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    • 1. 发明专利
    • MANUFACTURE OF SEMICONDUCTOR DEVICE
    • JPH03187234A
    • 1991-08-15
    • JP32624589
    • 1989-12-16
    • MITSUBISHI ELECTRIC CORP
    • HIGUCHI HIDEYOISHII MITSUO
    • H01L21/52
    • PURPOSE:To obtain a sufficient bonding strength without scrubbing by a method wherein a plate-shaped solder having a sufficiently smaller area than the area of the bonding surface of an optical semiconductor chip is provided. CONSTITUTION:A plate-shaped solder 2 having a sufficiently smaller area than the area of the bonding surface of a semiconductor chip 1 is placed between the semiconductor chip 1 and a bonding part. The semiconductor chip 1, the solder 2 and the bonding part are heated to a temperature higher than the melting point of the solder and a pressure is applied to the upper part of the semiconductor chip 1 to bond the semiconductor chip 1 to the bonding part with the solder 2. When the solder 2, for instance AuSn solder, is mashed by the optical semiconductor chip 1, as the area of the solder is small, the new solder which is not covered with an oxide film 3 bursts forth and the oxide film 3 is cut to pieces and the gap between the optical semiconductor chip 1 and the bonding part is filled with the new solder. With this constitution, a sufficient bonding strength can be obtained without scrubbing.
    • 2. 发明专利
    • MANUFACTURE OF SEMICONDUCTOR PHOTODETECTOR
    • JPH01183171A
    • 1989-07-20
    • JP730688
    • 1988-01-14
    • MITSUBISHI ELECTRIC CORP
    • MIZUOCHI HITOSHIHIGUCHI HIDEYO
    • H01L31/10
    • PURPOSE:To obtain a photodetector having equivalent characteristics to those of a conventional one by a liquid growing method(LPE) by forming a stripelike groove having a side face on a plane A (111) on a substrate made of InP on its upper face in a plane (100). CONSTITUTION:A substrate 1 having an upper face in a plane (100) is chemically etched in a direction for forming a plane A (111) on its side face to form a stripelike groove 8. Then, a light absorption layer 2 mad of N type InGaAs and a window layer 3 made of P-type InP are grown by the LPE. Accordingly, the upper face of the layer 2 also becomes a plane A (111), and the layer 3 made of InP can be grown thereon by the LPE without causing melt-back. Since the substrate 1 itself using its upper face in a plane (100) is employed, the isolation of a chip can be performed by cleaving, the isolation of the chip does not give an adverse influence thereto. Thus, a semiconductor photodetector in which its characteristics are stabilized is obtained by the LPE.
    • 3. 发明专利
    • SEMICONDUCTOR LASER DEVICE
    • JPH01129487A
    • 1989-05-22
    • JP28996687
    • 1987-11-16
    • MITSUBISHI ELECTRIC CORP
    • YAMAMOTO YOUSUKEHIGUCHI HIDEYO
    • H01S5/00H01S5/042
    • PURPOSE:To reduce electrostatic capacitance due to oppositely electrodes, and to modulate a semiconductor laser device at high speed by removing a growth layer up to an insulating substrate and forming one electrode and getting rid of the growth layer up to a clad layer and shaping the other electrode. CONSTITUTION:An N electrode 1, a P electrode 2 formed onto a P-InP lower clad layer 8, an SiO2 film 3 for preventing a short circuit, an N-InGaAsP contact layer 4, an N-InP upper clad layer 5, buried layers 6, 7 and an active layer, 9 as a light-emitting region are shaped onto an insulating substrate 10. Currents are constricted by the buried layers 6, 7, and currents are injected efficiently into the active layer 9. The electrodes 3, 2 are formed on the crystal growth surface side, thus reducing electrostatic capacitance by the electrodes 1, 2, then allowing modulation at high speed. Even when the electrode 1 is shaped through isolation by a striped trench reaching the substrate 10, the same effect is acquired.
    • 4. 发明专利
    • MEASURING DEVICE FOR OPTICAL SEMICONDUCTOR CHARACTERISTIC
    • JPS63248141A
    • 1988-10-14
    • JP8317187
    • 1987-04-03
    • MITSUBISHI ELECTRIC CORP
    • YOSHIDA KAZUTOMIHIGUCHI HIDEYO
    • H01L21/66H01L33/58
    • PURPOSE:To measure the characteristics of an optical semiconductor in the state of a wafer by a method wherein the title device is provided with an optical fiber with a spherical lens, an automatic optical axis matching unit, a photo output meter and an optical spectrum analyzer. CONSTITUTION:When the point of a probe electrode 3 comes into contact to a surface electrode 12, a current flows to an LED 11 through an electrode stand 1 and light 14 is emitted through a window 13. The light reaches an automatic optical axis matching unit 8 via an optical fiber 7 with a spherical lens and the unit 8 transfers the fiber to a position of the maximum coupling efficiency. After this, the light 14 is measured its output value by a meter 9 and the central wavelength and the half-value width of the wavelength are measured by a spectrum analyzer 10. By this constitution, as the measurement of the fiber coupling output characteristic and the optical spectrum characteristic of an optical semiconductor is conducted in the state of a wafer and the semiconductor can be preselected, the inspecting yield in after it is assembed is improved.
    • 10. 发明专利
    • Assembling method for semiconductor element
    • 半导体元件的组装方法
    • JPS5756936A
    • 1982-04-05
    • JP13248580
    • 1980-09-23
    • Mitsubishi Electric Corp
    • OOMURA ETSUJIHIGUCHI HIDEYO
    • H01L21/52H01L21/58H01S5/00
    • H01L24/83H01L24/32H01L2224/8319H01L2224/8385H01L2924/01013H01L2924/01029H01L2924/07802
    • PURPOSE:To remove residual stress applied to a semiconductor element at an ambient temperature by compressing the periphery of the heat sink of metal at the temperature rising time of heat fusion and bonding while limiting the thermal expansion. CONSTITUTION:A copper heat sink 12 is placed on a base 21, is compressed by a piston 22, and the expansion DELTAL of the heat sink is set to zero at the temperature rising time, or equalized approximately to the thermal expansion Al of the semiconductor laser 11. With this configuration, when it is returned from melting time to ambient temperature, the residual stress due to the difference of the thermal expansion coefficients can be almost eliminated. Accordingly, the reliability of the laser 11 can be improved.
    • 目的:通过在限制热膨胀的同时在热熔融和粘合的温度上升时间压缩金属散热器的周边来消除在环境温度下施加到半导体元件的残留应力。 构成:将铜散热器12放置在基座21上,被活塞22压缩,并且散热器的膨胀DELTAL在升温时间被设定为零,或大致相当于半导体的热膨胀Al 通过这种结构,当从熔融时间返回到环境温度时,可以几乎消除由于热膨胀系数的差异引起的残余应力。 因此,能够提高激光器11的可靠性。