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    • 8. 发明专利
    • Memory element, method of manufacturing the same, element having memory array structure, and memory array
    • 记忆元素,制造它们的方法,具有存储器阵列结构的元件和存储器阵列
    • JP2010080735A
    • 2010-04-08
    • JP2008248440
    • 2008-09-26
    • Funai Electric Advanced Applied Technology Research Institute IncFunai Electric Co Ltd株式会社船井電機新応用技術研究所船井電機株式会社
    • HAYASHI YUTAKAONO MASATOSHITAKAHASHI TAKESHIMASUDA YUICHIROFURUTA SHIGEO
    • H01L27/10
    • PROBLEM TO BE SOLVED: To solve a problem in an inclined evaporation type nano gap switch element in the prior art: the switching electric characteristics change in an ambient and finally the switching characteristics are not exhibited in the element having this structure because variations are caused in electric characteristics of a large number of two electrodes due to site dependency on a wafer and dependency per wafer which appear on a distance between the two electrodes.
      SOLUTION: In the memory element having a laminate structure configured by at least a first conductive film 130, a first insulating film 110 and a second conductive film 230, an opposite portion between the first conductive film 130 and the second conductive film 230 is provided via a first hole 180 provided in the first insulating film 110 and the memory element is configured by the first conductive film 130, the second conductive film 230 and a gap g between and the first conductive film 130 and the second conductive film 230 in the first hole 180. The first hole 180 and the gap g may be interrupted from an ambient air.
      COPYRIGHT: (C)2010,JPO&INPIT
    • 要解决的问题为了解决现有技术中的倾斜蒸发型纳米间隙开关元件的问题:环境中的开关电特性变化以及最终的开关特性在具有这种结构的元件中不显示出来,因为变化 由于对晶片的位置依赖性而导致大量的两个电极的电特性以及出现在两个电极之间的距离上的每个晶片的依赖性。 解决方案:在具有由至少第一导电膜130,第一绝缘膜110和第二导电膜230构成的层压结构的存储元件中,在第一导电膜130和第二导电膜230之间的相对部分 通过设置在第一绝缘膜110中的第一孔180提供,并且存储元件由第一导电膜130,第二导电膜230和第一导电膜130与第二导电膜230之间的间隙g构成 第一孔180.第一孔180和间隙g可以从环境空气中断。 版权所有(C)2010,JPO&INPIT