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    • 2. 发明专利
    • METHOD FOR THINNING SAMPLE
    • JPH1019748A
    • 1998-01-23
    • JP18806296
    • 1996-07-01
    • NIPPON TELEGRAPH & TELEPHONE
    • ISHII YOSHIICHIKUROSAWA MASARUSEKI MASAHIRO
    • G01N1/28G01N1/32
    • PROBLEM TO BE SOLVED: To avoid a work-flaw and distortion by cutting with a high speed rotary cutting edge while jetting water for working a place other than observed with an electron microscope, and polishing with a side surface of the high speed rotary cutting edge while jetting polishing liquid when a place including the sample place is worked. SOLUTION: A rotary cutting edge 1 is rotated fast with an air spindle motor 1-1, and a cut sample 2 is held on a sample bed 2-1 which is set on a working position. Polishing liquid 3 flows through a circulation system such as a polishing liquid tank 4, a supply pump 5, a supply pipe 6, a nozzle 7 and a discharge pipe 9, etc., and it is automatically switched to water, which is supplied from a supply system pipe 12 through an control valve 12-1, with a supply system three way cock 13. When a place other than observed with an electron microscope, of the cut sample 2 is worked, cutting work is performed with the fast rotary cutting edge 1 while jetting water. Meanwhile, when a place which contains the to-be-observed part is worked, non-contact polishing is performed with a side surface of the fast rotary cutting edge 1 while jetting polishing liquid. By this method, the to-be-observed part of the cut sample 2 which has no work-flaw or residual distortion is obtained.
    • 3. 发明专利
    • CONTROL PLASMA GENERATING DEVICE
    • JPH09171899A
    • 1997-06-30
    • JP33379895
    • 1995-12-21
    • HORII KYOYUKINIPPON TELEGRAPH & TELEPHONE
    • HORII KIYOYUKIKUROSAWA MASARUISHII YOSHIICHI
    • H05H1/00H05H1/30
    • PROBLEM TO BE SOLVED: To provide a stable plasma flow with little turbulence which is converged to the blowout axis by making a current flow to a high frequency coil, and making a spiral flow passing a gradually contracted tube part into a plasma. SOLUTION: An inert gas is supplied from a gas feed port 6, and the gas is blown out through an annular Coanda slit part 3. The angle θ of an inclined surface 3 is set to 5-70 deg., whereby a Coanda spiral flow which is one kind of turning flows is formed in the process of passing in a gradually contracted tube part 7 to develop a strong negative pressure sucking force in a suction port 2, and the spiral flow is consequently sucked into a device through the suction port 2 by the negative pressure sucking force. Further, the current is made to flow to a high frequency coil 8 wound on the outer wall of the gradually contracted tube part 7 to make the spiral flow passing the gradually contracted tube part 7 into a plasma. Thus, the plasma flow containing this turning spectrum component is converted to the blowout axis, and further forms a stable plasma flow with little turbulence.
    • 9. 发明专利
    • MASS SPECTROGRAPH FOR SECONDARY ION
    • JPS6445049A
    • 1989-02-17
    • JP20193587
    • 1987-08-14
    • NIPPON TELEGRAPH & TELEPHONE
    • HONMA YOSHIKAZUISHII YOSHIICHI
    • H01J49/26H01J49/06
    • PURPOSE:To enable very small amounts of impurities to be detected in materials with high purity by installing a vacuum evaporation source inside a sample chamber vacuum tank, coating the contaminated surface of the constituents of a device by means of metallic thin films so as to reduce the effect on memory due to contaminated layer and/or influence of contamination caused by remaining gases. CONSTITUTION:Prior to the spectroanalysis of a sample 6, a material stage 7 is moved from the position of a analysis to give no hindrance to the process of vacuum evaporation, for the purpose of coating a contaminated layer on the surface of a lead-out electrode 9 etc., with a metallic thin film. Then, a vacuum evaporation source 15 is actuated, to generate metallic vapor 16 which is guided to adhere to the lead-out electrode 9 or the surface of a cover in a primary ion optical system to form a vacuum evaporated metallic thin film. Owing to the abovementioned constitution, a memory effect or contamination by remaining gas used to hinder a microanalysis can be alleviated to enable very small amounts of impurities to be detected in materials with high purity.