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1. 发明专利

JP2009236471A Heat treatment device 审中-公开
标题翻译：热处理装置
公开(公告)号：JP2009236471A
公开(公告)日：2009-10-15
申请号：JP2008086816
申请日：2008-03-28
申请人： Espec Corp , エスペック株式会社
发明人： ASHIDA KENJI , KUWATA KENJI
IPC分类号： F27D17/00
摘要： PROBLEM TO BE SOLVED: To provide a heat treatment device capable of suppressing contamination of a heat treatment chamber caused by a sublimate occurring due to formed gas generated accompanying heat treatment of a heat treating object being cooled, and leakage of the sublimate.
SOLUTION: The heat treatment device 1 includes the heat treatment chamber 12, a separation tank 25, an exhaust gas system 26, an air supply system 27, and a blowing mechanism part 30. The exhaust gas system 26 and the air supply system 27 are separate systems and are connected independently to the separation tank 25. The heat treatment device 1 introduces air into the separation tank 25 via the exhaust gas system 26 and the air supply system 27 and generates a swirl flow by operating a blower 45 of the blowing mechanism part 30, mixes high temperature air of the exhaust gas system 26 with low temperature air of the air supply system 27 to cool the high temperature air, and sublimates the product gas contained in the high temperature air so that the sublimate can be collected.
COPYRIGHT: (C)2010,JPO&INPIT
摘要翻译：解决的问题：提供一种热处理装置，其能够抑制由于被冷却的热处理物体的热处理而产生的形成的气体而产生的升华引起的热处理室的污染，并且升华的泄漏。解决方案：热处理装置1包括热处理室12，分离槽25，废气系统26，供气系统27和吹风机构部30.排气系统26和供气装置系统27是分离的系统，并且独立地连接到分离罐25.热处理装置1经由排气系统26和供气系统27将空气引入分离罐25中，并通过操作鼓风机45产生涡流吹送机构部30将排气系统26的高温空气与空气供给系统27的低温空气混合，以冷却高温空气，并使包含在高温空气中的产品气升华，使得升华可以集。版权所有（C）2010，JPO＆INPIT

2. 发明专利

JP2007010186A Heat treatment device 审中-公开
标题翻译：热处理装置
公开(公告)号：JP2007010186A
公开(公告)日：2007-01-18
申请号：JP2005189357
申请日：2005-06-29
申请人： Espec Corp , エスペック株式会社
发明人： KANDA TOSHIRO , NAGANO YUKIO , ASHIDA KENJI
IPC分类号： F27D17/00 , F27B17/00 , F27D7/02
摘要： PROBLEM TO BE SOLVED: To provide a heat treatment device for heat treatment of a board or the like, capable of performing heat treatment equivalent to that by using an infrared radiation heater, and controlling rise of concentration of a produced gas.
SOLUTION: A shelf member is mounted in a heat treatment chamber 12, and a far infrared radiation plate 100 is mounted on a rear face of the shelf member. The far infrared radiation plate does not have a function of generating heat by itself, but radiates infrared radiation when heated. The board W loaded on the shelf member is exposed to hot air flowing in the heat treatment chamber and heated, here the far infrared radiation plate is also heated by the hot air and radiates infrared radiation. The board is also heated by the infrared radiation radiated from the far infrared radiation plate. The produced gas is carried by a large mount of hot air and discharged to the outside of the heat treatment chamber.
COPYRIGHT: (C)2007,JPO&INPIT
摘要翻译：要解决的问题：提供一种能够进行与通过使用红外线辐射加热器相当的热处理并控制所产生的气体的浓度升高的板等的热处理的热处理装置。解决方案：搁板构件安装在热处理室12中，远红外辐射板100安装在搁板构件的后表面上。远红外辐射板本身不具有产生热的功能，而是在加热时辐射红外辐射。装在货架上的板W暴露在热处理室内流动的热空气中并加热，这里远红外辐射板也被热空气加热并辐射红外辐射。该板也被远红外辐射板辐射的红外辐射加热。产生的气体由大量的热空气携带并排放到热处理室的外部。版权所有（C）2007，JPO＆INPIT

3. 发明专利

JP2007139234A Heat treatment apparatus 审中-公开
标题翻译：热处理设备
公开(公告)号：JP2007139234A
公开(公告)日：2007-06-07
申请号：JP2005330544
申请日：2005-11-15
申请人： Espec Corp , エスペック株式会社
发明人： KANDA TOSHIRO , NAGANO YUKIO , ASHIDA KENJI
IPC分类号： F27D5/00
摘要： PROBLEM TO BE SOLVED: To provide a heat treatment apparatus capable of stacking in a high density state and heat-treating the objects to be heated.
SOLUTION: The heat treatment apparatus 1 is provided with a rack 10 in the interior of a heating chamber 3a. Multiple shelf members 20 are stacked in a frame member 11 of the rack 10. The shelf member 20 has a base part 21, and placement part 22b with a relative position, with respect to the base part 21 deviated upward. When the shelf members 20 are stacked vertically, a gap allowing placement of a substrate W is formed between placement parts 22b, 22b. A region, allowing the insertion and withdrawal of a robot hand, is formed on a side of the placement part 22b.
COPYRIGHT: (C)2007,JPO&INPIT
摘要翻译：要解决的问题：提供一种能够以高密度状态堆叠并对被加热物进行热处理的热处理装置。解决方案：热处理设备1在加热室3a的内部设置有齿条10。多个搁架构件20堆叠在架子10的框架构件11中。搁架构件20具有基部21和相对于基部21向上偏移的相对位置的放置部22b。当搁板构件20垂直堆叠时，在放置部分22b，22b之间形成允许放置衬底W的间隙。在放置部22b的一侧形成有允许机器人手的插入和取出的区域。版权所有（C）2007，JPO＆INPIT

4. 发明专利

JP2007085702A Glass substrate treating device, glass substrate treating system and glass substrate treating method 审中-公开
标题翻译：玻璃基板处理装置，玻璃基板处理系统和玻璃基板处理方法
公开(公告)号：JP2007085702A
公开(公告)日：2007-04-05
申请号：JP2005278272
申请日：2005-09-26
申请人： Espec Corp , エスペック株式会社
发明人： KANDA TOSHIRO , NAGANO YUKIO , ASHIDA KENJI
IPC分类号： F27B9/36 , F27B9/10 , F27B9/24 , F27D7/04 , F27D11/02 , G02F1/13
CPC分类号： Y02P40/57
摘要： PROBLEM TO BE SOLVED: To provide a glass substrate treating device miniaturizable in outline by shortening a heat treating time of a glass substrate to reduce the storage number of glass. SOLUTION: The glass substrate treating device 1 has a heating chamber 2 whose six sides are covered with heat insulating walls 3 formed of a well-known heat insulating material. An exhaust duct 21 is mounted to the heating chamber 2. The exhaust duct 21 is connected to the top face of the heating chamber 2. A substrate placing member 30 and a plurality of halogen heaters 31 are provided in the heating chamber 2. The glass substrate 32 is heated mainly by the halogen heaters 31. COPYRIGHT: (C)2007,JPO&INPIT

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