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    • 3. 发明专利
    • Polishing method for magnetic head and device thereof
    • 磁头抛光方法及其装置
    • JP2003011054A
    • 2003-01-15
    • JP2001198264
    • 2001-06-29
    • Hitachi Ltd株式会社日立製作所
    • TANAKA HIDEAKITAKAHASHI TOSHIO
    • B24B19/26B24B37/00G11B5/187G11B5/39
    • PROBLEM TO BE SOLVED: To provide a polishing method for a magnetic head and a device thereof capable of polishing a levitation face of the magnetic head by combining a free abrasive grain polishing method and a fixed abrasive grain polishing method together. SOLUTION: This polishing method comprises a first process A in which a resistance value of detection pattern from a workpiece is measured, MR height distribution of the workpiece is calculated from the measured values, a polishing amount of the workpiece is calculated based on deviation of the measured values and a target value, the workpiece is bent by giving the inclination and bending, and polishing is formed by free abrasive grains until MR height of the workpiece reaches a predetermined value and a second process B in which finish polishing of the workpiece is performed by fixed abrasive grains up to final target MR height by moving at a pressurizing point where bending is given to the workpiece. Unevenness of MR height distribution of the workpiece is reduced, and MR height of the workpiece is realized with high precision. The workpiece is finish-polished by fixed abrasive grains embedded uniformly at high density to reduce unevenness among lots of roughness of a machining face of the workpiece and a recess amount.
    • 要解决的问题:提供一种通过将自由磨粒抛光方法和固定的磨粒抛光方法结合在一起而能够对磁头的悬浮面进行抛光的磁头及其装置的抛光方法。 解决方案:该抛光方法包括其中测量来自工件的检测图案的电阻值的第一处理A,根据测量值计算工件的MR高度分布,基于工件的偏差来计算工件的抛光量 测量值和目标值,通过给出倾斜和弯曲来弯曲工件,并且通过自由磨粒形成抛光,直到工件的MR高度达到预定值,并且执行工件的精加工的第二工艺B 通过在向工件施加弯曲的加压点处移动,通过固定的磨料颗粒直到最终目标MR高度。 工件的MR高度分布不均匀性降低,工件的高度高精度地实现。 用高密度均匀地嵌入的固定磨粒精加工工件,以减少工件加工面粗糙度和凹陷量之间的不均匀性。
    • 5. 发明专利
    • Magnetoresistive effect head and method for manufacturing the same
    • 磁阻效应头及其制造方法
    • JP2003317213A
    • 2003-11-07
    • JP2002115882
    • 2002-04-18
    • Hitachi Ltd株式会社日立製作所
    • TANAKA HIDEAKITAMURA TOSHIOFURUSAWA KENJI
    • G11B5/39
    • PROBLEM TO BE SOLVED: To provide a structure for a magnetoresistive effect head for manufacturing ferromagnetic tunnel junction elements or magnetoresistive elements to be used in a CPP mode by mechanical polishing alone while assuring working quality and working accuracy and a method for manufacturing the same. SOLUTION: The magnetoresistive effect head which is formed with laminated films interposed with an insulating layer 144 between a first magnetic layer 145 and a second magnetic layer 143 as a major part of the magnetoresistive element and consists of a system to pass a sense current in the film thickness direction of these laminated films comprises forming shielding layers 11 and 16 disposed on the outer side of the laminated films by amorphous metallic layers configurating preventive layers for suppressing the plastic flow of the magnetic layers during mechanical polishing. The electrode layers may be formed of the amorphous metallic layers in place of the shielding layers. The preventive layers for suppressing the plastic flow of the magnetic layers 145 and 143 are recommended to be formed to the spacing therebetween of a range within 40 nm in order to suppress the plastic flow of the magnetic layers. COPYRIGHT: (C)2004,JPO
    • 要解决的问题:提供一种用于制造用于CPP模式的铁磁隧道结元件或磁阻元件的磁阻效应头的结构,其中通过机械抛光单独确保工作质量和加工精度,以及制造方法 相同。 解决方案:磁阻效应头由层叠膜形成,其中介于第一磁性层145和第二磁性层143之间的绝缘层144作为磁阻元件的主要部分,并且由传感器 这些层叠膜的膜厚方向的电流包括通过非结构金属层形成设置在层叠膜的外侧的屏蔽层11和16,该非晶金属层构成用于抑制机械抛光期间磁性层的塑性流动的防止层。 电极层可以由非晶金属层代替屏蔽层形成。 为了抑制磁性层的塑性流动,推荐抑制磁性层145和143的塑性流动的防止层的间隔在40nm以内。 版权所有(C)2004,JPO