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1. 发明专利

JP2014184716A Pattern formation device and pattern formation method 有权
标题翻译：图案形成装置和图案形成方法
公开(公告)号：JP2014184716A
公开(公告)日：2014-10-02
申请号：JP2013265205
申请日：2013-12-24
申请人： Dainippon Screen Mfg Co Ltd , 大日本スクリーン製造株式会社
发明人： SHOJI KAZUHIRO , KAWAGOE MICHIFUMI , UENO HIROYUKI , SHIBAFUJI YAYOI , MASUICHI MIKIO , UENO MIKA
IPC分类号： B41F17/14 , B41F1/16 , B41F3/20 , B41F17/36 , B41M1/34 , H05K3/12
摘要： PROBLEM TO BE SOLVED: To butt a proof or a board on a blanket with the high precision of position.SOLUTION: While the peripheral part of a blanket being held in adsorptive manner by a frame-like lower stage 61, the central part of the blanket is locally held by a plurality of hands 625 which can rise and fall individually. By making a transfer roller unit 64 run along the undersurface of the blanket so as to push up the blanket partially, the blanket is abutted on the proof or board arranged above a blanket. Since the hand 625 descends in series with movement of the transfer roller unit 64 so as to evacuate downward, the interference with the transfer roller unit 64 is avoided.
摘要翻译：要解决的问题：以高精度的位置对接毯子上的证明或板。解决方案：当毯子的周边部分被框架状下层61吸附的方式时，其中心部分毯子由多个可以单独上升和下降的手625的局部保持。通过使转印辊单元64沿着毯子的下表面延伸以部分地推起毯子，毯子抵靠在布置在毯子上方的隔板或板上。由于手625随着转印辊单元64的移动而串联下降以便向下抽空，所以避免了与转印辊单元64的干涉。

2. 发明专利

JP2013114153A Imaging apparatus, alignment apparatus, and pattern forming apparatus 有权
标题翻译：成像装置，对准装置和图案形成装置
公开(公告)号：JP2013114153A
公开(公告)日：2013-06-10
申请号：JP2011261828
申请日：2011-11-30
申请人： Dainippon Screen Mfg Co Ltd , 大日本スクリーン製造株式会社
发明人： UENO HIROYUKI , KAWAGOE MICHIFUMI
IPC分类号： G03F9/00 , H01L21/027
摘要： PROBLEM TO BE SOLVED: To provide a technique that enables imaging a principal surface of a transparent plate-like object from the other principal surface side through the object without any problem even if, in particular, the object is thin.SOLUTION: The upper face 510 of a suction stage 51 that holds a blanket BL by suction, and the upper face 520 of a quartz window 52a that allows imaging an alignment pattern AP2 from below are arranged not to be coplanar and the upper face 520 of the quartz window 52a is recessed down. Thus, interference fringes, which are generated by partial contact of the blanket BL and the quartz window 52a, can be prevented from appearing in the image. The pressure in a gap space GS formed above the upper face 520 of the quartz window 52a is adjusted through a gas passage 518 and a valve V53 in order to prevent the vacuum-sucked blanket BL from being sucked into the gap space GS to deform.
摘要翻译：要解决的问题：提供一种能够使透明板状物体的主表面从另一个主表面侧通过物体成像的技术，即使特别是物体较薄也无任何问题。解决方案：通过抽吸保持橡皮布BL的吸入台51的上表面510和允许从下方对准对准图案AP2的石英窗口52a的上表面520布置成不共面，并且上部石英窗52a的面520向下凹。因此，可以防止由橡皮布BL和石英窗52a的部分接触而产生的干涉条纹出现在图像中。通过气体通道518和阀V53调节形成在石英窗52a的上表面520上方的间隙空间GS中的压力，以防止真空吸附的毯子BL被吸入间隙GS中以变形。版权所有（C）2013，JPO＆INPIT

3. 发明专利

JP2011198982A Pattern-forming device 有权
标题翻译：图案形成装置
公开(公告)号：JP2011198982A
公开(公告)日：2011-10-06
申请号：JP2010063738
申请日：2010-03-19
申请人： Dainippon Screen Mfg Co Ltd , 大日本スクリーン製造株式会社
发明人： SANADA MASAKAZU , IWASHIMA MASANOBU , FURUICHI TAKATSUGU , UENO HIROYUKI , NAKAJIMA MIKA
IPC分类号： H01L31/04 , B05B1/14 , B05C5/00 , B05C9/12
CPC分类号： Y02E10/50
摘要： PROBLEM TO BE SOLVED: To provide a technology for forming a pattern having a high aspect ratio by reducing a time from coating to light irradiation in a pattern-forming device for forming a pattern by curing a coating liquid applied to a substrate using light.SOLUTION: An optical fiber cable 55 is embedded into a wall at the bottom of a tank 51 in a coating head 5. While the substrate W is moved in a direction Ds, the coating liquid (conductive paste) stored in a liquid well space SP is pressurized and discharged from a discharge nozzle 52 for being applied to the substrate W. Light from a light source unit 7 is applied to the coating liquid from a lower surface of the coating head 5 via the optical fiber 55 to photo-cure the coating liquid. By applying light to a position adjacent to a discharge port 521, an electrode pattern in which a time from coating to light irradiation is short and an aspect ratio is high can be obtained.
摘要翻译：要解决的问题：提供一种用于通过使用光固化施加到基板上的涂布液来缩短形成图案的图案形成装置中的从涂覆到光照射的时间来形成具有高纵横比的图案的技术。：将光纤电缆55嵌入到涂覆头5中的罐51的底部的壁上。当基板W沿方向Ds移动时，存储在液体空间SP中的涂布液（导电膏）从排出喷嘴52加压并排出以供施加到基板W.来自光源单元7的光经由光纤55从涂覆头5的下表面施加到涂布液上，以使涂布液。通过将光照射到与排出口521相邻的位置，可以得到从涂布到光照射的时间短，纵横比高的电极图案。

4. 发明专利

JP2010177336A Thin film formation system and thin-film formation method 有权
标题翻译：薄膜形成系统和薄膜形成方法
公开(公告)号：JP2010177336A
公开(公告)日：2010-08-12
申请号：JP2009016540
申请日：2009-01-28
申请人： Dainippon Screen Mfg Co Ltd , 大日本スクリーン製造株式会社
发明人： YANAGIDA TAKAAKI , UENO HIROYUKI
IPC分类号： H01L21/02 , B05C11/08 , H01L21/027 , H01L21/31 , H01L21/768
摘要： PROBLEM TO BE SOLVED: To efficiently form a thin film while preventing catching of fire by solvent, relating to a thin film formation system and a thin film formation method which applies a coat liquid containing thin film material on a thin film carrier, which is transferred on a substrate surface, and peels the thin film carrier thereafter to form a thin film on the substrate.
SOLUTION: In the thin film formation system, a plurality of process units are arrayed on both sides of a transportation path for a main transportation robot 70 that reciprocally moves in X direction within a transportation space TP2 which is managed for atmosphere. Such layout is arranged as an apply unit 34 that can generate solvent vapor and a peeling unit 10 that can generate static electricity face each other across the transportation space TP2. Thus, catching fire by solvent is prevented, for efficient thin film formation process.
COPYRIGHT: (C)2010,JPO&INPIT
摘要翻译：要解决的问题：为了有效地形成薄膜，同时防止用溶剂捕获火焰，涉及薄膜形成系统和在薄膜载体上施加含有薄膜材料的涂布液的薄膜形成方法，其在衬底表面上转移，然后在其上剥离薄膜载体，以在衬底上形成薄膜。解决方案：在薄膜形成系统中，在用于大气管理的运输空间TP2内的主运输机器人70的运送路径的两侧排列多个处理单元，该运送路径在X方向上往复移动。这种布置被布置为可以产生溶剂蒸气的施加单元34和可以在运输空间TP2上彼此面对产生静电的剥离单元10。因此，为了有效的薄膜形成工艺，可以防止溶剂引起的火焰。版权所有（C）2010，JPO＆INPIT

5. 发明专利

JP2008006707A Printing equipment 审中-公开
标题翻译：印刷设备
公开(公告)号：JP2008006707A
公开(公告)日：2008-01-17
申请号：JP2006179522
申请日：2006-06-29
申请人： Dainippon Screen Mfg Co Ltd , 大日本スクリーン製造株式会社
发明人： UENO HIROYUKI , KITAZAWA HIROYUKI
IPC分类号： B41F31/20 , B41F17/14 , B41F35/04 , G02B5/20
摘要： PROBLEM TO BE SOLVED: To provide printing equipment which can correctly regulate the coat thickness of a coating solution on the surface of a coating solution feeder roller and transfer a pattern with a required coat thickness. SOLUTION: This printing equipment comprises a plate cylinder 14 to the outer peripheral surface of which a printing plate 17 is fitted, a coating solution feeder roller 12 which feeds the coating solution to the surface of the printing plate 17, a slit nozzle 11 which feeds the coating solution to the surface of the coating solution feeder roller 12, and a cleaning mechanism 13 which cleans the surface of the coating solution feeder roller 12 during a period until the coating solution is fed by the slit nozzle 11 after feeding the coating solution to the printing plate 17, in a position between the position for feeding the coating solution to the printing plate 17 at the coating solution feeder roller 12 and the position for feeding the coating solution by the slit nozzle 11 at the coating solution feeder roller 12. COPYRIGHT: (C)2008,JPO&INPIT
摘要翻译：要解决的问题：提供可以正确地调节涂布溶液供给辊表面上的涂布溶液的涂层厚度并转印所需涂层厚度的图案的印刷设备。解决方案：该印刷设备包括一个印版滚筒14，其外周表面上装有印版17，涂布液供给辊12将涂布溶液供给到印版17的表面，一个狭缝喷嘴 11，其将涂布溶液供给到涂布溶液供给辊12的表面;以及清洁机构13，其在供给了涂布溶液供给辊12的表面之后，在通过狭缝喷嘴11供给涂布溶液之前，清洁涂布液供给辊12的表面在涂布溶液供给辊12的位置和涂布液供给辊12的印刷板17的位置之间，通过狭缝喷嘴11在涂布液供给辊 12.版权所有（C）2008，JPO＆INPIT

6. 发明专利

JP2007152251A Coating apparatus 有权
标题翻译：涂装装置
公开(公告)号：JP2007152251A
公开(公告)日：2007-06-21
申请号：JP2005352427
申请日：2005-12-06
申请人： Dainippon Screen Mfg Co Ltd , 大日本スクリーン製造株式会社
发明人： UENO HIROYUKI , TAKAMURA YUKIHIRO , MASUICHI MIKIO , YOSHIDA JUNICHI , KAWAGOE MICHIFUMI , MATSUKA TAKESHI
IPC分类号： B05C5/00 , H01L51/50 , H05B33/10
摘要： PROBLEM TO BE SOLVED: To provide a coating apparatus preventing a foreign substance from dropping on a substrate to be coated.
SOLUTION: A guide member is extendedly disposed along the direction crossing the space above a stage; and a slide supporting member supporting a nozzle reciprocates along the guide member. A pair of pulleys are disposed at both end positions of the guide member respectively and tied with a driving belt connected to the slide supporting member. Pulley covers cover a pair of pulleys respectively and each includes a partition panel dividing an inner space into a first vacant chamber in which the pulley is disposed and a second vacant chamber provided at the side to which the guide member is disposed with respect to the first vacant chamber.
COPYRIGHT: (C)2007,JPO&INPIT
摘要翻译：要解决的问题：提供一种防止外来物质滴落在待涂布的基材上的涂布装置。解决方案：引导构件沿着与台架上方的空间交叉的方向延伸设置; 并且支撑喷嘴的滑动支撑构件沿着引导构件往复运动。一对滑轮分别设置在引导件的两端位置处，并与连接到滑动支撑件的传动带捆扎在一起。皮带轮盖分别覆盖一对皮带轮，并且每个皮带轮分别包括将内部空间分隔成其中布置滑轮的第一空腔中的分隔板和设置在引导构件相对于第一空房。版权所有（C）2007，JPO＆INPIT

7. 发明专利

JP2007088360A Substrate heating equipment 有权
标题翻译：基座加热设备
公开(公告)号：JP2007088360A
公开(公告)日：2007-04-05
申请号：JP2005277942
申请日：2005-09-26
申请人： Dainippon Screen Mfg Co Ltd , 大日本スクリーン製造株式会社
发明人： MASUICHI MIKIO , TAKAMURA YUKIHIRO , MATSUKA TAKESHI , KAWAGOE MICHIFUMI , UENO HIROYUKI , YOSHIDA JUNICHI
IPC分类号： H01L21/683
摘要： PROBLEM TO BE SOLVED: To provide substrate heating equipment capable of keeping incandescent ability with respect to a plurality of kinds of substrates different in size. SOLUTION: The substrate heating equipment comprises a stage having a first groove at a location corresponding to a periphery of first substrate of designated size; an attachment detachably mounted on the stage which has a substrate mounting face in which a second groove is arranged at a location corresponding to a second substrate different in a designated size, and a ventilation passage communicating the first and second grooves when the attachment is mounted on the stage; a suction means for sucking the first substrate mounted on the stage so that it may cover the first groove, or the attachment by vacuum suction; and a heating means for heating the stage. COPYRIGHT: (C)2007,JPO&INPIT
摘要翻译：要解决的问题：提供能够相对于尺寸不同的多种基板保持白炽能力的基板加热装置。基板加热设备包括在对应于指定尺寸的第一基板的周边的位置处具有第一凹槽的台，可拆卸地安装在台架上的附件，其具有基板安装面，第二凹槽布置在与指定尺寸不同的第二基板相对应的位置处，以及当附接安装在其上时连通第一和第二凹槽的通风通道舞台; 抽吸装置，用于吸附安装在台架上的第一基板，使得其可以覆盖第一凹槽，或者通过真空抽吸附着; 以及用于加热该台的加热装置。版权所有（C）2007，JPO＆INPIT

8. 发明专利

JP2004304037A Device for transferring plate-shaped article to be treated and high voltage treatment device 有权
公开(公告)号：JP2004304037A
公开(公告)日：2004-10-28
申请号：JP2003096851
申请日：2003-03-31
申请人： Dainippon Screen Mfg Co Ltd , Kobe Steel Ltd , 大日本スクリーン製造株式会社 , 株式会社神戸製鋼所
发明人： SARUMARU SHIYOUGO , YAMANE HIDEO , WATANABE KATSUMITSU , UENO HIROYUKI , ADACHI HIDEKI , FUKATSU EIJI
IPC分类号： B01J3/00 , B01J3/02 , H01L21/00 , H01L21/304 , H01L21/677 , H01L21/687 , H01L21/68
CPC分类号： H01L21/67751 , H01L21/67126 , H01L21/68728 , H01L21/68735 , Y10S414/139
摘要： PROBLEM TO BE SOLVED: To provide a plate-shaped article transferring device which can be adopted at the time of inputting/outputting plate-shaped articles to be treated to/from a treatment device, in which a clearance below articles to be treated when the articles to be treated are treated is reduced so that any wasteful large space can be prevented from being formed at the treatment device side, and to shorten a treatment time and reduce treatment costs of the treatment device as a result. SOLUTION: This plate-shaped article transferring device used for inputting/outputting articles W to be treated to/from a treatment position inside a treatment chamber formed of a pressure container is provided with a temporary holding member 13 for temporarily holding the articles W to be treated at a relay position until the articles W to be treated reach the treatment position, and for saving the articles W to be treated to the outside of the treatment chamber when the treatment chamber is formed of the pressure container. COPYRIGHT: (C)2005,JPO&NCIPI

9. 发明专利

JP2004186526A Substrate processing apparatus 有权
公开(公告)号：JP2004186526A
公开(公告)日：2004-07-02
申请号：JP2002353315
申请日：2002-12-05
申请人： Dainippon Screen Mfg Co Ltd , Kobe Steel Ltd , 大日本スクリーン製造株式会社 , 株式会社神戸製鋼所
发明人： FUKATSU EIJI , MIZOBATA IKUO , UENO HIROYUKI , OKUYAMA YASUO , GAMA TAKASHI , SAKASHITA YOSHIHIKO , WATANABE KATSUMITSU , MUNEMASA ATSUSHI
IPC分类号： B08B7/00 , B08B3/02 , H01L21/304 , H01L21/677 , H01L21/68
摘要： PROBLEM TO BE SOLVED: To provide a substrate processing apparatus, excellent in versatility though small in size and low in cost. SOLUTION: The substrate processing section PS is provided with two development process units 10A, 10B performing different development processes, respectively; with a supercritical drying process unit 20 performing a supercritical drying process for a substrate that has undergone its development process; and with a main carrier robot 30, so arranged as to be surrounded by the process units 10A, 10B, 20. The main carrier robot 30, upon receiving an unprocessed substrate W, forwards the substrate W to a development process unit to be specified by the material of the resist film formed on the substrate W. The main carrier robot 30 forwards the developed substrate W upon completion of the development process, regardless of whether it is developed at the development process unit 10A or 10B, as wet to the supercritical drying process unit 20. COPYRIGHT: (C)2004,JPO&NCIPI

10. 发明专利

JP2014192286A Peeling device and peeling method 有权
标题翻译：剥离装置和剥离方法
公开(公告)号：JP2014192286A
公开(公告)日：2014-10-06
申请号：JP2013065522
申请日：2013-03-27
申请人： Dainippon Screen Mfg Co Ltd , 大日本スクリーン製造株式会社
发明人： UENO MIKA , UENO HIROYUKI , SHIBAFUJI YAYOI , KAWAGOE MICHIFUMI , MASUICHI MIKIO , TANIGUCHI KAZUTAKA
IPC分类号： H05K3/20
摘要： PROBLEM TO BE SOLVED: To provide a technology capable of well peeling two plate-like bodies tightly fitting to each other, and especially coping with increase in size of the plate-like body.SOLUTION: (-Y) side end pat of a substrate SB in a work piece WK placed on a stage 30 is pulled up by adsorption-holding using a first adsorption unit 51, and a peeling roller 340 abutted with the substrate SB is moved in (+Y) direction, thus peeling is made to progress. A lower surface of the work piece WK is imaged with an imaging part 37 from below an abutment nip region R4 of the peeling roller 340, to detect position of a peeling border line that occurs at a border between a peeling region and a non-peeling region, for determining moving start timing of the peeling roller 340.
摘要翻译：要解决的问题：提供一种能够良好地剥离彼此紧密配合的两个板状体的技术，特别是应对板状体的尺寸增大。（A）侧基（-Y）使用第一吸附单元51将放置在台架30上的工件WK中的SB吸附到吸附保持中，并且与基板SB抵接的剥离辊340沿（+ Y）方向移动，从而进行剥离。从剥离辊340的邻接夹持区域R4的下方，用成像部37对成形工件WK的下表面进行成像，以检测在剥离区域和非剥离区域之间的边界处发生的剥离边界线的位置区域，用于确定剥离辊340的移动开始正时。

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