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1. 发明专利

JPS6233762A VACUUM DEPOSITION DEVICE 失效
公开(公告)号：JPS6233762A
公开(公告)日：1987-02-13
申请号：JP17173685
申请日：1985-08-06
申请人： HITACHI LTD
发明人： JINNO YUKISHIGE , HIRAISHI NOBUYUKI , IWABORI YASUO , OGAMI MICHIO , KATAHIRA MICHINORI
IPC分类号： C23C14/24
摘要： PURPOSE:To simplify the mechanism of a vacuum deposition device and to reduce the size of a vacuum vessel by continuously supplying a molten vapor deposition material through a transport pipe by a differential pressure from a reservoir part installed to the atm. side to a crucible for vapor deposition disposed in the vacuum vessel. CONSTITUTION:This vapor deposition device is constituted by supplying the molten vapor deposition material 1A obtd. by heating and melting the vapor deposition material 1 in the reservoir part 2 installed to the atm. side to the crucible 3 for vapor deposition disposed in the vacuum vessel 6 having a vacuum evacuation device 7 through the transport pipe 4 and further evaporating the same by heating to deposit the material by evaporation on a substrate 9 on a substrate holder 8. The molten vapor deposition material 1A in the reservoir part 2 of the above-mentioned device is continuously supplied to the crucible 3 by the differential pressure P0-P1 between the atm. pressure P0 and the pressure P1 in the crucible. The pressure is preferably balanced at all times in such a manner as to maintain P0-P1=DELTAP+rhoDELTAH as the fluid resistance DELTAP of the molten vapor deposition material 1A in the transport pipe 4, the head difference DELTAH between the crucible 3 and the reservoir part 2 and the density rhoof the material 1A.

2. 发明专利

JPS61233948A ANALYZER FOR GRAIN BOUNDARY RUPTURE IN VACUUM 失效
公开(公告)号：JPS61233948A
公开(公告)日：1986-10-18
申请号：JP7423885
申请日：1985-04-10
申请人： HITACHI LTD
发明人： JINNO YUKISHIGE , KATAHIRA MICHINORI , OKAJIMA YOSHIAKI , HATTORI SHIGEO , HOSOI NORIFUNE
IPC分类号： H01J37/20 , H01J37/252
摘要： PURPOSE:To accurately compare the characteristics of the surfaces of various test pieces with each other, by housing the plural test pieces in a chamber at one time, and rupturing and analyzing the test pieces in the same environment. CONSTITUTION:A housing chamber 1, into which a plurality of test pieces 4 are put from an atmospheric side, is removed of air by a vacuum pump 5. A rupturing chamber 2, in which a rupturing rod 9 for rupturing the test pieces is housed, is removed of air by a vacuum pump 6. An analyzing chamber 3, in which an analyzer 10 and a conveyor 19 employing a permanent magnet are housed, is removed of air by a vacuum pump 7. The test pieces 4 are conveyed between the housing chamber 1 and the rupturing chamber 2 by a conveyor 2 employing a pinion-rack mechanism. The plural test pieces can thus be put in the housing chamber at one time and ruptured and analyzed in the same environment to enhance the efficiency of work and accurately compare the physical properties of the surfaces of the various test pieces with each other.

3. 发明专利

JPS60157514A ROTARY BEARING PROVIDED WITH ROTARY DISPLACEMENT DETECTOR 失效
公开(公告)号：JPS60157514A
公开(公告)日：1985-08-17
申请号：JP1183584
申请日：1984-01-27
申请人： HITACHI LTD
发明人： OOMORI TSUNEHIKO , KATAHIRA MICHINORI , ICHIKAWA YOSHIAKI , NIREI YASUYUKI
IPC分类号： F16C41/00 , B25J13/08 , B25J17/00 , G01D5/245
摘要： PURPOSE:To enable to apply the titled detector to a rotary part of an industrial robot by making the titled detector possess both a bearing function of a rotary shaft and a rotary position detecting function, by providing a rotary displacement detector on a rotary bearing unitarily, in the rotary bearing provided with an inner and outer rings. CONSTITUTION:A rotary bearing, for example, a ball bearing is provided with an outer and inner rings 1, 7. In this case, the outer ring 1 is provided with a magnetism detecting head 9, the inner ring 7 is provided with a coded ring 6 to which a code based on the magnetism is recorded and a groove part of the outer ring 1 is provided with a stress detecting mechanism based on a strain gauge 12. With this construction, the titled bearing can detect highly accurately a rotary position, bending stress and thrust stress while it is functioning as the rotary bearing of a joint part and a rotary part of a robot especially.

4. 发明专利

JPS63133518A DEPOSITION DEVICE 失效
公开(公告)号：JPS63133518A
公开(公告)日：1988-06-06
申请号：JP27958386
申请日：1986-11-26
申请人： HITACHI LTD
发明人： JINNO YUKISHIGE , HIRAISHI NOBUYUKI , IWABORI YASUO , OGAMI MICHIO , KATAHIRA MICHINORI
IPC分类号： H01L21/285 , H01L21/203 , H01L21/26
摘要： PURPOSE:To control the film thickness to be distributed evenly while making the title device compact by a method wherein, when multiple layer films are formed using multiple cluster ion guns, cluster ion is deflected by a deflection magnetic pole to enter into the surface of substrate making a right angle therewith. CONSTITUTION:Aluminium and a silicon are respectively contained in a crucible in cluster ion guns 45a, and 45b. Then, after vacuum exhausting a vacuum chamber 1 by a vacuum exhausting equipment, aluminum cluster ion is jetted by the cluster ion gun 45a. This aluminum ion is deflected by a deflector magnetic pole 60 to enter into the surface of substrate 18 making a right angle therewith so that the aluminum cluster ion may be formed evenly on the surface of substrate 18 held by a holder 22. Finally, after aluminum filming process is finished, the cluster ion of silicon is likewise jetted by the cluster ion gun 45b to be filmed on the aluminum film on the surface of substrate 18 after being deflected by the deflector magnetic pole 50.

5. 发明专利

JPS58155666A FUEL CELL 失效
公开(公告)号：JPS58155666A
公开(公告)日：1983-09-16
申请号：JP3796782
申请日：1982-03-12
申请人： HITACHI LTD
发明人： TAKAHASHI ISAO , TAKEUCHI MASAHITO , OKADA HIDEO , OKABE SHIGERU , HIDA HIROSHI , TONAMI MUNEHIKO , KATAHIRA MICHINORI
IPC分类号： H01M8/02
摘要： PURPOSE:To improve the dispersibilities of a fuel and an oxidant, and provide a fuel cell which has a battery frame which can be effectively made in contact with the electrode surface by forming a current-collecting body by stacking plural pieces of thin plates which have an arbitrary number of opening holes and have an electric conductivity. CONSTITUTION:On a battery frame 12, diamond-crossing stacked current-collecting bodies 15 and 16 are provided alternately, with gas-separating plates 14 provided between them, and joined together by either a diffusion joint or an eutectic-crystal pressure contact so as to form a fuel chamber 17, which has an electric conductivity. The peripheral part 13 of the battery frame 12 is provided with fuel-inlet-side paths 18 and fuel-outlet-side paths 19. An oxidant chamber, which is provided in the center of the back surface of the battery frame 12, is formed by arranging diamond-crossing stacked current-collecting bodies 15 and 16 of the fuel chamber 17. Both oxidant-inlet-side paths 20 and oxidant- outlet-side paths 21 are connected to the oxidant chamber provided on the back surface of the battery frame 12.

6. 发明专利

JPS6487768A MULTIFUNCTION VACUUM PLATING DEVICE 失效
公开(公告)号：JPS6487768A
公开(公告)日：1989-03-31
申请号：JP24249087
申请日：1987-09-29
申请人： HITACHI LTD
发明人： SUZUKI YOSHIHIRO , TAKAHASHI AKIO , NARAHARA TOSHIKAZU , FUYAMA MORIAKI , KATAHIRA MICHINORI , KUROIWA MINORU
IPC分类号： C23C14/34
摘要： PURPOSE:To form multi-layered films by the same vacuum vessel and to form the inorg. films having high purity by segmenting a vacuum plating chamber to org. film and inorg. film forming regions, providing targets to the respective regions and constructing a device in such a manner that a substrate can be opposed to either of the targets at proper times. CONSTITUTION:A copper film is formed by sputtering on, for example, the polytetrafluoroethylene (PTFE) substrate 6. The substrate 5 faces the PTFE target 5 in the figure. A substrate rotating and mounting jig 9 is rotated to direct the substrate toward a copper target 4 electrode 3 side in the case of forming the copper film. Sputtering is then executed under prescribed conditions to form the copper film on the substrate 6. The target 6 is kept mounted to the jig 9 and is opposed in this state to the target 5. The sputtering is then executed under the prescribed conditions to form the PTFE film on the copper film. The contamination in the inorg. film forming chamber 7 is suppressed by providing a partition plate 2 and adequately maintaining the spacing between the inside circumference and the jig 9.

7. 发明专利

JPS62225936A X-RAY SPECTROSCOPY 失效
公开(公告)号：JPS62225936A
公开(公告)日：1987-10-03
申请号：JP6835086
申请日：1986-03-28
申请人： HITACHI LTD
发明人： USAMI KATSUHISA , KATAHIRA MICHINORI , OMORI TSUNEHIKO , MINAGAWA TADASHI
IPC分类号： G01N23/22
摘要： PURPOSE:To simplify a mechanism, by making a spectral crystal perform special actions to permit various devices set at an X-ray concentration point and therebehind to perform a fixed linear motion after the spectroscopy. CONSTITUTION:A straight line passing through a point S of an X rays source 1 and a point D of a spectral slit 3 are defined as X axis, an axis vertical to the X axis passing through the point S, Y axis and the center coordinate of a spectral crystal 2, C (x, y). When acute angleSTC=acute angleCSD=theta is varied while the crystal 2 is held on a Rowland circle with the radius R, the point C depicts a circular locus as given as x +(y-R) =R . Therefore, when a scanning is done so that the point (C) will move on the circumference of the circle to ensure that normal at the point C is always vertical to the X-axis, the crystal 2 can always stay on the Rowland circle with the radius R so that X rays can be concentrated on the point D by an angle corresponding to the size of the crystal at a desired angle theta while the point D always exists on the X-rays separated by the distance of 2x from a point 1.

8. 发明专利

JPS61141115A Semiconductor manufacturing equipment 失效
标题翻译：半导体制造设备
公开(公告)号：JPS61141115A
公开(公告)日：1986-06-28
申请号：JP26274384
申请日：1984-12-14
申请人： Hitachi Ltd
发明人： JINNO YUKISHIGE , KATAHIRA MICHINORI , NAGANUMA RYOICHI , OKAJIMA YOSHIAKI , HATTORI SHIGEO , HOSOI KISHIYUU
IPC分类号： H01L21/677 , C23C14/56 , H01L21/02
CPC分类号： H01L21/02
摘要： PURPOSE:To obtain the semiconductor manufacturing equipment employing a substrate conveyer which is small-sized and easy of operation by providing the device with a reaction chamber, a partition panel for keeping a hermetic state of a reaction chamber, a load-unload chamber for containing the substrates temporarily, a vacuum exhaust device, and the substrate conveyer. CONSTITUTION:A substrate 4 is inserted into a load-unload chamber 2 from the atmosphere and is set on a substrate conveyer 5. The air inside of the chamber 2 is exhausted to a vacuum by a vacuum exhaust device 8. When the degree of vacuum reaches the same value of a reaction chamber, a partition valve 3 opens and allows the substrate conveyer 5 to transfer the substrate 4 from the chamber 2 to the reaction chamber 1. After the substrate 4 is delivered to a substrate holder 6 or the like, the conveyer 5 withdraws into the load-unload chamber 2 and the partition valve 3 is closed. When the treatment is finished, the valve 3 is opened and the substrate conveyer 5 transfers the substrate 4 from the reaction chamber 1 to the load-unload chamber 2. After closing the valve 3, the load-unload chamber 2 is opened to the atmosphere and the substrate 4 is taken out from the chamber 2 to the atmosphere.
摘要翻译：目的：为了获得采用基板输送机的半导体制造设备，该基板输送机通过提供具有反应室的小型且容易的操作，用于保持反应室的气密状态的分隔板，用于容纳基板临时，真空排气装置和基板输送机。构成：将基板4从大气中插入卸载室2，并设置在基板输送机5上。室2内的空气被真空排气装置8排出至真空。当真空度达到反应室的相同值，分隔阀3打开，并允许基板输送机5将基板4从室2转移到反应室1.在将基板4输送到基板保持器6等之后，输送机5退出到卸载室2中，分隔阀3关闭。处理结束后，阀3打开，基板输送机5将基板4从反应室1输送到卸载室2.在关闭阀3之后，将负载室2向大气开放并且将基板4从室2取出到大气。

9. 发明专利

JPS58111249A SPARK SOURCE MASS SPECTROGRAPH 失效
公开(公告)号：JPS58111249A
公开(公告)日：1983-07-02
申请号：JP20707581
申请日：1981-12-23
申请人： HITACHI LTD
发明人： OOMORI TSUNEHIKO , KATAHIRA MICHINORI , KOYAMA SUSUMU , OKAJIMA YOSHIAKI
IPC分类号： G01N27/62 , H01J49/04 , H01J49/18 , H01J49/26
摘要： PURPOSE:To facilitate exchange of a sample, maintain an ion source chamber highly vacuum, and increase the analytical accuracy and the analytical efficiency of a spark source spectrograph by moving back a fitted disk plate after the whole analysis of the samlpe is finished, and revolving the fitted disk plate in that position. CONSTITUTION:A spark source mass spectrograph has a suspension plate 21 which is silidingly attached to the central shaft of a fitted disk plate 11, a metallic suspension member 20 retatably supporting the upper part of the plate 21, a sliding shaft 19 which supports the member 20 and penerates a supporter 17 installed on the upper surface of an ion source case 13, and a shaft-end supporting member 18. When a sample 1 is switched with the case 13 sealed, the movements of the sliding members 18 and 19 are prevented, and the fitted disk plate 11 is rotated. When the entire sample 1 is exchanged, the rotation of the suspension plate 21 is prevented, the plate 21 is linearly moved back to a given position, and the plate 21 is rotated in this state. In addition, an ion source chamber 10 is maintained highly vacuum. By the means mentioned above, the analytical accuracy and analytical efficiency of the mass spectrograph can be widely increased.

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