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    • 4. 发明专利
    • OPTICAL AMPLIFIER
    • JP2000340866A
    • 2000-12-08
    • JP14923799
    • 1999-05-28
    • NIPPON TELEGRAPH & TELEPHONE
    • SAKATA TOMOMISHIMOKAWA FUSAO
    • H01S3/06H01S3/20
    • PROBLEM TO BE SOLVED: To allow a small-sized optical amplifier to have a high gain by forming a groove within an optical waveguide provided on a substrate and filling the groove with an Ercontaining solution containing an Er compound. SOLUTION: A substrate 11 is provided with an optical waveguide 12, and a groove 13 is formed along the length of the waveguide 12. The groove 13 is sealed with an Er-containing solution 14. The solution 14 contains an index matching solution or an electrolytic solution as a solvent and an Er compound as a solute, and has a refractive index equivalent to that of the waveguide 12. In such an optical amplifier 10, the solution 14 can contain the Er compound as much as to the solubility of the solvent. Therefore, to obtain a gain of 20 dB which is required for a WDM optical system to transmit light through the solution having a high Er concentration, the length of the solutionsealed groove 13 can be only as short as about several centimeters in the amplifier 10. Hence, according to such an optical amplifier, a high gain can be obtained with a small size.
    • 10. 发明专利
    • OPTICAL SWITCH
    • JP2003107374A
    • 2003-04-09
    • JP2001305968
    • 2001-10-02
    • NIPPON TELEGRAPH & TELEPHONE
    • TOKO HIROYOSHIMAKIHARA MITSUHIROSAKATA TOMOMISHIMOKAWA FUSAO
    • G02B26/08
    • PROBLEM TO BE SOLVED: To provide an optical switch having excellent manufacturability and reliability. SOLUTION: An upper substrate is constituted to contain an alkaline ion compound (such as a lithium oxide) and the content of the alkaline ion compound is specified to 1 to 20%. Or an insulative thin film containing the alkaline ion compound (such as the lithium oxide) is formed on a joint surface of the upper substrate with an optical waveguide substrate or a joint surface of the optical waveguide substrate with the upper substrate and the content of the alkaline ion compound is specified to 1 to 20%. The thickness of the insulative thin film is specified to 0.1 to 10 μm. Also, the conductive thin film is formed on the surface facing the joint surface of the upper substrate with the optical waveguide or on the surface facing the joint surface of the optical waveguide with the upper substrate. Or the conductive thin film is formed on a boundary facing the joint surface of the insulative thin film form on the upper substrate with the optical waveguide substrate or the boundary facing the joint surface of the insulative thin film formed on the optical waveguide substrate with the upper substrate.