会员体验
专利管家(专利管理)
工作空间(专利管理)
风险监控(情报监控)
数据分析(专利分析)
侵权分析(诉讼无效)
联系我们
交流群
官方交流:
QQ群: 891211   
微信请扫码    >>>
现在联系顾问~
热词
    • 3. 发明专利
    • SEMICONDUCTOR SUBSTRATE DICING METHOD
    • JPH05166926A
    • 1993-07-02
    • JP32855391
    • 1991-12-12
    • HITACHI LTDHITACHI VLSI ENG
    • AKASAKI HIROSHIOTSUKA KANJI
    • H01L21/301H01L21/78
    • PURPOSE:To provide generation of faulty short-circuit between electrodes, and to improve the reliability of the products by a method wherein the metallizing film on the back side of a pellet located directly under a scribe line, is selectively removed before dicing. CONSTITUTION:The scribe line 4, drawn by patterning on the wiring metal layer 3 of a semiconductor substrate 1, is recognized by a pattern recognition part 5 through a protection film 6, a pulse laser beam 7 is applied to the surface of the backside metallizing layer 2 directly under the scribe line 4, a local laser annealing is conducted, and an alloy layer 9 is formed. Blade sawing is conducted with a diamond blade 8 from above the scribe line 4, and full-cut dicing is conducted as deeply as the groove reaches the alloy layer 9. As a result, even when the sawing blade reaches the back side metallizing film 2, microcrack pieces produced in the vicinity of the end of the groove by dicing in the back side of a pellet are supported by the metallizing film in the back side because the metallizing film 2 has lost metallic mechanical characteristics.
    • 5. 发明专利
    • ELECTRONIC DEVICE
    • JPH0465137A
    • 1992-03-02
    • JP18076390
    • 1990-07-05
    • HITACHI LTDHITACHI VLSI ENG
    • AKASAKI HIROSHIOTSUKA KANJI
    • H01L21/60
    • PURPOSE:To lengthen a fatigue life by a method wherein a plurality of external terminals are 'formed at a semiconductor chip or a semiconductor device, a plurality of terminals which are faced with the respective external terminals are formed at a mounting board and both are connected electrically via flexible bonding wires. CONSTITUTION:A stress is exerted on a part between an external terminal 2 of a semiconductor chip 1 and a terminal 11 due to the difference in a coefficient of thermal expansion between the chip 1 and a mounting board 10. The part in which a wire 12 is connected to the external terminal 2 via a brazing material 5 and the part in which the wire 12 is connected to the terminal 11 are fixed more firmly than the strength of wires 12 in parts other than them. As a result, the stress due to the difference in the coefficient of thermal expansion is exerted on the wires 12 in the parts other than the connecting parts. Since the wires 12 in the parts to which the stress is exerted are flexible, they can absorb the stress due to the difference in the coefficient of thermal expansion. Thereby, since it is possible to reduce that the connection of the external terminal 2 to the terminal 11 is set to a disconnection state, the reliability of an electronic device is enhanced.
    • 6. 发明专利
    • SEMICONDUCTOR DEVICE
    • JPH03242963A
    • 1991-10-29
    • JP3824390
    • 1990-02-21
    • HITACHI LTDHITACHI VLSI ENG
    • OKINAGA TAKAYUKIOTSUKA KANJIAKASAKI HIROSHI
    • H01L23/34H01L23/50H05K3/34
    • PURPOSE:To prevent misregistration of a pin grid array(PGA) readily and surely in surface mounting the PGA by making a part of lead pins of the PGA longer than remaining lead pins and by providing a hole whereto the longer lead pin is inserted on a packaging substrate. CONSTITUTION:In a PGA 2, four lead pins 9a inserted into a through-hole 8 positioned at four corners of a substrate 3 are longer than remaining lead pins 9. While ends of the remaining lead pins 9 are in contact with the surface of a land 10, the four lead pins 9a are inserted inside four holes 12 provided to a packaging substrate 1 and each end is projected slightly outside from the rear. That is, solder paste is applied to the surface of the land 10, the PGA 2 is laminated on the upper surface of the packaging substrate 1, and the lead pin 9a is inserted inside the hole 12 of the packaging substrate 1; thereby, an end of each of remaining lead pins 9 is temporarily fixed, which is positioned accurately on the surface of each opposite land 10. Thereby, it is possible to prevent misregistration of the PGA 2 readily and surely, which is surface- packaged on the packaging substrate 1.
    • 7. 发明专利
    • MANUFACTURE OF SEMICONDUCTOR INTEGRATED CIRCUIT DEVICE
    • JPH03173152A
    • 1991-07-26
    • JP31063889
    • 1989-12-01
    • HITACHI LTDHITACHI VLSI ENG
    • AKASAKI HIROSHIOTSUKA KANJI
    • H01L23/02
    • PURPOSE:To prevent a retreat of a bonding member and a blowhole from being produced at a sealing part by a method wherein a thickness and a volume of the bonding member at the sealing part and a heat-conducting part are adjusted, a pressure is self-adjusted in such a way that a pressure inside a cavity of a mounting board becomes equal to a pressure outside the cavity and the bonding member is sealed airtightly. CONSTITUTION:Solder preforms (bonding member preforms) 6a of a sealing part 5, a solder preform (a bonding member preform) 8a of a heat-conducting part 7 and a cap 3 are aligned respectively with metallized layers 9, 10, 11 and are piled up on a mounting board 2 on which a semiconductor chip 1 has been mounted via solder bumps 4. In this case, a thickness of the solder preforms 6a of the sealing part 5 which have been formed as, e.g. square posts is set to a value close to a sealing thickness at a time when a sealing operation is completed. The solder preform 8a of the heat-conducting part 7 is set to a volume which becomes a prescribed solder thickness at the time when the sealing operation is completed. When an area of a plane part is reduced, the preform formed to be a square post which is thicker than the solder preforms 6a of the sealing part can be used while its volume is kept definite.
    • 8. 发明专利
    • MANUFACTURE OF SEMICONDUCTOR DEVICE
    • JPH02288232A
    • 1990-11-28
    • JP10767589
    • 1989-04-28
    • HITACHI LTDHITACHI VLSI ENG
    • AKASAKI HIROSHIISHIDA TAKASHITATE HIROSHI
    • H01L21/3213H01L21/3205H01L21/321H01L21/60
    • PURPOSE:To shorten a manufacturing process by forming insulating protective films as a lower layer and an upper layer onto the metallic wiring layer of a flip-chip electrode section and an external exposed pad section and simultaneously conducting the etching process of the machining of the upper-layer insulating protective film with the flip-chip electrode section and the external exposed pad section. CONSTITUTION:An SiO2 film 7 as an upper-layer insulating protective film is shaped onto the surfaces of an opened flip-chip electrode section 2 and an external exposed pad section 3. The SiO2 film 7 of the flip-chip electrode section 2 and the external exposed pad section 3 is opened through wet etching by a hydrofluoric acid group etchant. Since the etching rates of the SiO2 film 7 of the upper-layer insulating protective film and the Si3N4 film 6 of a lower-layer insulating protective film differ and the etching rate of the Si3N4 film 6 is made lower than that of the SiO2 film 7 by approximately centuple at that time, the etching of the external exposed pad section 3 progresses only up to the surface of the lower-layer insulating film, and the Si3N4 film 6 is not etched. Since the SiO2 film 7 formed to the flip-chip electrode section 2 and the external exposed pad section 3 can be opened simultaneously through wet etching, the upper-layer insulating protective film can be machined at a time.