专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

1. 发明专利

JP2004212355A Biological electron microscope and method of sample observation 审中-公开
标题翻译：生物电子显微镜和样品观察方法
公开(公告)号：JP2004212355A
公开(公告)日：2004-07-29
申请号：JP2003002724
申请日：2003-01-09
申请人： Hitachi High-Technologies Corp , Hitachi Ltd , 株式会社日立ハイテクノロジーズ , 株式会社日立製作所
发明人： KAKIBAYASHI HIROSHI , HOSOKI SHIGEYUKI , TAKAGI YUJI , MIYAKE AKIRA , NAKAMURA KUNIYASU , SATO MITSUGI , KOBAYASHI HIROYUKI
IPC分类号： G01N23/04 , G01N1/28 , G01N23/225 , G01N33/483 , G01N37/00 , H01J37/20 , H01J37/22 , H01J37/26 , H01J37/28
CPC分类号： H01J37/22 , H01J37/26 , H01J2237/05 , H01J2237/2809 , H01J2237/2813
摘要： PROBLEM TO BE SOLVED: To implement a biological electron microscope and an observation method capable of observing a biosample with high contrast, without significant damages, and of analyzing images with high precision, and performing high-throughput sample pretreatments. SOLUTION: (1) Observation is performed by an accelerating voltage 1.2 to 4.2 times the sample transmission critical accelerating voltage of electron beams which is determined under prescribed conditions. (2) An E×B type energy filter of a compact and simple structure is provided between the sample and an electron beam detector, and an image is formed by electron beams existing within a specific energy region among electron beams transmitted through the sample. (3) Quantitative analysis is carried out by image processings on similarities among observed images of viruses, proteins, etc. in the sample and reference images of known viruses, proteins, etc. (4) A biosample pretreatment protocol is formed into a chip through the use of the MEMS technology, and the chip is mounted on a sample stage part of the electron microscope and will carry out introduction, pretreatment, and until the transfer of the sample to a sample holder. COPYRIGHT: (C)2004,JPO&NCIPI
摘要翻译：要解决的问题：实现能够以高对比度观察生物样品，没有显着损害和高精度分析图像并进行高通量样品预处理的生物电子显微镜和观察方法。解决方案：（1）通过在规定条件下确定的电子束的样品传输临界加速电压的1.2〜4.2倍的加速电压进行观察。（2）在样品和电子束检测器之间提供了紧凑且简单的结构的E×B型能量过滤器，并且通过在穿过样品的电子束中存在于特定能量区域内的电子束形成图像。（3）通过图像处理对样品中的病毒，蛋白质等的观察图像和已知病毒，蛋白质等的参考图像之间的相似性进行定量分析。（4）生物样品预处理方案形成为芯片通过使用MEMS技术，将芯片安装在电子显微镜的样品台部分，并进行引入，预处理，直到样品转移到样品架上。版权所有（C）2004，JPO＆NCIPI

2. 发明专利

JP2000146781A SAMPLE ANALYSIS METHOD AND SAMPLE PREPARATION METHOD AND DEVICE THEREFOR 失效
公开(公告)号：JP2000146781A
公开(公告)日：2000-05-26
申请号：JP32772898
申请日：1998-11-18
申请人： HITACHI LTD
发明人： UMEMURA KAORU , KAKIBAYASHI HIROSHI , MITSUI YASUHIRO , NAKAMURA KUNIYASU , TOMIMATSU SATOSHI
IPC分类号： H01J37/20 , G01N1/28 , G01N1/32 , G01N23/04 , G01N23/225 , H01J37/26 , H01J37/28
摘要： PROBLEM TO BE SOLVED: To analyze a part of interest in the direction of the plane and the cross-section by machining a fine thin-piece sample into a sectional sample in a direction that is vertical to the surface of the thin-piece sample and observing the section by a transmission electron microscope(TEM) or scanning transmission electron microscope(STEM). SOLUTION: A calculation processing part 15 controls a stage control part 10, a transport means control part 11, a secondary particle detector control part 12, a deposition gas source control part 131, an FIB control part 14, and the like, and further can store or process SIM image information and image information from a TEM. In addition, an image display part 16 can display the TEM image and a processed image as well as the SIM image and further can display the SIM image processed by the processing part 15 and the TEM image while they are overlapped each other. Further, networking is made with a main computer as a center, and a sample shape and element information data by a sample-preparing device and the TEM can be registered in a database via a network, thus integrally controlling the SIM image, TEM image, and processed image and recalling the image information or the like.

3. 发明专利

JPH11250850A SCANNING ELECTRON MICROSCOPE, MICROSCOPE METHOD, AND INTERACTIVE INPUT DEVICE 失效
公开(公告)号：JPH11250850A
公开(公告)日：1999-09-17
申请号：JP9393498
申请日：1998-03-02
申请人： HITACHI LTD
发明人： NAKAMURA KUNIYASU , KAKIBAYASHI HIROSHI , ICHIHASHI MIKIO , ISAGOZAWA SHIGETO , SATO YUJI , HASHIMOTO TAKAHITO
IPC分类号： H01J37/22 , H01J37/04 , H01J37/147 , H01J37/28
摘要： PROBLEM TO BE SOLVED: To enhance operability and to detect a scattered electron image having an optional angle range to obtain a scanning transmission image by scanning focused primary electron beams to a sample, detecting secondary charged particles transmitted through or reflected from the sample, and obtaining a diffraction image transmitted through the sample. SOLUTION: Electron beams sent from an electron beam source 1 are accelerated with multistage electrostatic lenses 2a-2c. Accelerated electron beams are contracted with a first stage focusing lens 3a and a second stage focusing lens 3b. The electron beams are contracted with an object rear magnetic field lens 4 set in a strong excitation state, and finally, a probe having a sub-nanometer diameter is formed on a sample 5. Electron beams scattered on the inside of the sample 5 are passed through the sample 5, forms an electron beam diffraction pattern in the lower part of the sample 5, and the electron beam diffraction pattern is projected in the lower part of the object rear magnetic field lens 7. The current excitation of a first stage projection lens 8a and a second stage projection lens 8b installed in the lower stage of the object rear magnetic field lens 7 is varied to vary magnification of the electron beam diffraction pattern, to project the electron beam diffraction pattern in a scattered electron beam detector 9.

4. 发明专利

JPH08292164A ELECTRON MICROSCOPE AND THREE-DIMENSIONAL ATOMIC ARRANGEMENT OBSERVING METHOD 失效
公开(公告)号：JPH08292164A
公开(公告)日：1996-11-05
申请号：JP9920295
申请日：1995-04-25
申请人： HITACHI LTD
发明人： TOKIDA RURIKO , KAKIBAYASHI HIROSHI , NAKAMURA KUNIYASU , SEKIHARA KENSUKE , MOTOIKE JUN
IPC分类号： G01N23/04 , H01J37/22 , H01J37/28
摘要： PURPOSE: To accurately reconstitute a three-dimensional atomic arrangement structure in which artifacts are eliminated or reduced by specifying the direction of the oblique axis of a sample from a plurality of two-dimensional projection images and reconstituting a three-dimensional structure. CONSTITUTION: An electron beam 11 is incident to the positions of the sample 12 of an integrated element reduced in thickness. Scattering angle ranges α to β are so set to the high angle side of several tens mrad or more for mostly occupying thermal diffuse reflection electron beam that the image contrast corresponds to the quantity of scattered electron beam 15, the sample 12 is inclined 8 around an oblique axis and the quantity of the beam 15 is measured to obtain a plurality of two-dimensional projection images 13 observed from various directions. The axis 14 is specified by the image analysis of the plurality of the images 13, set as designing specifications, a two-dimensional sectional image 1 perpendicular to the images 13 is constructed from the plurality of the images 13, and the three-dimensional atomic arrangement image constituted by stacking them is analyzed. Thus, the impurity atom in the sample 12 crystal and the three-dimensional structure of its cluster can be analyzed at the level of one atom.

5. 发明专利

JPH08106873A ELECTRON MICROSCOPE DEVICE 失效
公开(公告)号：JPH08106873A
公开(公告)日：1996-04-23
申请号：JP23978494
申请日：1994-10-04
申请人： HITACHI LTD
发明人： KAKIBAYASHI HIROSHI , NAKAMURA KUNIYASU , TOKIDA RURIKO
IPC分类号： H01J37/20 , H01J37/22
摘要： PURPOSE: To precisely and automatically correct a slippage by providing a sample rotating mechanism, a sample moving mechanism, and their control means, and receiving a generated position correcting signal to return an area to be observed to the space position before the inclination of a sample. CONSTITUTION: The inclination of an actual sample 14 is kept in 0 deg., a sample moving mechanism 5 is driven by a CPU 11 while observing its electron microscopic image on a display to move a specified area to be observed to the center of the visual field. The sample, 14 is then inclined by a required angle by a sample rotating mechanism 6, the slippage of the required angle is determined on the basis of the preliminarily stored slippage information by the CPU, and a position correcting signal of the value of the reversed sign is generated and transmitted to a sample moving mechanism control system 8. The control system 8 moves the position of the actual sample 14 so that the area to be observed after inclination is returned to the space position before inclination. Thus, the crystal structure of the sample can be regularly observed with a high magnification and the same visual field normal focus.

6. 发明专利

JP2008262921A Three-dimensional structure observation sample formation device, electron microscope, and its method 审中-公开
标题翻译：三维结构观察样品形成装置，电子显微镜及其方法
公开(公告)号：JP2008262921A
公开(公告)日：2008-10-30
申请号：JP2008182177
申请日：2008-07-14
申请人： Hitachi Ltd , 株式会社日立製作所
发明人： TOKIDA RURIKO , KAKIBAYASHI HIROSHI , TAKAGUCHI MASANARI , NAKAMURA KUNIYASU
IPC分类号： H01J37/20
摘要： PROBLEM TO BE SOLVED: To provide an electron microscope sample formation device for observing a three-dimensional structure of a desired portion in a semiconductor device machined finely, and an electron microscope and its method.
SOLUTION: The sample formation device uses a dicer for machining of a sample piece 10, and uses a focusing ion beam processing for process of cutting out the portion of observation subject on the sample piece in a projection shape, and fixes the sample piece 10 on a single-axis omnidirectional leaning sample holder by making the center axis of the projection 11 and the sample leaning axis Z coincide, and uses the TEM image formed by electrons diffused in high angles to make a reconstruction of the image structure.
COPYRIGHT: (C)2009,JPO&INPIT
摘要翻译：解决的问题：提供一种用于观察精细加工的半导体器件中所需部分的三维结构的电子显微镜样品形成装置和电子显微镜及其方法。解决方案：样品形成装置使用切片机来加工样品10，并且使用聚焦离子束处理来将样品上的观察对象部分切割成投影形状，并将样品通过使突起11的中心轴和样品倾斜轴Z重合，在单轴全向倾斜试样保持器上使用由高度扩散的电子形成的TEM图像来重构图像结构。版权所有（C）2009，JPO＆INPIT

7. 发明专利

JP2002184336A CHARGED PARTICLE BEAM MICROSCOPE DEVICE, CHARGED PARTICLE BEAM APPLICATION DEVICE, CHARGED PARTICLE BEAM MICROSCOPIC METHOD, CHARGED PARTICLE BEAM INSPECTION METHOD AND ELECTRON MICROSCOPE 失效
公开(公告)号：JP2002184336A
公开(公告)日：2002-06-28
申请号：JP2000377027
申请日：2000-12-12
申请人： HITACHI LTD
发明人： NAKAMURA KUNIYASU , KANDA KIMIO , SATO MITSUGI , ICHIHASHI MIKIO , SHINADA HIROYUKI , TOKIDA RURIKO
IPC分类号： G03F7/20 , H01J37/141 , H01J37/147 , H01J37/153 , H01J37/28 , H01L21/027
摘要： PROBLEM TO BE SOLVED: To provide an electron microscope device using a short focus objective lens that enables acquiring a good image of high resolution without any distortion in a wide range from low magnification to high magnification at the observation in low acceleration voltage condition. SOLUTION: In the electron microscope device that is constructed of an electron source 1, a focus lens 2, an upper stage deflection coil 4, a lower stage deflection coil 5, an objective lens 7, and a correction magnetic field lens 9 for electron beam deflection or the like, the distortion aberration that is generated in the objective lens 7 is cancelled by the reverse direction distortion aberration caused by the correction magnetic field lens 9 for electron deflection, and a good scanning electron microscopic image having a high resolution without any distortion in a wide range from low magnification to high magnification is obtained.

8. 发明专利

JP2000188077A SCANNING ELECTRON MICROSCOPE 失效
公开(公告)号：JP2000188077A
公开(公告)日：2000-07-04
申请号：JP36405898
申请日：1998-12-22
申请人： HITACHI LTD
发明人： NAKAMURA KUNIYASU , KAKIBAYASHI HIROSHI , ICHIHASHI MIKIO , ISAGOZAWA SHIGETO , SATO YUJI , HASHIMOTO TAKAHITO
IPC分类号： H01J37/09 , H01J37/28 , H01J37/295
摘要： PROBLEM TO BE SOLVED: To observe defects other than a sample matrix on a scanning transmission image or impurities at high contrast by two-dimensionally scanning a fine probe formed with a convergent lens and an objective lens by accelerating an electron beam with an electrostatic lens, and masking specified electron beams with a moving diaphragm installed on a detector for detecting the intensity of scattered electron beams. SOLUTION: Electron beams are reduced through first to third step lenses 2a-2c for accelerating to a predetermined voltage, first and second convergent lenses 3a, 3b, and an objective front magnetic field lens 4, and a probe on a sample 5 changes an aperture angle with a convergent diaphragm 6. An electron beam diffraction pattern formed after transmitting the sample 5 changes magnification with first and second step projection lenses 8a, 8b, projects to an electron beam detector 9, and is modulated in brightness. First and second step detector diaphragms 12a, 12b in the lower part of the second step projection lens 8b move in about four steps, have many kinds of mask patterns such as an electron beam diffraction pattern or round holes, mask a substrate crystal relating part, and enhance contrast in other part.

9. 发明专利

JP2006153894A Observation apparatus and method using electron beam 有权
标题翻译：观察装置和使用电子束的方法
公开(公告)号：JP2006153894A
公开(公告)日：2006-06-15
申请号：JP2006058855
申请日：2006-03-06
申请人： Hitachi Ltd , 株式会社日立製作所
发明人： TAKAGUCHI MASANARI , NAKAMURA KUNIYASU , UMEMURA KAORU , TANIGUCHI YOSHIFUMI , ICHIHASHI MIKIO
IPC分类号： G01N23/20 , H01J37/28
摘要： PROBLEM TO BE SOLVED: To provide an apparatus, a technique, and a method for two-dimensional distributions and measuring distortions and stress, having nanometer resolution of each type of crystal sample through the use of diffraction images observed by an electronic microscope.
SOLUTION: Electron beams are irradiated in minute amount and in parallel to a sample. The distances, between the spots of a diffraction image reflecting a crystal structure acquired by the irradiation, are measured by an image detector or a position detector. A two-dimensional stress distribution is superimposed on the measured positional information and displayed on an enlarged image of an electronic microscope. Distortions and stresses in minute crystals can be displayed at a high resolution and at a high speed in matching structural information of the sample.
COPYRIGHT: (C)2006,JPO&NCIPI
摘要翻译：要解决的问题：提供一种用于二维分布和测量失真和应力的装置，技术和方法，通过使用电子显微镜观察到的衍射图像，具有每种类型的晶体样品的纳米分辨率。解决方案：电子束以微量和平行于样品照射。通过图像检测器或位置检测器测量反射通过照射获得的晶体结构的衍射图像的光点之间的距离。将二维应力分布叠加在所测量的位置信息上并显示在电子显微镜的放大图像上。微分晶体中的变形和应力可以以高分辨率和高速显示，以匹配样品的结构信息。版权所有（C）2006，JPO＆NCIPI

10. 发明专利

JP2004301851A Device for manufacturing sample for observing three-dimensional structure, electron microscope and sample manufacturing method using the device 审中-公开
公开(公告)号：JP2004301851A
公开(公告)日：2004-10-28
申请号：JP2004166546
申请日：2004-06-04
申请人： Hitachi Ltd , 株式会社日立製作所
发明人： TOKIDA RURIKO , KAKIBAYASHI HIROSHI , TAKAGUCHI MASANARI , NAKAMURA KUNIYASU
IPC分类号： G01N23/04 , G01N1/28 , G01N1/32 , H01J37/20 , H01J37/22 , H01J37/26 , H01J37/317
摘要： PROBLEM TO BE SOLVED: To provide a sample manufacturing device for an electron microscope for observing the three-dimensional structure of a desired place in a finely processed semiconductor device, and to provide the electron microscope and a sample manufacturing method using the device. SOLUTION: A dicer is used for processing a sample piece 10 and converged ion beam processing is used in processing for shaving off the part to be observed of the sample piece 10 into a projected shape. The sample piece 10 is fixed to an uniaxial ominidirectionally inclined sample holder so that the center axis of the projection 11 formed coincides with the inclined axis Z of the sample piece and a TEM image formed by electrons scattered at a high angle is used as a projection image to perform reconstitution. COPYRIGHT: (C)2005,JPO&NCIPI

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式