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1. 发明专利

JP2014093507A Process liquid supply device and substrate processing apparatus including the same 有权
标题翻译：过程液体供应装置和基板处理装置，包括它们
公开(公告)号：JP2014093507A
公开(公告)日：2014-05-19
申请号：JP2012245176
申请日：2012-11-07
申请人： Sokudo Co Ltd , 株式会社Sokudo , Dainippon Screen Mfg Co Ltd , 大日本スクリーン製造株式会社
发明人： FUKUI MOTONORI , ONO KAZUYA , NAGASAWA KATSUJI
IPC分类号： H01L21/027 , H01L21/304
摘要： PROBLEM TO BE SOLVED: To provide a process liquid supply device which can supply process liquid to a plurality of processing sections while minimizing significant decrease in substrate processing capacity of the processing section, and to provide a substrate processing apparatus including the same.SOLUTION: A process liquid supply device 11 for supplying process liquid to a plurality of processing sections 5, 6 having processing units 8, 9 includes pumps 22, 27 provided in relation to respective processing sections 5, 6 and pressure feeding process liquid toward corresponding processing sections 5, 6, and a plurality of valve members 23, 28 for opening and closing the flow path of process liquid on the primary of the pumps 22, 27, for each processing section 5, 6.
摘要翻译：要解决的问题：提供一种处理液供给装置，其能够将处理液体供给到多个处理部，同时最小化处理部的基板处理能力的显着降低，并且提供包括该处理部的基板处理装置。解决方案：A 用于向具有处理单元8,9的多个处理部分5,6供应处理液的处理液体供应装置11包括相对于各个处理部分5,6设置的泵22,27和朝向相应处理部分5的压力供给处理液体，多个阀构件23,28用于打开和关闭每个处理部5,6的泵22,27的一次侧的处理液的流路。

2. 发明专利

JP2014093506A Process liquid supply device and substrate processing apparatus including the same 有权
标题翻译：过程液体供应装置和基板处理装置，包括它们
公开(公告)号：JP2014093506A
公开(公告)日：2014-05-19
申请号：JP2012245175
申请日：2012-11-07
申请人： Sokudo Co Ltd , 株式会社Sokudo , Dainippon Screen Mfg Co Ltd , 大日本スクリーン製造株式会社
发明人： FUKUI MOTONORI , ONO KAZUYA , NISHIMOTO MASAYUKI
IPC分类号： H01L21/027
摘要： PROBLEM TO BE SOLVED: To provide a process liquid supply device which can supply a process liquid to a plurality of processing sections while minimizing significant decrease in substrate processing capacity of the processing section, and to provide a substrate processing apparatus including the same.SOLUTION: A process liquid supply device 11 for supplying a process liquid to a plurality of processing sections 5, 6 having processing units 8, 9 includes a plurality of process liquid supply systems 15a, 15b, 16a, 16b for supplying the process liquid to each processing unit 8, 9, individually. Each process liquid supply system 15a, 15b, 16a, 16b includes a tank 21 for storing the process liquid, piping 22 interconnected with the tank 21 and feeding the process liquid toward a corresponding processing section 5, 6, a pressure feed section 23 for pressure feeding the process liquid to the processing sections 5, 6 through the piping 22, and a filter 24, a flowmeter 25 and a valve member 26 provided in the way of the piping 22.
摘要翻译：要解决的问题：提供一种处理液供给装置，其能够将处理液体供给到多个处理部，同时最小化处理部的基板处理能力的显着降低，并且提供包括其的基板处理装置。解决方案：用于向具有处理单元8,9的多个处理部分5,6供应处理液的处理液体供应装置11包括用于将处理液体供应到每个处理单元的多个处理液体供应系统15a，15b，16a，16b 8,9。每个处理液供给系统15a，15b，16a，16b包括用于储存处理液体的罐21，与罐21互连的管道22，并将处理液供给到相应的处理部5,6，压力供给部23 通过管道22将处理液体供给到处理部分5,6，以及设置在管道22中的过滤器24，流量计25和阀构件26。

3. 发明专利

JP2007201139A Method for polishing and manufacturing chuck 审中-公开
标题翻译：抛光和制造钻孔的方法
公开(公告)号：JP2007201139A
公开(公告)日：2007-08-09
申请号：JP2006017466
申请日：2006-01-26
申请人： Dainippon Screen Mfg Co Ltd , 大日本スクリーン製造株式会社
发明人： ONO KAZUYA , OKUMURA TAKESHI , FUKUTOMI YOSHIMITSU
IPC分类号： H01L21/683
摘要： PROBLEM TO BE SOLVED: To provide a manufacturing method of a chuck capable of remarkably reducing particle deposition to a rear face of a substrate. SOLUTION: When the chuck for fixedly holding a substrate such as a semiconductor wafer by vacuum adsorption is to be manufactured, the chuck is shaped (S1) by cutting from an ingot of a resin material in the first place. Then the surface polishing for finishing (S2) is done by means of an abrasive with a particle diameter of 1 μm or less in polishing the surface of the chuck after cutting. Thereafter, the surface of the chuck is washed (S3) by means of alcohol or a neutral detergent, and then the chuck is stored (S4) in a chuck case so that an adsorbing face of the chuck is free from contact. Then, the chuck case is vacuum-sealed S5 in which the chuck is stored. COPYRIGHT: (C)2007,JPO&INPIT
摘要翻译：要解决的问题：提供一种能够显着降低颗粒沉积到基板背面的卡盘的制造方法。解决方案：当制造通过真空吸附固定地保持诸如半导体晶片的基板的卡盘时，首先从树脂材料的锭切割卡盘成形（S1）。然后，通过在切割后对卡盘的表面进行研磨，用粒径为1μm以下的研磨剂进行精加工用的表面抛光（S2）。然后，通过醇或中性洗涤剂洗涤卡盘的表面（S3），然后将卡盘（S4）储存在卡盘壳体中，使得卡盘的吸附面不接触。然后，卡盘盒是真空密封的S5，其中卡盘被储存。版权所有（C）2007，JPO＆INPIT

4. 发明专利

JP2005101060A Periphery projection aligner 有权
标题翻译：外围投影对准器
公开(公告)号：JP2005101060A
公开(公告)日：2005-04-14
申请号：JP2003329927
申请日：2003-09-22
申请人： Dainippon Screen Mfg Co Ltd , 大日本スクリーン製造株式会社
发明人： AKIYAMA KAZUYA , KAMEI KENJI , ONO KAZUYA
IPC分类号： G03F7/20 , G03B27/42 , H01L21/027
CPC分类号： G03F7/2028
摘要： PROBLEM TO BE SOLVED: To provide a periphery projection aligner that reduces stagnation in periphery exposure and prevents deterioration in the quality of a substrate in the periphery exposure. SOLUTION: The periphery projection aligner has a light receiving unit 40 for detecting deterioration in the performance of a light source unit 21, and a light-up time measurement circuit 63. The light-up time measurement circuit 63 has a function for detecting that the light source unit 21 is in a preparation state for enabling the periphery exposure. When the light-on time measurement circuit 63 measures light-on time exceeding a set value or the light receiving unit 40 detects that light intensity becomes less than the set value, it is determined that the performance of a light source unit 21 1 has deteriorated, and the light is turned off. Additionally, the light-on time measurement circuit 63 measures the light-on time from the activation (turn-on) of a light source unit 21 2 , it is determined that the preparation state is on when the light-on time exceeds the set value, and the periphery exposure is started in the light source unit 21 2 . COPYRIGHT: (C)2005,JPO&NCIPI
摘要翻译：要解决的问题：提供一种减少周边曝光中的停滞的周边投影对准器，防止周边曝光时的基板质量的劣化。
解决方案：周边投影对准器具有用于检测光源单元21的性能劣化的光接收单元40以及点亮时间测量电路63.点亮时间测量电路63具有用于检测光源单元21处于用于实现周边曝光的准备状态。当点灯时间测量电路63测量超过设定值的点灯时间或光接收单元40检测到光强度小于设定值时，确定光源单元21的性能 1 已经劣化，并且灯被关闭。此外，点灯时间测量电路63测量从光源单元21 2 的激活（接通）开启的时间，确定准备状态在亮灯时间超过设定值，并且在光源单元21 2 中开始周边曝光。版权所有（C）2005，JPO＆NCIPI

5. 发明专利

JP2003347187A Edge exposure device 有权
标题翻译：边缘曝光装置
公开(公告)号：JP2003347187A
公开(公告)日：2003-12-05
申请号：JP2002149348
申请日：2002-05-23
申请人： Dainippon Screen Mfg Co Ltd , 大日本スクリーン製造株式会社
发明人： ONO KAZUYA , KAMEI KENJI , AKIYAMA KAZUYA
IPC分类号： G03F7/20 , H01L21/027
摘要： PROBLEM TO BE SOLVED: To provide an edge exposure device which is capable of exposing the edge of a substrate to light having a uniform distribution of light intensity so as to carry out superior edge exposure. SOLUTION: Light emitted from a light source unit has an irregular distribution of light intensity. Therefore, the intensity of light that impinges on optical fiber strands 33a and 33b composing light guides 31a and 31b reflects the light source having an irregular distribution of light intensity. When light having the irregular distribution of light intensity is incident on optical mixing optical elements 60a and 60b, the light is mixed inside the optical elements 60a and 60b, and lights emitted from light emitting surfaces 62a and 62b have nearly uniform distributions of light intensity. Moreover, the optical mixing optical elements 60a and 60b are pasted together as optically isolated from each other so as to prevent lights of the elements 60a and 60b from being mixed together. COPYRIGHT: (C)2004,JPO
摘要翻译：要解决的问题：提供一种边缘曝光装置，其能够将基板的边缘暴露于具有均匀光强分布的光，以便执行优良的边缘曝光。
解决方案：从光源单元发射的光具有不规则的光强分布。因此，构成光导31a，31b的光纤束33a，33b的光的强度反射光强度不均匀的光源。当具有光强度不规则分布的光入射到光学混合光学元件60a和60b时，光在光学元件60a和60b内部被混合，并且从发光表面62a和62b发射的光具有几乎均匀的光强分布。此外，光学混合光学元件60a和60b被彼此光学隔离地粘贴在一起，以防止元件60a和60b的光被混合在一起。版权所有（C）2004，JPO

6. 发明专利

JP2014049483A Substrate processing device, and power supply management method for the same 有权
标题翻译：基板处理装置及其电源管理方法
公开(公告)号：JP2014049483A
公开(公告)日：2014-03-17
申请号：JP2012188870
申请日：2012-08-29
申请人： Sokudo Co Ltd , 株式会社Sokudo , Dainippon Screen Mfg Co Ltd , 大日本スクリーン製造株式会社
发明人： KIRITA MASASHI , ONO KAZUYA , FUKUI MOTONORI , NISHIMURA JOICHI , NISHIMOTO MASAYUKI
IPC分类号： H01L21/677 , H01L21/027
摘要： PROBLEM TO BE SOLVED: To provide a substrate processing device capable of appropriately cutting off a power supply of a processing section, and a power supply management method for the same.SOLUTION: A substrate processing device 11 comprises: a processing unit 13 processing a substrate; a processing section wire 61 for supplying power to the processing unit 13; a magnet contactor 63 opening and closing the processing section wire 61 to apply and cut off a power supply of the processing unit 13; and a controller 71 changing a state of the processing unit 13 from a cut-off restriction state in which the cut-off of the power supply is restricted to a cut-off possible state in which the cut-off of the power supply is permitted. The controller 71 further permits an operation of the magnet contactor 63 when the processing unit 13 is in the cut-off possible state, and forbids the operation of the magnet contactor 63 when the processing unit 13 is in the cut-off restriction state.
摘要翻译：要解决的问题：提供能够适当地切断处理部的电源的基板处理装置及其电源管理方法。基板处理装置11包括：处理部13，对基板进行处理 ; 用于向处理单元13供电的处理部分线61; 电磁接触器63打开和关闭处理部分线61以施加和切断处理单元13的电源; 以及控制器71将处理单元13的状态从限制电源的截止限制的限制状态限制为允许切断电源的截止可能状态。当处理单元13处于截止可能状态时，控制器71还允许电磁接触器63的操作，并且当处理单元13处于截止限制状态时，禁止电磁接触器63的操作。

7. 发明专利

JP2005093953A Edge exposure system and substrate processing equipment having the same 有权
标题翻译：边缘曝光系统及其基板处理设备
公开(公告)号：JP2005093953A
公开(公告)日：2005-04-07
申请号：JP2003329018
申请日：2003-09-19
申请人： Dainippon Screen Mfg Co Ltd , 大日本スクリーン製造株式会社
发明人： ONO KAZUYA
IPC分类号： G03F7/20 , H01L21/027
摘要： PROBLEM TO BE SOLVED: To provide an edge exposure system having a simple structure, which can efficiently prevent smearing of optical members, and to provide substrate processing equipment having the edge exposure system. SOLUTION: A projector used for edge exposure processing comprises a mirror cylinder 11 and a light guide 1. The lower end of the light guide 1 is open so that exposure light that passes through the mirror cylinder 11 is irradiated on a substrate W. N 2 gas is supplied to a gas supply tube 60t from a gas supply unit, as shown by an arrow K1. Thus, as shown by an arrow K2, N 2 gas is introduced from the gas supply tube 60t through a gas guiding path 2 into an exposure space 1P that extends from a lens LE4 to the lower end of a light shielding mask 1. In this way, N 2 gas is filled in the half occluded space 1P. The successive supply of N 2 gas to the half occluded space 1P allows the N 2 gas filled therein to start leaking outside therefrom through an opening of the light shielding mask 1, as shown by an arrow K3. COPYRIGHT: (C)2005,JPO&NCIPI
摘要翻译：要解决的问题：提供具有简单结构的边缘曝光系统，其可以有效地防止光学部件的拖尾，并提供具有边缘曝光系统的基板处理设备。
解决方案：用于边缘曝光处理的投影仪包括镜筒11和导光器1.导光体1的下端打开，使得穿过反射镜筒11的曝光被照射在基板W上从气体供给单元向气体供给管60t供给气体，如箭头K1所示。因此，如箭头K2所示，气体从气体供给管60t通过气体引导路径2导入到从透镜LE4延伸到下部的曝光空间1P中遮光掩模1.以这种方式，在半封闭空间1P中填充N 2 SB 2气体。向半封闭空间1P连续供应N 2 气体使得其中填充的N 2 气体通过遮光掩模1的开口从其外部开始泄漏，如如箭头K3所示。版权所有（C）2005，JPO＆NCIPI

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