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    • 2. 发明专利
    • SEMICONDUCTOR LIGHT EMITTING DEVICE
    • JPH03109780A
    • 1991-05-09
    • JP24882389
    • 1989-09-25
    • MITSUBISHI ELECTRIC CORP
    • YOSHIDA KAZUTOMI
    • H01L33/58
    • PURPOSE:To obtain high condensing characteristics by positioning and fixing a flat rear face of a silicon substrate formed with a semi-spherical protrusion serving as a condenser lens on the surface on a surface of a semiconductor light emitting element radiating non-directional light. CONSTITUTION:On a flat surface of a semiconductor light emitting element 2 radiating non-directional light, a flat rear face of a silicon substrate 4 formed with a semi-spherical protrusion 5 serving as a condenser lens on the surface is positioned and fixed. That is, since micro-processibility of the silicon substrate 4 is more excellent than glass moldability, it is easy to form the protrusion 5 in a more geometrically complete semi-sphere. In addition, when the protrusion 5 of the silicon substrate 4 is to be positioned, the flat rear face of the silicon substrate 4 can be freely moved on the flat surface of the semiconductor light emitting element 2 so that a position of fixing the protrusion 5 can be adjusted and fixed to the optimum position for the protrusion 5 fixed position to exhibit high condensing function. Thus high condensing characteristics can obtained.
    • 4. 发明专利
    • MESA TYPE SEMICONDUCTOR DEVICE
    • JPS61172338A
    • 1986-08-04
    • JP1382585
    • 1985-01-28
    • MITSUBISHI ELECTRIC CORP
    • YOSHIDA KAZUTOMITAKAHASHI KAZUHISASHIBA TETSUOIKEDA KENJI
    • H01L21/312
    • PURPOSE:To reduce any surface leak current while protecting corners of mesa groove from being damaged, by a method wherein P-N junction part exposed to a mesa groove is covered surely to protect the surface of P-N junction part of semiconductor device actuated by means of impressing the P-N junction part with reverse bias. CONSTITUTION:The first polyimide layer 8a is preliminarily formed on the surface of peripheral part of mesa groove 7 to form a step difference while the second polyimide layer 8b is formed on overall surface of the mesa goove 7 and the first polyimide layer 8a to protect a P-N junction part 4. A step difference is formed in the photoreceiving part of photodiode since the outer surface outside the mesa groove 7 part is coated with the polyimide layer 8a to raise the wall surface of mesa groove 7 by the thickness of layer 8a. Resultantly if the step difference part is further coated with the polyimide layer 8b, polyimide flows into the mesa groove 7 sufficiently due to the step difference in the inner wall of mesa groove 7 to cover the inner wall whereto P-N junction part 4 is exposed. Therefore any dark current may be prevented from flowing when the P-N junction part 4 is irradiated with light. Moreover any corners may be protected from being damaged owing to the polyimide layer 8b covering the corners of mesa groove 7.
    • 6. 发明专利
    • SEMICONDUCTOR LIGHT EMITTING DEVICE
    • JPH01130576A
    • 1989-05-23
    • JP29132087
    • 1987-11-17
    • MITSUBISHI ELECTRIC CORP
    • YOSHIDA KAZUTOMI
    • H01L33/20H01L33/30
    • PURPOSE:To improve coupling efficiency with an optical fiber, and enable inspecting characteristics of each element in a wafer state, by forming the vicinity of light emitting point of a light emitting end surface into a semicolumar type, and arranging the light emitting point in the rear of chip end surface. CONSTITUTION:A light emitting end surface 13 formed into a columnar type has lens effect. Light output outward after refracted by said surface is bent in an active layer axis direction, and a light beam 12 has a beam spot whose light density is highest in the front of the light emitting end surface 13. By arranging an optical fiber 16 at the spot position, the light can be transmitted into the optical fiber 16 with high coupling efficiency. In a wafer state, each end surface light emitting diode chip exposes the light emitting end surface 13, and is electrically isolated, so that the chip can be driven by injecting a current from outside, and characteristics of each chip can be inspected in a wafer state.
    • 7. 发明专利
    • MEASURING DEVICE FOR OPTICAL SEMICONDUCTOR CHARACTERISTIC
    • JPS63248141A
    • 1988-10-14
    • JP8317187
    • 1987-04-03
    • MITSUBISHI ELECTRIC CORP
    • YOSHIDA KAZUTOMIHIGUCHI HIDEYO
    • H01L21/66H01L33/58
    • PURPOSE:To measure the characteristics of an optical semiconductor in the state of a wafer by a method wherein the title device is provided with an optical fiber with a spherical lens, an automatic optical axis matching unit, a photo output meter and an optical spectrum analyzer. CONSTITUTION:When the point of a probe electrode 3 comes into contact to a surface electrode 12, a current flows to an LED 11 through an electrode stand 1 and light 14 is emitted through a window 13. The light reaches an automatic optical axis matching unit 8 via an optical fiber 7 with a spherical lens and the unit 8 transfers the fiber to a position of the maximum coupling efficiency. After this, the light 14 is measured its output value by a meter 9 and the central wavelength and the half-value width of the wavelength are measured by a spectrum analyzer 10. By this constitution, as the measurement of the fiber coupling output characteristic and the optical spectrum characteristic of an optical semiconductor is conducted in the state of a wafer and the semiconductor can be preselected, the inspecting yield in after it is assembed is improved.
    • 10. 发明专利
    • CAPPING DEVICE
    • JPH0567690A
    • 1993-03-19
    • JP25575291
    • 1991-09-05
    • MITSUBISHI ELECTRIC CORP
    • YOSHIDA KAZUTOMI
    • H01L21/50H01L23/02H01S5/00
    • PURPOSE:To enable a cap and a semiconductor chip to be enhanced in relative positional accuracy by a method wherein the position adjustment of parts is automatically carried out taking advantage of the image data of the parts. CONSTITUTION:When an optical semiconductor element 3 is capped, the images of the optical semiconductor element 3 and a cap 1 are picked up by a camera 9 through a window glass 2, and the images are displayed on a CRT display 10. Then, the displayed image is processed into signals through an image processing device 11, and data that tell how distant time optical semiconductor chip 3 is located from the cap 1 on the basis of the outer periphery of the cap 1 are outputted. A control device 12 drives an upper electrode 4 receiving the data concerned so as to pout the cap 1 in position. After the cap 1 is located at an optimal position, and the cap 1 is welded at a welding point 7. As mentioned above, the position adjustment of the cap 3 is automatically carried out basing on the relative position data of the cap 1 and the optical semiconductor chip 3, so that a capping operation excellent in position accuracy can be easily executed.