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JP2007046155A Film deposition method and film deposition apparatus 有权
标题翻译：膜沉积方法和膜沉积装置
公开(公告)号：JP2007046155A
公开(公告)日：2007-02-22
申请号：JP2006186767
申请日：2006-07-06
申请人： Noda Screen:Kk , 株式会社野田スクリーン
发明人： OGAWA HIROYOSHI , KAWASE AKIHIRO , WANG SHUQIANG
IPC分类号： C23C16/44 , H01G4/10 , H01G4/12 , H01L21/31
摘要： PROBLEM TO BE SOLVED: To provide a film deposition method and a film deposition apparatus capable of depositing a thin film of excellent quality in the atmosphere.
SOLUTION: In the film deposition method and the film deposition apparatus, aerosol is generated by atomizing a metal compound as a raw material by the ultrasonic vibration in a carrier gas, and the aerosol is heated and sprayed on a work to obtain a uniform film of excellent quality. According to the film deposition method and the film deposition apparatus, the film can be deposited in the atmosphere, and the film deposition can be performed in an open space without providing any film deposition chamber or the like. Thus, the line arrangement of manufacturing equipment is facilitated, and the manufacturing efficiency can be enhanced.
COPYRIGHT: (C)2007,JPO&INPIT
摘要翻译：要解决的问题：提供一种能够在大气中沉积优质品质的薄膜沉积方法和成膜装置。解决方案：在成膜方法和成膜装置中，通过在载气中通过超声波振动将作为原料的金属化合物雾化而产生气溶胶，并且将气溶胶加热喷雾到工件上以获得均匀膜质量优良。根据膜沉积方法和成膜装置，可以将膜沉积在大气中，并且可以在开放空间中进行膜沉积，而不需要任何成膜室等。因此，制造设备的线路布置方便，并且可以提高制造效率。版权所有（C）2007，JPO＆INPIT

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