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1. 发明专利

JP2502977B2 失效
公开(公告)号：JP2502977B2
公开(公告)日：1996-05-29
申请号：JP8792886
申请日：1986-04-18
申请人： HITACHI LTD
发明人： AKIBA MASAKUNI , TAKAGAKI TETSUYA , TAKEUCHI YASUMASA , KOBAYASHI AKIHIRO , NAKAMURA HIROSHI
IPC分类号： H01L21/205 , H01L21/22 , H01L21/31

2. 发明专利

JPH0636408B2 失效
公开(公告)号：JPH0636408B2
公开(公告)日：1994-05-11
申请号：JP5603284
申请日：1984-03-26
申请人： HITACHI LTD
发明人： AKIBA MASAKUNI , MAEJIMA HIROSHI , TAKAGAKI TETSUYA , SHIDA HIROYUKI
IPC分类号： H01L21/677 , H01L21/205 , H01L21/31 , H01L21/67

3. 发明专利

JPH0335824B2 失效
公开(公告)号：JPH0335824B2
公开(公告)日：1991-05-29
申请号：JP27888184
申请日：1984-12-28
申请人： HITACHI LTD
发明人： AKIBA MASAKUNI , NAGATOMO HIROTO
IPC分类号： H01L21/22 , H01L21/223 , H01L21/677

4. 发明专利

JPH02304920A PLASMA TREATER 失效
公开(公告)号：JPH02304920A
公开(公告)日：1990-12-18
申请号：JP12432789
申请日：1989-05-19
申请人： HITACHI LTD
发明人： WATANABE SEIICHI , KAKEHI YUTAKA , AKIBA MASAKUNI , KANAI SABURO
IPC分类号： C23F4/00 , H01L21/205 , H01L21/302 , H01L21/3065 , H01L21/31
摘要： PURPOSE:To reduce direct exposure to plasma of a silicone resin, etc., and to prevent the contamination of a heavy metal such as Sn included in the silicone resin, etc., by using a heater having laminating structure, into which the thin-film heater is buried. CONSTITUTION:A substrate 10 is heated by supplying electricity to a thin-film resistor 11 through wirings 12. A cover 13 made of quartz is bonded with the substrate 10, to which the thin-film resistor 11 is formed, by using adhesives 14 such as a silicone resin, thus constituting a heater having laminating structure, into which the thin-film heater is buried. Accordingly, direct exposure to plasma of the silicone resin, etc., is reduced, and the contamination of a heavy metal such as Sn contained in a trace quantity in the silicone resin, etc., can be prevented.

5. 发明专利

JPH0241173B2 失效
公开(公告)号：JPH0241173B2
公开(公告)日：1990-09-14
申请号：JP12299381
申请日：1981-08-07
申请人： HITACHI LTD
发明人： AKIBA MASAKUNI , NAGATOMO HIROTO
IPC分类号： G01R31/26 , H01L21/66

6. 发明专利

JPS6480786A VACUUM PUMP 失效
公开(公告)号：JPS6480786A
公开(公告)日：1989-03-27
申请号：JP23481187
申请日：1987-09-21
申请人： HITACHI LTD
发明人： AKIBA MASAKUNI
IPC分类号： F04C18/16 , F04C18/08 , H01L21/205
摘要： PURPOSE:To prevent the rotation stop of a screw due to the sticking of a foreign object or the like by forming at least either spiral screws or the inner wall face of a casing facing them with a rugged surface. CONSTITUTION:Rotors 3a, 3b are constituted in a pair, one rotor 3a has a valley-shaped spiral screw 21a, and the other rotor 3b has a ridge-shaped spiral screw 21b. When suction is performed from the processing space with a vacuum pump, a foreign object in the processing space may be mingled in the air A to infiltrate into a rotor space 4. If the sticking and accumulation of the foreign object proceeds to some degree, the foreign object is cut from the inside face 4a of the rotor space by the rugged shape of a groove section 22a provided on the peripheral face of the screw 21a, and the cut chips 30a are discharged to the outside of the rotor space 4 through an exhaust port 6 together with the air A.

7. 发明专利

JPS63238281A WAFER TREATING DEVICE AND MICROMANOMETER USED THEREFOR 失效
公开(公告)号：JPS63238281A
公开(公告)日：1988-10-04
申请号：JP7143487
申请日：1987-03-27
申请人： HITACHI LTD
发明人： AKIBA MASAKUNI
IPC分类号： H01L21/66 , C23C16/52 , H01L21/31
摘要： PURPOSE:To control automatically the pressure in a reaction chamber with satisfactory accuracy and sensibility by providing a micromanometer capable of transducing the pressure change in the reaction chamber into an electric signal to the evacuation system of the reaction chamber. CONSTITUTION:A gaseous reactant 26A is introduced into the reaction chamber 19 from the upper part, the exhaust gas 26B is discharged from the evacuation system 38 to keep the inside of the reaction chamber 19 at a specified pressure, a wafer 22 on a susceptor 21 is heated by a heater 24, rotated, and revolved, and a thin film is formed on the wafer 22. At this time, the micromanometer 33A is connected to the evacuation system 38 through a pressure detecting boat 34A, and the micromanometer 33A is also connected to the atmosphere 30 through a pressure detecting boat 35A. Under such a constitution, when the pressure in the reaction chamber 19 is changed, the change in the flow rate of the atmosphere 30 is transduced by the micromanometer 33A into an electric signal which is sent to a control part 37A, a driving motor 28 and an exhaust fan 25 are controlled, the opening degree of an exhaust pressure control damper 27 and the rotational speed of the exhaust fan 25 are changed, and the pressure in the reaction chamber 19 is automatically controlled.

8. 发明专利

JPS62280366A DECOMPRESSION CHEMICAL VAPOR PHASE DEPOSITION DEVICE 失效
公开(公告)号：JPS62280366A
公开(公告)日：1987-12-05
申请号：JP12336486
申请日：1986-05-30
申请人： HITACHI LTD
发明人： TSUTSUMI YOSHIAKI , UEDA SHINJIRO , AKIBA MASAKUNI , KAWANABE TAKAO , MIHASHI SHINJI , OSAKABE ICHIRO , NAYA KOTARO
IPC分类号： H01L21/205 , C23C16/44 , C23C16/455 , C30B25/14
摘要： PURPOSE:To reduce the back diffusion of oil from an exhaust pump side and to decrease the oil pollution in a reaction pipe by providing an ejector driven by gas fed from the gas line of a gas feed pipe for dilution and sucking the gas incorporated in a vessel for lubricating oil used in the exhaust via the ejector. CONSTITUTION:After opening a cover 5 and introducing wafers 6 into a reaction pipe 1, the cover 5 is closed and the reaction pipe is exhausted by a screw vacuum pump 17 for exhaust. At this time, in case of feeding gas for diluting nonreacted gas through a gas line 16 and driving an ejector 18, the gas incorporated in the part vicinal to a bearing 17b is exhausted through a suction pipe 19 of the ejector and passed through a discharge pipe 20 thereof and exhausted to a discharge pipe 21 of the pump and therefore the pressure is reduced. When this pressure is made to same degree as the pressure of the high-pressure side of a pump rotor 17a or is made lower than it, the leakage of oil 17d to the rotor 17a leaked through a sealing part 17c is reduced and oil pollution of both the suction side of the pump and the reaction pipe 1 due to the back diffusion of oil is decreased.

9. 发明专利

JPS6265414A REDUCED PRESSURE CVD EQUIPMENT 失效
公开(公告)号：JPS6265414A
公开(公告)日：1987-03-24
申请号：JP20424985
申请日：1985-09-18
申请人： HITACHI LTD
发明人： TSUTSUMI YOSHIAKI , UEDA SHINJIRO , KOBARI TOSHIAKI , AKIBA MASAKUNI
IPC分类号： H01L21/205 , H01L21/31
摘要： PURPOSE:To reduce deterioration of oil used in an exhaust vacuum pump and decrease faults in the vacuum pump to improve its reliability, by effectively lowering the temperature of air in a heat exchanger when high-temperature air at the atmospheric pressure is exhausted through an auxiliary exhaust pipe. CONSTITUTION:After a wafer 6 is introduced into a reaction pipe 1, an exhaust valve 10 is closed and an auxiliary exhaust valve 11 is opened so that the air inside the reaction pipe 1 is slowly exhausted through an auxiliary exhaust pipe 9. At this time the high-temperature air at the atmospheric pressure in the reaction pipe 1 is heat-exchanged in a heat exchanger 16 installed on the auxiliary exhaust pipe 9. Therefore, the temperature becomes low enough not to promote deterioration of oil used n an exhaust mechanical booster 14 and a rotary pump 15. And when the pressure inside the reaction pipe 1 becomes comparatively low, the auxiliary exhaust valve 11 is closed and the exhaust valve 10 is opened so that exhaust pipe 8 during reaction, decrease in heat exchange efficiency is not caused by the reaction products attaching to the heat exchanger 16. Resultantly, reliability can be improved throughout the whole device.

10. 发明专利

JPS623571B2 失效
公开(公告)号：JPS623571B2
公开(公告)日：1987-01-26
申请号：JP4445677
申请日：1977-04-20
申请人： HITACHI LTD
发明人： AKIBA MASAKUNI , NAGATOMO HIROTO
IPC分类号： C21D1/00 , H01L21/22

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