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1. 发明专利

JP2011221538A Mask case, mask unit, exposure equipment, substrate processing apparatus and device manufacturing method 有权
标题翻译：掩模外壳，掩模设备，曝光设备，基板处理设备和设备制造方法
公开(公告)号：JP2011221538A
公开(公告)日：2011-11-04
申请号：JP2011089073
申请日：2011-04-13
申请人： Nikon Corp , 株式会社ニコン
发明人： NARA KEI , INOUE HIDEYA , KIUCHI TORU , KAWAGUCHI TORU
IPC分类号： G03F1/62 , G03F1/66 , G03F7/20 , H01L21/027
摘要： PROBLEM TO BE SOLVED: To protect a pattern face of a mask including a cylindrical pattern face.SOLUTION: A mask case that accommodates a mask on which a cylindrical pattern face is formed around a certain center axis includes a case body that forms a storage space for storing the mask and includes a window facing the pattern face of the mask stored in the storage space, and a regulation part that regulates a movement of the mask to prevent the pattern face from contacting the case body.
摘要翻译：要解决的问题：为了保护包括圆柱形图案面的面罩的图案面。解决方案：容纳围绕特定中心轴线形成圆柱形图案面的掩模的掩模盒包括形成用于存储掩模的存储空间的壳体，并且包括面向存储的掩模的图案面的窗口以及调节部件，其调节所述面罩的移动以防止所述图案面与所述外壳主体接触。版权所有（C）2012，JPO＆INPIT

2. 发明专利

JP2005286132A Optical apparatus and adjustment method thereof 审中-公开
标题翻译：光学装置及其调整方法
公开(公告)号：JP2005286132A
公开(公告)日：2005-10-13
申请号：JP2004098550
申请日：2004-03-30
申请人： Nikon Corp , 株式会社ニコン
发明人： SHIMODA TOSHIMASA , KAWAKAMI NAOYUKI , YAMASHITA OSAMU , KAWAGUCHI TORU , NAGAYAMA TADASHI
IPC分类号： H01L21/027
摘要： PROBLEM TO BE SOLVED: To provide an optical apparatus or the like, the adjustment and maintenance or the like of the optical system of which can be easily carried out. SOLUTION: A pair of wafer automatic focus units 50 (light transmitting and receiving systems) and a wafer alignment unit 60 are provided to a lower body 12 of an exposure 1. Transparent barriers 55, 65 are provided on borders between upper parts 51a, 61a and lower parts 51b, 61b in casings 51, 61 of each of the units 50 and the unit 60. The barriers 55, 65 partition the upper parts 51a, 61a (atmosphere) from the lower parts 51b, 61b (low vacuum) and also act like correction optical elements for applying optical correction (focusing or the like) to operation elements 53, 63 of the respective units 50, 60. The focal point position is corrected automatically, even after evacuation, and deviations are eliminated, by replacing the barriers 55, 65 (or barriers 57, 67) with those having a thickness corresponding to the change in the refractive index. COPYRIGHT: (C)2006,JPO&NCIPI
摘要翻译：要解决的问题：为了提供光学装置等，可以容易地进行其光学系统的调整和维护等。解决方案：将一对晶片自动聚焦单元50（光发射和接收系统）和晶片对准单元60设置在曝光1的下体12上。透明屏障55,65设置在上部 51a，61a和下部51b，61b在每个单元50和单元60的壳体51,61中。阻挡层55,65从下部51b，61b分隔上部51a，61a（大气）（低真空），并且还用于对相应单元50,60的操作元件53,63进行光学校正（聚焦等）的校正光学元件。即使在撤离之后，也可以自动校正焦点位置，并且通过用与折射率变化相对应的厚度代替屏障55,65（或屏障57,67）。版权所有（C）2006，JPO＆NCIPI

3. 发明专利

JP2005201675A Face position detector, device and exposing method 有权
标题翻译：表面位置检测器，装置和曝光方法
公开(公告)号：JP2005201675A
公开(公告)日：2005-07-28
申请号：JP2004005678
申请日：2004-01-13
申请人： Nikon Corp , 株式会社ニコン
发明人： KAWAGUCHI TORU
IPC分类号： G01B11/00 , G03F7/207 , H01L21/027
摘要： PROBLEM TO BE SOLVED: To provide a face position detector which can accurately detect a face position of a face to be inspected without affecting by installation errors of the device or the like. SOLUTION: A face position detector 2 to detect a face position of a face to be inspected S by irradiating the face to be inspected S with a detecting light from a slanting direction based on the light of the light source and receiving the detecting light reflected from the face to be inspected S, comprises a sending light system SL which sends a detecting light to the face to be inspected S to form a slit-shaped light irradiation area on each of a plurality of detecting points which are two-dimensionally arranged on the face to be inspected S, and a receiving light system RL which receive the detecting light reflected at each of the detecting points arranged on the face to be inspected S, wherein the detecting light is sent from direction which is almost orthogonal to the longitudinal direction of the slit-shaped light irradiation area formed on the detecting points. COPYRIGHT: (C)2005,JPO&NCIPI
摘要翻译：要解决的问题：提供一种可以精确地检测要检查的面部的脸部位置而不受设备的安装错误等的影响的面部位置检测器。解决方案：一种面部位置检测器2，用于通过基于光源的光从倾斜方向用检测光照射被检查的面S来检测被检查面S的面部位置，并接收检测从被检查面S反射的光包括发送光系统SL，其将检测光发送到被检查面S，以在二维的多个检测点中的每一个上形成狭缝状的光照射区域布置在被检查面S上的接收光系统RL以及接收在被检查面S上的每个检测点反射的检测光的接收光系统RL，其中检测光从几乎正交于形成在检测点上的狭缝状光照射区域的长度方向。版权所有（C）2005，JPO＆NCIPI

4. 发明专利

JP2005201672A Face position detector, device and exposing method 审中-公开
标题翻译：表面位置检测器，装置和曝光方法
公开(公告)号：JP2005201672A
公开(公告)日：2005-07-28
申请号：JP2004005636
申请日：2004-01-13
申请人： Nikon Corp , 株式会社ニコン
发明人： KAWAGUCHI TORU
IPC分类号： G01B11/00 , G03F7/207 , H01L21/027
摘要： PROBLEM TO BE SOLVED: To provide a face position detector which can detect a face position of a face to be inspected using a light source enabling to modulate optical power. SOLUTION: A face position detector 2 to detect a face position of a face to be inspected S by irradiating the face to be inspected S with a detecting light from a slanting direction based on the light of the light source and receiving the detecting light reflected from the face to be inspected S, comprises a light source modulating means which modulates optical power from the light source by driving the light source, a sending light system S which projects an image of an irradiating light pattern of a light irradiating face 12 a on the face to be inspected S based on the modulate light from the light source which passes through the light irradiating face 12 having an irradiating light pattern, and a receiving light system R which receives light reflected by the face to be inspected S through a light receiving face having a light receiving pattern. COPYRIGHT: (C)2005,JPO&NCIPI
摘要翻译：要解决的问题：提供一种能够使用能够调制光功率的光源来检测要检查的面部的脸部位置的面部位置检测器。解决方案：一种面部位置检测器2，用于通过基于光源的光从倾斜方向用检测光照射被检查的面S来检测被检查面S的面部位置，并接收检测从被检查面S反射的光包括通过驱动光源来调制来自光源的光功率的光源调制装置，投射光照射面12的照射光图案的图像的发送光系统S 基于来自通过具有照射光图案的光照射面12的光源的调制光的被检查面S的a和接收光系统R，接收光系统R接收被检查面S反射的光，通过光接收面具有受光图案。版权所有（C）2005，JPO＆NCIPI

5. 发明专利

JP2005135949A Aligner and exposure method 有权
标题翻译：对准和曝光方法
公开(公告)号：JP2005135949A
公开(公告)日：2005-05-26
申请号：JP2003367041
申请日：2003-10-28
申请人： Nikon Corp , 株式会社ニコン
发明人： MIZUTANI HIDEO , KAWAGUCHI TORU , HIDAKA YASUHIRO , OMURA YASUHIRO , TANAKA KAZUMASA
IPC分类号： G03F7/20 , G03F7/207 , H01L21/027
摘要： PROBLEM TO BE SOLVED: To provide an aligner for precisely detecting the surface face position information of a substrate surface, even if the refractive index on optical path of detection light of an AF detection system changes.
SOLUTION: In the aligner EX, the pattern of a mask M illuminated by exposure light EL is transferred to a substrate P via a projection optical system PL while prescribed liquid 1 is supplied between an optical member on a substrate-side the most in the projection optical system PL and the substrate P. The device is provided with a face position detecting device 100 for projecting detection light on the substrate P from an oblique direction, receiving detection light via the substrate P and detecting the face position of the substrate P, and a liquid-holding member 30 having a window, through which detection light passes and holding prescribed liquid 1 between the surface of the substrate P and the optical member at a side closest to the substrate P-side in the projection optical system PL.
COPYRIGHT: (C)2005,JPO&NCIPI
摘要翻译：要解决的问题：即使AF检测系统的检测光的光路的折射率发生变化，也可以提供用于精确地检测基板表面的表面位置信息的对准器。解决方案：在对准器EX中，通过曝光光EL照射的掩模M的图案经由投影光学系统PL被传送到基板P，同时将规定的液体1供给到基板侧的光学部件最多在投影光学系统PL和基板P中。该装置设置有面部位置检测装置100，用于从倾斜方向在基板P上投射检测光，经由基板P接收检测光并检测基板的表面位置 P和具有窗口的液体保持构件30，检测光通过该液体保持构件30，并且在投影光学系统PL中最靠近基板P侧的一侧在基板P的表面和光学构件之间保持规定液体1 。版权所有（C）2005，JPO＆NCIPI

6. 发明专利

JP2004340659A Measurement axis interval measuring instrument, measurement axis interval measuring method, multiaxial interferometer, exposing device, and exposing method 审中-公开
公开(公告)号：JP2004340659A
公开(公告)日：2004-12-02
申请号：JP2003135439
申请日：2003-05-14
申请人： Nikon Corp , 株式会社ニコン
发明人： KAWAGUCHI TORU
IPC分类号： G01B11/14 , H01L21/027
摘要： PROBLEM TO BE SOLVED: To provide a measurement axis interval measuring instrument and a measurement axis interval measuring method for accurately measuring a measurement axis interval of a multiaxial interferometer, a multiaxial interferometer equipped with the measuring instrument, an exposing device equipped with the multiaxial interferometer, and an exposing method using the exposing device. SOLUTION: This measurement axis interval measuring instrument is equipped with a light guide means for guiding a beam for axis interval measurement emitted from a beam source 18 for measurement to a first corner cube 36 included in a first measurement axis of the multiaxial interferometer 10 or a second corner cube 44 included in a second measurement axis thereof, a detection means 18 for detecting the beam for axis interval measurement reflected by the first or second corner cube, a determination means for determining that the beam for axis interval measurement detected by the detection means has been reflected by a vertex 36a or 48a of the first or second corner cube, a measurement means for measuring the positions of the beams for axis interval measurement respectively determined by the determination means to have been reflected by the vertices of the first and second corner cubes, and an axis interval calculation means for calculating an interval between the first and second measurement axes of the multiaxial interferometer based on the positions of the beams for axis interval measurement reflected by the vertices of the first and second corner cubes measured by the measurement means. COPYRIGHT: (C)2005,JPO&NCIPI

7. 发明专利

JP2004245590A Interferometer, projection aligner, and exposure method 审中-公开
公开(公告)号：JP2004245590A
公开(公告)日：2004-09-02
申请号：JP2003032510
申请日：2003-02-10
申请人： Nikon Corp , 株式会社ニコン
发明人： KAWAGUCHI TORU
IPC分类号： G01B9/02 , G03F9/00 , H01L21/027
摘要： PROBLEM TO BE SOLVED: To provide an interferometer using low-photoelasticity glass that is strong against mechanical strain.
SOLUTION: The interferometer DI comprises a light source 1, a luminous flux dividing means 3 for dividing luminous flux from the light source 1 into reference light and measurement light, a reflector 7 mounted to a measurement target for reflecting the measurement light, and a photoelectric detector 10 for receiving measurement light reflected by the reflector 7 and interference light generated by the interference with the reference light. In the interferometer DI, at least one of optical members included in the interferometer DI including the luminous flux dividing means 3 satisfies either -1×10
-8 (cm
2 /N)≤C(photoelasticity coefficient)≤-0.2 ×10
-8 (cm
2 /N), or 0.2×10
-8 (cm
2 /N)≤C≤1×10
-8 (cm
2 /N).
COPYRIGHT: (C)2004,JPO&NCIPI

8. 发明专利

JP2004241744A Surface position detector, aligner and aligning method 审中-公开
公开(公告)号：JP2004241744A
公开(公告)日：2004-08-26
申请号：JP2003032259
申请日：2003-02-10
申请人： Nikon Corp , 株式会社ニコン
发明人： KAWAGUCHI TORU
IPC分类号： G02B7/28 , G03F7/207 , H01L21/027
摘要： PROBLEM TO BE SOLVED: To provide a surface position detector less affected by fluctuation in an optical reflectance of a specimen. SOLUTION: A surface position detector projects the light from the oblique direction to a surface to be inspected 6a, receives the light passed through the surface to be inspected, and detects a surface position of the surface to be inspected. The detector is provided with a light transmission pattern 20 having a light transmission region and a non-light transmission region, a light reception pattern 36 having a light reception region and a non-light reception region, a scanning means for relatively scanning an image of the light transmission pattern formed on the light reception pattern and the light reception pattern, a photoelectric detecting means for photoelectrically detecting the light that goes through the light reception pattern, and a surface to be inspected position detecting means detecting a surface position of the surface to be inspected based on the detection signal detected by the photoelectric detecting means. The scanning means scans the image of one light transmission region of the light transmission pattern over a plurality of light reception regions of the light reception pattern. The surface to be inspected position detecting means detects the surface to be inspected position based on a phase of the detection signal detected by the photoelectric detecting means. COPYRIGHT: (C)2004,JPO&NCIPI

9. 发明专利

JP2002184665A DEVICE AND METHOD FOR ALIGNMENT, AND ALIGNER 失效
公开(公告)号：JP2002184665A
公开(公告)日：2002-06-28
申请号：JP2000379174
申请日：2000-12-13
申请人： NIKON CORP
发明人： KAWAGUCHI TORU
IPC分类号： G03F9/00 , H01L21/027 , H01L21/68
摘要： PROBLEM TO BE SOLVED: To provide a device and a method for alignment, in which the space is economized using simple constitution and throughput lowering is avoided, and to provide an aligner. SOLUTION: The pre-alignment system PAS comprises light sources 1a-1c that respectively emit light fluxes, prisms 2a-2c, that are respectively arranged at positions facing the light sources 1a-1c, sandwiching a wafer W between and that respectively bend the light fluxes from the light sources 1a-1c to respectively irradiates a plurality of edge parts e1-e3 of the wafer W, and detector units 3a-3c that respectively detect the edge parts e1-e3, based on the light fluxes via the edge parts 1a-1c of the wafer W. The wafer W is positioned, based on the information of the positions of the edge parts e1-e3 detected by the detector units 3a-3c.

10. 发明专利

JP2000182929A SURFACE POSITION DETECTING DEVICE 失效
公开(公告)号：JP2000182929A
公开(公告)日：2000-06-30
申请号：JP35503698
申请日：1998-12-14
申请人： NIKON CORP
发明人： KAWAGUCHI TORU
IPC分类号： H01L21/027 , G02B7/28 , G02B7/32 , G02B15/00 , G03F9/00
摘要： PROBLEM TO BE SOLVED: To provide a device which allows detection of the surface position at high precision over the entire wide detection region of a surface to be inspected while telecentric characteristics of a both-side telecentric optical system is kept. SOLUTION: A specified pattern formed on a first surface 8, projection optical systems 9, 100, and 10 which project the specified pattern to a surface 1a which is to be inspected, condensing optical systems 11 and 12 wherein the optical flux reflected on the surface to be inspected is condensed so that the image of specified pattern is imaged on a second surface, and a detector which detects the image of specified pattern photoelectrically, are provided and the surface position of the surface to be inspected is detected based on the output of the detector. Here, at least one of the projection optical system and condensing optical system comprises a variable-power optical system part 100 comprising a variable-power lens group and an open angle limiting member for limiting an open angle in specified direction of at least one optical flux between that projected on the surface to be inspected and that reflected on it, with an allocation order of the open angle limiting member and variable-power lens group changeable.

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