会员体验
专利管家(专利管理)
工作空间(专利管理)
风险监控(情报监控)
数据分析(专利分析)
侵权分析(诉讼无效)
联系我们
交流群
官方交流:
QQ群: 891211   
微信请扫码    >>>
现在联系顾问~
热词
    • 9. 发明专利
    • METHOD FOR SYNTHESIZING HARD TURBOSTRATIC BN THIN LAYER AND DEVICE THEREFOR
    • JP2000129422A
    • 2000-05-09
    • JP31540098
    • 1998-10-19
    • NAT INST RES INORGANIC MAT
    • TANAKA KOJI
    • C23C14/06C23C14/22
    • PROBLEM TO BE SOLVED: To synthesize a hard BN thin film having excellent characteristics as those of a coating material to be used at high temp. and further capable of applying coating on the surface of a thermaly weak material. SOLUTION: In a method in which, simultaneously with the evaporation of thermal boron(B), ions by an ion source and neutral, accelerated, active nitrogen grains (N2*) are applied toward a substrate for film formation to synthesize a boron nitride(BN) thin film on the substrate, a substrate holder 8 is provided with a refrigerant flowing passage for subjecting the substrate to forced cooling to a low temp. region lower than room temp., and, in the process of film formation, the substrate is subjected to forced cooling to hold the substrate temp. to a low temp., by which the grain growth of hexagonal crystal BN (h-BN) is suppressed and the development of the layer is suppressed to form into more amorphous BN, and, moreover, by controlling the ratio of the granular number between N2* and the evaporated B, i.e., (N2*/B), the high purity turbostratic BN (t-BN) thin film of high quality which does not contain unreacted B is synthesized.