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1. 发明专利

JP2013125063A Pattern drawing device 审中-公开
标题翻译：图案绘图装置
公开(公告)号：JP2013125063A
公开(公告)日：2013-06-24
申请号：JP2011272257
申请日：2011-12-13
申请人： Fujikura Ltd , 株式会社フジクラ , National Institute Of Advanced Industrial & Technology , 独立行政法人産業技術総合研究所
发明人： INOUE TOSHIAKI , AKETO JUN , ENDO AKIHITO , TSUDA HIROKI
IPC分类号： G03F7/20
摘要： PROBLEM TO BE SOLVED: To reduce management work steps of a laser head required for every change of an insulation base material 1 applied with laser light, when drawing a pattern by an ink jet while applying the laser light.SOLUTION: A pattern drawing device includes an ink jet head 2 that is arranged on one main surface side of an insulation base material 1, and discharges a droplet 7 of ink including conductive material to a predetermined area in the one principal surface of the insulation base material 1, and a laser head that is arranged on the other main surface side of the insulation base material 1, and applies laser light from the other main surface side of the insulation base material 1. On the other main surface side of the insulation base material 1, an absorber layer 8 to absorb the laser light is arranged.
摘要翻译：要解决的问题：为了减少施加激光的绝缘基材1的每次变化所需的激光头的管理工作步骤，当施加激光时通过喷墨绘制图案。解决方案：图案描绘装置包括布置在绝缘基材1的一个主表面侧的喷墨头2，并且将包含导电材料的墨水滴7排出到一个主表面中的预定区域绝缘基材1和设置在绝缘基材1的另一个主面侧的激光头，并且从绝缘基材1的另一个主面侧施加激光。另一方面，设置绝缘基材1，吸收激光的吸收体层8。版权所有（C）2013，JPO＆INPIT

2. 发明专利

JP2013125773A Patterning method and patterning device 审中-公开
标题翻译：绘图方法和图案设备
公开(公告)号：JP2013125773A
公开(公告)日：2013-06-24
申请号：JP2011272259
申请日：2011-12-13
申请人： Fujikura Ltd , 株式会社フジクラ , National Institute Of Advanced Industrial & Technology , 独立行政法人産業技術総合研究所
发明人： INOUE TOSHIAKI , AKETO JUN , ENDO AKIHITO , TSUDA HIROKI
IPC分类号： H05K3/10 , B23K26/00 , B23K26/067
摘要： PROBLEM TO BE SOLVED: To provide a patterning method capable of fine patterning.SOLUTION: The patterning method for forming a pattern 110 on a substrate 100 by ejecting liquid droplets 120 of ink sequentially toward a substrate 100 includes a first step S11 of heating a predetermined position Pon the substrate 100 by irradiating a first laser beam Ltoward the predetermined position P, a second step S13 of ejecting the liquid droplets 120 of ink toward the predetermined position P, and a third step S14 of heating the liquid droplets 120 of ink by irradiating a second laser beam Ltoward the flying liquid droplets 120 of ink. Power density of the second laser beam Lis relatively lower than that of the first laser beam L, and the first laser beam Land the second laser beam Lhave the same wavelength.
摘要翻译：要解决的问题：提供能够精细图案化的图案化方法。解决方案：通过将墨水液滴120顺序地朝向基板100喷射而在基板100上形成图案110的图案化方法包括：加热预定位置P n < / SB>朝向预定位置P n 照射第一激光束L 1 ，在第二步骤S13 将墨液滴120喷射到预定位置P n ，以及通过照射第二激光束L 2 朝向喷墨液滴120喷墨。第二激光束L 2 的功率密度比第一激光束L 1 的功率密度相对较低，第一激光光束L 1 ，第二激光束L 2 具有相同的波长。版权所有（C）2013，JPO＆INPIT

3. 发明专利

JP2008291291A Brittle material film structure 有权
标题翻译： BRITTLE MATERIAL FILM STRUCTURE
公开(公告)号：JP2008291291A
公开(公告)日：2008-12-04
申请号：JP2007136046
申请日：2007-05-22
申请人： National Institute Of Advanced Industrial & Technology , 独立行政法人産業技術総合研究所
发明人： AKETO JUN , TSUDA HIROKI
IPC分类号： C23C24/04 , B82Y10/00 , B82Y40/00 , H01L21/8246 , H01L27/105 , H01L41/09 , H01L41/18 , H01L41/314 , H01L41/39
摘要： PROBLEM TO BE SOLVED: To provide a dense and highly-transparent brittle material film structure of the low leak current and the sub-micron order or nm order film thickness which is applicable to an optical waveguide device and a thin film capacitor element by using an inexpensive particle material for a raw material. SOLUTION: The brittle material film structure having a polycrystalline structure in which the content volume fraction of an amorphous phase is ≤30% and the mean grain size is ≤50 nm is formed by pulverizing brittle material particles into ones of the particle size of ≤100 nm, blowing them on a substrate, and depositing them on the substrate. COPYRIGHT: (C)2009,JPO&INPIT
摘要翻译：要解决的问题：为了提供适用于光波导器件和薄膜电容器元件的低漏电流和亚微米级或nm级膜厚的致密且高度透明的脆性材料膜结构通过使用廉价的原料粒子材料。解决方案：通过将脆性材料颗粒粉碎成粒径的脆性材料颗粒，形成具有多晶结构的脆性材料膜结构，其中非晶相的含量体积分数≤30％，平均粒径≤50nm ≤100nm，将它们吹到衬底上，并将它们沉积在衬底上。版权所有（C）2009，JPO＆INPIT

4. 发明专利

JP2008298528A Optical film thickness monitor and coating device using the same 审中-公开
标题翻译：光学薄膜厚度监测器和涂层设备
公开(公告)号：JP2008298528A
公开(公告)日：2008-12-11
申请号：JP2007143674
申请日：2007-05-30
申请人： National Institute Of Advanced Industrial & Technology , Nec Corp , 日本電気株式会社 , 独立行政法人産業技術総合研究所
发明人： NAKADA MASABUMI , AKETO JUN , TSUDA HIROKI , IWATA ATSUSHI , NAKANO ZEN
IPC分类号： G01B11/06 , G01N21/45
摘要： PROBLEM TO BE SOLVED: To provide an optical film thickness monitor which is suitable for aerosol deposition (AD method) and is used for on-the-spot measurement, and to provide a coating device that uses the same.
SOLUTION: This optical film thickness monitor is used for a coating device, wherein ultrafine-particle brittle materials supplied onto a substrate 49, are loaded with a mechanical impact force to cause the brittle materials to join to each other, and a compact is formed. White light is inputted into the compact from an end face of a measuring probe 410, to measure the reflectance spectra coming from the compact, and the film thickness and reflectance of the compact are derived from the interfering state of the reflectance spectrum, under conditions where the wavelength band of the reflectance spectrum is larger than the particle diameters of the brittle materials.
COPYRIGHT: (C)2009,JPO&INPIT
摘要翻译：要解决的问题：提供适用于气溶胶沉积的光学膜厚度监测器（AD方法）并用于现场测量，并提供使用它的涂覆装置。解决方案：该光学膜厚度监视器用于涂覆设备，其中提供到基底49上的超微粒脆性材料被加载机械冲击力以使脆性材料彼此接合，并且紧凑形成了。将白光从测量探头410的端面输入到压缩体中，以测量来自压块的反射光谱，并且压片的膜厚度和反射率源自反射光谱的干涉状态，反射光谱的波长带大于脆性材料的粒径。版权所有（C）2009，JPO＆INPIT

5. 发明专利

JP2014046254A Pattern printing device, pattern printing method and testing equipment 有权
标题翻译：图案打印设备，图案打印方法和测试设备
公开(公告)号：JP2014046254A
公开(公告)日：2014-03-17
申请号：JP2012190361
申请日：2012-08-30
申请人： Advantest Corp , 株式会社アドバンテスト , National Institute Of Advanced Industrial & Technology , 独立行政法人産業技術総合研究所
发明人： KAKINUMA FUMIKAZU , TANAKA TAKESHI , HAYAKAWA TOSHIAKI , AKETO JUN , ENDO AKIHITO , TSUDA HIROKI
IPC分类号： B05C9/14 , B05C5/00 , B05C11/00 , B05D1/26 , B05D3/02 , B41M5/00
CPC分类号： B41J11/002 , B41J3/28 , B41J3/407 , B41J2202/04
摘要： PROBLEM TO BE SOLVED: To form a minute and complicated wiring pattern by ink jet printing.SOLUTION: The pattern printing device includes: an ink output part having a nozzle for dripping ink to an area to be drawn of a substrate, and a heating part for heating an area to be preheated located in a movement direction of the nozzle with respect to the substrate; a drive part for moving the substrate relatively to the ink output part; and a control part for controlling the drive part. The control part moves the substrate relatively to the ink output part, so that the area to be preheated is located in a movement direction of the area to be drawn, and makes a pattern formed of ink be drawn. When switching extending directions of patterns to be drawn, the control part moves the area to be preheated to an end of a pattern before switching and heats the area to be preheated, and after that, moves the area to be drawn to the end of the pattern before switching, and starts drawing a pattern after switching.
摘要翻译：要解决的问题：通过喷墨打印形成微小复杂的布线图案。解决方案：图案印刷装置包括：墨水输出部分，其具有用于将墨水滴落到基底的拉伸区域上的喷嘴和加热部分用于加热相对于所述基板在所述喷嘴的移动方向上被预热的区域; 用于相对于所述墨输出部移动所述基板的驱动部; 以及用于控制驱动部的控制部。控制部将基板相对于墨水输出部移动，使得被预热区域位于待拉伸区域的移动方向上，并且形成由油墨形成的图案。当切换要绘制的图案的延伸方向时，控制部分在切换之前将待预热的区域移动到图案的末端，并加热待预热的区域，之后将待绘制的区域移动到切换前的图案，切换后开始绘制图案。

6. 发明专利

JP2013123653A Pattern forming method 审中-公开
标题翻译：图案形成方法
公开(公告)号：JP2013123653A
公开(公告)日：2013-06-24
申请号：JP2011272258
申请日：2011-12-13
申请人： Fujikura Ltd , 株式会社フジクラ , National Institute Of Advanced Industrial Science & Technology , 独立行政法人産業技術総合研究所
发明人： INOUE TOSHIAKI , AKETO JUN , ENDO AKIHITO , TSUDA HIROKI
IPC分类号： B05D1/26 , B05D3/00 , B05D3/02
摘要： PROBLEM TO BE SOLVED: To provide a pattern forming method for inhibiting an interface from being formed between ink droplets landed on an insulation base material 1.SOLUTION: When the ink droplets 7 including a functional material are sequentially ejected toward a predetermined region of the insulation base material 1 and patterns are formed on the main surface of the insulation base material 1, the insulation base material 1 is periodically heated according to ink ejecting timing so that the temperature of the predetermined region is relatively lowered at landing scheduled timing where ink is landed on the insulation base material 1.
摘要翻译：要解决的问题：提供一种用于抑制在落在绝缘基材1上的墨滴之间形成界面的图案形成方法。解决方案：当包括功能材料的墨滴7被顺序地朝向绝缘基材1的预定区域和图案形成在绝缘基材1的主表面上，绝缘基材1根据喷墨正时定期加热，使得预定区域的温度在着陆时相对降低墨水着陆在绝缘基材1上的预定时间。版权所有（C）2013，JPO＆INPIT

7. 发明专利

JP2013123654A Pattern forming method and pattern forming device 审中-公开
标题翻译：图案形成方法和图案形成装置
公开(公告)号：JP2013123654A
公开(公告)日：2013-06-24
申请号：JP2011272260
申请日：2011-12-13
申请人： Fujikura Ltd , 株式会社フジクラ , National Institute Of Advanced Industrial Science & Technology , 独立行政法人産業技術総合研究所
发明人： INOUE TOSHIAKI , AKETO JUN , ENDO AKIHITO , TSUDA HIROKI
IPC分类号： B05D1/26 , B05C5/00 , B05C9/14 , B23K26/00 , B23K26/06
摘要： PROBLEM TO BE SOLVED: To provide a pattern forming method capable of forming fine patterns.SOLUTION: The pattern forming method where ink droplets 120 are sequentially ejected toward a base material 100 to form the patterns 110 on the base material 100 includes: a first process S11 for heating a predetermined position Pby irradiating with first laser light Lthe predetermined position Pof the base material 100; a second process S13 for ejecting the ink droplets 120 toward the predetermined position P; and a third process S14 for heating the droplets 120 by irradiating with second laser light Lthe droplets 120 of the ink that are flown. The wavelength of the first laser light Land the wavelength of the second laser light Lare different.
摘要翻译：要解决的问题：提供能够形成精细图案的图案形成方法。解决方案：其中墨滴120顺序地向基材100喷射以在基材100上形成图案110的图案形成方法包括：用于加热预定位置P n 的第一激光L 1 > n 用于将墨滴120朝向预定位置P n 喷射的第二处理S13; 以及第三处理S14，用于通过用流动的墨的液滴120的第二激光L 2 加热液滴120。第一激光L 1 的波长和第二激光L 2 的波长是不同的。版权所有（C）2013，JPO＆INPIT

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