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1. 发明专利

JP2000155420A PATTERN FORMING MATERIAL AND PATTERN FORMING METHOD USING SAME 失效
公开(公告)号：JP2000155420A
公开(公告)日：2000-06-06
申请号：JP33224098
申请日：1998-11-24
申请人： HITACHI LTD , HITACHI CHEMICAL CO LTD
发明人： SAKAMIZU TOSHIO , MURAI FUMIO , ARAI TADASHI , KATO KOJI , SATO KAZUHIKO , ARASAWA MASATOSHI
IPC分类号： G03F7/004 , G03F7/023 , G03F7/039
摘要： PROBLEM TO BE SOLVED: To make it possible to form a resist high in sensitivity and resolution by exposure to (i) line or radiation by using a a sulfonate ester having a specified structure as an acid precursor for a chemically amplifiable photoresist using a novolak resin as a base resin. SOLUTION: The pattern forming material comprises the novolak resin, a medium having a reactivity for increasing solubility in an aqueous alkaline solution by an acid catalyst, and an acid precursor having an ester of an N- hydroxy imide and a camphor sulfonic acid. As the acid precursor, the ester of the N-hydroxyimide having >=2 condensed polycyclic hydrocarbon with the camphor sulfonic acid is perferable. It is preferred that the content of this acid precursor is 0.5-10 pts.wt. of 100 pts.wt. of the sum of the medium having reactivity of changing solubility in the aqueous alkaline solution by the acid catalystic reaction and the alkali-soluble resin.

2. 发明专利

JP2011157407A Coal gasification system 有权
标题翻译：煤气化系统
公开(公告)号：JP2011157407A
公开(公告)日：2011-08-18
申请号：JP2010017513
申请日：2010-01-29
申请人： Hitachi Ltd , 株式会社日立製作所
发明人： SHIMODA MAKOTO , KISO FUMIHIKO , AKIYAMA TORU , SATO KAZUHIKO
IPC分类号： C10J3/46 , C01B3/16 , C10K3/04
摘要： PROBLEM TO BE SOLVED: To provide a coal gasification system which can be safely operated by safely starting or stopping a carbon monoxide conversion device installed in the coal gasification system.
SOLUTION: The coal gasification system is so constituted that a combustion device 1000 consuming oxygen contained in a nitrogen gas produced by an oxygen producing device 100 is provided and the nitrogen gas from the combustion device is supplied to a system in which a refined gas 6 is supplied to the carbon monoxide conversion device 400 from a gas refining facility.
COPYRIGHT: (C)2011,JPO&INPIT
摘要翻译：要解决的问题：提供一种煤气化系统，其可以通过安全地启动或停止安装在煤气化系统中的一氧化碳转化装置来安全地操作。解决方案：煤气化系统的构成是，提供消耗由氧气产生装置100产生的氮气中所含的氧气的燃烧装置1000，并且来自燃烧装置的氮气被供给到精炼气体6从气体精炼设备供给到一氧化碳转化装置400。版权所有（C）2011，JPO＆INPIT

3. 发明专利

JP2003170760A TRAVEL CONTROLLER FOR VEHICLE, AND RECORDING MEDIUM FOR MAP INFORMATION DATA 审中-公开
公开(公告)号：JP2003170760A
公开(公告)日：2003-06-17
申请号：JP2001374699
申请日：2001-12-07
申请人： HITACHI LTD
发明人： KOJIMA TAKAO , YOSHIKAWA TOKUJI , SATO KAZUHIKO , KURAGAKI SATOSHI , IZUMI SHIHO , MINOWA TOSHIMICHI
IPC分类号： G01C21/00 , B60K31/00 , B60R21/00 , B60T7/12 , F02D29/02 , G01C21/26 , G08G1/16
摘要： PROBLEM TO BE SOLVED: To acquire information effective for safe drive to allow travel control fit to driver's feeling, in a vehicular travel controller having an ACC function. SOLUTION: The first travel speed of own vehicle is determined based on an intervehicular distance Dc detected by an intervehicular distance detecting means 3 and a relative speed Vr between a preceding vehicle and the own vehicle. An own vehicle position detecting means 4 detects a positional point of the own vehicle, and a map information acquiring means 5 acquires road information, a road width, a curvature radius, and a slope from map information, based on the positional information. A visible distance estimating means 6 estimates a visible distance based on the acquired map information, and determines the second travel speed capable of conduct driving without anxiety, based on the estimated visible distance. A travel control means 8 determines the minimum speed out of a set speed set by a driver, the first travel speed and the second travel speed as a target travel speed. COPYRIGHT: (C)2003,JPO

4. 发明专利

JP2003048523A Braking device of automobile, controller thereof, and control program thereof 有权
标题翻译：汽车制动装置，其控制器及其控制程序
公开(公告)号：JP2003048523A
公开(公告)日：2003-02-18
申请号：JP2001234917
申请日：2001-08-02
申请人： Hitachi Ltd , 株式会社日立製作所
发明人： SATO KAZUHIKO , KOJIMA TAKAO , MINOWA TOSHIMICHI
IPC分类号： B60N3/06 , B60T7/04 , B60T8/96
摘要： PROBLEM TO BE SOLVED: To accurately perform acceleration and deceleration of a vehicle in accordance with driver's intention even if a footrest function is uncontrollable. SOLUTION: A braking device of the automobile its provided with wheel braking force addition mechanisms 4, 6, 9, 10a to 10d for applying a braking force to each wheel by inputting a braking command in accordance with an additional force applied to a brake pedal 1, a footrest mechanism 3 for adding a reaction force to the brake pedal 1, a pedal additional force sensor 2 for detecting an additional force applied to the brake pedal 1, and a control unit 8 for adding a braking force to each wheel by outputting a braking command to an active brake booster 4 of the wheel braking force addition mechanism when an additional force detected by the sensor 2 exceeds a value determined in advance while the footrest mechanism 3 functions.
摘要翻译：要解决的问题：即使脚踏功能不可控，也可以根据驾驶员的意图精确地执行车辆的加速和减速。解决方案：汽车的制动装置具有车轮制动力添加机构4,6，9,10a至10d，用于通过根据施加到制动踏板1的附加力输入制动指令向每个车轮施加制动力，用于向制动踏板1添加反作用力的脚踏机构3，用于检测施加到制动踏板1的附加力的踏板附加力传感器2，以及用于通过输出制动踏板1向每个车轮添加制动力的控制单元8 当传感器2检测到的附加力超过了搁脚机构3起作用时预先确定的值时，制动指令到车轮制动力添加机构的主动制动助力器4。

5. 发明专利

JP2002106702A CONTROL DEVICE, METHOD AND SYSTEM FOR AUTOMATIC TRANSMISSION 审中-公开
公开(公告)号：JP2002106702A
公开(公告)日：2002-04-10
申请号：JP2001255443
申请日：2001-08-27
申请人： HITACHI LTD , HITACHI CAR ENG CO LTD
发明人： NODA JUNICHI , SATO KAZUHIKO , IBAMOTO MASAHIKO , KUROIWA HIROSHI , OKADA MITSUYOSHI
IPC分类号： F16H61/04 , B60W10/04 , B60W10/10 , B60W10/11 , F02D29/00 , F16H59/14 , F16H59/42 , F16H61/68 , F16H61/684 , F16H61/686
摘要： PROBLEM TO BE SOLVED: To always and stably provide a gear shift, regardless of a driving state, to suppress shift shock, to reduce unpleasant feeling to an occupant and to easily determine a control constant when designing a control device. SOLUTION: A control device of an automatic transmission of an automobile is constituted so as to determine transmission torque of a friction member during the gear shift according to input rotational speed, input torque and target gear shift time of the friction member, to determine target torque during the gear shift, to reduce output torque of an engine according to a difference of the transmission torque and target torque, to determine control transmission torque to be supplied to the friction member according to the torque difference and the transmission torque, to determine operating force to the friction member and to supply operating force to the friction member.

6. 发明专利

JP2001322538A TRAVEL CONTROL DEVICE OF AUTOMOBILE AND AUTOMOBILE 失效
公开(公告)号：JP2001322538A
公开(公告)日：2001-11-20
申请号：JP2000147450
申请日：2000-05-15
申请人： HITACHI LTD
发明人： SATO KAZUHIKO , MINOWA TOSHIMICHI , KURAGAKI SATOSHI , YOSHIKAWA TOKUJI , KOJIMA TAKAO
IPC分类号： B60R21/00 , B60K31/00 , B60T7/04 , B60T7/12 , B60T17/22 , B60W10/04 , B60W10/06 , B60W10/08 , B60W10/18 , B60W10/188 , B60W30/00 , B60W30/14 , B60W40/08 , F02D29/02 , B60K41/00 , B60K41/20
摘要： PROBLEM TO BE SOLVED: To solve problems in adding footrest function to a brake pedal wherein a driver is required to manually set footrest force before driving due to the dependence of the footrest force on a physical constitution of the driver and is required to adjust a speed with a burden for the driver by stepping a brake for traveling at the same preset speed as a straight line road when there is no preceding car in ACC travel on a curved road and a bad road. SOLUTION: A load estimating means of the driver is provided for deciding the footrest force according to an individual driver, and the footrest force of the footrest function is adjusted according to a load arithmetically operated by the load estimating means. A detecting means is provided for detecting whether or not one's own car is cornering to change the preset speed of the one's own car according to the corner.

7. 发明专利

JP2000320363A DRIVING FORCE CONTROL DEVICE FOR AUTOMOBILE 失效
公开(公告)号：JP2000320363A
公开(公告)日：2000-11-21
申请号：JP12888299
申请日：1999-05-10
申请人： HITACHI LTD , HITACHI CAR ENG CO LTD
发明人： IBAMOTO MASAHIKO , SATO KAZUHIKO
IPC分类号： B60W10/04 , B60K6/20 , B60K6/36 , B60K6/48 , B60K6/543 , B60W10/06 , B60W10/08 , B60W10/10 , B60W10/101 , B60W10/105 , B60W10/109 , B60W10/11 , B60W20/00 , F02D29/00 , F02D29/02 , F16H61/02 , F16H63/50 , B60K41/06 , B60K41/12
摘要： PROBLEM TO BE SOLVED: To provide a driving force control device for automobiles that can produce prime mover torque as a function of the allowable torque transmission level of transmissions, thus protecting them. SOLUTION: A line pressure sensor 56 detects an actual line pressure acting on a transmission 40 controlled by a CVT control means 30. From the line pressure the line pressure sensor 56 detects, an allowable driving torque arithmetic part in driving force control means 100 computes an allowable driving torque for the transmission 40. Based on the allowable driving torque which the driving force control means 100 calculated, engine control means 10 controls an engine 20.

8. 发明专利

JPH11297584A METHOD AND APPARATUS FOR MANUFACTURING SEMICONDUCTOR INTEGRATED CIRCUIT DEVICE 失效
公开(公告)号：JPH11297584A
公开(公告)日：1999-10-29
申请号：JP9862698
申请日：1998-04-10
申请人： HITACHI LTD , HITACHI ULSI SYS CO LTD
发明人： FUDO HIDEKIMI , MORI SHIGEKI , SATO KAZUHIKO
IPC分类号： H01L21/027
摘要： PROBLEM TO BE SOLVED: To reduce the size variation of a resist pattern by writing a second resist pattern at designated irradiation quantity from an irradiation quantity correcting map formed based on a size correction map of a first resist pattern and applying the baking treatment. SOLUTION: A first resist pattern size is measured in step 105, size data in a wafer plane are collected in step 106, if the resist pattern size is out of specifications, a size correction map is formed in step 108 and inputted to an electron beam direct writing apparatus in step 109, an irradiation quantity correction map per shot of the electron beam is formed from the resist size correcting map in wafer plane in step 110, a second resist is coated on the surface of a semiconductor wafer in step 100, the electron beam is irradiated at an optimum irradiation quantity based on the irradiation quantity correcting map per shot of the electron beam in step 101 and the baking treatment is applied in step 102.

9. 发明专利

JPH1126357A MANUFACTURE OF SEMICONDUCTOR DEVICE 失效
公开(公告)号：JPH1126357A
公开(公告)日：1999-01-29
申请号：JP18209897
申请日：1997-07-08
申请人： HITACHI LTD
发明人： YOSHIMURA TOSHIYUKI , MURAI FUMIO , SATO KAZUHIKO , YAMAMOTO JIRO , TERASAWA TSUNEO
IPC分类号： G03F7/20 , G03F9/00 , H01L21/027
摘要： PROBLEM TO BE SOLVED: To provide a high throughput and high accuracy alignment by patterning a processed layer between a processed layer for exposure of an optical transfer apparatus and that for the exposure of the next optical transfer apparatus, using a charged particle beam lithography system to correct optical distortions of the two transfer apparatus. SOLUTION: The method comprises forming a metal film and resist on a semiconductor substrate, exposing and developing a first min. size wiring pattern, using a Kr fluoride excimer laser stepper 101 of an optical transfer apparatus S1, etching to form a wiring, irradiating a contact hole pattern for connecting this wiring to a wiring of an upper layer, using a unit 104 of an electron beam lithography system S2, exposing and developing a second min. size wiring pattern, using an i-beam stepper 102 of an optical transfer apparatus S2 to form a wiring while the optical distortions of the two transfer apparatus S1, S2 are measured to correct the formed patterns' positions, based on the measured result.

10. 发明专利

JPH1079335A ELECTRON BEAM LITHOGRAPHY SYSTEM 失效
公开(公告)号：JPH1079335A
公开(公告)日：1998-03-24
申请号：JP23391296
申请日：1996-09-04
申请人： HITACHI LTD
发明人： KATO MAKOTO , MATSUZAKA TAKASHI , SATO KAZUHIKO
IPC分类号： G03F7/20 , H01J37/305 , H01L21/027
摘要： PROBLEM TO BE SOLVED: To mount a batch pattern on the second mask as much as possible without wastefullness by a method wherein an aperture part is selected from the first mask having the aperture parts of a plurality of kinds of sizes in conformity with the size of the batch pattern to be formed by the second mask. SOLUTION: A batch pattern is selected by a batch pattern selecting mechanism, and a lithography pattern is projected on the material to be processed. At this point, the first mask 17, having a plurality of kinds of aperture parts 18, 19 and 20, is used. As a result, aperture parts 22, 23 and 24, having the pitch optimum to the respective size, can be arranged without waste on the second mask 21. Although a mechanical selective structure is shown on an aperture selective structure, and also an example of an electromagnetic selective structure is shown on a batch pattern, the combination of thereof can be made freely. Also, the aperture part of the first mask 17 illustrates the case of three kinds, but any number of kinds may be used. Besides, the batch patterns 22, 23 and 24 indicate by a constant pitch respectively, but a random pitch may be used.

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