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1. 发明专利

JP2008164097A Sliding structure 有权
标题翻译：滑动结构
公开(公告)号：JP2008164097A
公开(公告)日：2008-07-17
申请号：JP2006355606
申请日：2006-12-28
申请人： Komatsu Ltd , Nissan Motor Co Ltd , 日産自動車株式会社 , 株式会社小松製作所
发明人： SHIMADA MASARU , KAJIURA GOJI , OKUMURA TAKUJI , NAKAGAWA TADASHI , YOSHIDA TOSHIYUKI
IPC分类号： F16J1/02 , C10M103/02 , C10N30/06 , C10N40/02 , C10N50/08 , C23C14/06 , F04B53/00 , F04B53/14 , F04B53/16 , F16J10/04
摘要： PROBLEM TO BE SOLVED: To provide a sliding structure which carries out low friction sliding which combines wear resistance and seizure resistance while reducing influence by droplet particles and reducing a friction coefficient of a sliding surface which slides in lubricating oil. SOLUTION: A DLC film 20 with a hydrogen content of 10 at% or less is formed on the outer surface of a piston 5 formed with a hardened layer 23, by a PVD method or the like. A sliding surface 14 of a cylinder bore 12 is formed of a copper alloy. The surface roughness of the hardened layer 23 is formed to 0.1 μm or less in centerline average roughness Ra, and the DLC film 20 is formed into a thickness of 1.0 μm or less. The surface roughness of the DLC film 20 is set at 0. 05 μm or less in centerline average roughness Ra and set at 0.5 μm or less at maximum height Rmax. The height of droplets projected from the centerline or average line 35 of a roughness curve in the DLC film 20 covering the sliding surface is reduced to 0.4 μm or less. COPYRIGHT: (C)2008,JPO&INPIT
摘要翻译：要解决的问题：提供一种执行低摩擦滑动的滑动结构，其结合耐磨性和抗咬合性，同时减少液滴颗粒的影响并降低在润滑油中滑动的滑动表面的摩擦系数。解决方案：通过PVD法等在形成有硬化层23的活塞5的外表面上形成氢含量为10原子％以下的DLC膜20。气缸孔12的滑动表面14由铜合金形成。硬化层23的表面粗糙度在中心线平均粗糙度Ra中形成为0.1μm以下，DLC膜20形成为1.0μm以下的厚度。 DLC膜20的表面粗糙度在中心线平均粗糙度Ra为0.05μm以下，最大高度Rmax为0.5μm以下。从覆盖滑动面的DLC膜20的粗糙度曲线的中心线或平均线35突出的液滴的高度减小到0.4μm以下。版权所有（C）2008，JPO＆INPIT

2. 发明专利

JP2014119049A Oil pipe arrangement structure 有权
标题翻译：油管布置结构
公开(公告)号：JP2014119049A
公开(公告)日：2014-06-30
申请号：JP2012275330
申请日：2012-12-18
申请人： Jatco Ltd , ジヤトコ株式会社 , Nissan Motor Co Ltd , 日産自動車株式会社
发明人： NEHASHI TOSHIOMI , SHIMADA MASARU , SASAKI EIJI
IPC分类号： F16H57/04
摘要： PROBLEM TO BE SOLVED: To assemble an oil pipe connecting two oil passages formed on regions separated from each other, of a transmission case with high workability even when their opening directions are different from each other.SOLUTION: A pipe insertion hole 25 communicating with an oil pump output side is formed on a rear wall surface of a front oil passage formation block 20, and a pipe insertion hole 35 communicating with a clutch plate lubricating portion side is formed on a front wall surface of a rear oil passage formation block 30 in a state of being opposed to the pipe insertion hole 25. An oil pipe 5 is composed of a first pipe 50 and a second pipe 60 respectively having inserting portions 51, 63 at one end, and long portions 53, 61 at the other end. The inserting portion of the first pipe is inserted to the pipe insertion hole of the oil passage formation block 20 in a state of deeply inserting one of the long portions into the other long portion, and then the second pipe is slid to insert its insertion portion to the pipe insertion hole of the oil passage formation block 30. The long portions keep their fitting and connecting state, and two pipe insertion holes 25, 35 are communicating with each other by the oil pipe 5.
摘要翻译：要解决的问题：即使在打开方向彼此不同的情况下，也可以组装连接两个彼此分离的两个油路的油管，即变速箱的加工性高。另外，与油泵输出侧形成在前油路形成块20的后壁面上，与后方油路形成块30的前壁面形成有与离合器板润滑部侧连通的管插入孔35 与管插入孔25相对的状态。油管5由分别具有一端的插入部51,63和另一端的长部53,61的第一管50和第二管60构成。第一管的插入部分在将一个长部分深入另一长部的状态下插入到油通道形成块20的管插入孔中，然后第二管滑动以插入其插入部分到油路形成块30的管插入孔。长部分保持其装配和连接状态，两个管插入孔25,35通过油管5彼此连通。

3. 发明专利

JP2007045684A System and method for controlling target to be controlled of time-variant system having idle time 有权
标题翻译：用于控制目标的系统和方法，以控制具有空闲时间的时变系统
公开(公告)号：JP2007045684A
公开(公告)日：2007-02-22
申请号：JP2005234221
申请日：2005-08-12
申请人： Komatsu Ltd , Sumco Techxiv株式会社 , Sumco Techxiv Corp , 株式会社小松製作所
发明人： BANDO KENICHI , MORIMOTO SHIGEO , OKUMURA TAKUJI , OSADA SATORU , SHIMADA MASARU , TOMIOKA JUNSUKE , SHIRAISHI YUTAKA , KODAMA TAKESHI
IPC分类号： C30B15/20 , C30B29/06
摘要： PROBLEM TO BE SOLVED: To control a target to be controlled of a time-variant system having idle time with good precision.
SOLUTION: Set values expressing the idle time of the target 200 to be controlled, time constant, and process gain are previously set. The set value of the process gain has a predetermined time-variant property. Output value y and its first and second order time differential values are used as the state variable x of the target 200 to be controlled. A nonlinear state estimator 206 estimates the value x(t+Ld) of the state variable x at a future time point after the idle time from present time based on the present output value y and the set values of the idle time, the time constant and the process gain. A gain scheduled sliding mode controller 212 performs a gain scheduled sliding mode control operation based on the estimated value of x(t+Ld) of the state variable x at the future time point, the output deviation z(t+Ld) at the future time point, and the set values of the time constant and the process gain at the future time point so as to determine the operation quantity u
T to the target 200 to be controlled.
COPYRIGHT: (C)2007,JPO&INPIT
摘要翻译：要解决的问题：以高精度控制具有空闲时间的时变系统的目标。解决方案：预先设定表示要控制的目标200的空闲时间，时间常数和过程增益的设定值。过程增益的设定值具有预定的时变特性。输出值y及其第一和第二阶时间微分值被用作要控制的目标200的状态变量x。非线性状态估计器206基于当前输出值y和空闲时间的设定值，时间常数，估计从当前时间起的空闲时间之后的未来时间点的状态变量x的值x（t + Ld）和过程增益。增益调度滑动模式控制器212基于未来时间点的状态变量x的x（t + Ld）的估计值，将来的输出偏差z（t + Ld）来执行增益调度滑动模式控制操作时间点，以及将来时间点的时间常数和过程增益的设定值，以确定要被控制的目标200的操作量u T 。版权所有（C）2007，JPO＆INPIT

4. 发明专利

JP2005057086A Device and method for loading semiconductor wafer 有权
标题翻译：用于加载半导体波形的装置和方法
公开(公告)号：JP2005057086A
公开(公告)日：2005-03-03
申请号：JP2003287035
申请日：2003-08-05
申请人： Komatsu Electronic Metals Co Ltd , Komatsu Ltd , コマツ電子金属株式会社 , 株式会社小松製作所
发明人： TAJIRI TOMOAKI , TAKEDA HIDETOSHI , KITAHASHI MASAMITSU , SHIMADA MASARU
IPC分类号： B24B37/04 , B24B37/30 , H01L21/304 , H01L21/68
摘要： PROBLEM TO BE SOLVED: To set the deviation of a wafer from a chuck to an allowable quantity or less by centering the wafer without being influenced by fitting errors of the chuck and a retainer. SOLUTION: A centering pin 22 approaches the side face of the semiconductor wafer 30 mounted on a top plate 21 and side face of the chuck 11 without interfering in the retainer 12, and stops at a position corresponding to the diameter of the chuck 11. Since there is a centering deviation between the center axis 11c of the chuck 11 and the center axis 21c of the top plate 21, the top plate 21 is moved in the moving direction of the centering pin 22 together with an upper base 26 when the centering pin 22 is abutted on the side face of the semiconductor wafer 30 on the top plate 21. When the centering pin 22 stops on the position corresponding to the diameter of the chuck 11, the center axis 21c of the top plate 21 almost coincides with the center axis 11c of the chuck 11, and the centering deviation (d) can be made almost zero. COPYRIGHT: (C)2005,JPO&NCIPI
摘要翻译：要解决的问题：通过使晶片居中而不受夹头和保持器的配合误差的影响，将晶片从卡盘偏离到容许量以下。解决方案：定心销22接近安装在顶板21和卡盘11的侧面上的半导体晶片30的侧面，而不会妨碍保持器12，并且停止在对应于卡盘直径的位置由于卡盘11的中心轴11c与顶板21的中心轴线21c之间存在中心偏离，因此顶板21与上基座26一起沿着定心销22的移动方向移动，定心销22抵靠在顶板21上的半导体晶片30的侧面。当定心销22停止在与卡盘11的直径相对应的位置时，顶板21的中心轴21c几乎重合与卡盘11的中心轴线11c相对应，并且中心偏差（d）可以几乎为零。版权所有（C）2005，JPO＆NCIPI

5. 发明专利

JP2004106134A Working substrate fixing device, and its manufacturing method 有权
公开(公告)号：JP2004106134A
公开(公告)日：2004-04-08
申请号：JP2002274290
申请日：2002-09-20
申请人： Komatsu Electronic Metals Co Ltd , Komatsu Ltd , コマツ電子金属株式会社 , 株式会社小松製作所
发明人： KITAHASHI MASAMITSU , SHIMADA MASARU , TAJIRI TOMOAKI
IPC分类号： B24B37/30 , H01L21/304 , B24B37/04
摘要： PROBLEM TO BE SOLVED: To provide a wafer chuck which reduces a damage to the wafer without deteriorating the flatness of a wafer chuck surface, and maintains wafer processing accuracy at a high level, and the wafer chuck also prevents "pockets" from being produced on the surface of the chuck and a processed powder from scratching the back side of the wafer or attaching to the back side of the wafer by allowing the processed powder to enter the "pockets". SOLUTION: In the substrate fixing device which retains one face of an object to be polished 16 to allow other faces of the object to be polished 16 to contact a polishing cloth, the material of a portion which contacts the object to be polished 16 in the substrate fixing device is made of a ceramic pore free material wherein the diameter of a bubble 18 contained in the material is 1 μm or less and the number of bubbles is 100,000pcs/mm 3 or less. In addition, the surface roughness of a wafer contacting section is controlled to be Rmax of 1μm or less by grinding or polishing. COPYRIGHT: (C)2004,JPO

6. 发明专利

JPS5772508A Pool conveyer 失效
标题翻译： POOL CONVEYER
公开(公告)号：JPS5772508A
公开(公告)日：1982-05-06
申请号：JP14970080
申请日：1980-10-25
申请人： Nissan Motor Co Ltd , Rain Kogyo Kk , Tsubakimoto Kogyo Kk
发明人： KIBASHI TATSU , FUKUI KOUICHI , SHIMADA MASARU , NAKAI ISAO
IPC分类号： B65G17/24
摘要： PURPOSE: To continue conveying work of a conveyed object with a roller of larger friction force even for light resistance applied to the conveyed object, by mounting two kind of rollers with mutually different friction force to roller shafts secured to hung and driven chains.
CONSTITUTION: Between a pair of left and right chains 4, 4' wound on a drive sprocket 2 coupled to a motor 1 and driven sprocket 3, many roller shafts 5 are secured and fitted with both rollrs 7 through ball bearings 6 and rollers 9 through rotatable bushes 8. At operation, the above described rollers 7, 9 are moved along chain rails 14, 14' to convey a conveyed object A placed on the roller. When the conveyed object A is contacted to a guide bar 11 and applied with light resistance, the roller 7 of smaller friction force for the roller shaft 5 runs idle but the roller 9 with larger friction force maintains its stopping state to transmit conveying power to the conveyed object A, thus conveying work can be continued.
COPYRIGHT: (C)1982,JPO&Japio
摘要翻译：目的：通过将具有相互不同的摩擦力的两种滚子安装到固定到悬挂和驱动链条的滚轴上，即使对被传送物体施加的阻力，也可以通过较大摩擦力的滚轮继续传送被传送物体的工作。构成：在连接到电动机1和从动链轮3的驱动链轮2上的一对左右链条3,4'之间，许多辊轴5通过球轴承6和辊9穿过两个辊7固定并安装可旋转的衬套8.在操作时，上述辊7,9沿着链条导轨14,14'移动以传送放置在辊上的被输送物体A. 当被搬运物体A与导杆11接触并施加耐光性时，辊轴5的较小摩擦力的辊7怠速运转，而具有较大摩擦力的辊9保持其停止状态，以将输送功率传递至输送物体A，从而可以继续输送作业。

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