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1. 发明专利

JP2001033231A SAMPLE MEASURING DEVICE 失效
公开(公告)号：JP2001033231A
公开(公告)日：2001-02-09
申请号：JP20723399
申请日：1999-07-22
申请人： HITACHI LTD , HITACHI SCIENCE SYSTEMS LTD
发明人： KOSHIHARA SHUNSUKE , TAMOCHI RYUICHIRO , KUROSAWA KOICHI , MIZUNO TAKESHI , UEDA KAZUHIRO
IPC分类号： H01J37/22 , G01B11/24 , G01B15/04 , G06T1/00 , G06T7/00 , H01L21/027 , H01L21/66
摘要： PROBLEM TO BE SOLVED: To make automatically performable multipoint measurement of a semiconductor wafer by storing an enlarged image when the degree of matching between the shape of a specified part of an enlarged image and the shape of a specified part of a sample image is out of a threshold. SOLUTION: A primary electron beam 4 drawn out by a draw-out voltage applied across a cathode 1 and a first anode 2 is accelerated by voltage Vacc applied to a second anode 3 to advance to a lens system. A scanning signal of a deflecting coil 8 is controlled according to an observation magnification by a deflection control device 9. A secondary electron 10 generated from the sample by the primary electron beam scanning on a wafer 7 is detected by a secondary electron detector 11. The secondary electron information detected by the secondary electron detector 1 is amplified by an amplifier 12 and displayed on a CRT 13. For multipoint measurement, an X-Y stage for moving the wafer 7 in the vertical direction to the radiating direction of the primary electron beam 4 and an image shift function of largely moving the irradiation portion of the primary electron beam 4 are provided.

2. 发明专利

JP2013221882A Measuring apparatus 审中-公开
标题翻译：测量装置
公开(公告)号：JP2013221882A
公开(公告)日：2013-10-28
申请号：JP2012094467
申请日：2012-04-18
申请人： Hitachi Ltd , 株式会社日立製作所
发明人： NANBU AKIRA , UEDA KAZUHIRO , YAMAMOTO TAKESHI , KOIZUMI HIDEAKI , HASHIZUME TOMIHIRO
IPC分类号： G01N23/04 , G01N23/223
CPC分类号： G01N23/083
摘要： PROBLEM TO BE SOLVED: To provide a measuring apparatus capable of measuring distribution of specific elements inside a sample by soft X-rays at a state without an influence of a dyeing agent, etc. even in the case of a single sample or a sample such as a cell lump which are live, taken out from the inside of a living body to the outside of the body.SOLUTION: A measuring apparatus using soft X-rays has: a connection part 23 which is connected to a soft X-ray beam line 7; a mechanism 4 for condensing spot size of soft X-rays 1 to a microbeam; and a low vacuum container having a measurement chamber 6 in which a sample 5 is arranged.
摘要翻译：要解决的问题：提供一种能够在不影响染色剂等的状态下通过软X射线测量样品内的特定元素的分布的测量装置，即使在单个样品或样品的情况下作为活体的细胞团，从活体的内部取出到身体的外部。解决方案：使用软X射线的测量装置具有：连接部23，其连接到软X射线束第7行用于将软X射线1的光斑大小聚光到微束的机构4; 以及具有测试室6的低真空容器，其中配置了样品5。

3. 发明专利

JP2013083454A Vector field tomography apparatus and vector field tomographic image reconstitution method 有权
标题翻译：矢量场测量装置和矢量场图像图像重建方法
公开(公告)号：JP2013083454A
公开(公告)日：2013-05-09
申请号：JP2011221490
申请日：2011-10-06
申请人： Hitachi Ltd , 株式会社日立製作所
发明人： UEDA KAZUHIRO , YONEYAMA AKIO
IPC分类号： G01N23/04 , G01N23/223
摘要： PROBLEM TO BE SOLVED: To obtain a tomographic image not of a scalar field such as density but of a vector field such as magnetism in the Computerized Tomography Method (CT method) for capturing a tomographic image of a specimen by utilizing electromagnetic waves of X rays or the like, electron beams, or corpuscular beams such as neutron beams.SOLUTION: From x-φ distribution of an intensity I(x) which is measured by rotating a specimen or incident energy rays by φ, 2I(x) cos(φ) and 2I(x) sin(φ) is used to reconstitute a sinogram and component separation of a vector field is performed for reconstitution, thereby obtaining a tomographic image of a vector.
摘要翻译：要解决的问题：为了获得用于通过利用电磁波捕获样本的断层图像的计算机断层成像方法（CT方法）中不具有诸如密度但是诸如磁性的矢量场的标量场的断层图像的X射线等，电子束或诸如中子束的粒子束。
解决方案：从x r -φ分布强度I φ（x （x r ）测量的样品或入射能量射线的测量值， sin（φ）和sin（φ）用于重构正弦图和分量分离的ψ（φ）和2I φ 执行向量场进行重构，从而获得矢量的断层图像。版权所有（C）2013，JPO＆INPIT

4. 发明专利

JP2008224308A Thin film laminate testing method 有权
标题翻译：薄膜层压板测试方法
公开(公告)号：JP2008224308A
公开(公告)日：2008-09-25
申请号：JP2007060376
申请日：2007-03-09
申请人： Hitachi Ltd , 株式会社日立製作所
发明人： UEDA KAZUHIRO
IPC分类号： G01N23/201
CPC分类号： G01B15/02
摘要： PROBLEM TO BE SOLVED: To provide an X-ray reflectance measuring method capable of measuring and inspecting highly precisely a film thickness of a thin film laminate, in a sample with a thick film on the thin film laminate.
SOLUTION: An X-ray converged to 1/3 or less of a film thickness of the thick film on the thin film laminate is incident from an end face of the thick film, transmitted through the thick film, and incident on the thin film laminate, and the reflected X-ray is again transmitted through the thick film, and taken out as the reflected X-ray from an end face in an end side opposite to the incident face. Thus, the X-ray reflectance of the thin film laminate embedded in the thick film is measured. The film thickness of the thin film laminate embedded in the thick film is inspected by a Fourier transformation method or least square method analysis with respect to a theoretical curve.
COPYRIGHT: (C)2008,JPO&INPIT
摘要翻译：要解决的问题：提供一种能够在薄膜层叠体上具有厚膜的样品中高精度地测量和检查薄膜层压体的膜厚的X射线反射测量方法。解决方案：从薄膜层叠体的厚膜的膜厚收敛到1/3以下的X射线从厚膜的端面入射，透过厚膜，入射到薄膜层叠体，反射的X射线再次透过厚膜，从与入射面相反的端面的端面作为反射X射线取出。因此，测量了嵌入厚膜中的薄膜层叠体的X射线反射率。通过傅里叶变换方法或关于理论曲线的最小二乘法分析来检查嵌入厚膜中的薄膜层压体的膜厚。版权所有（C）2008，JPO＆INPIT

5. 发明专利

JP2006133000A Minute-part layered structure inspection device 审中-公开
标题翻译：分分层结构检查装置
公开(公告)号：JP2006133000A
公开(公告)日：2006-05-25
申请号：JP2004320022
申请日：2004-11-04
申请人： Hitachi Ltd , 株式会社日立製作所
发明人： UEDA KAZUHIRO , HIRANO TATSUMI
IPC分类号： G01N23/201 , G21K1/06
摘要： PROBLEM TO BE SOLVED: To provide a minute-part layered structure inspection device for measuring the film thicknesses of a nano thin film layered body and its interface width in a domain of a measurement range of 1 mm or less.
SOLUTION: This minute-part layered structure inspection device comprises a spectral element and a condensing element existing between an X-ray source and a specimen. X rays generated in the X-ray source are monochromatized by the spectral element and condensed by the condensing element so that the horizontal and vertical sizes of an X-ray beam become 10μm or less and 1 mm or less, respectively, at the position of the specimen, and projected onto the specimen. The energy and strength of incident X rays scattered by a thin-film scatterer existing between the spectral element and the specimen are measured by a scattered X-ray detector while X rays mirror-reflected by the specimen are measured by a reflected X-ray detector. An energy synchronous measurement instrument is provided for counting the strength of the scattered X rays and that of the reflected X rays with the energy of the incident X rays made to coincide with that of the reflected X rays by inputting thereinto the output of the scattered X-ray detector and that of the reflected X-ray detector. Reflectivity unaffected by fluorescent X rays from the specimen is measured while changing the energy of the incident X rays.
COPYRIGHT: (C)2006,JPO&NCIPI
摘要翻译：要解决的问题：提供一种测量范围为1mm以下的范围内的纳米薄膜层叠体的膜厚测定用微细层叠结构检查装置及其界面宽度。解决方案：该微小分层结构检查装置包括存在于X射线源和样本之间的光谱元件和聚光元件。在X射线源中产生的X射线被光谱元件单色化并被聚光元件冷凝，使得X射线束的水平和垂直尺寸分别变为10μm以下且1mm以下，样品，并投影到样品上。通过散射X射线检测器测量由光谱元件和样品之间存在的薄膜散射体散射的入射X射线的能量和强度，并通过反射X射线检测器测量由样品镜像反射的X射线。提供了一种能量同步测量仪器，用于对散射的X射线的强度和X射线的强度进行计数，其中入射的X射线的能量与反射的X射线的能量一致，通过输入散射X的输出射线检测器和反射X射线检测器。在改变入射X射线的能量的同时测量不受来自样品的荧光X射线影响的反射率。版权所有（C）2006，JPO＆NCIPI

6. 发明专利

JP2001289800A INSPECTION METHOD FOR LAMINATED STRUCTURE 失效
公开(公告)号：JP2001289800A
公开(公告)日：2001-10-19
申请号：JP2000110547
申请日：2000-04-06
申请人： HITACHI LTD
发明人： UEDA KAZUHIRO , HIRANO TATSUMI , IMAGAWA TAKAO
IPC分类号： G01N23/207
摘要： PROBLEM TO BE SOLVED: To provide a method for inspecting the crystalline structure of an only laminated film aimed at, as for a layered product forming two or more layered thin films on a substrate and having the same crystalline structure and a close lattice constant value for each laminated thin film, which is oriented uniaxially in the normal direction of the substrate. SOLUTION: This inspection can be achieved by analysis of taking the difference in diffracted rays, measured by using two or more kinds of X-rays having wave lengths in the vicinity of the X-ray absorption edge of an element contained in the target laminated film.

7. 发明专利

JPH11237230A METHOD AND EQUIPMENT FOR SPECIMEN MEASURING IN ELECTRON MICROSCOPE 失效
公开(公告)号：JPH11237230A
公开(公告)日：1999-08-31
申请号：JP4011998
申请日：1998-02-23
申请人： HITACHI LTD , HITACHI INSTRUMENTS ENG
发明人： UEDA KAZUHIRO , SHIMIZU MINORU
IPC分类号： G01B15/00
摘要： PROBLEM TO BE SOLVED: To reduce influence of contamination and charging-up phenomenon of a specimen, concerning characteristic values characterizing the specimen. SOLUTION: In this specimen measuring method, a portion where dimension is measured is selected on the basis of an image (secondary electron image) of a secondary electron signal, and the dimension of the portion is repeatedly measured by using a dimension measuring apparatus 15. The results are stored in a measurement results storing equipment 16. On the basis of the stored measurement results, a correction function computing equipment 17 obtains a correction function by using, e.g. a method of least squares, and further estimates a dimension measurement value zero number of measurement time.

8. 发明专利

JPH08139022A ATOM BEAM EPITAXIAL GROWTH METHOD AND ITS APPARATUS 失效
公开(公告)号：JPH08139022A
公开(公告)日：1996-05-31
申请号：JP26982594
申请日：1994-11-02
申请人： HITACHI LTD
发明人： UEDA KAZUHIRO
IPC分类号： B01J19/08 , H01L21/203
摘要： PURPOSE: To provide a means which can form a very thin pattern of large area and a fine long pattern by using one or more kinds of atoms containing elements of nonconductivity. CONSTITUTION: By monitoring a tunnel current 8, a needle-like fine tube 1 is retained to maintain an almost constant distance from the surface of a substrate 2, and material gas 10 flowing in the fine tube 1 is heated with a heater 9 and decomposed. Volatile elements 7 in the decomposed material gas scatter. Residual elements turn to an atom beam 4 and reach the surface of the substrate 2, and are deposited as an atom layer 3. The needle-like thin tube 1 or the substrate 2 is XY-scanned with a three-dimensional actuator, and an atom layer having a desired pattern is formed.

9. 发明专利

JP2019002750A 光電子分光装置用試料ホルダ审中-公开
公开(公告)号：JP2019002750A
公开(公告)日：2019-01-10
申请号：JP2017116366
申请日：2017-06-14
申请人： HITACHI LTD
发明人： UEDA KAZUHIRO
IPC分类号： G01N23/2273
摘要：【課題】簡易な装置構成の下、試料表面の汚染を抑制して試料に発生したチャージアップを除去する。【解決手段】励起光1を絶縁性の試料2に照射し試料2から発生した光電子15のエネルギーを分析する光電子分光装置に配置された試料2を保持する試料ホルダである。金属部に複数の開口部が形成された金属メッシュ12を有し、金属メッシュ12は、金属部に当たって発生した光電子の一部を用いて試料2の表面に発生したチャージアップ16を除去するように試料2から所定距離だけ離して配置されている。【選択図】図1(A)

10. 发明专利

JP2012112914A X-ray imaging apparatus and x-ray imaging method 审中-公开
标题翻译： X射线成像装置和X射线成像方法
公开(公告)号：JP2012112914A
公开(公告)日：2012-06-14
申请号：JP2010264486
申请日：2010-11-29
申请人： Hitachi Ltd , 株式会社日立製作所
发明人： YONEYAMA AKIO , UEDA KAZUHIRO
IPC分类号： G01N23/04 , G21K1/06
摘要： PROBLEM TO BE SOLVED: To provide a refraction contrast type X-ray imaging method with high density resolution and wide dynamic range.SOLUTION: By changing degree of asymmetry of an unsymmetrical crystal corresponding to density distribution of a photographic subject, an angular area in which an incident X-ray and a diffraction X-ray are approximately proportional is extended. A measurement is carried out at a low angle and a high angle of the incident angle in which the diffraction X-ray intensity is half of the maximum value.

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