专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

1. 发明专利

JPH02272400A SOFT X-RAY TAKING-OUT WINDOW 失效
公开(公告)号：JPH02272400A
公开(公告)日：1990-11-07
申请号：JP9291789
申请日：1989-04-14
申请人： NEC CORP
发明人： NOMURA HIDEKAZU
IPC分类号： G21K5/00
摘要： PURPOSE:To prevent the degradation of airtightness and radiation by providing two fitting faces on both window frames on the vacuum side and the atmospheric pressure side and evacuating air in the space between them and holding an X-ray transmission material on the fitting face on the inner peripheral side interposing a metallic foil between them. CONSTITUTION:Flat and smooth annular projections 2a and 2b are formed on inside peripheral parts of an extrahigh vacuum-side window frame 5 and an atmospheric pressure-side window frame 6, and conflat edges 10c and 10d are formed on outer peripheral sides of projections 2a and 2b, and a through hole 14 connected to the space formed between projections 2a and 2b and edges 10c and 10d is provided. A oxygen free copper gasket 11 is clipped between edges 10c and 10d, and a metallic beryllium foil 1 is clipped between projections 2a and 2b interposing an annular aluminium foil 4 between them, and it is clamped by a bolt 7, a spring washer 8, and a flat washer 9, and air between window frames 5 and 6 is evacuated by connecting an oil rotary pump to a through hole 14.

2. 发明专利

JPS63248132A MANUFACTURE OF SEMICONDUCTOR ELEMENT AND DEVICE THEREFOR 失效
公开(公告)号：JPS63248132A
公开(公告)日：1988-10-14
申请号：JP8235687
申请日：1987-04-02
申请人： NEC CORP
发明人： NOMURA HIDEKAZU
IPC分类号： H01L21/302 , G03F7/20 , H01L21/027 , H01L21/205 , H01L21/30 , H01L21/31
摘要： PURPOSE:To effectively utilize energy of a light source by a method wherein light to be used for an X-ray lithography, photo assisted etching, a photo assisted film formation, photo assisted metal film deposition and so on is separated into the optimum wave ranges needed for each photo process and each photo process is continuously executed using the light beams of these wave ranges. CONSTITUTION:An electron or a position 1 in circular motion in an electron synchrotron M is bent to the tangential direction to an orbit 1a by a deflecting electromagnet 2 and a radiation beam 4 is made to pass through ultrahigh vacuum beam lines 3 and is irradiated on a reflecting mirror 5 which is periodically oscillated by an external force. In such a way, the beam 4 is separated into the wave ranges of a radiation beam 6 for X-ray lithography, a radiation beam 8 for photo assisted etching, a radiation beam 10 for photo assisted film formation and so on by the oscillating reflecting mirror 5. The separated beams 6, 8 and 10 are respectively incided in a chamber 7 for lithography, a chamber 9 for photo assisted etching and a chamber 12 for photo assisted film formation through a transmission window 11 for long wavelength component deletion to make each process execute.

3. 发明专利

JPS63122999A SOFT X-RAY EXTRACTING WINDOW 失效
公开(公告)号：JPS63122999A
公开(公告)日：1988-05-26
申请号：JP27132586
申请日：1986-11-13
申请人： NEC CORP
发明人： NOMURA HIDEKAZU
IPC分类号： G21K5/00

4. 发明专利

JPH02105412A THIN-FILM MANUFACTURING APPARATUS 失效
公开(公告)号：JPH02105412A
公开(公告)日：1990-04-18
申请号：JP25697188
申请日：1988-10-14
申请人： NEC CORP
发明人： NOMURA HIDEKAZU
IPC分类号： C23C14/34 , C23C14/46 , H01L21/203 , H01L21/285
摘要： PURPOSE:To eliminate a cause of a drop in a purity inside a sputtering chamber even when an atom and a molecule are stripped off from the surface by being subjected to a shock of a high-energy particle by a method wherein at least a part to be subjected to the shock of the high-energy particle inside a thin-film manufacturing apparatus is made of a thin-film constitutive substance. CONSTITUTION:When a shock is exerted on the surface of a tungsten target 6 by an ion of argon or the like and a tungsten thin film is formed on a substrate, a filament 24, an anode 25, a grid 26 and a gas introduction pipe 27 of an ion source 2 are all made of high-purity tungsten. An outer enclosure 21 is made of stainless steel; an electromagnet coil 23 used to increase an ionization efficiency of a gas by lengthening a traveling distance of an electron is installed at its side-wall face. Thereby, a component of stainless steel is not detected at all in a composition of the thin film.

5. 发明专利

JPH01276550A STRUCTURE FOR SOFT X-RAY EXTRACTING WINDOW AND MANUFACTURE THEREOF 失效
公开(公告)号：JPH01276550A
公开(公告)日：1989-11-07
申请号：JP10247688
申请日：1988-04-27
申请人： NEC CORP
发明人： NOMURA HIDEKAZU
IPC分类号： H05G1/00 , H01J35/18 , H05G1/04
摘要： PURPOSE:To make the thickness of an X-ray permeating material thin and cope with both the thermal stress and static stress by inserting an elastic member made of metal and deformable in the direction parallel with an opening face between a window frame surrounding the opening section and the X-ray permeating material. CONSTITUTION:After an oxide film on the surface of a metal beryllium foil 5 is removed, A copper circular ring (elastic member) 6 with a C-shaped cross section is brazed to it at the temperature of about 600 deg.C. The degree of deflection of the circular ring cross section is adjusted by the thickness of copper and the rigidity in the radial direction of a coil spring 7 made of a piano wire axially inserted into the C-shaped interior. The beryllium foil 5 brazed with the C-shaped copper circular ring 6 is brazed to a window frame 1 with high- temperature solder of about 700 deg.C. Since they are thus stuck, the static pressure stress is not changed in direction for positions in the foil and is offset by the thermal stress at all places, the breakdown of the foil hardly occurs, the thickness of the foil can be made thinner that much.

6. 发明专利

JPS6364253A SOFT X-RAY PICKUP WINDOW 失效
公开(公告)号：JPS6364253A
公开(公告)日：1988-03-22
申请号：JP20901086
申请日：1986-09-04
申请人： NEC CORP
发明人： NOMURA HIDEKAZU
IPC分类号： H05G1/00 , H01J35/18 , H05G1/02
摘要： PURPOSE:To satisfy both requirements, a high permeability at the window and maintaining a superhigh vacuum degree, which are essential to a soft X-ray area, by using a material connecting airtight with a permeable window material as a permeable window frame, and moreover, utilizing the permeable window frame as a gasket. CONSTITUTION:A thin metal beryllium foil 10, whose airtightness is guaranteed, is connected to the opening of a nonoxygen copper disk 20 in a diffusion connection. The disk 20 is squeezed from the both sides by a stainless steel fixing flange 30 with a conflate edge 25 and an X-ray pickup window flange 40, and fastened by a stainless spring washer 50 and a bolt 60. As a result, the conflate edges are fit in from both sides of the disk 20 and a superhigh vacuum is maintained. The soft X-ray pickup window formed in the above way can be installed at the desired position of the superhigh vacuum system to the conflate edge 70 of the opposite side by using a normal ring-formed nonoxygen copper gasket.

7. 发明专利

JPH02272399A SOFT X-RAY TAKING-OUT WINDOW 失效
公开(公告)号：JPH02272399A
公开(公告)日：1990-11-07
申请号：JP9292189
申请日：1989-04-14
申请人： NEC CORP
发明人： NOMURA HIDEKAZU
IPC分类号： G21K5/00 , H05H7/00
摘要： PURPOSE:To prevent the degradation of airtightness and radiation by forming a knife edge on the outside peripheral part of the innermost annular projection of a window frame and binding an X-ray transmission material between a specific annular member fitted to the outside peripheral part of the projection and a retaining member. CONSTITUTION:A circular through hole is formed in the center part of a double- faced conflat window frame flange 1, and a flat and smooth annular projection 2 is formed on its inside edge, and a knife edge 3 where a slope is formed toward the projection 2 is formed on the outside of the projection 2. A metallic ring 4 which has prescribed consistency and vapor pressure characteristic and is made of oxygen free copper or the like is fitted to the outside peripheral part of the projection 2, and a metallic beryllium foil 6 is placed on the ring 4 and is pressed by a retaining plate 7 made of stainless steel, and a bolt 8, a spring washer 9, and a flat washer 10 are used to clamp it.

8. 发明专利

JPH02151803A MANUFACTURE OF DIFFRACTION GRATING 失效
公开(公告)号：JPH02151803A
公开(公告)日：1990-06-11
申请号：JP30598188
申请日：1988-12-05
申请人： NEC CORP
发明人： NOMURA HIDEKAZU
IPC分类号： G02B5/18
摘要： PURPOSE:To obtain a short-period diffraction grating by grinding a multilayered film formed by laminating a material which reflects light in a desired wavelength range and a material which does not reflect the light many times to constant thickness slantingly at an optional angle. CONSTITUTION:The material 1 which reflects the light in the desired wavelength range is deposited on the surface of a flat substrate 3 and the thin film 2 of the material which does not reflects said light is deposited thereupon. Those thin films of those materials 1 and 2 are deposited alternately many times. Then the multi-layered film is ground slantingly at the optional angle theta and its surface is used as the diffraction grating. Consequently, the diffraction grating which has the optional relatively short grating cycle is accurately manufactured by the easy method.

9. 发明专利

JPH01321329A METHOD AND APPARATUS FOR MEASURING RESIDUAL STRESS IN SELF-SUPPORTING THIN FILM EQUIPPED WITH FRAME 失效
公开(公告)号：JPH01321329A
公开(公告)日：1989-12-27
申请号：JP15612888
申请日：1988-06-23
申请人： NEC CORP
发明人： NOMURA HIDEKAZU
IPC分类号： G01L1/00
摘要： PURPOSE:To simply measure residual stress by a method wherein the displacement quantity of a thin film at the center thereof is measured in a non-contact state while the magnitude of the difference between the known pressures applied to the thin film on both sides thereof is changed to obtain a pressure-displacement quantity characteristic curve which is, in turn, compared with that guided from an elastodynamic theory considering no residual stress in the thin film. CONSTITUTION:When a thin film sample 1 to be inspected is mounted to the opening part of an airtight chamber 2 in an airtight state and the displacement of the central part of the thin film sample to be inspected is measured by a non-contact distance measuring device 5 while the pressure in the airtight chamber 2 is reduced or raised by an exhaust pump 3 or pressure device 4, a pressure-displacement quantity characteristic curve is obtained. Further, on the basis of an elastodynamic theory considering no residual stress in the thin film, the displacement quantity of the central part of the thin film is calculated according to a predetermined formula and a pressure-displacement quantity characteristic curve is obtained. By comparing these pressure-displacement quantity characteristic curves with each other, the magnitude of the residual stress in the thin film can be measured as a value converted to the pressure applied from the outside.

10. 发明专利

JP2002203015A SYSTEM TO CALL TAXI 失效
公开(公告)号：JP2002203015A
公开(公告)日：2002-07-19
申请号：JP2000403101
申请日：2000-12-28
申请人： NEC CORP
发明人： FUJITA JUNICHI , BABA TOSHIO , NIHEI FUMIYUKI , IGUCHI NORIYUKI , NOMURA HIDEKAZU , KAWAURA HISAO , HONGO HIROO , UEMURA TETSUYA , SUNAMURA JUN , ZEN YOSHIN
IPC分类号： G06Q10/00 , G06Q50/00 , G06Q50/10 , G06Q50/30 , G08G1/123 , H04B7/26 , H04W4/02 , G06F17/60 , H04Q7/34
摘要： PROBLEM TO BE SOLVED: To provide a system that can accept a dispatching a taxi even though a requesting procedure to call the taxi company is unknown. SOLUTION: A disclosed taxi call system receives the calling for dispatching the taxi at a taxi call terminal 10 via Internet 1. A service station 3 connected to the Internet 1, then, recognizes a transmission position of a taxi call terminal 10 and sends the position data of the taxi call terminal 10 and the taxi dispatch data from the call terminal 10 to a taxi company terminal 4 or a taxi terminal 81, 82, and so on via the Internet 1. Therefore, a person who calls the taxi can get the taxi dispatch without knowing a telephone number of the taxi company. Consequently, the system can realize the taxi dispatch that satisfies customer requirements.

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式