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    • 4. 发明专利
    • NUMERICALLY CONTROLLED CURVED SURFACE WORKING DEVICE
    • JP2001092516A
    • 2001-04-06
    • JP26504299
    • 1999-09-20
    • HITACHI LTDHITACHI SOFTWARE ENG
    • HIRAI JUNICHIARAI HIROSHIHARIHARA TAMOTSUCHIBA OSAMUTAKAHASHI MASAAKI
    • G05B19/4103B23Q15/00G05B19/4099
    • PROBLEM TO BE SOLVED: To provide a numerically controlled curved surface working device capable of improving the roughness of a working surface and the accuracy of the working surface by smoothly moving and working a tool along an NURBS curve, executing a high speed working and sharply shortening the working manhour by omitting manual work. SOLUTION: This working device is provided with a means for reading out CL data consisting of a tool tip position vector and a main axis direction vector in a work coordinate system, a means for converting the CL data into the positional vectors and rotational angles of three straight axes in a machine coordinate system on the basis of the constitution of a simultaneous multi-axes controlling NC working machine, a means for calculating a not vector of an optimum interval for a NURBS curve on the basis of the positional vectors and the rotational angles of the three straight axes, and a means for calculating NURBS curves for the three straight axes and a rotational axis on the basis of the not vector. The device is also provided with a means for converting the NURBS curves into NC data for interpolating NURBS, a means for converting the working speed of the work coordinate system into a minute feed working speed of the machine coordinate system and a means for transmitting the NC data to an NC working machine to execute an NURBS interpolated work.
    • 8. 发明专利
    • POWER SEMICONDUCTOR ELEMENT SUBSTRATE AND MANUFACTURE THEREOF
    • JPH08191120A
    • 1996-07-23
    • JP206695
    • 1995-01-10
    • HITACHI LTD
    • OGAWA TOSHIOTAKAHASHI MASAAKIKAMIMURA NORITAKAYAMADA KAZUJI
    • H05K1/02H01L23/12H01L23/373H01L23/473
    • PURPOSE: To obtain a power semiconductor element substrate, which inhibits thermal strain of ceramic chips while ensuring a high heat conductivity between the ceramic chips and a metal heat sink and makes the adhesion between both of the chips and the heat sink superior, by a method wherein AIN chips are buried in an Al/SiC base in such a way that the exposed surfaces of the AIN chips are on the same plane as the exposed surface of the base. CONSTITUTION: A power semiconductor element substrate is manufactured into such a structure that AIN chips 12 are buried in a base 13, which contains Al and SiC as its main component, by an injection molding method and the exposed surfaces (free surfaces) 12A of the chips 12 are on the same plane as the exposed surface 13A of the base 13. Power semiconductor elements 11 may be directly bonded to the surfaces of the chips 12, but are secured to the chips 12 via lower electrodes 17 as needed. In this case, a bridge-shaped electrode 18 is designed so that it is connected with the electrodes 17 of the elements 11 adjacent to the electrode 18 and ensures a current value requied for the several elements in all. As a result, the temperature rise of the power semiconductor elements is inhibited and a heat dissipation burden, which is applied to a heat sink, can be made small.