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    • 5. 发明专利
    • SEMICONDUCTOR DEVICE AND MANUFACTURE THEREOF
    • JPH06244415A
    • 1994-09-02
    • JP2773093
    • 1993-02-17
    • HITACHI LTD
    • KIMURA SHINICHIROKURE TOKUONODA HIROMASA
    • H01L29/78H01L21/336H01L29/784
    • PURPOSE:To prevent the increase in parastic capacitance and the decrease in carrier mobility to decrease the resistance of a diffused layer by making the gate electrode, formed in a groove, with a gate insulation film in between, contact a diffusion layer, so as to establish contact with the diffused layer by a high conduction layer. CONSTITUTION:With a silicon oxide film 6 and a silicon nitride film 5 as a mask, the exposed part of a semiconductor substrate 1 is etched by RIE for forming a groove, and a gate silicon oxide film 10 is formed inside the groove, and using a CVD method, a conduction film 11 is formed all over it. Arsenic is implanted into the substrate 1 so that a diffused layer is formed. Thus, the depth at the corner of the groove gate 11 agrees with that of the diffused layer 12. Then, after a silicon oxide film is formed all over it, full surface anisotropic etching is done to leave a silicon oxide film 13 on a side wall of the gate electrode 1 as it is, so the surface of the substrate 1 or base material is exposed, and then after arsenic is ion-implanted for forming a high concentration diffused layer 14, thermal treatment is done for a metal film to be deposited all over it, and then, etching is made so that a silicide film 15 is left as it is only on the diffused layers 12 and 14 and the gate electrode 11.
    • 9. 发明专利
    • CLOCK GENERATING CIRCUIT
    • JPH11312025A
    • 1999-11-09
    • JP11768898
    • 1998-04-28
    • HITACHI LTDHITACHI ULSI SYS CO LTD
    • NODA HIROMASANAGASHIMA YASUSHIAOKI MASAKAZUTANAKA HITOSHI
    • G06F1/04G06F1/10G11C11/407H03K3/02H03K5/135H03L7/00H04L7/00
    • PROBLEM TO BE SOLVED: To form an inside clock signal of 50% duty factor with a simple configuration, and to highly precisely form an outside synchronizing clock pulse high in responsiveness. SOLUTION: The coincidence of a delay signal in each stage transmitted through a delay circuit DL1 having large time resolution with the clock edge delayed by one clock of an input pulse is detected by an edge detecting circuit ED1, and the delay input clock pulse is transmitted through a delay circuit DL2 so that the same number of delay stages of the delay circuit DL1 can be obtained with the edge detection signal. In the same way, the clock pulse is transmitted through a delay circuit DL3 so that the same number of stages as that of the delay circuit DL2 can be obtained, and the output pulse of the delay circuit DL2 is inputted to a delay circuit DL4, and the coincidence of the delay signal in each stage transmitted through the delay circuit DL4 having small time resolution with the clock edge delayed by two clocks of the input pulse is detected by an edge detecting circuit ED2. Then, an inside clock signal is formed of the delay signal of the delay circuit DL4, and the delay time of a dummy delay circuit is made equal to the synthetic delay time of an input buffer circuit and a clock generating circuit.