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    • 9. 发明专利
    • SEMICONDUCTOR MEMORY DEVICE
    • JPH01145851A
    • 1989-06-07
    • JP30319487
    • 1987-12-02
    • HITACHI LTDHITACHI VLSI ENG
    • YAMAZAKI TAKASHIOSHIMA KAZUYOSHIKUMADA ATSUSHIUDO SHINJITAKANO MITSUHIRO
    • H01L27/10G11C11/409H01L21/8242H01L27/108
    • PURPOSE:To shorten the separating interval between data lines and to improve an integration density, by making the extending direction of complementary data lines agree with the direction of the gate length of a shorting MISFET, and inverting the pattern of a complementary signal in the next stage with respect to the pattern of a preceding complementary signal. CONSTITUTION:In a DRAM, the extending direction of each complementary data line is made to agree with the direction of the gate length of a shorting MISFET QSH. Then, the deviating amount in mask alignment between a connecting part Cont and a gate electrode G of the shorting MISFET QSH is generated in the extending direction of each complementary data line DL. Therefore, the separating interval between the complementary data lines DLs is shortened. With respect to the pattern of the complementary signal of the complementary data line DL, the pattern of the complementary signal of the complementary data line DL at the next stage is inverted. Thus, two data lines (d2 and d3) are made to pass between two connecting parts Cont's between two pieces of the data line (d1 and d4) and two input/output selecting MISFET QYs. Therefore, the separating interval between the data lines can be shortened by the amount of the part, where the separating interval corresponding to the deviating amount in mask alignment is not present.