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    • 2. 发明专利
    • JPH05235325A
    • 1993-09-10
    • JP7212892
    • 1992-02-24
    • NIPPON TELEGRAPH & TELEPHONE
    • SHIGEKAWA NAOTERUWAHO TAKAOFUKUYAMA HIROYUKI
    • H01L29/205H01L29/68
    • PURPOSE:To obtain a resonance tunnel transistor, which combines the effect of a valley current suppression and the reduction effect of electron passage time by constituting a barrier layer out of the mixed crystal material doped with n-type impurities, and constituting a well layer out of a semiconductor material which does not contain impurities. CONSTITUTION:This transistor is constituted by stacking a collector layer 1 doped with n-type impurities, a first barrier layer 2, a well layer 3, a second barrier layer 4, and an emitter layer 5 doped with n-type impurities in order, and forming an emitter electrode 6, a base electrode 7, and a collector electrode 8 to connect with the collector layer 1, the well layer 3, and the emitter layer 5, respectively. And, the well layer 3 consists of a direct transition type semiconductor material, and the first barrier layer 2 and the second barrier layer 4 consists of indirect transition type mixed crystal material. The well layer 3 does not contain impurities, and at least one part each of the first barrier layer 2 and the second barrier layer 4 is doped positively with n-type impurities.
    • 10. 发明专利
    • RESONANCE TUNNEL THREE-TERMINAL DEVICE
    • JPH065844A
    • 1994-01-14
    • JP18321992
    • 1992-06-17
    • NIPPON TELEGRAPH & TELEPHONE
    • FUKUYAMA HIROYUKIWAHO TAKAO
    • H01L29/06H01L29/68
    • PURPOSE:To obtain a current amplification factor larger than one, by stacking a collector layer having a first semiconductor layer, a base layer of a second conductivity type reverse to a first conductivity type, and an emitter layer having a second semiconductor layer of the first conductivity type. CONSTITUTION:A collector layer 2, a base layer 3 and an emitter layer 4 are sequentially stacked on a semiconductor substrate 1. The collector layer 2 comprises a semiconductor layer 2d of GaAs, a semiconductor layer 2e of AlGaAs and a semiconductor layer 2f of AlAs. The base layer 3 comprises a barrier layer 3d, a quantum well layer 3e and a barrier layer 3f. The emitter layer 4 comprises a semiconductor layer 4d, a semiconductor layer 4e of GaAlAs and a semiconductor layer 4f of GaAs. A collector electrode layer 5 is ohmically connected to the semiconductor substrate 1. When electrons are implanted from the semiconductor layer 4d of the emitter layer 4 to the collector layer 2, the number of electrons implanted to the semiconductor layer 2f becomes large and a current amplification factor larger than one can be obtained.