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    • 7. 发明专利
    • Pattern formation for photosensitive resin
    • 光敏树脂图案形成
    • JPS61111533A
    • 1986-05-29
    • JP23476784
    • 1984-11-05
    • Mitsubishi Electric Corp
    • MAEJIMA TAROENDO ATSUSHIHIROSE ETSUKOTABUCHI TAKESHITSUKAO RYUSAKU
    • H01L21/027G03F7/20G03F7/26H01L21/30H01L21/3205
    • H01L21/30
    • PURPOSE:To obtain tapered patterns of photosensitive resin of little swelling at the pattern outline section by a method wherein the amount of photo irradiation to the outline section of a required pattern is made larger with distances from the boundary of the required pattern so as to vary the solubility of the outline section of the required pattern. CONSTITUTION:A photosensitive resin layer applied on a substrate by spin coating is irradiated with light in the required pattern. At this time, the first photo irradiation is carried out with a photo mask 3 at a proper position of the required pattern, the second photo irradiation with a photo mask 4 at a position slightly shifted to right, and the third photo irradiation with a photo mask 5 slightly shifted to left. Therefore, the amount of photo irradiation, forming the boundary of a pattern size (a), increases in the order of outline sections (b), (c) located farther from the boundary up to the maximum at a region (d).
    • 目的:通过一种方法获得在图案轮廓部分具有很小溶胀的感光性树脂的锥形图案,其中使所需图案的轮廓部分的光照射量随着所需图案的边界的距离变大,从而变化 所需图案的轮廓部分的溶解度。 构成:通过旋涂涂布在基板上的感光性树脂层用所需图案的光照射。 此时,第一光照照射是在所需图案的正确位置处的光掩模3进行的,在轻微向右偏移的位置处的光掩模4进行第二次光照射,并且用照片进行第三次照射 面具5轻微向左移动。 因此,形成图案尺寸(a)的边界的光照射量按区域(d)的距离越远离边界的轮廓部分(b),(c)的顺序增加。