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1. 发明专利

JP2011106025A Al-BASED ALLOY SPUTTERING TARGET 有权
标题翻译：基于Al的合金喷射目标
公开(公告)号：JP2011106025A
公开(公告)日：2011-06-02
申请号：JP2010161002
申请日：2010-07-15
申请人： Kobe Steel Ltd , Kobelco Kaken:Kk , 株式会社コベルコ科研 , 株式会社神戸製鋼所
发明人： MATSUMOTO KATSUSHI , IWASAKI YUKI , TAKAGI TOSHIAKI , NAGAO MAMORU , MAKINO HIDETADA , KOBAYASHI YOSHIHIRO , OKUNO HIROYUKI , KUGIMIYA TOSHIHIRO , GOTO YASUSHI
IPC分类号： C23C14/34
摘要： PROBLEM TO BE SOLVED: To provide a technique for reducing the generation of splashes, particularly, initial splashes in the case an Al-(Ni, Co)-(La, Nd) based alloy or an Al-(Ni, Co)-(La, Nd)-(Cu, Ge) based alloy is used as a sputtering target.
SOLUTION: The Al-based alloy sputtering target comprises: at least one selected from an A group (Ni, Co) and at least one selected from a B group (La, Nd), wherein in the cross-section vertical to the rolling face of the sputtering target, when the crystal grain size in the rolling direction in the face parallel to the rolling direction is measured, the average crystal grain size is ≤500 μm, and also, the maximum crystal grain size is ≤1,500 μm.
COPYRIGHT: (C)2011,JPO&INPIT
摘要翻译：要解决的问题：提供一种减少飞溅产生的技术，特别是在Al-（Ni，Co） - （La，Nd）基合金或Al-（Ni，Co ） - （La，Nd） - （Cu，Ge）基合金作为溅射靶。解决方案：Al基合金溅射靶包括：选自A组（Ni，Co）和选自B组（La，Nd）中的至少一种的至少一种，其中在横截面垂直于溅射靶的滚动面在测量与轧制方向平行的轧制方向的晶粒尺寸时，平均晶粒尺寸≤500μm，最大晶粒尺寸≤1,500μm 。版权所有（C）2011，JPO＆INPIT

2. 发明专利

JP2014159617A Production method of slag for sub-base 有权
标题翻译：用于子基的SLAG的生产方法
公开(公告)号：JP2014159617A
公开(公告)日：2014-09-04
申请号：JP2013030979
申请日：2013-02-20
申请人： Kobe Steel Ltd , 株式会社神戸製鋼所
发明人： KOBAYASHI YOSHIHIRO , SUZUKI RYOHEI
IPC分类号： C21C1/02 , C04B5/06
CPC分类号： Y02P10/212
摘要： PROBLEM TO BE SOLVED: To reliably suppress a Pb elution amount from slag in which Pb is included by high concentration within an earth environmental quality standard without the steep rise of production cost in slag for sub-base.SOLUTION: In a production method of slag for sub-base, when slag removed in a preliminary treatment step performed before decarbonization treatment is recycled as the slag for sub-base, dust 10 including Fe component and Pb component is input in the preliminary treatment step, blowing is performed depending on a refining condition satisfying a prescribed relation derived from a Pb input amount, a molten iron temperature, a blowing time, an oxygen concentration in a furnace, and a slag amount, and Pb is made harmless, thereby the slag removed after the blowing is recycled as the slag for sub-base.
摘要翻译：要解决的问题：为了在地下环境质量标准中可靠地抑制高浓度含铅的炉渣中的Pb洗脱量，而不会使底层炉渣的生产成本急剧上升。解决方案：在炉渣的生产方法中对于底座，当在脱碳处理之前进行的预处理步骤中除去的炉渣作为副炉渣再循环时，在预处理步骤中输入包括Fe成分和Pb成分的粉尘10，根据精炼条件满足从Pb输入量，铁水温度，吹炼时间，炉中的氧浓度和渣量导出的规定关系，并且使Pb变得无害，从而将吹入后的渣除去作为子底渣。

3. 发明专利

JP2014039898A Method of modifying slag and modified slag 审中-公开
标题翻译：修改SLAG和改性SLAG的方法
公开(公告)号：JP2014039898A
公开(公告)日：2014-03-06
申请号：JP2012182675
申请日：2012-08-21
申请人： Kobe Steel Ltd , 株式会社神戸製鋼所
发明人： YANAGISAWA KAZUMI , KOBAYASHI YOSHIHIRO , SATO ATSUSHI , ABIKO TAKASHI , FUNAOKA YOICHI
IPC分类号： B09B3/00 , C04B5/00 , C21B3/04
CPC分类号： Y02W30/542
摘要： PROBLEM TO BE SOLVED: To sufficiently suppress elution of fluorine contained in a slag by reliably producing ettringite in a slag containing a blast furnace slag.SOLUTION: A slag 1 containing a blast furnace slag with a fluorine content of 0.08 wt% or more is subjected to the wetting/drying processing having a first step of aerating the slag 1, a second step of depositing moisture to the slag 1 after the first step, and a third step of curing the slag 1 with moisture deposited in the second step. Ettringite is produced in the inside of the slag 1 and on the surface thereof, and the fluorine contained in the slag 1 is fixed in the ettringite.
摘要翻译：要解决的问题：通过在含有高炉矿渣的炉渣中可靠地制造钙矾石来充分抑制炉渣中的氟的洗脱。溶液：含有含氟量为0.08重量％以上的高炉渣的渣1经受涉及具有对炉渣1进行充气的第一步骤的润湿/干燥处理，在第一步骤之后向炉渣1沉积水分的第二步骤，以及在第二步骤中沉积有水分的炉渣1固化的第三步骤。在渣1的内部及其表面产生铁矾石，炉渣1中所含的氟被固定在钙矾石中。

4. 发明专利

JP2014031588A Aluminum alloy clad material for a heat exchanger 有权
标题翻译：用于热交换器的铝合金材料
公开(公告)号：JP2014031588A
公开(公告)日：2014-02-20
申请号：JP2013225366
申请日：2013-10-30
申请人： Kobe Steel Ltd , 株式会社神戸製鋼所
发明人： KOBAYASHI YOSHIHIRO , SAKASHITA SHINJI , UEDA TOSHIKI
IPC分类号： C22C21/00 , B23K35/22 , B23K35/28 , C22F1/00 , C22F1/053
摘要： PROBLEM TO BE SOLVED: To provide an aluminum alloy clad material for a heat exchanger having an excellent solderability and excellent in terms of pitting corrosion resistance.SOLUTION: In an aluminum alloy clad material 1a for a heat exchanger comprising a core material 2, a sacrificial material 3 formed on one surface of the core material 2, and a solder material 4 consisting of an Al-Si alloy formed on the other surface of the core material 2, the core material 2 includes specified contents of Si, Mn, Cu, and Ti and has the balance comprising Al and inevitable impurities, whereas the sacrificial material 3 includes specified contents of Zn, Cr, Si, and Mn and has the balance comprising Al and inevitable impurities, whereas the respective maximal sizes, number densities, and area ratios of Al-Mn, Al-Mn-Si, and Al-Cu intermetallic compounds deposited on the sacrificial material 3 after a 3 min soldering thermal treatment at 595°C are peculiarly regulated.
摘要翻译：要解决的问题：提供一种具有优异的可焊性和耐点腐蚀性优异的用于热交换器的铝合金包覆材料。解决方案：在用于包括芯材2的热交换器的铝合金包覆材料1a中，牺牲形成在芯材2的一个表面上的材料3和形成在芯材2的另一个表面上的由Al-Si合金组成的焊料材料4，芯材2包括特定含量的Si，Mn，Cu和 Ti，余量包含Al和不可避免的杂质，而牺牲材料3包括Zn，Cr，Si和Mn的特定含量，余量包含Al和不可避免的杂质，而各自的最大尺寸，数量密度和面积比特别调节了在595℃下3分钟焊接热处理后沉积在牺牲材料3上的Al-Mn，Al-Mn-Si和Al-Cu金属间化合物。

5. 发明专利

JP2011216782A Thin film transistor substrate with superior resistance to ito pinhole corrosion 审中-公开
标题翻译：薄膜晶体管衬底，具有超导电阻ITO引线腐蚀
公开(公告)号：JP2011216782A
公开(公告)日：2011-10-27
申请号：JP2010085425
申请日：2010-04-01
申请人： Kobe Steel Ltd , 株式会社神戸製鋼所
发明人： KOBAYASHI YOSHIHIRO , NAGAO MAMORU
IPC分类号： H01L29/786 , G02F1/1368 , H01L21/28 , H01L21/3205 , H01L23/52
摘要： PROBLEM TO BE SOLVED: To provide a thin film transistor substrate having a structure such that a thin film transistor has a transparent conductive film and an Al alloy film connected directly to each other, the thin film transistor being prevented from having pinhole corrosion without providing processes for application and peeling of paint for corrosion prevention for a manufacturing process thereof.SOLUTION: The present invention relates to the thin film transistor substrate having the structure such that the thin film transistor has the transparent conductive film and Al alloy film connected directly to each other, wherein the Al alloy film contains 0.1 to 5 atom% Ge, and has a laminate structure comprising a first layer containing Ge three or more times as much as that of the Al alloy film, and a second layer made of Al alloy having a lower Ge content than the first layer.
摘要翻译：要解决的问题：为了提供具有使薄膜晶体管具有彼此直接连接的透明导电膜和Al合金膜的结构的薄膜晶体管基板，可以防止薄膜晶体管在没有提供工艺的情况下具有针孔腐蚀用于其制造工艺中用于防腐蚀涂料的涂布和剥离。本发明涉及具有薄膜晶体管的薄膜晶体管基板，其薄膜晶体管具有彼此直接连接的透明导电膜和Al合金膜其中，所述Al合金膜含有0.1〜5原子％的Ge，并且具有层叠结构，所述叠层结构包含含有Ge的比率为所述Al合金膜的三倍以上的第一层，以及由Al合金制成的第二层， Ge含量比第一层。

6. 发明专利

JP2010202919A Aluminum alloy cladding material 有权
标题翻译：铝合金材料
公开(公告)号：JP2010202919A
公开(公告)日：2010-09-16
申请号：JP2009048277
申请日：2009-03-02
申请人： Kobe Steel Ltd , 株式会社神戸製鋼所
发明人： SAKASHITA SHINJI , KOBAYASHI YOSHIHIRO
IPC分类号： C22C21/00 , B23K35/28 , C22F1/00 , C22F1/04 , F28F21/08
摘要： PROBLEM TO BE SOLVED: To provide an aluminum alloy cladding material for a heat exchanger which maintains high corrosion resistance and high strength, particularly exhibits excellent inside corrosion resistance as that of an automotive brazing type radiator tube material, even when being made thin in thickness. SOLUTION: In the aluminum alloy cladding material provided with: a core material; a sacrificial anode material clad on one side of the core material; and a brazing filler metal clad on the other side of the core material, the core material comprises, by mass, 0.2 to 2.0% Si, 0.2 to 2.0% Mn and 0.3 to 2.0% Cu, and the balance Al with inevitable impurities, the sacrificial anode material comprises, by mass, 1.0 to 12% Zn, and further comprises one or more selected from 0.01 to 5.0% Mo and 0.01 to 5.0% W, and the balance Al with inevitable impurities, and the brazing filler metal comprises 6 to 15 mass% Si, and the balance Al with inevitable impurities. COPYRIGHT: (C)2010,JPO&INPIT
摘要翻译：要解决的问题：为了提供一种保持高耐腐蚀性和高强度的热交换器的铝合金包覆材料，特别是表现出与汽车钎焊型散热器管材料相比优异的内部耐腐蚀性，即使在制成薄厚度。解决方案：在具有芯材的铝合金覆层材料中，包覆在芯材一侧的牺牲阳极材料; 以及包覆在芯材的另一侧的钎料填充材料，芯材以质量计含有Si：0.2〜2.0％，Mn：0.2〜2.0％，Cu：0.3〜2.0％，余量为Al，不可避免的杂质为牺牲阳极材料以质量计含有1.0〜12％的Zn，还含有选自0.01〜5.0％Mo和0.01〜5.0％W的一种或多种，剩余部分Al含有不可避免的杂质，钎焊料包含6〜 15质量％Si，余量为Al与不可避免的杂质。版权所有（C）2010，JPO＆INPIT

7. 发明专利

JP2010165865A Al-ALLOY FILM FOR DISPLAY DEVICE, DISPLAY DEVICE, AND Al-ALLOY SPUTTERING TARGET 审中-公开
标题翻译：用于显示装置的合金膜，显示装置和铝合金喷射目标
公开(公告)号：JP2010165865A
公开(公告)日：2010-07-29
申请号：JP2009006959
申请日：2009-01-15
申请人： Kobe Steel Ltd , 株式会社神戸製鋼所
发明人： KOBAYASHI YOSHIHIRO , NAGAO MAMORU , TAKAGI TOSHIAKI , MIKI AYA
IPC分类号： H01L21/3205 , C23C14/14 , C23C14/34 , H01L21/285 , H01L23/52 , H01L29/786
摘要： PROBLEM TO BE SOLVED: To provide an Al-alloy film for a display device in which contact resistance with a transparent pixel electrode directly connected with the Al-alloy film is sufficiently reduced and corrosion resistance and heat resistance are improved. SOLUTION: The Al-alloy film is directly connected with a transparent conductive film on a substrate of a display device. The Al-alloy film contains ≤0.5 atom% (not including 0 atom%) of Co, 0.2-2.0 atom% of Ge, and ≤0.5 atom% (not including 0 atom%) of Cu. The Al-alloy film is configured such that a total amount of Co, Ge, and Cu is 0.2-2.0 atom% while satisfying formula (1): Cu/Co≤1.5 or formula (2): 2.5≤Cu/Co≤6.0. In formulas (1), (2), Cu and Co represent a content (atom%) of each element in the Al-alloy film, respectively. COPYRIGHT: (C)2010,JPO&INPIT
摘要翻译：解决的问题：提供一种显示装置的铝合金膜，其中与与Al合金膜直接连接的透明像素电极的接触电阻充分降低，并且耐腐蚀性和耐热性得到改善。解决方案：Al合金膜与显示装置的基板上的透明导电膜直接连接。 Al合金膜含有≤0.5原子％（不包括0原子％）的Co，0.2-2.0原子％的Ge和≤0.5原子％（不包括0原子％）的Cu。 Al合金膜被配置为使得Co，Ge和Cu的总量为0.2-2.0原子％，同时满足式（1）：Cu /Co≤1.5或式（2）：2.5≤Cu/Co≤6.0 。在式（1），（2）中，Cu和Co分别表示Al合金膜中各元素的含量（原子％）。版权所有（C）2010，JPO＆INPIT

8. 发明专利

JP2013227601A Elution control method of hexavalent chromium from slag and slag 有权
标题翻译：来自SLAG和SLAG的六价铬的控制方法
公开(公告)号：JP2013227601A
公开(公告)日：2013-11-07
申请号：JP2012098756
申请日：2012-04-24
申请人： Kobe Steel Ltd , 株式会社神戸製鋼所
发明人： KOBAYASHI YOSHIHIRO , NAGAO MOTOHIRO , KAMIYAMA TAIICHI , NISHIGUCHI KATSUSHIGE , TOMIOKA ATSUSHI , ABIKO TAKASHI , SAKAMOTO KOICHI
IPC分类号： C21C5/54 , B09B3/00 , C04B5/06
CPC分类号： Y02P10/216
摘要： PROBLEM TO BE SOLVED: To readily control elution of hexavalent chromium from a chromium-containing slag.SOLUTION: An elution control method of hexavalent chromium from a slag is a method for controlling elution of hexavalent chromium from a Cr-containing slag and comprises allowing 50-80 mass% Cr of total Cr contained in the slag to exist in the form of MgOCrOor MnOCrO, allowing ≥3 mass% Cr to be contained in M. Fe in the form of a mineral phase containing the Cr and allowing the remaining Cr to exist in a non-CrOform.
摘要翻译：要解决的问题：容易控制来自含铬渣的六价铬的洗脱。溶液：来自渣的六价铬的洗脱控制方法是控制来自含Cr矿渣的六价铬的洗脱的方法，包括允许50 -80质量％的Cr中所含的总Cr以MgOCrOor MnOCrO的形式存在，允许以含有Cr的矿物相的形式在M.Fe中含有≥3质量％的Cr，并允许剩余的Cr 存在于非CrOform中。

9. 发明专利

JP2013224486A Al ALLOY FILM FOR DISPLAY DEVICE AND DISPLAY DEVICE 审中-公开
标题翻译：用于显示装置和显示装置的铝合金膜
公开(公告)号：JP2013224486A
公开(公告)日：2013-10-31
申请号：JP2013054947
申请日：2013-03-18
申请人： Kobe Steel Ltd , 株式会社神戸製鋼所
发明人： TAKAGI TOSHIAKI , NANBA SHIGENOBU , NAGAO MAMORU , KOBAYASHI YOSHIHIRO
IPC分类号： C23C14/14 , C22C21/00 , G09F9/30
摘要： PROBLEM TO BE SOLVED: To provide an Al alloy film for a display device that shows low contact resistance and electric resistance and preferably has excellent heat resistance and corrosion resistance even if the Al alloy film is directly connected with a transparent pixel electrode while a barrier metal layer omitted.SOLUTION: An Al alloy film is directly connected with a transparent conductive film on a substrate of a display device. The Al alloy film contains Ni and/or Co of 0.1-6 atm% and Ge of 0.1-2 atm%, where Ge concentration of an aluminum matrix grain boundary satisfies more than 1.8 times Ge concentration of the Al alloy film.
摘要翻译：要解决的问题：为了提供一种用于显示低接触电阻和电阻的显示装置的Al合金膜，并且即使Al合金膜与透明像素电极直接连接，并且优选具有优异的耐热性和耐腐蚀性，而阻挡金属层。在显示装置的基板上，Al合金膜与透明导电膜直接连接。 Al合金膜含有0.1-6atm％的Ni和/或Co，0.1-2atm％的Ge，其中Al基质晶界的Ge浓度满足Al合金膜的Ge浓度的1.8倍以上。

10. 发明专利

JP2013107134A Flux composition and brazing sheet 有权
标题翻译：通风组合物和制动片
公开(公告)号：JP2013107134A
公开(公告)日：2013-06-06
申请号：JP2012194620
申请日：2012-09-04
申请人： Kobe Steel Ltd , 株式会社神戸製鋼所
发明人： KOBAYASHI YOSHIHIRO , HORIGUCHI MOTOHIRO , SAKAMOTO KOICHI , UEDA TOSHIKI , KIMURA SHINHEI , IZUMI TAKAHIRO
IPC分类号： B23K35/363 , B23K1/00 , B23K1/19 , B23K35/40 , B23K101/14 , B23K103/10 , C22C21/00 , F28F21/08
CPC分类号： B23K35/3605 , B23K1/0012 , B23K1/19 , B23K1/203 , B23K35/0233 , B23K35/0238 , B23K35/286 , B23K35/36 , B23K35/361 , B23K35/362 , B23K2201/006 , B23K2203/10 , F28F21/089 , Y10T428/273 , Y10T428/31678
摘要： PROBLEM TO BE SOLVED: To provide a flux composition capable of improving a brazing property even with a small coating amount when used for brazing of an aluminum alloy material containing magnesium, and a brazing sheet using the flux composition.SOLUTION: The flux composition for brazing of an aluminum alloy material is characterized by comprising [A] a flux component containing KAlFand [B] a fluoride containing elements other than the group I elements and the group II elements and not containing K. The brazing sheet comprises a core material formed from an aluminum alloy, a brazing material laminated on at least one of surfaces of the core material, and a flux layer laminated on one of the surfaces of the brazing material and including the flux composition.
摘要翻译：待解决的问题：提供即使在使用含镁的铝合金材料钎焊的情况下即使用小的涂布量也能够提高钎焊性的助焊剂组合物，以及使用助焊剂组合物的钎焊片。解决方案：用于钎焊铝合金材料的助焊剂组合物的特征在于包含[A]含有KAlF 4 的通量成分和[B]除了 I族元素和II族元素而不含有K.钎焊片包括由铝合金形成的芯材料，层压在芯材表面的至少一个表面上的钎焊材料和层压在芯材之一上的焊剂层钎焊材料的表面并包括焊剂组合物。版权所有（C）2013，JPO＆INPIT

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