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1. 发明专利

JPH03235644A AC GENERATOR FOR VEHICLE 失效
公开(公告)号：JPH03235644A
公开(公告)日：1991-10-21
申请号：JP2605990
申请日：1990-02-07
申请人： HITACHI LTD , HITACHI AUTOMOTIVE ENG
发明人： SATO OSAMU
IPC分类号： H02K5/10 , H02K5/18 , H02K5/20 , H02K9/06 , H02K19/22
摘要： PURPOSE:To enhance cooling performance by disposing a drip-proof resin cover at the rear end of a rear bracket, extending the rib of the cover as a cooling air guide thereby feeding the cooling air efficiently to an IC regulator section upon application of the drip-proof cover. CONSTITUTION:A drip-proof cover 10 for blocking intrusion of mud or water into a generator is disposed to cover the outside of a rear bracket 8. When the rib of the drip-proof cover 10 is extended as a cooling air guide 11, the cooling air produced upon rotation of a rotor 3 and cooling fans 4a, 4b is concentrated on a suction window 9 in the rear bracket 8 thus increasing the cooling air flow through the suction window 9. Consequently, heat is radiated furiously from the surface of an IC regulator 12 disposed at the inside of the suction window 9.

2. 发明专利

JPS63240344A AC GENERATOR FOR ROLLING STOCK 失效
公开(公告)号：JPS63240344A
公开(公告)日：1988-10-06
申请号：JP7152987
申请日：1987-03-27
申请人： HITACHI LTD , HITACHI AUTOMOTIVE ENG
发明人： SATO OSAMU , KAI KENJIRO
IPC分类号： H02K5/10
摘要： PURPOSE:To improve environmental adaptability of a bearing section, by providing a designated seal section to the clearance between a bearing supporting section and a cooling fan mounting section. CONSTITUTION:An AC generator for a rolling stock is composed of a rotor 1 secured to a shaft 2, a bearing 3 to hold the shaft 2 and a bracket 5 through a bearing supporting section 4, a cooling fan 6, a stator 8 arranged to the bracket 5, etc. On this occasion, a seal section 9 of a labyrinth structure is provided. The cylinder section of a bearing supporting section 4 protrudes towards inside a generator. A recessed section is formed to the mounting section of the cooling fan 6 arranged adjacent to the cylinder section of the bearing supporting section 4 at a slight interval with a projected section of to the spot corresponding to the above-mentioned projected section. The seal section 9 of a labyrinth structure is composed of these recessed and projected sections. Mud water and dust from outside can thereby be prevented.

3. 发明专利

JPS63310347A AC GENERATOR FOR ROLLING STOCK 失效
公开(公告)号：JPS63310347A
公开(公告)日：1988-12-19
申请号：JP14316487
申请日：1987-06-10
申请人： HITACHI LTD , HITACHI AUTOMOTIVE ENG
发明人： SATO OSAMU , KAI KENJIRO
IPC分类号： H02K19/22 , H02K9/06
摘要： PURPOSE:To reduce the temperature of a rotor winding, by providing a centrifugal fan integrated with a front cooling fan between the clicks of a rotor core. CONSTITUTION:A centrifugal fan 6a' integrated with a front cooling fan 6a is provided between clicks of a rotor core 7a. When a rotor 7 and the centrifugal fan 6a' thereby rotate, wind will flow from behind to front through between a rotor winding 8 and rotor cores 7a, 7b and is discharged to the outside of a motor. Heat removal is thus performed so actively from the surface of the rotor winding 8 that the rotor winding gets cooled. By this cooling action the reduction of temperature of the rotor winding 8 can be accomplished, so that the resistance of the rotor 8 is reduced and the field current increased to increase magnetomotive force.

4. 发明专利

JP2002186180A METHOD AND APPARATUS FOR VOLTAGE COMPENSATION IN DIRECT-CURRENT POWER SUPPLY 失效
公开(公告)号：JP2002186180A
公开(公告)日：2002-06-28
申请号：JP2000380014
申请日：2000-12-14
申请人： HITACHI LTD , HITACHI ENG CO LTD
发明人： KITAMI HIDEYOSHI , SATO OSAMU , OBARA TOSHIYUKI , KUSAYAMA YOSHIO
IPC分类号： H02J1/00
摘要： PROBLEM TO BE SOLVED: To solve the problem that, if a direct-current motor for auxiliary equipment in a direct-current power supply unit is started at a plant failure, a terminal voltage of a control device is reduced beyond an allowable range by a starting current at that time. SOLUTION: Direct-current power is supplied from an alternating-current power supply 1 to the control device 6 via a charger 3 and a storage battery 4. A bypass contactor 5b opens when the control device terminal voltage is above an allowable upper limit voltage, and closes when the control device terminal voltage is below the allowable lower limit voltage, and inserts or bypasses a silicon dropper 5a to regulate the voltage. When a motor operation command is given to a motor control circuit 7a at the plant failure, a contactor 6a, together with a synchronous contactor 5g, is closed. As a result, the bypass contactor 5b is closed by MC 5f and the silicon dropper 5a is bypassed. Thus a transient and excessive voltage drop due to the starting current is avoided.

5. 发明专利

JP2001325912A ELECTRON BEAM INSPECTION DEVICE 失效
公开(公告)号：JP2001325912A
公开(公告)日：2001-11-22
申请号：JP2000148574
申请日：2000-05-16
申请人： HITACHI LTD
发明人： SATO OSAMU , KITSUNAI HIROYUKI , SHIMIZU MINORU
IPC分类号： G01B15/00 , G01B15/04 , G01N23/20 , G01N23/225 , H01J37/16 , H01J37/20
摘要： PROBLEM TO BE SOLVED: To prevent contamination of samples in a simple structure without deterioration of resolution in an electron beam inspection device. SOLUTION: The electron beam inspection device irradiates electron beam from an electron gun in an electron gun chamber onto samples placed in a sample room and detects secondary electron and reflected electron generated from the samples. With this kind of the electron beam inspection device, a means for generating active species of hydrogen is provided in the sample room, where hydrocarbon system gas remaining in the sample room is dissolved into carbon dioxide (CO2) and water (H2O) through oxidization by activated species of oxygen, to eliminate hydrocarbon system gas from inside the sample room, thus, contamination of the samples can be cut off.

6. 发明专利

JP2001217304A SUBSTRATE STAGE, SUBSTRATE PROCESSING APPARATUS AND METHOD USING THE SUBSTRATE STAGE 失效
公开(公告)号：JP2001217304A
公开(公告)日：2001-08-10
申请号：JP2000027360
申请日：2000-01-31
申请人： HITACHI LTD
发明人： KITSUNAI HIROYUKI , SATO OSAMU
IPC分类号： H01L21/302 , C23C14/54 , H01L21/203 , H01L21/3065 , H01L21/68 , H01L21/683
摘要： PROBLEM TO BE SOLVED: To provide a substrate stage capable of very accurately controlling the temperature distribution of a substrate in processing, a substrate processing device which processes the substrate while controlling its temperature distribution by the above substrate state, and a substrate processing method. SOLUTION: The parts of a glass substrate stage 4 which are brought into contact with a substrate 1 are formed of conductors 2 and 2', power supplies 5 and 5' which apply voltages to the conductors 2 and 2' are provided. Furthermore, gas piping having a temperature controlling function and introducing thermally conductive gas to the rear of the substrate is provided inside the board stage 4. The substrate 1 is efficiently controlled in temperature when it is being processed, so that the substrate can be very uniformly processed through its surface.

7. 发明专利

JP2001075815A METHODS FOR GENERATING AND LOADING SOURCE BUILT-IN TYPE EXECUTABLE PROGRAM AND COMPUTER-READABLE RECORDING MEDIUM WITH SOURCE BUILT-IN TYPE EXECUTABLE PROGRAM GENERATION PROGRAM RECORDED THEREON 失效
公开(公告)号：JP2001075815A
公开(公告)日：2001-03-23
申请号：JP25119399
申请日：1999-09-06
申请人： HITACHI LTD
发明人： SAWARA HIROSHI , KAWAI MASAO , SATO OSAMU , TAKEDA KOICHI , NAKAJIMA HIROTO , YOSHIKAWA SATOSHI
IPC分类号： G06F9/06 , G06F9/45 , G06F21/22
摘要： PROBLEM TO BE SOLVED: To clarify the correspondence among a load module, source data needed to produce it and data such as project information and to manage the load module, the source data and the data such as project information. SOLUTION: A compiler 50 compiles source data 100 and generates and stores an object module, a compressing part 60 compresses the data 100 and project information 200 (compiler option, linker option and information necessary to load production such as load name to be generated) and acquires and stores a compressed source 150 and compressed project information 250, and a linker 58 links the object module, generates a load module 350, also unites the module 350, the source 150 and the information 250 into one and generates a source built-in type executable program 320. A header label 500 that is referred to when included load, source and project information are later extracted is attached to the program 320.

8. 发明专利

JP2000200819A TEST DATA ANALYZING SYSTEM AND TEST DATA ANALYZING METHOD 失效
公开(公告)号：JP2000200819A
公开(公告)日：2000-07-18
申请号：JP2000018004
申请日：2000-01-25
申请人： HITACHI LTD
发明人： ISHIKAWA SEIJI , SAKATA MASAO , NAKAZATO JUN , SHIMOSHA SADAO , NAGATOMO HIROTO , TANIGUCHI YUZO , SATO OSAMU , OKABE TSUTOMU , SAKAMOTO YUZABURO , MURAMATSU KIMIO , MATSUOKA KAZUHIKO , HASHIMOTO TAIZO , OYAMA YUICHI , EBARA YUTAKA , MIYAZAKI ISAO , HANASHIMA SHUICHI
IPC分类号： B65B57/10 , G01N21/956 , G01R31/26 , G06T1/00 , G06T7/00 , H01L21/66
摘要： PROBLEM TO BE SOLVED: To recognize a relation between a occurrence state of appearance failure of each chip and a product property of the chip, to analyze new data and to clarify a cause and effect relation between the appearance failure and the product property by analyzing data by chip unit. SOLUTION: A foreign substance data analyzing station 2 and an appearance failure data analyzing station 5 have chip arranging information for each product kind, to which chip an appearance failure belongs is judged by a detected appearance failure coordinate and how many appearance failures occurred is counted for each chip. The foreign substance data analyzing station 2 and the appearance failure data analyzing station 5 analyze based upon the number of outward failures, a coordinate and a number of appearance failures within the chip on a wafer. Also the foreign substance data analyzing station 2 and the appearance failure data analyzing station 5 analyze based upon the number of outward failures, a coordinate and the number of appearance failures within the chip and product property data for each chip read from a probe test data analyzing station 8 on the wafer.

9. 发明专利

JP2000200358A SYSTEM AND METHOD FOR ANALYZING INSPECTION DATA 失效
公开(公告)号：JP2000200358A
公开(公告)日：2000-07-18
申请号：JP2000018003
申请日：2000-01-25
申请人： HITACHI LTD
发明人： ISHIKAWA SEIJI , SAKATA MASAO , NAKAZATO JUN , SHIMOSHA SADAO , NAGATOMO HIROTO , TANIGUCHI YUZO , SATO OSAMU , OKABE TSUTOMU , SAKAMOTO YUZABURO , MURAMATSU KIMIO , MATSUOKA KAZUHIKO , HASHIMOTO TAIZO , OYAMA YUICHI , EBARA YUTAKA , MIYAZAKI ISAO , HANASHIMA SHUICHI
IPC分类号： B65B57/10 , G01N21/956 , G06T1/00 , G06T7/00 , H01L21/66
摘要： PROBLEM TO BE SOLVED: To enable analysis which suitably narrows down generation factors of an outward appearance defect by discriminating and outputting which of 1st to 3rd inspecting processes an outward appearance defect detected in the 3rd inspecting process is detected in for the 1st time. SOLUTION: An analysis unit which processes the inspection result of an inspecting device and outputs the result stores coordinate data of an outward appearance defect detected in a 1st or 2nd inspecting process for the 1st time and compares them with coordinate data of an outward appearance detect detected in the 3rd inspecting process. Then which of the 1st, 2nd, and 3rd inspecting processes the outward appearance detect is detected in for the 1st time is discriminated and outputted. For display, a bar graph is drawn by taking the number of foreign matters on a longitudinal axis 1096 and process names on a lateral axis 1095. The process names are arranged in order from the oldest one from the left. For the bar graph, the sticking processes A, B and C are painted in the same colors by the processes or meshed by layers 1100 to 1102 and the upper and lower lines of the parts are connected by lines.

10. 发明专利

JPH1084021A METHOD OF MANUFACTURING ELECTRONIC DEVICE 失效
公开(公告)号：JPH1084021A
公开(公告)日：1998-03-31
申请号：JP20881097
申请日：1997-08-04
申请人： HITACHI LTD
发明人： ISHIKAWA SEIJI , SAKATA MASAO , NAKAZATO JUN , SHIMOSHA SADAO , NAGATOMO HIROTO , TANIGUCHI YUZO , SATO OSAMU , OKABE TSUTOMU , SAKAMOTO YUZABURO , MURAMATSU KIMIO , MATSUOKA KAZUHIKO , HASHIMOTO TAIZO , OYAMA YUICHI , EBARA YUTAKA , MIYAZAKI ISAO , HANAJIMA SHUICHI
IPC分类号： G01N21/88 , G01N21/94 , G01N21/956 , G06T1/00 , G06T7/00 , H01L21/66
摘要： PROBLEM TO BE SOLVED: To make feasible the data analysis per chip unit by a method wherein the whole manufacturing line is monitored by a foreign matter inspection instrument at rapid inspection rate so as to inspect around any abnormality shown part by a visual inspection instrument for monitoring the defect developed amount. SOLUTION: In a clean room 13, a foreign matter inspection instrument 1 measuring the numbers of visual defects and the coordinates thereof on a produced wafer, a visual inspection instrument 4 exhibiting the performance of measuring the numbers of visual defects on the produced wafer and the performance of recognizing the kinds of the visual defectives as well as a probe inspection instrument 7 inspecting the produced chip characteristics are installed. Besides, these instruments 1, 4, 7 are provided with the data analysis stations 2, 5, 8 so that the whole manufacturing line may be monitored by the foreign matter inspection instrument 1 so as to inspect an abnormality shown part by the visual inspection instrument 4 for monitoring the defective developed amount. Through these procedures, the data analysis per chip unit can be precisely performed.

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