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    • 4. 发明专利
    • DIFFRACTION GRATING
    • JPH049803A
    • 1992-01-14
    • JP11199290
    • 1990-04-27
    • KURARAY CO
    • NAKAMU SHIGEKIFUJISAWA KATSUYAICHIMURA EIJIRO
    • G02B5/18G02B27/46
    • PURPOSE:To obtain the diffraction grating which has near IR absorptivity and excellent water resistance and moisture resistance and is adequate for use as an optical low-pass filter by forming a grid-like rugged structure on the main surface of a substrate consisting of a resin having the near IR absorptivity. CONSTITUTION:This diffraction grating is constituted by forming the grid-like rugged structure 2 on the main surface of the substrate 1 consisting of the resin having the near IR absorptivity. A transparent resin into which a near IR absorbent is incorporated may be used as the resin having the near IR absorptivity. Heteropolycyclic dyes stuff, such as pentacene derivaties, and anthraquinone dyes stuff, such as 1, 4, 5, 8-tetrachloroanthaquinone, are exemplified as the near IR absorbent. The diffraction grating which has the near IR absorptivity and the excellent water resistance and moisture resistance and is adequate for use as the optical low-pass filter is obtd. in this way.
    • 5. 发明专利
    • OPTICAL INFORMATION RECORDING MEDIUM AND ITS PRODUCTION
    • JPH02179941A
    • 1990-07-12
    • JP33544388
    • 1988-12-29
    • KURARAY CO
    • ICHIMURA EIJIRONAKAMU SHIGEKI
    • G11B23/40G11B7/24G11B7/26
    • PURPOSE:To enable visual check of a specified pattern on the surface of a recording medium without causing any influence of the formed pattern on recording/reproducing characteristics by making difference in intensity or color of reflected or diffracted light in the area corresponding to the pattern from other area. CONSTITUTION:If the fine signal patterns 5 in a macroscopic area 7 corresponding to the prescribed pattern 2 are made different in either shape or size from other signal patterns, diffraction effect in the area 7 differs from that in the other area to give different intensity or color of reflected or diffracted light from light in other area. If a photosensitive resin is provided on this substrate ad exposed to light, first to form uneven surface state and second to form the specified pattern, the projections or recessions in the pattern area differ from those in other area in shape or size. By this method, the obtd. optical information recording medium can have patterns of letters or images which can be visually checked without causing any trouble on recording/reproducing by an optical head.
    • 9. 发明专利
    • JPH05288904A
    • 1993-11-05
    • JP11416592
    • 1992-04-06
    • KURARAY CO
    • NAKAMU SHIGEKI
    • G02B3/00G03F7/20
    • PURPOSE:To form a lens pattern (optical component) for improving the numerical aperture of a liquid crystal panel, a CCD area sensor, etc., with good reproducibility and productivity by precisely controlling a lens sectional shape at the time of exposure. CONSTITUTION:When a pattern consisting of many small lens groups is formed on a photosensitive resin film, exposure is carried out twice by using two kind of photomasks 15A and 15B which differ in the area of parts corresponding to the small lenses. A 1st exposure is performed with good resolution by using the 1st photomask 15A which is large in the area of the parts corresponding to the small lenses and a 2nd exposure is performed with low resolution by using the 2nd photomask 15B which is small in the area of the parts corresponding to the small lenses. The photomasks are replaced between the 1st exposure and 2nd exposure. Consequently, the specific lens pattern can be formed without making the lens shape uneven nor forming a flat part.
    • 10. 发明专利
    • PATTERN FORMING METHOD
    • JPH04309954A
    • 1992-11-02
    • JP10396091
    • 1991-04-08
    • KURARAY CO
    • NAKAMU SHIGEKIWATANABE MUTSUJIICHIMURA EIJIRO
    • G03F7/004G03F7/027G03F7/031G03F7/40
    • PURPOSE:To obtain a pattern having a surface relief structure by partially irradiating a thin film of a photosensitive resin consisting of a specific polymer and compound with ultraviolet ray, by removing unreacted compound with a specific solvent and by irradiating the full surface with ultraviolet ray. CONSTITUTION:The thin film of the photosensitive resin composition consisting of a polymer A containing 2-100mol% structure unit expressed by the formula I, 0-98mol% structure unit expressed by the formula II and a compound B selected from a group of aromatic aldehyde and aromatic keton is formed. In the formula I, X is hydrogen atom or alkyl group, Y is cycloalkenyl group or the like. And in the formula II, X is hydrogen atom or alkyl group, Y is phenyl group or the like. Next, the thin film is partially irradiated with ultraviolet wave corresponding the the desired pattern and unreacted compound B is removed from the thin film with the solvent which does not dissolve the polymer A. After that, the full surface of the thin film is irradiated with ultraviolet wave. In this way, refractive index of the exposed part becomes higher than that the unexposed part and heat resistant pattern is formed.