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1. 发明专利

JPS6122616A Solid electrolytic condenser 失效
公开(公告)号：JPS6122616A
公开(公告)日：1986-01-31
申请号：JP14269384
申请日：1984-07-09
申请人： Kogyo Gijutsuin , Showa Aluminium Co Ltd
发明人： OSADA SUMIO , OOTSUKA YOSHITATSU , SUZUKI TAKAO , TSUKAMOTO KENJI , OKITA KOUICHI
IPC分类号： B22D18/02 , B22D25/02 , C22C1/08 , H01G9/04

2. 发明专利

JPS6122615A Dry electrolytic condenser 失效
标题翻译：干电解冷凝器
公开(公告)号：JPS6122615A
公开(公告)日：1986-01-31
申请号：JP14269484
申请日：1984-07-09
申请人： Kogyo Gijutsuin , Showa Aluminium Co Ltd
发明人： OSADA SUMIO , OOTSUKA YOSHITATSU , SUZUKI TAKAO , TSUKAMOTO KENJI , OKITA KOUICHI
IPC分类号： H01G9/055 , H01G9/04

3. 发明专利

JPH0557201B2 失效
公开(公告)号：JPH0557201B2
公开(公告)日：1993-08-23
申请号：JP2793587
申请日：1987-02-09
申请人： SHOWA ALUMINIUM CO LTD
发明人： TSUKAMOTO KENJI , ISOYAMA EIZO , HOTSUTA NORYASU
IPC分类号： C01B21/072

4. 发明专利

JPH0221328B2 失效
公开(公告)号：JPH0221328B2
公开(公告)日：1990-05-14
申请号：JP2673183
申请日：1983-02-18
申请人： SHOWA ALUMINIUM CO LTD
发明人： ISOYAMA EIZO , TSUKAMOTO KENJI
IPC分类号： B21C23/00 , B21C23/14 , C22F1/04

5. 发明专利

JPS6140748B2 失效
公开(公告)号：JPS6140748B2
公开(公告)日：1986-09-10
申请号：JP23808283
申请日：1983-12-16
申请人： SHOWA ALUMINIUM CO LTD
发明人： KATO YUTAKA , TSUKAMOTO KENJI , ISOYAMA EIZO
IPC分类号： C23C8/02 , C23C8/10 , C23C8/12 , C23C14/56

6. 发明专利

JPS60174865A SURFACE TREATMENT OF ALUMINUM SUBSTRATE FOR FORMING THIN FILM 失效
公开(公告)号：JPS60174865A
公开(公告)日：1985-09-09
申请号：JP2784184
申请日：1984-02-15
申请人： SHOWA ALUMINIUM CO LTD
发明人： TSUKAMOTO KENJI , KATOU YUTAKA , ISOYAMA EIZOU , TANIMOTO SHIGEMI
IPC分类号： C23C8/12 , C23C14/02 , C23C16/02 , C23F4/00 , G03G5/08 , G03G5/10 , G03G5/14 , H01L21/316
摘要： PURPOSE:To form a favorable thin film free from surface defects by working the surface of an Al substrate in an atmosphere contg. oxygen while preventing contact with the air contg. moisture so as to expose a fresh surface. CONSTITUTION:The surface of an Al substrate is worked by cutting, grinding, laser working, electron beam working or other method in an atmosphere contg. oxygen while preventing contact with the air contg. moisture. An oxide film is formed on the exposed fresh surface.

7. 发明专利

JPS60174863A SURFACE TREATMENT OF ALUMINUM SUBSTRATE FOR FORMING THIN FILM 失效
公开(公告)号：JPS60174863A
公开(公告)日：1985-09-09
申请号：JP2783984
申请日：1984-02-15
申请人： SHOWA ALUMINIUM CO LTD
发明人： TSUKAMOTO KENJI , KATOU YUTAKA , ISOYAMA EIZOU , TANIMOTO SHIGEMI
IPC分类号： C23C8/12 , C23C8/10 , C23C14/02 , C23C16/02 , C23F4/00 , G03G5/08 , G03G5/10 , G03G5/14 , H01L21/316
摘要： PURPOSE:To form a favorable thin film free from surface defects by dry-etching the surface of an Al substrate to remove an oxide hydrate film and to make the surface clean and dry and by heating the Al substrate in an atmosphere contg. oxygen while preventing contact with the air contg. moisture. CONSTITUTION:The surface of an Al substrate is dry-etched by discharge cleaning, reactive gas etching, plasma etching, reactive ion beam etching or other method to remove an oxide hydrate film and to make the surface clean and dry. The Al substrate is then heated in an atmosphere contg. oxygen while preventing contact with the air contg. moisture. An oxide film is formed on the surface of the Al substrate.

8. 发明专利

JPS60152666A PRODUCTION OF ALUMINUM MATERIAL FOR VACUUM 失效
公开(公告)号：JPS60152666A
公开(公告)日：1985-08-10
申请号：JP1063084
申请日：1984-01-23
申请人： SHOWA ALUMINIUM CO LTD
发明人： KATOU YUTAKA , TSUKAMOTO KENJI , ISOYAMA EIZOU
IPC分类号： C23C8/12 , C23F4/00
摘要： PURPOSE:To release adsorbed gases from an Al surface and to prevent the decrease in the degree of vacuum in the stage of producing an Al member to be used in a high vacuum part by subjecting the surface facing the vacuum part to surface working such as cutting in a gaseous atmosphere contg. oxygen without bringing the same into contact with the atmosphere contg. moisture. CONSTITUTION:The surface facing a vacuum part of an Al member as a material facing the vacuum member of a high vacuum device is cut or ground to expose the fresh surface in a gaseous atmosphere contg. 0.5-30vol% O2 and consisting of the balance Ar, He or gaseous N inert with Al or a vacuum contg. a slight amt. of O2 in the stage of producing said member. The exposed surface of Al contacts with O2 without contacting with the atm. air contg. moisture and is therefore oxidized by which an Al2O3 film is formed on the surface. Since no hydrated oxide is formed on the surface of the Al, moisture, gaseous hydrocarbon and gases such as CO2, CO, etc. which decrease the degree of vacuum are not generated in vacuum. The high degree of vacuum is thus maintained.

9. 发明专利

JPS60128259A PRODUCTION OF ALUMINUM MATERIAL FOR VACUUM 失效
公开(公告)号：JPS60128259A
公开(公告)日：1985-07-09
申请号：JP23808283
申请日：1983-12-16
申请人： SHOWA ALUMINIUM CO LTD
发明人： KATOU YUTAKA , TSUKAMOTO KENJI , ISOYAMA EIZOU
IPC分类号： C23C8/02 , C23C8/10 , C23C8/12 , C23C14/56
摘要： PURPOSE:To form an oxide film on the surface and to produce a formed Al material usable in a high vacuum by cleaning the surface of the formed Al material with an alkali or acid to remove the hydrated oxide then heating the material in an inert gaseous atmosphere contg. oxygen. CONSTITUTION:An Al or Al alloy shape material formed by extrusion forming rolling, press forming, etc. is preliminarily dipped in a treating soln. for suppressing formation of a hydrated oxide film contg. 0.000001-0.0005% acid such as chromic acid, silicic acid, etc. or the salt thereof. The material is then subjected to alkali cleaning using caustic soda or pickling using sulfuric acid in a vacuum vessel by which the working fluid sticking thereto is removed from said material and the hydrated oxide film on the surface is removed therefrom. While the evacuation is continued, the material is dried at 70-90 deg.C and in succession, the material is heated for 0.5-6hr at 200-300 deg.C in an inert gaseous atmosphere of Ar, He, etc. contg. 1-10vol% oxygen. The dense oxide film is formed on the surface and the formed Al material which does not release gas even in a high vacuum is obtd.

10. 发明专利

JPH0461070B2 失效
公开(公告)号：JPH0461070B2
公开(公告)日：1992-09-29
申请号：JP2784184
申请日：1984-02-15
申请人： SHOWA ALUMINIUM CO LTD
发明人： TSUKAMOTO KENJI , KATO YUTAKA , ISOYAMA EIZO , TANIMOTO SHIGEMI
IPC分类号： C23C8/12 , C23C14/02 , C23C16/02 , C23F4/00 , G03G5/08 , G03G5/10 , G03G5/14 , H01L21/316

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