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1. 发明专利

JP2013083759A Phase shift mask, method for forming asymmetric pattern, method for manufacturing diffraction grating, and method for manufacturing semiconductor device 有权
$Phase shift mask, method for forming asymmetric pattern, method for manufacturing diffraction grating, and method for manufacturing semiconductor device$
标题翻译：相位移掩模，形成非对称图案的方法，制造衍射光栅的方法和制造半导体器件的方法
公开(公告)号：JP2013083759A
公开(公告)日：2013-05-09
申请号：JP2011222907
申请日：2011-10-07
申请人： Hitachi Ltd , 株式会社日立製作所 , Hitachi High-Technologies Corp , 株式会社日立ハイテクノロジーズ
发明人： TSUNODA KAZUYUKI , ONOZUKA TOSHIHIKO , MATSUI SHIGERU , EHATA YOSHISADA , HASEGAWA NORIO
IPC分类号： G03F1/68 , G03F7/20
CPC分类号： H01L21/3065 , G03F1/0046 , G03F1/26 , G03F1/28 , G03F1/30 , H01L21/3085
摘要： PROBLEM TO BE SOLVED: To provide a technique of forming an asymmetric pattern using a phase shift mask, the technology capable of achieving improvement in the accuracy of products and reduction of a production time, and to provide a technique of manufacturing a diffraction grating and a semiconductor device.SOLUTION: In the method for manufacturing a diffraction grating using a phase shift mask 30 (in which a light-shielding part and a transmissive part (comprising a first transmissive part giving no phase shift and a second transmissive part giving a phase shift) are periodically arranged), the light radiating from an illumination light source 10 is made to transmit through the phase shift mask 30; a 0-order beam and a +1-order beam generated by the transmission through the phase shift mask 30 are made to interfere with each other on the surface of a Si wafer 50 to expose a photoresist 60 on the surface of the Si wafer 50; thereby a diffraction grating having a blazed cross-sectional shape is formed on the Si wafer 50.
摘要翻译：要解决的问题：为了提供使用相移掩模形成不对称图案的技术，可以实现产品精度提高和生产时间缩短的技术，并且提供制造衍射的技术光栅和半导体器件。解决方案：在使用相移掩模30（其中遮光部分和透射部分（包括不具有相移的第一透射部分和给出相移的第二透射部分）的衍射光栅的制造方法中）周期性地布置），使从照明光源10发出的光透过相移掩模30; 使通过相移掩模30的透射产生的0级光束和+ 1级光束在Si晶片50的表面上彼此干涉，以暴露Si晶片50的表面上的光致抗蚀剂60 ; 从而在Si晶圆50上形成具有闪耀截面形状的衍射光栅。（C）2013，JPO＆INPIT

2. 发明专利

JP2014134449A Measurement device for concave surface optical element, measurement device for concave surface diffraction grating, and measurement device for flat surface diffraction grating 有权
$Measurement device for concave surface optical element, measurement device for concave surface diffraction grating, and measurement device for flat surface diffraction grating$
标题翻译：用于表面光学元件的测量装置，用于表面衍射光栅的测量装置和用于平面表面衍射光栅的测量装置
公开(公告)号：JP2014134449A
公开(公告)日：2014-07-24
申请号：JP2013002447
申请日：2013-01-10
申请人： Hitachi High-Technologies Corp , 株式会社日立ハイテクノロジーズ
发明人： NAKAI NAOYA , EHATA YOSHISADA
IPC分类号： G01M11/00 , G01J3/18
摘要： PROBLEM TO BE SOLVED: To provide a measurement device capable of quantitatively measuring a stray light value of a concave surface optical element in the same condition as a mounting state.SOLUTION: A measurement device of a concave surface optical element 7 includes: a concave surface optical element; a rotation stage 6 that rotates the concave optical element; a laser device 1 that can change a distance to the rotation stage and is a light source irradiating the concave surface optical element with light; and a photodetector 8 that forms a predetermined angle with a line connecting the light source and the rotation stage, can change the distance to the rotation stage, and detects light reflected at a position other than a light focusing-point out of light reflected from the concave surface optical element.
摘要翻译：要解决的问题：提供一种能够在与安装状态相同的条件下定量测量凹面光学元件的杂散光值的测量装置。解决方案：凹面光学元件7的测量装置包括：凹面光学元件使凹入的光学元件旋转的旋转台6; 激光装置1，其可以改变到旋转台的距离，并且是用光照射凹面光学元件的光源; 并且与连接光源和旋转台的线形成预定角度的光电检测器8可以改变到旋转台的距离，并且检测在从光聚焦点以外的位置反射的光不是从凹面光学元件。

3. 发明专利

JP2011002487A Method of manufacturing diffraction grating, diffraction grating, and spectral analysis device using the same 审中-公开
$Method of manufacturing diffraction grating, diffraction grating, and spectral analysis device using the same$
标题翻译：使用相同方法制造衍射光栅，衍射光栅和光谱分析装置
公开(公告)号：JP2011002487A
公开(公告)日：2011-01-06
申请号：JP2009143071
申请日：2009-06-16
申请人： Hitachi High-Technologies Corp , 株式会社日立ハイテクノロジーズ
发明人： NAKAYAMA YOSHINORI , YAMAMOTO JIRO , KOSHI HIROYUKI , EHATA YOSHISADA , TANAKA TATSUYA
IPC分类号： G02B5/18 , G01J3/32
摘要： PROBLEM TO BE SOLVED: To provide a diffraction grating reducing the occurrence of abnormal peaks of diffraction light occurring by repeated exposure to allow sharp spectroscopy with few abnormal peaks, and to provide a highly precise spectral analysis device by using the diffraction grating.SOLUTION: In manufacturing a diffraction grating with a fixed pitch by repeated exposure, exposure is repeated while setting a relationship between the pitch dimension of the diffraction grating to be manufactured and a repeated exposure cycle with a small-angle deflection to achieve a ratio P/S of 0.1 or higher between the pitch dimension P to be exposed and the repeated exposure cycle S with the small-angle deflection, the occurrence of the abnormal peaks of diffraction light occurring by exposure is reduced, and consequently, the diffraction grating allowing sharp spectroscopy with few abnormal peaks is obtained.
摘要翻译：要解决的问题：提供一种衍射光栅，通过重复曝光减少衍射光异常峰值的出现，从而允许具有少量异常峰值的尖锐光谱，并通过使用衍射光栅提供高精度的光谱分析装置。通过重复曝光制造具有固定间距的衍射光栅，同时设置要制造的衍射光栅的间距尺寸与具有小角度偏转的重复曝光周期之间的关系的曝光，以实现比率P / S为0.1 或更高的间隔尺寸P和具有小角度偏转的反复曝光周期S之间，通过曝光产生的衍射光的异常峰值的出现减少，因此，允许具有少量异常的尖锐光谱的衍射光栅得到峰。

4. 发明专利

JP2014013366A Manufacturing method for curved diffraction grating, mold for curved diffraction grating, and curved diffraction grating using the same 有权
$Manufacturing method for curved diffraction grating, mold for curved diffraction grating, and curved diffraction grating using the same$
标题翻译：弯曲衍射光栅的制造方法，弯曲衍射光栅的模具和使用其的弯曲衍射光栅
公开(公告)号：JP2014013366A
公开(公告)日：2014-01-23
申请号：JP2013001829
申请日：2013-01-09
申请人： Hitachi High-Technologies Corp , 株式会社日立ハイテクノロジーズ
发明人： AONO TAKANORI , EHATA YOSHISADA , MATSUI SHIGERU , WATANABE TETSUYA , ONODA YUGO
IPC分类号： G02B5/18
CPC分类号： G02B5/1847 , B29C59/02 , B32B37/12 , B32B37/24 , B32B38/0012 , B32B2551/00 , G02B5/18 , G02B5/1814 , G02B5/1852 , Y10T156/1028
摘要： PROBLEM TO BE SOLVED: To highly accurately produce a curved diffraction grating with a required curvature.SOLUTION: A manufacturing method for a curved diffraction grating comprises: the step of forming a diffraction grating pattern 20 onto a silicon substrate 2 that has a flat plate form; the step of producing a mold 1 for a curved diffraction grating in such a manner that a fixing substrate 3 with a required curved face is pressed under heat to the silicon substrate 2 with the diffraction grating pattern 2 formed thereon, and the silicon substrate 2 with the diffraction pattern is fixed onto the fixing substrate 3 of the curved shape; and the step of bringing a flexible member into contact with the mold for the curved diffraction grating, thereby transferring the diffraction grating pattern onto the member.
摘要翻译：要解决的问题：高精度地制造具有所需曲率的弯曲衍射光栅。解决方案：一种弯曲衍射光栅的制造方法包括：将衍射光栅图案20形成在具有平板形式的硅基板2上的步骤 ; 制造弯曲衍射光栅的模具1的步骤是这样一种方式使得具有所需曲面的固定基板3在其上形成有衍射光栅图案2的同时被加热地压在硅基板2上，硅基板2具有将衍射图案固定在弯曲形状的固定基板3上; 以及使柔性构件与用于弯曲衍射光栅的模具接触的步骤，从而将衍射光栅图案转印到构件上。

5. 发明专利

JP2012112663A Spectrophotometer 审中-公开
标题翻译：分光光度计
公开(公告)号：JP2012112663A
公开(公告)日：2012-06-14
申请号：JP2010259253
申请日：2010-11-19
申请人： Hitachi High-Technologies Corp , 株式会社日立ハイテクノロジーズ
发明人： MATSUI SHIGERU , YAMAMURA SHUHEI , AKIYAMA HIDEYUKI , EHATA YOSHISADA
IPC分类号： G01N21/27 , G01J3/02 , G01J3/36
CPC分类号： G01J3/42 , G01J3/0218 , G01J3/28 , G01J2003/2866 , G01N21/05 , G01N21/3151
摘要： PROBLEM TO BE SOLVED: To obtain, with a single beam type spectrophotometer, highly stable transmission and absorption spectrum having a high S/N ratio and a drift suppressed for a long period of time even when the quantity of light emitted from a light source is varied with time.SOLUTION: A spectrophotometer comprises: a light source; a sample cell; a polychromator generating a transmission spectrum of a sample contained in the sample cell by dispersing light having passed through the sample out of light emitted from the light source into a plurality of wavelength components; an image sensor detecting the transmission spectrum of the sample; a light source monitoring photodetector detecting light not having passed through the sample cell out of the light emitted from the light source; and an operation part correcting the transmission spectrum of the sample by using an output signal of the light source monitoring photodetector.
摘要翻译：要解决的问题为了通过单光束型分光光度计获得具有高S / N比和长时间抑制的漂移的高度稳定的透射和吸收光谱，即使当从光源随时间而变化。分光光度计包括：光源; 样品池; 多色分光器，其通过将从所述光源发出的光中分散的光分散成多个波长成分，来生成包含在所述样品池中的样品的透射光谱; 检测样本的透射光谱的图像传感器; 光源监测光电检测器，从光源发出的光中检测未通过样品池的光; 以及通过使用光源监视光电检测器的输出信号来校正样品的透射光谱的操作部分。版权所有（C）2012，JPO＆INPIT

6. 发明专利

JP2012002712A Spectrophotometer 审中-公开
标题翻译：分光光度计
公开(公告)号：JP2012002712A
公开(公告)日：2012-01-05
申请号：JP2010138861
申请日：2010-06-18
申请人： Hitachi High-Technologies Corp , 株式会社日立ハイテクノロジーズ
发明人： EHATA YOSHISADA , SATO TAKAYA , NAKAMURA SATOSHI , KOJIMA NORIKO
IPC分类号： G01N21/27 , G01J3/02 , G01J3/42
摘要： PROBLEM TO BE SOLVED: To provide a spectrophotometer capable of automatically correcting dark current on a high precision detecting device with small noise.SOLUTION: The spectrophotometer comprises: a pulse-lighting light source; a spectroscope that takes out a particular wavelength from white light emitted from the light source and converts the light into monochromatic light; a sample chamber that holds a sample; a detecting device that detects the monochromatic light transmitted through the sample or reflected thereby; and a processor for control in such a way that: when changing the wavelength taken out by the spectroscope, the light source is turned off for correcting the dark current of the detecting device, and at a point when a desired wavelength is obtained, the light source is turned on to detect the monochromatic light.
摘要翻译：要解决的问题：提供能够在噪声小的高精度检测装置上自动校正暗电流的分光光度计。
解决方案：分光光度计包括：脉冲照明光源; 从光源发出的白光中取出特定波长并将光转换成单色光的分光镜; 保持样品的样品室; 检测装置，其检测通过样品透射的单色光或者由其反射; 以及处理器，以这样的方式进行控制：当改变由分光镜取出的波长时，关闭光源以校正检测装置的暗电流，并且在获得期望波长的点处，光源被打开以检测单色光。版权所有（C）2012，JPO＆INPIT

7. 发明专利

JP2008070172A Spectrophotofluorometer and its correction method 审中-公开
标题翻译：分光光度计及其校正方法
公开(公告)号：JP2008070172A
公开(公告)日：2008-03-27
申请号：JP2006247474
申请日：2006-09-13
申请人： Hitachi High-Tech Manufacturing & Service Corp , Hitachi High-Technologies Corp , 株式会社日立ハイテクノロジーズ , 株式会社日立ハイテクマニファクチャ&サービス
发明人： HORIGOME JUN , WAKUI TAKAYUKI , EHATA YOSHISADA
IPC分类号： G01J3/443 , G01J3/02 , G01N21/64
摘要： PROBLEM TO BE SOLVED: To correct accurately an integrating sphere without being influenced by restriction of a wavelength and an error caused by an optical system, when measuring a light emission quantity.
SOLUTION: Concerning a spectrophotofluorometer having the integrating sphere, in a step 1, a spectral spectrum is measured with a light diffusion element installed on a sample installation part of the integrating sphere, to acquire fluorescence intensity including a characteristic in each wavelength of the integrating sphere. Then, in a step 2, the integrating sphere is removed from on an optical path, and the light diffusion element is installed on the optical path, and a spectral spectrum not including a wavelength characteristic of the integrating sphere is acquired in a condition similar to the integrating sphere. In a step 3, the wavelength characteristic of the integrating sphere is acquired from ratio operation between the spectral spectrum acquired in the step 1 and the spectral spectrum acquired in the step 2.
COPYRIGHT: (C)2008,JPO&INPIT
摘要翻译：要解决的问题：在测量发光量的同时，不会受到波长的限制和由光学系统引起的误差的影响而精确地校正积分球。解决方案：关于具有积分球的分光光度计，在步骤1中，利用安装在积分球的样品安装部分上的光漫射元件测量光谱，以获得包括每个波长的特性的荧光强度积分球。然后，在步骤2中，从光路上除去积分球，并将光漫射元件安装在光路上，并且在类似于...的条件下获取不包括积分球的波长特性的光谱积分球。在步骤3中，积分球的波长特性从步骤1中获得的光谱和在步骤2中获得的光谱之间的比值操作获得。（C）2008，JPO＆INPIT

8. 发明专利

JP2014182301A Curved diffraction grating and manufacturing method of the same, and optical device 有权
$Curved diffraction grating and manufacturing method of the same, and optical device$
标题翻译：其折射衍射及其制造方法及光学器件
公开(公告)号：JP2014182301A
公开(公告)日：2014-09-29
申请号：JP2013057127
申请日：2013-03-19
申请人： Hitachi High-Technologies Corp , 株式会社日立ハイテクノロジーズ
发明人： AONO TAKANORI , EHATA YOSHISADA , MATSUI SHIGERU , WATANABE TETSUYA
IPC分类号： G02B5/18 , G02B5/00
CPC分类号： G02B5/1852 , G01N21/31 , G02B1/04 , G02B5/1814 , G02B5/1857 , G02B5/1861
摘要： PROBLEM TO BE SOLVED: To provide a technique for fabricating a curved diffraction grating having a desired curvature by plastically deforming a plane diffraction grating fabricated on a silicon substrate by a semiconductor process along a curved surface substrate, and for fabricating a highly accurate diffraction grating.SOLUTION: A plane diffraction grating made of silicon fabricated by the semiconductor process is transferred to an amorphous material, and an amorphous material substrate is curved and mounted on a curved surface fixation substrate, thereby a curved diffraction grating including a crystalline material in which the occurrence of a dislocation line is suppressed is provided.
摘要翻译：要解决的问题：提供一种通过沿着曲面基板通过半导体工艺使在硅衬底上制造的平面衍射光栅发生塑性变形并制造高精度衍射光栅来制造具有所需曲率的弯曲衍射光栅的技术。解决方案：由半导体工艺制造的由硅制成的平面衍射光栅转移到非晶材料，非晶材料基板弯曲并安装在曲面固定基板上，由此形成包括结晶材料的弯曲衍射光栅，其中发生的位错线被抑制。

9. 发明专利

JP2001264165A SPECTROPHOTOMETER AND MEASUREMENT METHOD 失效
公开(公告)号：JP2001264165A
公开(公告)日：2001-09-26
申请号：JP2000081716
申请日：2000-03-17
申请人： HITACHI LTD
发明人： HIROSE MANABU , TAKAHASHI KENICHIRO , SUZUKI TADASHI , EHATA YOSHISADA
IPC分类号： G01J3/08 , G01J3/42 , G01N21/27 , G02B26/04 , G02B26/08
摘要： PROBLEM TO BE SOLVED: To provide a spectrophotometer which controls the rotational speeds of a zero chopper and a sector mirror. SOLUTION: This spectrophotometer is provided with a light source, a diffraction grating which disperses the light from the light source, and the zero chopper which periodically intercepts the luminous flux between the light source and diffraction grating. The spectrophotometer is also provided with a sector mirror which splits the dispersed light to a sample side and a reference side, a detector which detects the intensity of the light, and first and second stepping motors which respectively drive the zero chopper and sector mirror. Therefore, the noise contained in measurement data can be reduced.

10. 发明专利

JPH06129909A SPECTROPHOTOMETER 失效
公开(公告)号：JPH06129909A
公开(公告)日：1994-05-13
申请号：JP27832992
申请日：1992-10-16
申请人： HITACHI LTD
发明人： EHATA YOSHISADA
IPC分类号： G01J3/18 , G01J3/42
摘要： PURPOSE:To constitute a spectrophotometer wherein a measurement can be performed quickly and accurately. CONSTITUTION:A beam of white light from a light source 1 is constituted as double beams of reflected light by using reflectors 2, 3, the beams of light which have been transmitted through a sample 4 and a reference 5 are incident on an entrance slit 10 in which two opening parts have been formed along the groove direction of an aberration correction-type diffraction grating 11, and beams of light which have been diffracted spectrally are detected by respective array-type detectors 12, 13 for sample-side beam use and for reference-side beam use. Beams of light after reflectors 8, 9 onward are passed perpendicularly to their surfaces. When a double-beam spectrophotometer is constituted of a polychromator and the array-type detectors, a measurement can be performed quickly and accurately.

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