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1. 发明专利

JP2017092286A 基板の処理方法及びその方法に用いる溶剤审中-公开
公开(公告)号：JP2017092286A
公开(公告)日：2017-05-25
申请号：JP2015221599
申请日：2015-11-11
申请人：セントラル硝子株式会社 , Central Glass Co Ltd
发明人： YAO AKIFUMI , KUMON SOICHI , FUJIWARA MASAO , NANAI HIDETOSHI
IPC分类号： H01L21/304
摘要：【課題】超臨界流体中でのフッ素原子の放出量が低減された基板の処理方法を提供する。【解決手段】水系洗浄液が付着した基板表面に、Fe、Ni、Cr、Al、Zn、Cu、Mg、Li、K、Na、Caの各元素の含有量がそれぞれ1000質量ppb以下である炭素数が2〜6の含フッ素アルコールを含有する溶剤(含フッ素アルコール含有溶剤)を供給する工程、含フッ素アルコール含有溶剤が付着した基板表面に、各元素の含有量がそれぞれ500質量ppb以下であるフッ素を含有する溶剤を供給する工程、フッ素を含有する溶剤が付着した基板をチャンバ内に移し、基板の表面のフッ素を含有する溶剤を、各元素の含有量がそれぞれ500質量ppb以下であるフッ素を含有する溶剤の超臨界流体に置換させた後、チャンバ内の圧力を下げて超臨界流体を気体に変化させる工程を有する。【選択図】図1

2. 发明专利

JP2012033890A Chemical liquid for forming protective film, and method of cleaning wafer surface 有权
标题翻译：用于形成保护膜的化学液体和清洁表面的方法
公开(公告)号：JP2012033890A
公开(公告)日：2012-02-16
申请号：JP2011127149
申请日：2011-06-07
申请人： Central Glass Co Ltd , セントラル硝子株式会社
发明人： ARATA SHINOBU , SAITO MASANORI , SAIO TAKASHI , KUMON SOICHI , NANAI HIDETOSHI
IPC分类号： H01L21/304
CPC分类号： C09D5/38 , H01L21/02068 , H01L21/321
摘要： PROBLEM TO BE SOLVED: To provide a chemical liquid for forming a protective film for improving a cleaning process, which easily induces pattern collapse, of a wafer (a metal system wafer) having an uneven pattern on its surface and having at least one kind of elements chosen from a group consisting of titanium, tungsten, aluminum, copper, tin, tantalum, and ruthenium on a recessed part surface of the uneven pattern, in manufacturing a semiconductor device.SOLUTION: A chemical liquid for forming a water-shedding protective film at least on a recessed part surface of a metal system wafer, contains a surface active agent having a hydrophobic portion that has an HLB (Hydrophile Lipophile Balance) value of 0.001-10 by a Griffin method and that contains a hydrocarbon group with the carbon number of 6-18, and water. A concentration of the surface active agent in the chemical liquid is 0.00001 mass% or more based on the total amount 100 mass% of the chemical liquid, and equal to or less than the saturation concentration.
摘要翻译：要解决的问题：提供一种用于形成保护膜的化学液体，用于改善其表面上具有不均匀图案的晶片（金属系统晶片）易于引起图案塌陷的清洁过程，并且至少具有在半导体器件的制造中，在不均匀图案的凹部表面上选自由钛，钨，铝，铜，锡，钽和钌组成的组中的一种元素。解决方案：至少在金属系统晶片的凹部表面上形成脱水保护膜的化学液体含有具有HLB（亲水亲油平衡值）值为0.001的疏水部分的表面活性剂 -10，并且含有碳原子数为6-18的烃基和水。化学液中的表面活性剂的浓度相对于化学液的总量100质量％为0.00001质量％以上，且为饱和浓度以下。版权所有（C）2012，JPO＆INPIT

3. 发明专利

JP2007133026A Method of manufacturing optical waveguide with v-groove 审中-公开
标题翻译：使用V-GROOVE制造光波导的方法
公开(公告)号：JP2007133026A
公开(公告)日：2007-05-31
申请号：JP2005323937
申请日：2005-11-08
申请人： Central Glass Co Ltd , セントラル硝子株式会社
发明人： MOROI NAGAHIRO , NANAI HIDETOSHI
IPC分类号： G02B6/13 , G02B6/122 , G02B6/30
摘要： PROBLEM TO BE SOLVED: To provide a method of easily manufacturing a device, provided with an optical waveguide and a V groove on the same substrate, in high manufacturing yield without leaving polymer refuse in a V-groove region. SOLUTION: In the optical device having a resin optical waveguide and the V groove for fixing an optical fiber on the same substrate, a photosensitive resin material is used for an adhesive layer between the resin optical waveguide and the substrate in manufacturing the optical device. The device is characterized in that the resin material for the optical waveguide is either one of fluorinated polyimide resin, fully fluorinated polyimide resin, fluorinated silicon resin, fluorinated acrylic resin, deuterated polysiloxane resin, fluorinated epoxy resin, fully fluorinated alicyclic resin or silicon resin, and that the photosensitive resin material is a heat-resistant photosensitive resin. COPYRIGHT: (C)2007,JPO&INPIT
摘要翻译：解决的问题：提供一种容易地制造在相同基板上设置有光波导和V形槽的器件的制造方法，而不会在V沟槽区域中留下聚合物垃圾。解决方案：在具有树脂光波导的光学装置和用于将光纤固定在同一基板上的V槽中，在制造光学器件中使用感光树脂材料用于树脂光波导和基板之间的粘合剂层设备。该装置的特征在于，用于光波导的树脂材料是氟化聚酰亚胺树脂，全氟化聚酰亚胺树脂，氟化硅树脂，氟化丙烯酸树脂，氘代聚硅氧烷树脂，氟化环氧树脂，全氟化脂环族树脂或硅树脂之一，感光性树脂材料为耐热感光性树脂。版权所有（C）2007，JPO＆INPIT

4. 发明专利

JP2004086080A Optical waveguide device 审中-公开
标题翻译：光波器件
公开(公告)号：JP2004086080A
公开(公告)日：2004-03-18
申请号：JP2002249928
申请日：2002-08-29
申请人： Central Glass Co Ltd , セントラル硝子株式会社
发明人： SAKAGUCHI SHIGEKI , MOROI NAGAHIRO , YAMAMOTO YUJI , NANAI HIDETOSHI , HAYAMIZU TAKASHI
IPC分类号： G02B6/122
摘要： PROBLEM TO BE SOLVED: To provide an optical waveguide device whose loss is made low, which has both of facility and reproducibility in manufacture and which has an inflection point. SOLUTION: The basic structure of an optical waveguide holding the core of optical communication technology is obtained by connecting a straight line and a curved line or connecting a curved line and a curved line, and includes the inflection point. By providing axial deviation to the inflection point in order to reduce light loss at the inflection point and forming a gap between the end faces of both waveguides at the connection part where the axial deviation is provided, the low-loss and high-quality optical waveguide device is manufactured with good reproducibility as designed. COPYRIGHT: (C)2004,JPO
摘要翻译：要解决的问题：提供一种损耗低的光波导装置，其具有制造中的设备和再现性以及具有拐点的两者。解决方案：通过连接直线和曲线或连接曲线和曲线获得保持光通信技术核心的光波导的基本结构，并且包括拐点。通过向拐点提供轴向偏差，以减少拐点处的光损失，并且在提供轴向偏差的连接部分处形成两个波导的端面之间的间隙，低损耗和高质量的光波导设备按照设计制造具有良好的重现性。版权所有（C）2004，JPO

5. 发明专利

JP2003329865A Method of manufacturing resin optical waveguide 审中-公开
标题翻译：制造树脂光波导的方法
公开(公告)号：JP2003329865A
公开(公告)日：2003-11-19
申请号：JP2002141563
申请日：2002-05-16
申请人： Central Glass Co Ltd , セントラル硝子株式会社
发明人： MOROI NAGAHIRO , NISHIMURA MOTOYASU , HAYAMIZU TAKASHI , NANAI HIDETOSHI , YAMAMOTO YUJI
IPC分类号： G02B6/13
摘要： PROBLEM TO BE SOLVED: To provide a means of forming a trench optical waveguide which has low loss and excellent optical characteristics. SOLUTION: In a manufacturing process of the trench type optical waveguide in which an optical waveguide pattern is formed by a photolithography and a reactive ion etching (RIE) method, the resin optical waveguide is manufactured which has a low loss and excellent optical characteristics by eliminating the surface roughness of the trench generated in forming process of the trench and keeping the flatness of the boundary face between an optical waveguide core and a clad by forming a flat coating layer on the trench surface by using a material which has refractive index smaller than that of the core before burying the core material into the patterned trench. COPYRIGHT: (C)2004,JPO
摘要翻译：要解决的问题：提供一种形成具有低损耗和优异光学特性的沟槽光波导的方法。解决方案：在通过光刻和反应离子蚀刻（RIE）方法形成光波导图案的沟槽型光波导的制造工艺中，制造了具有低损耗和优异光学性的树脂光波导通过消除在沟槽的形成过程中产生的沟槽的表面粗糙度并通过使用具有折射率的材料在沟槽表面上形成平坦的涂层而保持光波导芯和包层之间的边界面的平坦度的特性在将核心材料埋入图案化的沟槽中之前，小于芯的厚度。版权所有（C）2004，JPO

6. 发明专利

JP2013118347A Cleaning method of wafer 审中-公开
标题翻译：清洗方法
公开(公告)号：JP2013118347A
公开(公告)日：2013-06-13
申请号：JP2011274084
申请日：2011-12-15
申请人： Central Glass Co Ltd , セントラル硝子株式会社
发明人： KUMON SOICHI , SAIO TAKASHI , ARATA SHINOBU , SAITO MASANORI , NANAI HIDETOSHI , AKAMATSU YOSHINORI
IPC分类号： H01L21/304
CPC分类号： H01L21/02057 , C11D3/162 , C11D11/0047
摘要： PROBLEM TO BE SOLVED: To provide a cleaning method to improve a cleaning step easily inducing pattern collapse in a manufacturing method of a wafer having an uneven pattern on the surface.SOLUTION: A cleaning method of a wafer having an uneven pattern on the surface comprises at least the steps of: cleaning the wafer with a cleaning liquid; replacing the cleaning liquid kept in a recess part of the wafer after cleaning with a water-repellent chemical liquid; and drying the wafer, where the cleaning liquid comprises 80 mass% or more of a solvent having a boiling-point of 55 to 200°C, and in the replacing step, the temperature of the water-repellent chemical liquid is 40°C or more and below the boiling-point of the water-repellent chemical liquid, for water-repelling of at least the recess part surface.
摘要翻译：要解决的问题：提供一种清洁方法，以改善在表面上具有不均匀图案的晶片的制造方法中容易引起图案塌陷的清洁步骤。解决方案：表面上具有不均匀图案的晶片的清洁方法至少包括以下步骤：用清洗液清洗晶片; 在用憎水化学液体清洗后，更换保存在晶片的凹部内的清洗液; 并干燥晶片，其中清洗液体包含沸点为55-200℃的溶剂的80质量％以上，在替代工序中，防水化学液的温度为40℃，更多和低于防水化学液体的沸点，用于至少凹陷部分表面的排斥。版权所有（C）2013，JPO＆INPIT

7. 发明专利

JP2013098303A Cleaning and drying agent, and method of cleaning and drying substrate using the same 有权
标题翻译：清洁和干燥剂，以及使用其清洁和干燥底物的方法
公开(公告)号：JP2013098303A
公开(公告)日：2013-05-20
申请号：JP2011238825
申请日：2011-10-31
申请人： Central Glass Co Ltd , セントラル硝子株式会社
发明人： NADANO AKIRA , AKIBA SHINYA , HIROTSU MASANORI , NANAI HIDETOSHI
IPC分类号： H01L21/304 , B08B3/08 , C11D7/28
摘要： PROBLEM TO BE SOLVED: To provide: a cleaning and drying agent which is used for cleaning and drying an extremely fine and precise pattern, releases no fluorine ion, and has no flash point; and a method of cleaning and drying a substrate.SOLUTION: The cleaning and drying agent contains fluorine-containing tertiary alcohol represented by the general formula (1) or fluorine-containing tertiary diol represented by the general formula (2).
摘要翻译：要解决的问题：提供：用于清洁和干燥非常精细和精确图案的清洁和干燥剂，不释放氟离子，并且没有闪点; 以及清洗和干燥基材的方法。清洗干燥剂含有由通式（1）表示的含氟叔醇或由通式（2）表示的含氟叔二醇。版权所有（C）2013，JPO＆INPIT

8. 发明专利

JP2012033881A Chemical liquid for forming water-shedding protective film, and method of cleaning wafer using chemical liquid 有权
标题翻译：用于形成水洗保护膜的化学液体和使用化学液体清洁水的方法
公开(公告)号：JP2012033881A
公开(公告)日：2012-02-16
申请号：JP2011108634
申请日：2011-05-13
申请人： Central Glass Co Ltd , セントラル硝子株式会社
发明人： SAITO MASANORI , SAIO TAKASHI , ARATA SHINOBU , KUMON SOICHI , NANAI HIDETOSHI
IPC分类号： H01L21/304
摘要： PROBLEM TO BE SOLVED: To provide a water-shedding protective film forming agent capable of cleaning efficiently, a chemical liquid for forming a water-shedding protective film containing the agent, and a method of cleaning a wafer using the chemical liquid, in relation to a method of cleaning the wafer while preventing pattern collapse of the wafer containing a silicon element at least on a recessed part surface of the wafer having an uneven pattern formed on its surface, in manufacturing a semiconductor device.SOLUTION: A water-shedding protective film forming agent forms a water-shedding protective film at least on a recessed part surface of a wafer in cleaning of the wafer. The agent is a silicon compound represented by the following general formula [1].
摘要翻译：待解决的问题：为了提供能够有效清洗的脱水保护膜形成剂，用于形成含有该试剂的脱水保护膜的化学液以及使用该化学液体清洗晶片的方法，关于在制造半导体器件时，至少在具有形成在其表面上的不均匀图案的晶片的凹部表面上防止包含硅元素的晶片的图案崩溃的方法。解决方案：脱水保护膜形成剂在晶片的清洁中至少在晶片的凹部表面上形成脱水保护膜。该试剂是由以下通式[1]表示的硅化合物。版权所有（C）2012，JPO＆INPIT

9. 发明专利

JP2012009802A Chemical liquid for protective film formation 有权
标题翻译：化学液体用于保护膜形成
公开(公告)号：JP2012009802A
公开(公告)日：2012-01-12
申请号：JP2010228652
申请日：2010-10-08
申请人： Central Glass Co Ltd , セントラル硝子株式会社
发明人： SAITO MASANORI , ARATA SHINOBU , SAIO TAKASHI , KUMON SOICHI , NANAI HIDETOSHI , AKAMATSU YOSHINORI
IPC分类号： H01L21/304 , C11D1/40
CPC分类号： H01L21/02068 , C11D1/002 , C11D1/004 , C11D1/04 , C11D1/40 , C11D11/0047 , H01L21/02057 , H01L21/0212 , H01L21/027 , H01L21/306 , H01L21/31127
摘要： PROBLEM TO BE SOLVED: To provide chemical liquid for protective film formation, in a semiconductor device manufacturing, improving a washing step in which pattern collapse of a wafer including at least one kind of material selected from a group consisted of titanium, titanium nitride, tungsten, aluminum, copper, tin, tantalum nitride, ruthenium, and silicon in at least part of fine irregular pattern of the surface tends to be induced.SOLUTION: There is provided chemical liquid for water-repellent protective film formation of a wafer, which is formed with fine irregular pattern on the surface, including water-repellent protective film formation agent for forming water-repellent protective film on at least surfaces of the recessed parts in washing the wafer. The wafer has at least one kind of material selected from a group consisted of titanium, titanium nitride, tungsten, aluminum, copper, tin, tantalum nitride, ruthenium, and silicon in at least part of the surfaces of the recessed parts of the irregular pattern. The water-repellent protective film formation agent is water insoluble surface active agent.
摘要翻译：要解决的问题：为了提供用于保护膜形成的化学液体，在半导体器件制造中，改进洗涤步骤，其中包括至少一种选自钛，钛，钛，氮化物，钨，铝，铜，锡，氮化钽，钌和硅中的至少一部分细微的不规则图案倾向于被诱导。
解决方案：提供了用于防水保护膜形成的化学液体，其在表面上形成有细微不规则图案，包括至少形成防水保护膜的防水保护膜形成剂在洗涤晶片时凹部的表面。在不规则图案的凹部的至少一部分表面中，晶片具有选自由钛，氮化钛，钨，铝，铜，锡，氮化钽，钌和硅组成的组中的至少一种材料。防水保护膜形成剂是水不溶性表面活性剂。版权所有（C）2012，JPO＆INPIT

10. 发明专利

JP2007304298A Photoactive element mounting substrate 审中-公开
标题翻译：光电元件安装基板
公开(公告)号：JP2007304298A
公开(公告)日：2007-11-22
申请号：JP2006132077
申请日：2006-05-11
申请人： Central Glass Co Ltd , セントラル硝子株式会社
发明人： SAKAGUCHI SHIGEKI , NANAI HIDETOSHI
IPC分类号： G02B6/42
摘要： PROBLEM TO BE SOLVED: To provide a surface mounting substrate that reduces coupling loss and inter-channel crosstalk in the optical coupling of a surface receiving/emitting photoactive element and an optical waveguide and that makes efficient surface mounting possible while curtailing manufacturing cost. SOLUTION: The photoactive element mounting substrate is a transparent substrate for the purpose of mounting a surface receiving/emitting photoactive element on the surface. The substrate is characterized in that, in the mounting position of the photoactive element, a curved surface for producing a lens effect is formed in a manner not in contact with the surface of the photoactive element, and that a space formed between the curved surface and the surface of the photoactive element is filled with a transparent resin having a different refractive index from that of the substrate. COPYRIGHT: (C)2008,JPO&INPIT
摘要翻译：要解决的问题：提供一种降低表面接收/发射光敏元件和光波导的光耦合中的耦合损耗和沟道间串扰的表面安装基板，并且能够有效地进行表面安装，同时缩小制造成本。解决方案：光敏元件安装基板是用于在表面上安装表面接收/发光光敏元件的透明基板。基板的特征在于，在光活性元件的安装位置，用于产生透镜效果的弯曲表面以不与光敏元件的表面接触的方式形成，并且形成在弯曲表面和光敏元件的表面填充有与基板的折射率不同的折射率的透明树脂。版权所有（C）2008，JPO＆INPIT

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