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    • 9. 发明专利
    • ANTIMICROBIAL ALUMINUM OR ALUMINUM ALLOY MATERIAL AND ITS PRODUCTION
    • JPH10147898A
    • 1998-06-02
    • JP31854496
    • 1996-11-15
    • FUJISHIMA AKIRAHASHIMOTO KAZUHITOYKK CORP
    • FUJISHIMA AKIRAHASHIMOTO KAZUHITONAKADA NOBUYUKIARAI TOSHIO
    • A01N59/16A01N59/20C25D11/18
    • PROBLEM TO BE SOLVED: To provide production by which a photocatalyst layer that shows good covering power and excellent adhesion even to an aluminum alloy base material having a complicated shape, can be formed without reducing strength of the aluminum alloy base material. SOLUTION: This production comprises: subjecting a base material 11 that consists of an aluminum alloy, to anodic oxidation treatment to form an anodic oxide coating film 12 on the base material 11; further immersing the treated material in a solution contg. suspended fine semiconductor particles 10, coating the treated material with the solution contg. suspended fine semiconductor particles 10 (liquid suspension of fine semiconductor particles 10) or subjecting the treated base material to electrophoresis treatment in the liquid suspension of fine semiconductor particles 10, to deposit the fine semiconductor particles 10 on the anodic oxide coating film 12; and thereafter, subjecting the resulting material to sealing treatment to form a photocatalyst layer consisting of a composite phase in which a swelled anodic oxide coating film 12a and the fine semiconductor particles 10 coexist, and also to improve corrosion resistance of the aluminum alloy base material 11. At this time, since the production is a wet process, the photocatalyst layer that shows good covering power even to the base material having a complicated shape, can be formed even at room temp. Thus, the formation of the photocatalyst layer also having sufficient massproductivity can be performed without any possibility of reducing strength of the aluminum alloy base material 11.