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1. 发明专利

JP2002025794A PLASMA PROCESSING APPARATUS WITH REAL-TIME PARTICLE FILTER 失效
公开(公告)号：JP2002025794A
公开(公告)日：2002-01-25
申请号：JP2000207290
申请日：2000-07-07
申请人： HITACHI LTD , NANOFILM TECHNOLOGIES INT
发明人： INABA HIROSHI , SASAKI SHINJI , HIRANO SHINYA , FURUSAWA KENJI , YAMASAKA MINORU , AMATATSU ATSUSHI , SHII SHU
IPC分类号： H05H1/24 , B01J19/08 , C23C14/32 , C23F4/00 , H01J37/32 , H01L21/203 , H01L21/302 , H01L21/3065
摘要： PROBLEM TO BE SOLVED: To effectively capture and remove uncharged neutral particles and charged particles, each having a diameter of 5 μm or smaller in a plasma treatment apparatus utilizing a low pressure arc discharge. SOLUTION: In this apparatus, when the low-pressure arc discharge 5 is caused between a target 1 and a striker 4, plasma 11 is generated and is made to irradiate the surface of a treated substrate 7 inside a processing chamber 6 through a first magnetic field duct 14 and a second magnetic field duct 15. An adhesion-preventing filter 23 having a through-hole 25 in the center part for allowing passage of the plasma 11 is provided between the first duct 14 and the second duct 15 to capture the neutral particles 24 suspended in the plasma 11, while a cylindrical electric field filter 16 is provided between the second duct 15 and the treated substrate 7 to capture the negatively charged particles 17 suspended in the plasma 11. Accordingly, the plasma 11, from which the neutral particles 24 and the charged particles 17 are removed, is made to irradiate the treated substrate 7.

2. 发明专利

JP2585437B2 失效
公开(公告)号：JP2585437B2
公开(公告)日：1997-02-26
申请号：JP24193489
申请日：1989-09-20
申请人： HITACHI LTD
发明人： YAMASAKA MINORU , TAKESHITA KOJI
IPC分类号： B24B27/06 , B28D1/24

3. 发明专利

JPH076341A PRODUCTION OF SLIDER FOR THIN-FILM MAGNETIC HEAD 失效
公开(公告)号：JPH076341A
公开(公告)日：1995-01-10
申请号：JP14934693
申请日：1993-06-21
申请人： HITACHI LTD
发明人： YAMASAKA MINORU , HAGIWARA YOSHIKI , FUJISAWA MASAYASU
IPC分类号： G11B5/31 , G11B5/60 , G11B21/21
摘要： PURPOSE:To decrease working stages and to shorten. the process for production by coating the medium-facing surface of the slider for a thin-film magnetic head with a high-polymer material, removing a part of the coating to expose a part to be worked and forming this part to a desired shape, then working the part to be worked of the medium-facing surface by injection of fine particles. CONSTITUTION:For example, a novolak resin is applied as a mask material on the medium-facing surface 3 of the slider 1 for the thin-film magnetic head. This surface is irradiated with an excimer laser beam 5 from an excimer laser oscillator 4 via a slit 6 and a lens 7. The slit 6 has a shape corresponding to the rail part shape of the floating surface. The magnification of the size of the hole shape of the slit 6 with respect to the shape of the mask material 2 is determined according to the reduction ratio of an optical system. The part 8 to be irradiated with the laser beam of the mask material 2 applied on the slider 1 is decomposed away by mainly the photochemical effect of the excimer laser beam 5, by which the hole part of the laser beam slit 6 is transferred and formed at the reduced size. Consequently, the part 9 to be worked is exposed. The part 9 to be worked is then worked by irradiation with the ion beam 11, etc. The stages for exposing, developing, washing and drying are decreased to one stage of the irradiation with the laser beam in such a manner.

4. 发明专利

JPS63260754A CHAMFERING DEVICE 失效
公开(公告)号：JPS63260754A
公开(公告)日：1988-10-27
申请号：JP9101487
申请日：1987-04-15
申请人： HITACHI LTD
发明人： OKU TSUNEO , TAMURA TOSHIO , YAMASAKA MINORU , NOTO KOICHI
IPC分类号： B24B9/00 , B24B19/26 , B24B21/00
摘要： PURPOSE:To enable the outer edge part of a magnetic head or the like to easily perform chamfering of asymmetrical shape, by eccentrically placing the rotary center for the chamfered objective surface center of a workpiece and chamfering the outer edge part giving a predetermined tilt to the periphery of a cylindrical tool. CONSTITUTION:Holding a workpiece 6 of magnetic head or the like, forming a rectangular parallelepiped shape, to a holding part 8, when chamfering of oval shape 2aX2b with a point P serving as the center is performed for a chamfering objective surface 2AX2B with a point O serving as the center, the rotary center of the workpiece 6 is displaced from ll' to mm' by an X-direction eccentric amount adjusting screw 9. And setting a tilt angle range of the workpiece 6 to a control unit 21, adjusting an eccentric amount of an eccentric disc 14 and performing rotary motion and swivel motion in a swivel direction 5 of a cylindrical grinding wheel 1, a chamfering device, which rotates the workpiece by a motor 16 in a direction 7 while changing tilt angle continuously by swiveling a rotary table 18, chamfers the workpiece pressing it by a spring 11. Further for eccentricity, when it is performed in an axial direction bb, a Y-direction eccentric amount adjusting screw 10 is used. In this way, asymmetrical chamfering can be easily performed.

5. 发明专利

JPS63188489A LASER BEAM ASSISTING CHEMICAL MACHINING DEVICE 失效
公开(公告)号：JPS63188489A
公开(公告)日：1988-08-04
申请号：JP1830287
申请日：1987-01-30
申请人： HITACHI LTD
发明人： FUJISAWA MASAYASU , YAMASAKA MINORU
IPC分类号： B23K26/14
摘要： PURPOSE:To increase the machining efficiency of the laser beam assisting chemical machining and besides, to make its handling convenient by providing a machining head so that the gap dimensions formed between the work surface and a glass plate can be adjusted and allowing a chemical liquid to flow to only a machining point and its vicinity. CONSTITUTION:A work 5 is mounted and fixed on an XY table 16 and the machining head 3 is mounted so that the lower surface of a machining frame 22 of the machining head 3 abuts slightly on the work 5 and the gap dimensions between the glass plate 9 and the work are adjusted to a prescribed value. Then, a switch of a pump 2 is turned on and the chemical liquid 12 is circulated to a supply port 4, a gap and a discharge port 7 and a laser beam is projected on the machining point 6 of the work 5 while adjusting the pressure of the chemical liquid 12 at the gap under the atmospheric pressure. Then, although the machining of the work 5 is progressed by the movement of the XY table 16 by a controller, the deteriorated chemical liquid does not stagnate on the machining point 6, so the high machining efficiency is obtained.

6. 发明专利

JPS6190862A Polishing method of hard fragile material 失效
标题翻译：硬质材料的抛光方法
公开(公告)号：JPS6190862A
公开(公告)日：1986-05-09
申请号：JP20817584
申请日：1984-10-05
申请人： Hitachi Ltd
发明人： YAMASAKA MINORU
IPC分类号： B24B1/00 , B24B7/24
摘要： PURPOSE: To efficiently polish a hard fragile material, by starting on the half way of its polishing the polishing of the other hard fragile material, whose preceding polished surface roughness is larger than the surface roughness of the former said hard fragile material, in a part where it is relatively slided with a diamond pellet.
CONSTITUTION: A vertically movable work holding plate 4', being opposed to a diamond pellet 2 on a bottom surface plate 3, is arranged separating 180° from a holding plate 4. And a setting time T, until a polishing amount almost focuses by only polishing a glass 1, is previously set to a control device, here any of the holding plates 4, 4' at this point of time is placed in the upper separating from the surface plate 3. If the device is turned on, only the holding plate 4 lowers, and the device, rotating the surface plate 3 and the holding plate 4 around a driving shaft 3a, 4a and advancing polishing as shown by a characteristic curve 5 in the drawing, gradually focuses a polishing amount. After the time T, the holding plate 4' lowers, and the device, starting polishing of the other glass 1' and dressing the diamond pellet 2, reduces a polishing time of the glass 1 and increases a polishing amount.
COPYRIGHT: (C)1986,JPO&Japio
摘要翻译：目的：为了有效地研磨硬脆性材料，通过在其抛光的一半上开始研磨另一个硬的脆性材料，其先前抛光的表面粗糙度大于前者所述硬脆性材料的表面粗糙度，在那里它与金刚石颗粒相对滑动。构成：与底面板3上的金刚石颗粒2相对的可垂直移动的工件保持板4'被布置成180度。预先将设置时间T设定为控制装置，此时，在此时刻放置任何一个保持板4,4' 在与表面板3分离的上部。如果装置打开，则只有保持板4降低，并且装置将表面板3和保持板4绕驱动轴3a，4a旋转并且如图所示进行抛光通过图中的特性曲线5逐渐聚焦抛光量。在时间T之后，保持板4'降低，并且装置开始抛光另一个玻璃1'并修整金刚石颗粒2，减少玻璃1的抛光时间并增加抛光量。

7. 发明专利

JP2002092823A METHOD FOR MANUFACTURING THIN FILM MAGNETIC HEAD, METHOD FOR INSPECTING THIN FILM MAGNETIC HEAD AND ITS DEVICE 失效
公开(公告)号：JP2002092823A
公开(公告)日：2002-03-29
申请号：JP2000285232
申请日：2000-09-14
申请人： HITACHI LTD
发明人： YOSHIDA MINORU , SASAZAWA HIDEAKI , NAKADA TOSHIHIKO , YAMASAKA MINORU
IPC分类号： G01B11/02 , G11B5/31 , G11B5/39
摘要： PROBLEM TO BE SOLVED: To provide a method for optically and efficiently measuring positions of plural thin film magnetic head elements formed on a bar in a row at high speed and with high precision and to feed the measured result back to a manufacturing stage to stabilize the manufacturing process of the thin film magnetic head element. SOLUTION: A positional estimation value of a sample in the bar is obtained from the positional deviation between the element and the next element and the distance between them by estimating the value using a primary approximate straight line or a several order approximate curve and the element simultaneously moves by the estimation value and the distance between them. The stage for measuring the dimension has a stage for photoelectrically transforming an image formed in a lens optical system to an image signal and a stage for calculating the dimension. The transformation to the image signal is performed directly after the next element moves and continuously repeated and the stage for calculation is processed parallel to the stage for transferring to the image signal. Thus, highly precise, highly stable and high resolution image measurement is made possible and highly precise measurement of the narrow track width of a GMR head is made possible. A high yield in the manufacturing stage can be maintained by feeding the measured result back to the manufacturing stage.

8. 发明专利

JPH0954914A MR HEAD 失效
公开(公告)号：JPH0954914A
公开(公告)日：1997-02-25
申请号：JP20066495
申请日：1995-08-07
申请人： HITACHI LTD
发明人： YAMASAKA MINORU , YUHITO ISAMU
IPC分类号： G11B5/39
摘要： PROBLEM TO BE SOLVED: To obtain an MR head having good signal reproducing characteristics by grinding a base film into specified surface roughness and forming an MR film on the base film. SOLUTION: An insulating layer 2 and a shield film layer 3 are formed on a substrate 1 and further a base film 4 for a thin film magnetoresistance(MR) element is formed and ground to have

9. 发明专利

JPH08102014A FORMING METHOD FOR MAGNETIC CORE OF THIN FILM MAGNETIC HEAD 失效
公开(公告)号：JPH08102014A
公开(公告)日：1996-04-16
申请号：JP23645394
申请日：1994-09-30
申请人： HITACHI LTD
发明人： YAMASAKA MINORU , TSUKADA YUKIHISA , WAKAGI YASUO
IPC分类号： G11B5/31
摘要： PURPOSE: To maintain high accuracy of the thickness and depth of a lower core and to improve surface properties of the core by forming a protective film surrounding the element part and then flattening the film. CONSTITUTION: A lower magnetic film 3 comprising Permalloy or the like, alumina gap layer 4, an upper core step forming silicon layer 5, resist adhesion layer 6 of carbon are provided on an aluminum base film 2 on the surface of a thin film magnetic head substrate 1. Then, a resist layer 7 is laminated to specified thickness, exposed to light for a specified shape and size, and developed to form a resist pattern 8. The pattern 8 is used as a mask to remove the resist adhesion layer 6, the upper core step forming layer 5, gap layer 4, and lower magnetic film 3 by ion milling to form the lower core part 12 of the element. Then the resist 7 is removed and the lower core part 12 is covered by the protective film 9. A carbon film of 0.1-0.5μm thick is formed on the protective film 9 as the lap protective layer 10 in the area except for the core part 12. Then the projecting part 11 of the lower core part 12 is flattened by lapping.

10. 发明专利

JPH06176321A POLISHING DEVICE AND POLISHING METHOD FOR MAGNETIC HEAD 失效
公开(公告)号：JPH06176321A
公开(公告)日：1994-06-24
申请号：JP32434892
申请日：1992-12-03
申请人： HITACHI LTD
发明人： WAKI YOSHIHARU , FUJISAWA MASAYASU , ISONO CHIHIRO , YAMASAKA MINORU
IPC分类号： G11B5/31 , G11B5/60 , G11B21/21
摘要： PURPOSE:To enable the polishing of the floating surface of a magnetic head to an arbitrary projecting shape in the state of adhering the magnetic head to a supporting spring and to decrease the working level difference between a head substrate and a magnetic film. CONSTITUTION:The magnetic head 7 which is mounted with an X table 1, a Y table 2, a Z table 3, an theta motor 4 and a phi motor 5 and is adhered to the supporting spring 6 mounted to the theta motor 4 is oscillated in an orbit of an arbitrary function. The magnetic head 7 is pressed and oscillated to a diamond disk 9 for polishing mounted to an air spindle 8 and is brought into sliding contact therewith, by which the floating surface shape of the magnetic head is generated and polished.

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