, dimensional fluctuation due to the case can be accurately corrected.
摘要翻译：要解决的问题：即使在图形尺寸与绘制后的图形中的尺寸波动的现象的影响范围相同或足够大的情况下，也能够精确地校正尺寸波动的方法解决方案：图案数据创建方法包括：设置由设计维度定义的图形的一侧的代表点的步骤（S102）;通过求解方程式来获取代表点的校正量的步骤（S104）其中用于校正使用电子束的代表点的校正量在绘制用于曝光的掩模衬底上的图形之后在图形中产生的尺寸波动是未知的; 以及调整图形尺寸的尺寸的步骤（S106），使得校正量已被校正的代表点位于相应的一侧。根据本发明，即使在图形的尺寸与现象的影响范围相同或充分大的情况下，也可以准确地校正由于该情况引起的尺寸变动。

2. 发明专利

JP2009141290A Drawing device, and drawing data conversion method 有权
标题翻译：绘图设备和绘图数据转换方法
公开(公告)号：JP2009141290A
公开(公告)日：2009-06-25
申请号：JP2007319067
申请日：2007-12-11
申请人： Nuflare Technology Inc , 株式会社ニューフレアテクノロジー
发明人： SHIBATA HAYATO
IPC分类号： H01L21/027
CPC分类号： H01J37/3174 , B82Y10/00 , B82Y40/00 , G03F1/78
摘要： PROBLEM TO BE SOLVED: To provide a drawing device for reducing the data size by reducing the useless number of bits. SOLUTION: This drawing device 100 of one embodiment has a magnetic disk device 110 storing drawing data, a pattern dividing part 46 acquiring information on a defined pattern, a format selecting part 50 selecting any of a plurality of formats different in the use number of bits based on the acquired pattern information with every predetermined area, a format conversion part 52 converting data in a predetermined area defined to the drawing data by the selected format, and a drawing part 150 drawing a predetermined pattern on a sample based on the converted data in the predetermined area, This invention can largely reduce the data size. COPYRIGHT: (C)2009,JPO&INPIT
摘要翻译：要解决的问题：提供一种通过减少无用数位来减小数据大小的绘图装置。解决方案：一个实施例的绘图装置100具有存储绘图数据的磁盘装置110，在定义的图案上获取信息的图案划分部分46，选择使用中不同的多种格式中的任一种的格式选择部分50 基于所获取的每个预定区域的图案信息的位数，格式转换部分52，按照所选择的格式将绘制数据中定义的预定区域中的数据进行转换;以及绘制部分150，基于在预定区域转换数据，本发明可以大大减少数据大小。版权所有（C）2009，JPO＆INPIT

3. 发明专利

JP2011023564A Charged particle beam drawing apparatus, and charged particle beam drawing data generation device 有权
标题翻译：充电颗粒光束绘图设备和充电颗粒光束绘图数据生成设备
公开(公告)号：JP2011023564A
公开(公告)日：2011-02-03
申请号：JP2009167525
申请日：2009-07-16
申请人： Nuflare Technology Inc , 株式会社ニューフレアテクノロジー
发明人： HARA SHIGEHIRO , SHIBATA HAYATO , HIGURE HITOSHI
IPC分类号： H01L21/027 , G03F7/20
摘要： PROBLEM TO BE SOLVED: To shorten an unnecessary wait time and a total processing time of a data processing section while alleviating an increase in total memory capacity needed for data processing in the data processing section. SOLUTION: A charged particle beam drawing apparatus 10 which draws a pattern on a sample M with a charged particle beam 10a1b: divides cells of size larger than a first threshold included in drawing data D1 into a plurality of cells of size equal to or smaller than the first threshold; redefines cells having data amounts larger than a second threshold among the cells of size equal to or smaller than the first threshold as the cells including a plurality of figures of an array type and the cells including a plurality of figures of a non-array type; divides cells of size larger than a third threshold into a plurality of cells of size equal to or smaller than the third threshold among cells including a plurality of figures of the non-array type; and allocates a plurality of cells after those processings to a plurality of data processing sections 10b1e1, ..., to perform data processing on the plurality of cells in parallel. COPYRIGHT: (C)2011,JPO&INPIT
摘要翻译：要解决的问题：减少数据处理部分的不必要的等待时间和总处理时间，同时减轻数据处理部分中的数据处理所需的总存储器容量的增加。解决方案：带电粒子束10a1b在样品M上绘制图案的带电粒子束描绘装置10：将大于包含在绘制数据D1中的第一阈值的尺寸的细胞分成多个等于或小于第一阈值; 重新定义具有大于等于或小于第一阈值的单元格中的数据量大于第二阈值的单元，这些单元包括阵列类型的多个图形，并且所述单元包括非阵列类型的多个图形; 将具有大于第三阈值的大小的单元划分成包括非阵列类型的多个图形的单元之间的大小等于或小于第三阈值的多个单元; 并且在这些处理之后分配多个单元到多个数据处理单元10b1e1，...，以并行地对多个单元进行数据处理。版权所有（C）2011，JPO＆INPIT

4. 发明专利

JP2010067808A Drawing apparatus, drawing data conversion method, and drawing method 审中-公开
标题翻译：绘图设备，绘图数据转换方法和绘图方法
公开(公告)号：JP2010067808A
公开(公告)日：2010-03-25
申请号：JP2008233021
申请日：2008-09-11
申请人： Nuflare Technology Inc , 株式会社ニューフレアテクノロジー
发明人： SHIBATA HAYATO
IPC分类号： H01L21/027 , G03F1/20 , G03F1/68 , G03F7/20
摘要： PROBLEM TO BE SOLVED: To provide a drawing apparatus capable of reducing the number of bits per pixel and also reducing data size. SOLUTION: The drawing apparatus 100 is characterized by including: a pattern partitioning section 46 that acquires pattern information including at least one of a plurality of pattern figure codes, an array flag, the number of arrays and an array pitch; an accumulation table forming section 50 that relates each pattern information to the number of use for each pattern information for each predetermined region; a Huffman tree forming section 52 that forms a Huffman tree, a Huffman table forming section 54 that forms a Huffman table that relates each pattern information to an encrypted binary variable length code, wherein a smaller numerical value is assigned to pattern information as the frequency of use increases; a format converting section 56 that converts data in a predetermined region defined as drawing data in a predetermined format using a variable length code, and a drawing section 150 that draws a plurality of patterns in a test piece based on the converted data in the predetermined region. COPYRIGHT: (C)2010,JPO&INPIT
摘要翻译：解决的问题：提供能够减少每像素的位数并且还减少数据大小的绘图装置。解决方案：绘图装置100的特征在于包括：图案划分部分46，其获取包括多个图案图形代码，阵列标志，阵列数和阵列间距中的至少一个的图案信息; 累积表形成部50，其将每个图案信息与每个预定区域的每个图案信息的使用次数相关联; 形成霍夫曼树的霍夫曼树形成部52，形成将每个图案信息与加密的二进制可变长度码相关联的霍夫曼表的霍夫曼表形成部54，其中较小的数值被分配给模式信息作为频率使用增加; 格式转换部分56，其使用可变长度代码将预定区域中定义为绘制数据的数据转换成数据;以及绘制部分150，其基于预定区域中的转换数据绘制测试片中的多个图案。版权所有（C）2010，JPO＆INPIT

5. 发明专利

JP2009188000A Writing apparatus and writing data conversion method 有权
标题翻译：书写装置和书写数据转换方法
公开(公告)号：JP2009188000A
公开(公告)日：2009-08-20
申请号：JP2008023577
申请日：2008-02-04
申请人： Nuflare Technology Inc , 株式会社ニューフレアテクノロジー
发明人： SHIBATA HAYATO
IPC分类号： H01L21/027
CPC分类号： H01J37/3174 , B82Y10/00 , B82Y40/00
摘要： PROBLEM TO BE SOLVED: To provide a lithographic apparatus capable of reducing the data size by reducing the number of bits. SOLUTION: The writing apparatus 100, according to one embodiment, is provided with: a pattern separating section 46 for acquiring pattern information of a plurality of patterns, based on lithographic data; an accumulation table generating section 50 for generating an accumulation table in which each piece of pattern information is associated with the number of usage times in units of predetermined regions; a Huffman tree generating section 52 for generating a Huffman tree, based on the accumulation table; a Huffman table generating section 54 for generating a Huffman table in which each piece of pattern information is associated with a variable-length code, obtained by encoding each piece of pattern information so that the frequently used pattern information has a small value, based on the Huffman tree; and a format conversion section 56 for converting data in a predetermined format by using the variable-length code based on the Huffman table. The writing apparatus can significantly reduce the data size. COPYRIGHT: (C)2009,JPO&INPIT
摘要翻译：要解决的问题：提供能够通过减少位数来减少数据大小的光刻设备。解决方案：根据一个实施例，写入装置100设置有：基于光刻数据获取多个图案的图案信息的图案分离部分46; 累积表生成部50，用于生成每个图案信息与预定区域的单位的使用次数相关联的累加表; 基于积累表生成霍夫曼树的霍夫曼树生成部52; 霍夫曼表生成部54，用于生成霍夫曼表，其中每个图案信息与可变长度代码相关联，所述可变长度代码是通过对每个图案信息进行编码而获得的，以便频繁使用的图案信息具有小的值，霍夫曼树以及格式转换部分56，用于通过使用基于霍夫曼表的可变长度代码来转换预定格式的数据。写入设备可以显着减少数据大小。版权所有（C）2009，JPO＆INPIT

6. 发明专利

JP2011023542A Charged particle beam drawing method and device 有权
标题翻译：充电颗粒光束绘图方法和装置
公开(公告)号：JP2011023542A
公开(公告)日：2011-02-03
申请号：JP2009167179
申请日：2009-07-15
申请人： Nuflare Technology Inc , 株式会社ニューフレアテクノロジー
发明人： SHIBATA HAYATO , HIGURE HITOSHI , ANPO AKIHITO , YASHIMA JUN , HARA SHIGEHIRO , OKI SUSUMU
IPC分类号： H01L21/027 , H01J37/305
CPC分类号： H01J37/3026 , B82Y10/00 , B82Y40/00 , H01J37/3174
摘要： PROBLEM TO BE SOLVED: To curtail the capacity of an output buffer and a memory, and to shorten transfer time of data. SOLUTION: In a charged particle beam drawing device 10 in which a pattern corresponding to a figure included in drawing data is drawn on a sample M by a charged particle beam 10a1b, strip-shaped stripe frames STR1 or the like on the sample M are divided into a plurality of block frames DPB11, DPB12 or the like, the block frames DPB11 and DPB12 adjacent to each other of the plurality of block frames DPB11, DPB12 or the like in the stripe frames STR1 or the like are collected, thereby constituting a virtual block frame VDPB11, and data DVDPB11 corresponding to the virtual block frame VDPB11 is read out from an input buffer 10b1b by an input data dividing module 10b1d, stored in an output buffer 10b1d1, and transferred from an output buffer 10b1d1 to a shared memory 10b1e12 of converters 10b1e1 and 10b1e2. COPYRIGHT: (C)2011,JPO&INPIT
摘要翻译：要解决的问题：减少输出缓冲器和存储器的容量，并缩短数据传输时间。解决方案：在带电粒子束描绘装置10中，其中通过带电粒子束10a1b将与图形数据中包括的图形对应的图案绘制在样本M上，样本上的带状条纹STR1等 M被分成多个块帧DPB11，DPB12等，收集在条带帧STR1等中的多个块帧DPB11，DPB12等中彼此相邻的块帧DPB11和DPB12，由此构成虚拟块帧VDPB11，与虚拟块帧VDPB11对应的数据DVDPB11由存储在输出缓冲器10b1d1中的输入数据分割模块10b1d从输入缓冲器10b1b读出，并从输出缓冲器10b1d1传送到共享转换器10b1e1和10b1e2的存储器10b1e12。版权所有（C）2011，JPO＆INPIT

7. 发明专利

JP2010050186A Acquisition method for division area data volume of drawing data, and acquisition device for division area data volume of drawing data 有权
标题翻译：绘图数据分区数据量采集方法及分区数据收集数据量图
公开(公告)号：JP2010050186A
公开(公告)日：2010-03-04
申请号：JP2008211424
申请日：2008-08-20
申请人： Nuflare Technology Inc , 株式会社ニューフレアテクノロジー
发明人： SHIBATA HAYATO , ANPO AKIHITO
IPC分类号： H01L21/027
摘要： PROBLEM TO BE SOLVED: To provide a method of acquiring a block size not only exceeding a memory capacity of a buffer memory but also preventing it from getting low unnecessarily.
SOLUTION: This acquisition method for a division area data volume of a drawing data is provided with a process (S202) for inputting the drawing data, a process (S208) for dividing a drawing area into a plurality of block areas having a prescribed block size, a process (S216) for estimating a data volume of a pattern arranged within each block area, using a pattern number expected value, after divided, derived based on a probability of dividing the defined pattern, and a process (S224) for outputting the data volume of each block area. The data volume of each block area is easily acquired before drawing.
COPYRIGHT: (C)2010,JPO&INPIT
摘要翻译：要解决的问题：提供一种获取不仅超过缓冲存储器的存储容量的块大小的方法，而且还防止其不必要地变低。解决方案：绘制数据的分割区域数据量的该获取方法具有用于输入绘制数据的处理（S202），用于将绘制区域划分为多个块区域的处理（S208）规定块大小的处理（S216），用于基于划分所定义的图案的概率导出的分割之后，使用模式数量期望值来估计布置在每个块区域内的图案的数据量的处理（S224）用于输出每个区块的数据量。绘制前容易获取每个块区域的数据量。版权所有（C）2010，JPO＆INPIT

8. 发明专利

JP2013157623A Drawing method and drawing device 有权
标题翻译：绘图方法和绘图装置
公开(公告)号：JP2013157623A
公开(公告)日：2013-08-15
申请号：JP2013067231
申请日：2013-03-27
申请人： Nuflare Technology Inc , 株式会社ニューフレアテクノロジー
发明人： ABE TAKAYUKI , SHIBATA HAYATO , KATO YASUO , MATSUMOTO YASUSHI , YASHIMA JUN , IIJIMA TOMOHIRO , MOTOSUGI TOMOO , ONISHI TAKAYUKI , YASUSE HIROTO
IPC分类号： H01L21/027 , G03F7/20 , H01J37/305
摘要： PROBLEM TO BE SOLVED: To provide a drawing device capable of calculating a radiation value obtained by correcting a proximity effect with higher accuracy.SOLUTION: A drawing device 100 of one embodiment of this invention includes a radiation value calculation unit 112 for solving an equation of stored energy by backscattering of charged particle beams defined by a polynomial expression having secondary or more items of an irradiation amount to calculate an irradiation amount, and a drawing unit 150 for irradiating a sample 101 with an electron beam 200 with the calculated irradiation amount to draw a pattern thereon. According to the invention, drawing can be performed with an irradiation amount obtained by correcting a proximity effect with higher accuracy.
摘要翻译：要解决的问题：提供能够计算通过以更高的精度校正邻近效应而获得的辐射值的绘图装置。解决方案：本发明的一个实施例的绘图装置100包括：辐射值计算单元112，用于求解通过由具有次要或更多个照射量项目的多项式表达式定义的带电粒子束的后向散射来计算存储能量，以计算照射量;以及绘制单元150，用于用计算的照射量向样品101照射电子束200以绘制其上的图案。根据本发明，可以以通过以更高的精度校正邻近效应而获得的照射量进行绘图。

9. 发明专利

JP2010098275A Drawing method and drawing apparatus 有权
标题翻译：绘图方法和绘图装置
公开(公告)号：JP2010098275A
公开(公告)日：2010-04-30
申请号：JP2008306009
申请日：2008-12-01
申请人： Nuflare Technology Inc , 株式会社ニューフレアテクノロジー
发明人： ABE TAKAYUKI , SHIBATA HAYATO , KATO YASUO , MATSUMOTO YASUSHI , YASHIMA JUN , IIJIMA TOMOHIRO , MOTOSUGI TOMOO , ONISHI TAKAYUKI , YASUSE HIROTO
IPC分类号： H01L21/027 , G03F7/20
摘要： PROBLEM TO BE SOLVED: To provide a drawing apparatus capable of obtaining an irradiation dose for which a proximity effect is corrected more highly accurately.
SOLUTION: The drawing apparatus 100 of one embodiment includes: an irradiation dose calculation part 112 for determining the irradiation dose by solving the equation of storage energy by backscattering of a charged particle beam defined by a polynomial having the term of at least second order of the irradiation dose; and a drawing part 150 for drawing a pattern on a sample 101 by irradiation with an electron beam 200 by the determined irradiation dose. Drawing is executed by the irradiation dose with which the proximity effect is corrected more highly accurately.
COPYRIGHT: (C)2010,JPO&INPIT
摘要翻译：解决的问题：提供能够获得更高精度地校正邻近效应的照射剂量的绘图装置。解决方案：一个实施例的绘图装置100包括：照射剂量计算部分112，用于通过由具有至少第二项的多项式定义的带电粒子束的后向散射来求解存储能量方程式来确定照射剂量照射剂量的顺序; 以及用于通过用确定的照射剂量用电子束200照射来在样品101上绘制图案的绘图部分150。通过照射剂量执行绘图，其中更接近地校正更接近效应。版权所有（C）2010，JPO＆INPIT

10. 发明专利

JP2010066337A Method for creating pattern data, method for creating mask, method for manufacturing semiconductor device, and method and program for creating pattern 有权
标题翻译：用于创建图案数据的方法，用于创建掩模的方法，制造半导体器件的方法，以及用于创建图案的方法和程序
公开(公告)号：JP2010066337A
公开(公告)日：2010-03-25
申请号：JP2008230430
申请日：2008-09-09
申请人： Nuflare Technology Inc , 株式会社ニューフレアテクノロジー
发明人： ABE TAKAYUKI , SHIBATA HAYATO , KATO YASUO , MATSUMOTO YASUSHI , YASHIMA JUN , IIJIMA TOMOHIRO
IPC分类号： G03F1/36 , G03F1/68 , G03F1/70 , H01L21/027
摘要： PROBLEM TO BE SOLVED: To provide a method for correcting a dimensional change with high accuracy even when the size of a figure pattern after drawn is almost equal to or significantly larger than the range influenced by a phenomenon that causes dimensional changes in the figure pattern.
SOLUTION: A method for creating pattern data includes: a step (S102) of setting a representative point on a side of a figure pattern defined by a design dimension; a step (104) of determining a correction amount of the representative point by using and solving an equation with the correction amount of the representative point as an unknown for correcting the dimensional change induced in the figure pattern after the pattern is drawn on a mask substrate for exposure by using an electron beam; and a step (S106) of resizing the dimension of the figure pattern in such a manner that the representative point corrected by the correction amount is positioned on the corresponding side of the resized pattern. By this method, even when the size of the figure is almost equal to or enough larger than the range influenced by the phenomenon, dimensional changes caused by the phenomenon can be corrected with high accuracy.
COPYRIGHT: (C)2010,JPO&INPIT
摘要翻译：要解决的问题：即使当绘制后的图形图案的尺寸几乎等于或显着大于由引起的尺寸变化的现象影响的范围时，提供一种以高精度校正尺寸变化的方法图形图案。解决方案：一种用于创建图案数据的方法包括：步骤（S102），其设置由设计维度定义的图形图案的一侧的代表点; 通过使用和求解具有代表点的校正量的方程作为未知的来确定代表点的校正量的步骤（104），用于校正在图案被绘制在掩模基板上之后的图形图案中引起的尺寸变化用于通过使用电子束曝光; 以及以通过校正量校正的代表点位于调整大小的图案的相应侧上的方式调整图形尺寸的尺寸的步骤（S106）。通过这种方法，即使当图的大小几乎等于或足够大于受现象影响的范围时，也可以高精度地校正由该现象引起的尺寸变化。版权所有（C）2010，JPO＆INPIT

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