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    • 6. 发明专利
    • Planting penetration trench
    • 投影渗透
    • JP2010037863A
    • 2010-02-18
    • JP2008203664
    • 2008-08-07
    • Public Works Research Institute独立行政法人土木研究所
    • TSUTSUMI SHOICHIJO EIKYO
    • E03F1/00A01G1/00A01G7/00E03B3/02
    • Y02A20/108
    • PROBLEM TO BE SOLVED: To provide a planting penetration trench capable of suppressing the degradation of the storage function of the trench resulting from the deposition of mud and sediment by accumulating the mud and sediment flowing into the trench at the bottom of the trench and discharging the mud and sediment out of the trench.
      SOLUTION: A space 19 for accumulating the mud and sediment flowing into the trench is formed at the bottom of the trench using a resin pallet 15 which is an example of a spacer. The bottom surface of the space 19 has a gradient tilted downward toward an inlet 20 for mud and segment. The mud and sediment accumulated in the space 19 flow down naturally to the inlet 20 by the gradient.
      COPYRIGHT: (C)2010,JPO&INPIT
    • 要解决的问题:提供一种种植穿透沟槽,其能够通过积聚流入沟槽底部的沟槽中的泥浆和沉积物来抑制泥浆和沉积物的沉积产生的沟槽的储存功能的劣化 并将泥浆和沉淀物排出沟槽。 解决方案:使用作为间隔件的实例的树脂托盘15,在沟槽的底部形成用于积聚流入沟槽的泥浆和沉积物的空间19。 空间19的底面具有朝向泥浆和段的入口20向下倾斜的梯度。 积聚在空间19中的泥土和沉积物自然流向入口20渐变。 版权所有(C)2010,JPO&INPIT