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1. 发明专利

JP2012015245A Device and method for drawing charged particle beam 有权
标题翻译：用于绘制充电颗粒束的装置和方法
公开(公告)号：JP2012015245A
公开(公告)日：2012-01-19
申请号：JP2010148842
申请日：2010-06-30
申请人： Nuflare Technology Inc , 株式会社ニューフレアテクノロジー
发明人： KATO YASUO , ANPO AKIHITO , YASHIMA JUN
IPC分类号： H01L21/027
摘要： PROBLEM TO BE SOLVED: To provide a device for drawing an electron beam which reduces the drawing time when performing the multiple drawing.SOLUTION: The drawing device 100 includes: a layer forming unit 50 which forms a plurality of layers constituted by a plurality of small areas obtained by virtually dividing a chip region where graphic patterns are disposed so as to coincide with the maximum multiplicity out of the multiplicity set in a plurality of pieces of multiplicity setting area information in which at least one of two or more types of multiplicity is set; a graphic arrangement unit 52 in which the graphic patterns in the small area are disposed in the plurality of the small areas of each layer so that the layer is divided for every multiplicity; and a drawing unit 150 which draws the graphic patterns in the plurality of the small areas in accordance with the multiplicity using electron beams.
摘要翻译：要解决的问题：提供一种用于绘制电子束的装置，其在进行多次绘制时缩短了绘制时间。解决方案：绘图装置100包括：层形成单元50，其形成由通过虚拟地划分图形图案的芯片区域而获得的多个小区域构成的多个层，以便与最大多重性出口一致在多个多重设置区域信息中设置两个或多个多重类型中的至少一个的多重集合中的多项集合; 图形布置单元52，其中小区域中的图形布置在每个层的多个小区域中，使得该层被分割成多个; 以及绘制单元150，其根据使用电子束的多重性绘制多个小区域中的图形。版权所有（C）2012，JPO＆INPIT

2. 发明专利

JP2012015244A Device and method for drawing charged particle beam 有权
标题翻译：用于绘制充电颗粒束的装置和方法
公开(公告)号：JP2012015244A
公开(公告)日：2012-01-19
申请号：JP2010148841
申请日：2010-06-30
申请人： Nuflare Technology Inc , 株式会社ニューフレアテクノロジー
发明人： KATO YASUO , YASHIMA JUN , ANPO AKIHITO
IPC分类号： H01L21/027
摘要： PROBLEM TO BE SOLVED: To provide a method for drawing a charged particle beam which reduces the drawing time when performing the multiple drawing.SOLUTION: A drawing device 100 includes: a division part 50 which virtually divides a chip region in which a pattern is formed into a plurality of small areas; a multiplex degree computing/setting part 64 which sets the multiplex degree for drawing the pattern in the small areas for every small area so that the multiplex degree different from the others is set to at least a part of the plurality of the small areas obtained by virtual division of the chip region; and a drawing part 150 which draws the pattern in the small areas with the multiplex degree set for every small area using the charged particle beam.
摘要翻译：要解决的问题：提供一种在进行多次拉拔时减少拉伸时间的带电粒子束的绘制方法。解决方案：绘图装置100包括：划分部分50，其将形成图案的芯片区域虚拟地划分为多个小区域; 多重度计算/设置部分64，其设置用于每个小区域在小区域中绘制图案的复用度，使得与其他区域不同的多路复用度被设置为通过以下方式获得的多个小区域的至少一部分：虚拟划分芯片区域; 以及绘制部分150，其使用带电粒子束在每个小区域上设置多个度的小区域中绘制图案。版权所有（C）2012，JPO＆INPIT

3. 发明专利

JP2007059429A Method for verifying data 有权
标题翻译：验证数据的方法
公开(公告)号：JP2007059429A
公开(公告)日：2007-03-08
申请号：JP2005239444
申请日：2005-08-22
申请人： Nuflare Technology Inc , 株式会社ニューフレアテクノロジー
发明人： ANPO AKIHITO , HARA SHIGEHIRO , HIGURE HITOSHI , IIJIMA TOMOHIRO , HANDA SUKEHITO
IPC分类号： H01L21/027 , G03F1/84
摘要： PROBLEM TO BE SOLVED: To provide a simpler method for verifying writing data. SOLUTION: The method for verifying the writing data 12 for the layout data 10 by comparing the layout data 10 including information about a region where a figure is arranged with the writing data 12 comprises a step (S102) for inputting the writing data 12 and the layout data 10, a step (S112) for comparing the area of a figure in a predetermined region of both the data, a step (S116) for comparing the centroidal position of a figure in a predetermined region of both the data, and a step (S124) for outputting the result of the area comparison step and the result of the centroidal position comparison step. COPYRIGHT: (C)2007,JPO&INPIT
摘要翻译：要解决的问题：提供用于验证写入数据的更简单的方法。解决方案：通过将包括关于图形的区域的信息的布局数据10与写入数据12进行比较来验证布局数据10的写入数据12的方法包括用于输入写入数据的步骤（S102） 12和布局数据10，用于比较两个数据的预定区域中的图形的区域的步骤（S112），用于比较两个数据的预定区域中的图形的重心位置的步骤（S116）以及用于输出区域比较步骤的结果和重心位置比较步骤的结果的步骤（S124）。版权所有（C）2007，JPO＆INPIT

4. 发明专利

JP2010050187A Acquisition method for division area size of drawing data, and acquisition device for division area size of drawing data 审中-公开
标题翻译：绘图数据区划区域的采集方法和图形数据区划区域的获取装置
公开(公告)号：JP2010050187A
公开(公告)日：2010-03-04
申请号：JP2008211425
申请日：2008-08-20
申请人： Nuflare Technology Inc , 株式会社ニューフレアテクノロジー
发明人： SHIBATA HAYATO , ANPO AKIHITO
IPC分类号： H01L21/027 , G03F7/20
摘要： PROBLEM TO BE SOLVED: To provide a method of acquiring a block size not exceeding a memory capacity of a buffer memory.
SOLUTION: This acquisition method for a division area size of a drawing data is provided with a process (S202) for inputting the drawing data, a process (S208) for dividing a drawing area into a plurality of block areas having the block size, a process (S216) for storing a data volume of a pattern in a cell into a corresponding element of a quad tree, in every cell, a process (S220) for distributing the data volume of the pattern to a corresponding block area, a process (S222) for accumulation-adding the distributed data volume of the pattern in every area, a process (S226) for determining whether an accumulation-added data volume is within the memory capacity or not, a process (S228) for reducing the block size, when not within the memory capacity as a determination result, to feed back a new block size, and a process (S230) for outputting the block size of which the block size is the memory capacity or less.
COPYRIGHT: (C)2010,JPO&INPIT
摘要翻译：要解决的问题：提供一种获取不超过缓冲存储器的存储容量的块大小的方法。解决方案：用于绘制数据的分割区域尺寸的该获取方法具有用于输入绘图数据的处理（S202），用于将绘图区域划分成具有块的多个块区域的处理（S208）在每个小区中存储用于将小区中的模式的数据量存储到四叉树的对应元素中的处理（S216），用于将模式的数据量分配到对应的块区域的处理（S220）用于在每个区域中累积 - 添加图案的分布式数据量的处理（S222），用于确定累积相加数据量是否在存储器容量内的处理（S226），用于减少累积相加数据量的处理当不在作为确定结果的存储器容量内时，块大小来反馈新的块大小，以及用于输出块大小是存储器容量或更小的块大小的处理（S230）。版权所有（C）2010，JPO＆INPIT

5. 发明专利

JP2009064862A Charged particle beam lithography apparatus and method 有权
标题翻译：充电颗粒光束光刻设备和方法
公开(公告)号：JP2009064862A
公开(公告)日：2009-03-26
申请号：JP2007229853
申请日：2007-09-05
申请人： Nuflare Technology Inc , 株式会社ニューフレアテクノロジー
发明人： OKI SUSUMU , HIGURE HITOSHI , ANPO AKIHITO , YAMAMOTO TOSHIAKI
IPC分类号： H01L21/027 , H01J37/305
CPC分类号： H01J37/3174 , B82Y10/00 , B82Y40/00 , H01J37/3026
摘要： PROBLEM TO BE SOLVED: To provide a drawing apparatus for efficiently calculating pattern area density and proximity effect compensation.
SOLUTION: A lithography apparatus 100 includes a block area dividing section 122 for dividing a lithography area into a plurality of first block areas in different sizes to provide the almost equal number of shots, an area density calculating section 126 for calculating each internal pattern area density in each first block area, a second block area dividing section 128 to newly divide the lithography area into a plurality of second block areas, a proximity effect correction calculating section 134 to calculate amount of radiation of light for each internal proximity effect correction using pattern area density in each second block area, a radiation amount calculating section 134 to calculate amount of radiation beam using amount of radiation of light for proximity effect correction, and a lithography section 150 for implementing lithography in the calculated amount of radiation of beam. Thus, fluctuation in calculating time periods among blocks can be eliminated.
COPYRIGHT: (C)2009,JPO&INPIT
摘要翻译：要解决的问题：提供一种用于有效地计算图案区域密度和邻近效应补偿的绘图装置。解决方案：光刻设备100包括块区域划分部分122，用于将光刻区域划分成多个不同大小的第一块区域以提供几乎相等数量的照片;区域密度计算部分126，用于计算每个内部每个第一块区域中的图案区域密度，将光刻区域重新划分为多个第二块区域的第二块区域划分部分128，用于计算每个内部邻近效应校正的光的辐射量的邻近效应校正计算部分134 使用每个第二块区域中的图案区域密度;辐射量计算部134，用于计算使用用于邻近效应校正的光的辐射量的辐射束的量;以及用于在计算的光束辐射量中实现光刻的光刻部分150。因此，可以消除块之间的计算时间段的波动。版权所有（C）2009，JPO＆INPIT

6. 发明专利

JP2008130862A Producing method of drawing data, converting method of drawing data and charged particle beam drawing method 有权
标题翻译：绘制数据的制作方法，绘制数据的转换方法和带电粒子束绘图方法
公开(公告)号：JP2008130862A
公开(公告)日：2008-06-05
申请号：JP2006315048
申请日：2006-11-22
申请人： Nuflare Technology Inc , 株式会社ニューフレアテクノロジー
发明人： KASAHARA ATSUSHI , HIGURE HITOSHI , HARA SHIGEHIRO , ANPO AKIHITO
IPC分类号： H01L21/027 , G03F7/20
摘要： PROBLEM TO BE SOLVED: To provide the producing technique of drawing data excellent in processing efficiency and provide the converting technique of the drawing data excellent in processing efficiency.
SOLUTION: The producing method of the drawing data for drawing based on the design data of a circuit employing the charged particle line is provided with an arrangement data file producing process S102 for producing an arrangement data file comprising the arrangement data for arranging a pattern, a pattern information file producing process S104 for producing the pattern data file and a link data file producing process S106 for producing an information for linking the arrangement data to the pattern data and a link data file wherein the operational information of the linked pattern data are defined.
COPYRIGHT: (C)2008,JPO&INPIT
摘要翻译：要解决的问题：提供绘制处理效率优异的数据的制造技术，并提供加工效率优异的绘图数据的转换技术。解决方案：基于使用带电粒子线的电路的设计数据绘制绘制数据的制造方法，设置有用于产生排列数据文件的排列数据文件生成处理S102，该排列数据文件包括用于布置图案，用于产生图案数据文件的图案信息文件生成处理S104和用于产生用于将排列数据链接到图案数据的信息的链接数据文件产生处理S106和链接图案数据的操作信息的链接数据文件被定义。版权所有（C）2008，JPO＆INPIT

7. 发明专利

JP2012191087A Charged particle beam lithography apparatus and charged particle beam lithography method 有权
标题翻译：充电颗粒光束光刻装置和充电颗粒光束光刻方法
公开(公告)号：JP2012191087A
公开(公告)日：2012-10-04
申请号：JP2011054856
申请日：2011-03-11
申请人： Nuflare Technology Inc , 株式会社ニューフレアテクノロジー
发明人： ANPO AKIHITO
IPC分类号： H01L21/027
摘要： PROBLEM TO BE SOLVED: To provide a charged particle beam lithography apparatus capable of securing high throughput while preventing a deterioration in drawing accuracy.SOLUTION: A charged particle beam lithography apparatus includes: a layout data storage unit 106 for storing layout data; a position correction information storage unit 107 for storing position correction information for drawing a figure in a predetermined position of a sample; a main area setting unit 141 for setting a plurality of main areas in a drawing area; a sub-area setting unit 142 for setting a sub-area subject to the main area and adjacent to the main area; a figure distribution unit 143 for distributing the figures to the main area and the sub-area; a figure conversion unit 144 for distributing the figure to a sub-field; a position correction unit 145 for correcting a position of the sub-field on the basis of position correction information; a mapping unit 146 for performing mapping of the positionally-corrected sub-field and a drawing data stripe; a shot conversion unit 147 for converting the figure, which is distributed to the sub-field, to shot data; and a drawing unit 102 for performing drawing by sequentially applying a charged particle beam onto the sample.
摘要翻译：要解决的问题：提供一种能够确保高通量同时防止拉拔精度降低的带电粒子束光刻设备。解决方案：带电粒子束光刻设备包括：布局数据存储单元106，用于存储布局数据; 位置校正信息存储单元107，用于存储在样本的预定位置绘制图形的位置校正信息; 主区域设定单元141，用于设置绘图区域中的多个主要区域; 子区域设定单元142，用于设定主区域并与主区域相邻的子区域; 图形分配单元143，用于将图分配到主区域和子区域; 图形转换单元144，用于将图形分配到子场; 位置校正单元145，用于基于位置校正信息校正子场的位置; 用于执行位置校正子场和绘图数据条纹的映射的映射单元146; 镜头转换单元147，用于将分配给子场的图形转换成镜头数据; 以及用于通过将带电粒子束依次施加到样本上来进行绘图的绘图单元102。版权所有（C）2013，JPO＆INPIT

8. 发明专利

JP2011066036A Charged particle beam writing method and apparatus therefor 有权
标题翻译：充电颗粒光束写入方法及其装置
公开(公告)号：JP2011066036A
公开(公告)日：2011-03-31
申请号：JP2009212780
申请日：2009-09-15
申请人： Nuflare Technology Inc , 株式会社ニューフレアテクノロジー
发明人： ANPO AKIHITO
IPC分类号： H01L21/027
CPC分类号： H01J37/3174 , B82Y10/00 , B82Y40/00
摘要： PROBLEM TO BE SOLVED: To reduce writing time for writing a plurality of writing groups different in writing conditions.
SOLUTION: The writing apparatus 100 includes a memory device 144 for inputting layout information of a plurality of chips on which pattern formation is to be achieved and storing the information; a writing group setting section 108 for setting, by using the layout information, a plurality of writing groups with each constituted of at least one chip and each having writing conditions differing from each other; a frame-setting section 112 for setting a frame which encloses the overall chip regions in all the writing groups; a stripe dividing section 114 for virtually dividing the frame into a plurality of stripe regions in a predetermined direction, while allowing the chips of the different writing groups to be mixed; an order-setting section 116 for setting an order of each of the plurality of regions so that a reference position of each of the regions is located in order in the predetermined direction; and a writing section 150 for writing a pattern in each of the regions onto a sample according to the order which has been set, by using an electron beam 200.
COPYRIGHT: (C)2011,JPO&INPIT
摘要翻译：要解决的问题：减少写入写入条件不同的多个写入组的写入时间。解决方案：写入装置100包括用于输入将要实现图案形成的多个芯片的布局信息并存储该信息的存储器件144; 写入组设定部分108，用于通过使用布局信息来设置由至少一个芯片构成的并且每个具有彼此不同的写入条件的多个写入组; 帧设置部分112，用于设置在所有写入组中包围整个芯片区域的帧; 条形分割部分114，用于在允许不同写入组的芯片混合的同时将帧实际上划分成预定方向上的多个条带区域; 用于设置多个区域中的每一个的顺序的顺序设置部分116，使得每个区域的基准位置按预定方向依次定位; 以及写入部分150，用于通过使用电子束200，根据已设定的顺序，将每个区域中的图案写入样本。（C）2011，JPO＆INPIT

9. 发明专利

JP2010212456A Charged particle beam lithography system, charged particle beam lithography method, and device for selecting data processing system 有权
标题翻译：充电粒子束光刻系统，充电粒子束光刻方法和选择数据处理系统的装置
公开(公告)号：JP2010212456A
公开(公告)日：2010-09-24
申请号：JP2009056961
申请日：2009-03-10
申请人： Nuflare Technology Inc , 株式会社ニューフレアテクノロジー
发明人： ANPO AKIHITO
IPC分类号： H01L21/027 , G03F7/20 , H01J37/305
摘要： PROBLEM TO BE SOLVED: To provide a device which can process data more efficiently even if the SF size and the cluster size are made smaller.
SOLUTION: The lithography system 100 includes a control computer 110 which selects either an all-layer conversion system that generates the internal data for the number of times of multiple drawing so that figures corresponding to the number of times of multiple drawing are arranged in an SF or a single-layer conversion system that generates the internal data for single time of multiple drawing so that a figure is arranged in a cluster, a control computer 130 which generates the internal data by one system by processing the data according to a selected system, a storage device 174 which stores the internal data temporarily, a control computer 140 which generates a plurality of shot data for the number of times of multiple drawing by processing the data according to the selected system, and a drawing unit 150 which performs multiple drawing of a pattern on a sample by using the plurality of shot data while shifting the drawing range of each time.
COPYRIGHT: (C)2010,JPO&INPIT
摘要翻译：要解决的问题：即使SF尺寸和簇尺寸较小，也可以提供能够更有效地处理数据的装置。解决方案：光刻系统100包括控制计算机110，其选择产生多次绘制次数的内部数据的全层转换系统，使得对应于多次绘制的次数的图形被布置在SF或单层转换系统中，其生成多次绘图的单次时间的内部数据，使得图形被布置在群集中;控制计算机130，其通过一个系统通过处理数据根据一个系统生成内部数据选择系统，临时存储内部数据的存储装置174，根据所选择的系统处理数据，生成多次绘制次数的多个拍摄数据的控制计算机140，以及执行在每次移动绘图范围的同时通过使用多个拍摄数据在样本上多次绘制图案。版权所有（C）2010，JPO＆INPIT

10. 发明专利

JP2010147100A Verification method for data processing on drawing data, and drawing device 审中-公开
标题翻译：用于数据处理的图像数据验证方法和绘图装置
公开(公告)号：JP2010147100A
公开(公告)日：2010-07-01
申请号：JP2008320031
申请日：2008-12-16
申请人： Nuflare Technology Inc , 株式会社ニューフレアテクノロジー
发明人： ANPO AKIHITO , HIGURE HITOSHI
IPC分类号： H01L21/027 , G03F7/20
摘要： PROBLEM TO BE SOLVED: To provide a verification method for data processing which is fast and highly reliable. SOLUTION: The verification method for the data processing on drawing data includes: inputting layout data in which a plurality of cells comprising at least one figure are defined in a chip area; extracting cells, expected to be disposed inside in each of a plurality of processing areas for decentralized processing on the layout data, among the plurality of cells for the each processing area according to position relation based upon a first reference position; extracting cells, expected to be disposed in each of verification areas set at identical positions in the plurality of processing areas corresponding to the plurality of processing areas respectively, among the plurality of cells for the each verification area according to position relation based upon a second reference position different from the first reference position; comparing positions of the corresponding extracted cells between the processing areas and verification areas corresponding to the processing areas by the processing areas to determine whether the positions are identical; and outputting comparison results. COPYRIGHT: (C)2010,JPO&INPIT
摘要翻译：要解决的问题：提供快速高可靠性的数据处理验证方法。解决方案：用于绘制数据的数据处理的验证方法包括：输入其中在芯片区域中定义包括至少一个图形的多个单元的布局数据; 根据基于第一参考位置的位置关系，在每个处理区域的多个单元之间提取期望布置在用于对布局数据进行分散处理的多个处理区域中的每一个中的单元; 根据基于第二参考的位置关系，提取在每个验证区域的多个单元中分别设置在设置在与多个处理区域对应的多个处理区域中的相同位置的每个验证区域中的单元位置与第一参考位置不同; 通过处理区域比较处理区域与对应于处理区域的验证区域之间的对应提取单元的位置，以确定位置是否相同; 并输出比较结果。版权所有（C）2010，JPO＆INPIT

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