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    • 2. 发明专利
    • Display device and method for manufacturing the same
    • 显示装置及其制造方法
    • JP2006215279A
    • 2006-08-17
    • JP2005028093
    • 2005-02-03
    • Mitsui Mining & Smelting Co Ltd三井金属鉱業株式会社
    • MATSUZAKI KENJIURABE HIRONARI
    • G02F1/1368C22C21/00G09F9/00H01L21/3213H01L21/336H01L29/786
    • PROBLEM TO BE SOLVED: To provide a display device which is not corroded with a developer in the manufacturing process so as to have stable production, and which makes a low junction resistance even when direct junction with a transparent electrode is conducted, with respect to the display device equipped with a thin film transistor, a transparent electrode layer and an aluminum alloy film layer for wiring. SOLUTION: In the display device equipped with the thin film transistor, the transparent electrode layer, and the aluminum alloy film layer for wiring, a transparent metal oxide layer is disposed between the transparent electrode layer and the aluminum alloy film layer so as to make them electrically connected with each other. Also the oxygen content of the transparent metal oxide layer is lower than that of the transparent electrode layer, and in the case the transparent metal oxide layer is constructed of ITO, its optical absorption coefficient is set to be 3×10 4 -4×10 4 cm -1 . COPYRIGHT: (C)2006,JPO&NCIPI
    • 要解决的问题:为了提供一种在制造过程中不被显影剂腐蚀以产生稳定的显示装置,即使在与透明电极直接接合的情况下也具有低结电阻,与 涉及配备有薄膜晶体管的显示装置,透明电极层和用于布线的铝合金膜层。 解决方案:在配备有薄膜晶体管,透明电极层和用于布线的铝合金膜层的显示装置中,透明金属氧化物层设置在透明电极层和铝合金膜层之间,以便 使它们彼此电连接。 此外,透明金属氧化物层的氧含量低于透明电极层的氧含量,在透明金属氧化物层由ITO构成的情况下,其吸光系数设定为3×10 4 < / SP> -4×10 4 厘米 -1 。 版权所有(C)2006,JPO&NCIPI