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1. 发明专利

JP2014195837A 研磨装置有权
标题翻译：抛光装置
公开(公告)号：JP2014195837A
公开(公告)日：2014-10-16
申请号：JP2013071773
申请日：2013-03-29
申请人：株式会社荏原製作所 , Ebara Corp
发明人： USHIMARU SEIYA , TANAKA TOMOHIRO , SONE CHUICHI
IPC分类号： B24B37/00 , H01L21/304
摘要：【課題】研磨テーブルが円軌道に沿って並進運動した場合に、これに接続される液供給配管が傷つかないようにした研磨装置を提供する。【解決手段】研磨装置は、研磨面16aを有し、円軌道に沿って並進運動をする研磨テーブル10と、基板Wを研磨面16aに押し付けるトップリング28と、研磨テーブル10に連結された駆動軸20と、駆動軸20の内部を延びる保護パイプ65と、保護パイプ65の内部を延び、研磨テーブル10の下面に接続された液供給配管60,61と、保護パイプ65内で液供給配管60,61を支持する支持部材68とを備える。【選択図】図3
摘要翻译：要解决的问题：提供一种抛光装置，当抛光台沿着圆形轨道进行平移运动时，防止与抛光台连接的液体供应管线被损坏。抛光装置包括：抛光台10，其具有抛光表面16a并沿圆形轨道进行平移运动; 将基板W按压到研磨面16a的顶环28; 与抛光台10连接的驱动轴20; 在驱动轴20内延伸的保护管65; 在保护管65内延伸并与抛光台10的下表面连接的液体供应管道60,61; 以及支撑构件68，其支撑保护管65中的液体供应管线60,61。

2. 发明专利

JP2014087908A Polishing device 有权
标题翻译：抛光装置
公开(公告)号：JP2014087908A
公开(公告)日：2014-05-15
申请号：JP2012240394
申请日：2012-10-31
申请人： Ebara Corp , 株式会社荏原製作所
发明人： UMEMOTO MASAO , ERIGUCHI MASAAKI , SONE CHUICHI , AIZAWA HIDEO , KOSUGE RYUICHI
IPC分类号： B24B37/34 , H01L21/304
摘要： PROBLEM TO BE SOLVED: To provide a polishing device having an atomizer cover that can prevent as much as possible liquid rebounding from a polished surface from remaining on an inner peripheral surface and further can be comparatively easily cleaned by cleaning liquid.SOLUTION: The polishing device comprises: a rotatable polishing table 12 with a polishing face 10a; and an atomizer 40 whose upper face is covered with an atomizer cover 42 and which injects fluid against the polishing face 10a of the polishing table 12 to clean the polishing face 10a. The atomizer cover 42 has: a semicircle-shaped apical plate 50 in which a first arc-shaped apical plate 50a having a contant radius and a second arc-shaped apical plate 50b with a radius gradually decreasing from the base end toward the apical end are connected to each other at the top thereof; and a pair of lateral plates 52 and 54 that continuously hang down from the apical plate 50.
摘要翻译：要解决的问题：提供一种具有雾化器盖的抛光装置，其可以尽可能多地防止从抛光表面的液体反弹残留在内周面上，并且还可以相对容易地通过清洗液体清洁。抛光装置包括：具有抛光面10a的可旋转抛光台12; 以及雾化器40，其上表面被雾化器盖42覆盖，并且将流体喷射到抛光台12的抛光面10a上以清洁抛光面10a。雾化器盖42具有：半圆形顶座板50，其具有从基端朝向顶端的半径逐渐减小的具有约半径的第一弧形顶片50a和第二弧形顶点板50b，在其顶部彼此连接; 以及从顶板50连续地下垂的一对侧板52和54。

3. 发明专利

JP2013188686A Gas-liquid separator and polishing apparatus 有权
标题翻译：气液分离器和抛光装置
公开(公告)号：JP2013188686A
公开(公告)日：2013-09-26
申请号：JP2012056679
申请日：2012-03-14
申请人： Ebara Corp , 株式会社荏原製作所
发明人： AIZAWA HIDEO , SONE CHUICHI , UMEMOTO MASAO
IPC分类号： B01D45/12 , B24B37/34 , B24B57/00
CPC分类号： B08B3/14 , B01D19/0057 , B04C2003/006 , B24B57/02
摘要： PROBLEM TO BE SOLVED: To separate a gas-liquid two-phase flow into gas and liquid while minimizing generation of mist or bubbles with a compact structure, even when a relatively large amount of liquid such as washing waste liquid of a polishing apparatus is treated, or even when a foamable substance is contained in a liquid to be treated.SOLUTION: This gas-liquid separator includes: a bottomed cylindrical separator body 12; a gas-liquid introducing tube 16 for introducing a gas-liquid two-phase flow into the separator body, the tube being extended downward from an upper portion of the separator body to reach the inside of the separator body; and a guide mechanism 24 disposed inside the gas-liquid introduction tube, the guide mechanism causing a turning motion in the gas-liquid two-phase flow flowing through the gas-liquid introduction tube. A liquid discharge port 12a communicating with a drain pipe 20 is provided at the bottom of the separator body, and an exhaust port 12b communicating with an exhaust pipe 22 is provided at a position higher in level than the lower end of the gas-liquid introduction tube on a lateral portion of the separator body.
摘要翻译：要解决的问题：为了将气液两相流分离成气体和液体，同时尽可能减少结构紧凑的雾或气泡的产生，即使在处理相对较大量的诸如抛光装置的洗涤废液的液体，或者即使在待处理液体中含有可发泡物质的情况下也可以。否则，该气液分离器包括：有底筒状分离体12; 用于将气液两相流引入分离器主体的气液引入管16，该管从分离器主体的上部向下延伸到分离器体的内部; 以及设置在气液引入管内的引导机构24，引导机构在流经气液导入管的气液两相流中引起转动。与排水管20连通的排液口12a设置在分离器体的底部，与排气管22连通的排气口12b设置在高于气液导入口下端的位置管分离器主体的侧面部分。

4. 发明专利

JPH09228962A CONTROL PANEL 失效
公开(公告)号：JPH09228962A
公开(公告)日：1997-09-02
申请号：JP17065696
申请日：1996-06-10
申请人： EBARA CORP
发明人： SONE CHUICHI , TAKADA TSUTOMU , NAKAJIMA KAORU
IPC分类号： F04B49/10
摘要： PROBLEM TO BE SOLVED: To provide a control panel which can easily set a connection form a contact conformed to required specification of an external output terminal further with a set contact easily changeable in a set up jobsite or the like. SOLUTION: A panel has a CPU11 for control, ROM14 storing a control program, readable/writable memory means 12, 13, external output part 20 and an input means, when a content is set which must be output from the input means, the setting is written in the readable/writable memory means 12, 13, in the case of generating a content which must be output, it is output to the concerned external output part 20 by a preset value written in the memory means.

5. 发明专利

JPH09217683A VARIABLE SPEED WATER SUPPLY DEVICE 失效
公开(公告)号：JPH09217683A
公开(公告)日：1997-08-19
申请号：JP5095596
申请日：1996-02-14
申请人： EBARA CORP , EBARA DENSAN KK
发明人： SONE CHUICHI , TAKADA TSUTOMU , TEJIMA TOMOJI
IPC分类号： F04B49/06
摘要： PROBLEM TO BE SOLVED: To carry out pressure monitoring drive without causing pressure rise and certainly carry out small water quantity stop motion. SOLUTION: A device is constituted to be furnished with a pump 13 rotationally driven by an electric motor, a variable speed means 19 to vary the number of rotation of the pump 13, a check valve 21 provided on the discharge side of the pump 13, a means 20 to detect small water quantity of the pump 13 and a small water quantity stop means to stop the pump 13 after accumulating pressure in the pressure tank 16 at the time when small water quantity is detected by the small water quantity detection means 20. In this case, the small water quantity stop means confirms that a discharge pressure value is kept higher than a specified pressure value for a specified period of situation checking time without increasing rotational speed of the pump 13 after after detecting a small water quantity state from the small water quantity detection means 20, carries out pressure accumulating drive and thereafter, stops driving the pump 13.

6. 发明专利

JPH08331670A CENTRALIZED CONTROL/MONITORING DEVICE OF AIR CONDITIONING SYSTEM 失效
公开(公告)号：JPH08331670A
公开(公告)日：1996-12-13
申请号：JP16000695
申请日：1995-06-02
申请人： EBARA CORP , EBARA DENSAN KK
发明人： SONE CHUICHI , TATEISHI KAZUFUMI , KAWANISHI TAKU , SATO MOTOYASU , KIDO KOICHI
IPC分类号： H04Q9/00
摘要： PURPOSE: To excellently control all the air conditioners by connecting one or plural remote control devices which can be controlled by even three or more pushing priorities with a unit group and further using the remote control device having the same constitution as the rate control device as a centralized control device. CONSTITUTION: A remote control device 12 can be controlled by three or more pushing priorities and the abnormality of an air conditioner 10 is displayed on the display parts 12-1 of all the remote control devices 12 provided on each group. When the unit group is composed of plural air conditioners 10, also the address number of the air conditioner 10 is displayed so as to know the contents of the abnormality and in which of the air conditioners 10 the abnormality is generated. Each remote control device 12 installed at a centralized control roan 20 performs a centralized control for the air conditioner 10 of the unit group with which the control device 12 is connected. In this centralized control room 20, all the functions of the air conditioner 10 for each unit group can be controlled, and when the abnormality is is generated, what abnormality is generated in what air conditioner 10 of which unit group can be displayed.

7. 发明专利

JPH08251680A CONTROL COMMUNICATION EQUIPMENT FOR AIR CONDITIONER 失效
公开(公告)号：JPH08251680A
公开(公告)日：1996-09-27
申请号：JP8193795
申请日：1995-03-13
申请人： EBARA CORP , EBARA DENSAN KK
发明人： SATO MOTOYASU , KIDO KOICHI , KAWANISHI TAKU , TATEISHI KAZUFUMI , SONE CHUICHI
IPC分类号： F24F11/02 , H04Q9/00 , H04Q9/14
摘要： PURPOSE: To obtain a control communication equipment for an air conditioner capable of executing non-polarity/bidirectional data transmission while supplying power from a master equipment to a slave equipment by simplifying circuit constitution and using a common communication line and a power supply line. CONSTITUTION: A master equipment 1 is connected to respective slave equipments 2 through two transmission lines 4 and the master equipment 1 is provided with a means for superposing an ON/OFF signal with a prescribed amplitude level (+7V) to a prescribed DC voltage level (+5V) under control by a monitor and control means (CPU 1-7), transmitting the superposed signal and receiving a signal from the slave equipment 1 through a signal polarity matching circuit 1-5. Each slave equipment 1 is provided with a means for receiving the signal from the master equipment 2 through the circuit 1-5, differentiating the ON/OFF signal with the prescribed amplitude level (+7V) from the DC voltage with the prescribed level (+5V), utilizing the DC voltage of the prescribed level as power supply for the slave equipment 1 itself, and transmitting an ON/OFF signal with a prescribed amplitude level (+12V) to the master equipment 2 through a signal polarity matching circuit 2-1 under control by a control means (CPU 2-5).

8. 发明专利

JPH02111276A ELECTRIC MOTOR DRIVING GEAR 失效
公开(公告)号：JPH02111276A
公开(公告)日：1990-04-24
申请号：JP26346388
申请日：1988-10-19
申请人： EBARA CORP , EBARA DENSAN KK
发明人： NAKAJIMA KAORU , SONE CHUICHI , KUBOTA MASAHIRO , SHINOZAKI YUKIO
IPC分类号： H02P1/16
摘要： PURPOSE:To prevent a standby condition from being mistaken for a trouble condition by providing a display driving means driving a visual check display part to be actuated only in a period with a delay given to a start signal from a starting means. CONSTITUTION:A start switch 11 is operated and a start signal St is input to a start delay circuit 9, where an in-delay action signal Sto, successively obtaining '1', is generated in a waveform (c), and a flickering signal Sm is output in a waveform (d) from a flickering circuit 10. During outputting the signal Sm, it is supplied via an OR gate 7 to a display lamp 8 to flicker it, so that an operator can visually check an electric motor 1 for a standby condition. When a stop switch 12 is operated, a stop signal Sp is generated in a waveform (f) and supplied to an operation condition holding circuit 6 to reset it with both an operation condition signal S1. An inverter start signal Si disappears, and the operation condition display lamp 8 turns off, displaying a transfer of the electric motor to a stop condition to open relay breakers 4, 5.

9. 发明专利

JP2014117776A Polishing method 有权
标题翻译：抛光方法
公开(公告)号：JP2014117776A
公开(公告)日：2014-06-30
申请号：JP2012274723
申请日：2012-12-17
申请人： Ebara Corp , 株式会社荏原製作所
发明人： SONE CHUICHI , KOSUGE RYUICHI , TANAKA TOMOHIRO
IPC分类号： B24B37/34 , B24B37/00
摘要： PROBLEM TO BE SOLVED: To provide a polishing method which can prevent liquid from dropping from an atomizer during polishing of a substrate such as a wafer.SOLUTION: A polishing method includes the steps of: bringing a substrate W into slide contact with a polishing surface 3a to polish a substrate W while supplying a polishing liquid to the polishing surface 3a; injecting a washing fluid containing at least a washing liquid from an atomizer 30 toward the polishing surface 3a after polishing the substrate W to wash the polishing surface 3a; and supplying a purge gas to the atomizer 30 after stopping the injection of the washing fluid to discharge the washing liquid remaining inside the atomizer 30.
摘要翻译：要解决的问题：提供一种抛光方法，其可以在诸如晶片的基板的抛光期间防止液体从喷雾器掉落。抛光方法包括以下步骤：使基板W与抛光表面滑动接触 3a，在向研磨面3a供给研磨液的同时研磨基板W; 在抛光衬底W之后，将至少含有来自雾化器30的洗涤液的洗涤液注入研磨面3a以洗涤研磨面3a; 并且在停止喷射洗涤流体以排出残留在雾化器30内部的洗涤液体之前，向雾化器30供给净化气体。

10. 发明专利

JP2010205796A Substrate processing device and method, semiconductor manufacturing device, semiconductor manufacturing device engineering system, and system 有权
标题翻译：基板处理装置及方法，半导体制造装置，半导体制造装置工程系统及系统
公开(公告)号：JP2010205796A
公开(公告)日：2010-09-16
申请号：JP2009047221
申请日：2009-02-27
申请人： Ebara Corp , 株式会社荏原製作所
发明人： KOGURE NAOAKI , TSUJIMURA MANABU , ISOBE SOICHI , OIKAWA FUMITOSHI , SUGITA KENICHI , SONE CHUICHI , MINAMI YOSHIO
IPC分类号： H01L21/304 , B24B37/04 , B24B55/06
摘要： PROBLEM TO BE SOLVED: To reduce utility such as power or the like used in stopping operation. SOLUTION: A semiconductor wafer W is held between a polishing pad 16 and a top ring 18 attached to a rotary surface plate 17 of a CMP (Chemical and Mechanical Polishing) device 1 and is relatively rotated to polish the wafer W. A rinsing flow regulating valve 13 is provided in a rinsing supply pipe 11 to intermittently supply pure water to the polishing pad 16 in a polishing portion 2 to maintain it in a wet state. In a washing portion 3, the polished wafer W is pinched between washing sponge rollers 26, 27 and is washed while carrying it. Rinsing flow regulating valves 14, 14 are provided in rinsing supply pipes 12a, 12b to intermittently supply pure water to the washing sponge rollers 26, 27 to maintain them in a wet state. Assuming that an interval at which the pure water is supplied is t minutes and a duration for which the pure water is supplied each time is dt seconds, the following relations (1) and (2) are satisfied. (1) dt=20ä1.6-exp(-0.01783t)}, (2) 10≤t≤30. COPYRIGHT: (C)2010,JPO&INPIT
摘要翻译：要解决的问题：为了减少在停止操作中使用的诸如电源等的实用性。解决方案：半导体晶片W被保持在抛光垫16和附接到CMP（化学和机械抛光）装置1的旋转表面板17上的顶环18之间，并被相对旋转以抛光晶片W. 冲洗流量调节阀13设置在冲洗供给管11中，以在抛光部2中间歇地向研磨垫16供给纯水，使其处于湿润状态。在洗涤部分3中，抛光的晶片W被夹在洗涤海绵辊26和27之间，并在携带时清洗。冲洗流量调节阀14,14设置在冲洗供给管12a，12b中，以间歇地向洗涤海绵辊26,27供给纯水，以将它们保持在湿润状态。假设供给纯水的间隔为t分钟，每次供给纯水的持续时间为dt秒，满足以下关系式（1）和（2）。（1）dt =20ä1.6-exp（-0.01783t）}，（2）10≤t≤30。版权所有（C）2010，JPO＆INPIT

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