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    • 7. 发明专利
    • PHOTOSENSITIVE COMPOSITION
    • JPH0420503A
    • 1992-01-24
    • JP12466790
    • 1990-05-15
    • KAO CORP
    • II ATSUHIKOMINAMI TAKAHIDENAKAMURA KOICHI
    • G03F7/031C07D335/16C08F2/50
    • PURPOSE:To obtain a photosensitive composition which can form a latent image in high sensitivity to visible light and can form an excellent photopolymer image by mixing a specified thioxanthol with a polymerizable compound and a photopolymerization initiator sensitive to visible light. CONSTITUTION:0.1-50 pts.wt. thioxanthol of the formula (wherein Z and Z are each a benzene or naphthalene ring which may be substituted) is mixed with 100 pts.wt. polymerizable compound (e.g. ethyl acrylate), 0.1-10 pts.wt. photopolymerization initiator sensitive to visible light, and optionally 0.1-10 pts.wt., per pt.wt. thioxanthol, amine (e.g. tributylamine) to obtain a photosenstive composition. This composition is applied to a substrate in a thickness of 0.1-10mum, dried and irradiated with visible light of a wavelength of 400-850nm after the pattern of the desired image to form a latent image on it, and the entire surface is irradiated with ultraviolet light. The image is developed with a solvent such as ethanol or methyl cellosolve.