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1. 发明专利

JP2012145214A Halogen-containing gas supply device 有权
标题翻译：含氢气供应装置
公开(公告)号：JP2012145214A
公开(公告)日：2012-08-02
申请号：JP2011033005
申请日：2011-02-18
申请人： Central Glass Co Ltd , セントラル硝子株式会社
发明人： UMEZAKI TOMONORI , YAO AKIFUMI , NAKAHARA KEITA , TAKEDA YUTA
IPC分类号： F17C13/00 , F17C7/00
摘要： PROBLEM TO BE SOLVED: To suppress a rise of a temperature in a valve chamber of an introduction valve which introduces a halogen-containing gas into an external device, and to suppress surface corrosion in the valve chamber of the introduction valve and the deterioration of a seal material used in the introduction valve.SOLUTION: The halogen-containing gas supply device which supplies the halogen-containing gas to the external device 101 from a vessel which is filled with the halogen-containing gas at high pressure comprises: a supply pipe 4 which connects the vessel 1 and the external device 101; and a supply valve 3 which is arranged at the supply pipe 4, and supplies the halogen-containing gas from the vessel 1. A circulation direction change mechanism for changing the circulation direction of the halogen-containing gas is formed in a pipe at a part of the supply pipe 4 downstream of the supply valve 3.
摘要翻译：要解决的问题：为了抑制将含卤素气体引入外部装置的导入阀的阀室中的温度上升，并且抑制导入阀的阀室的表面腐蚀和导入阀中使用的密封材料的劣化。解决方案：从含有含卤素气体的高压容器向外部装置101供给含卤素气体的含卤素气体供给装置包括：供给管4，其将容器1 和外部设备101; 以及供给阀3，其设置在供给管4处，并从容器1供给含卤素气体。在该部分的管中形成有用于改变含卤素气体的循环方向的循环方向改变机构供应阀3的下游。供应阀3的下游。（C）2012，JPO＆INPIT

2. 发明专利

JP2012102864A Halogen-containing gas supply device 审中-公开
标题翻译：含氢气供应装置
公开(公告)号：JP2012102864A
公开(公告)日：2012-05-31
申请号：JP2011033001
申请日：2011-02-18
申请人： Central Glass Co Ltd , セントラル硝子株式会社
发明人： UMEZAKI TOMONORI , YAO AKIFUMI , NAKAHARA KEITA , TAKEDA YUTA
IPC分类号： F17C13/00 , F17C7/00
摘要： PROBLEM TO BE SOLVED: To suppress a rise of a temperature in a valve chamber of an introduction valve that leads a halogen-containing gas to an external device, and to suppress the surface corrosion of the inside of the valve chamber of the introduction valve, and the deterioration of a seal material used in the introduction valve.SOLUTION: A halogen-containing gas supply device which supplies the halogen-containing gas to the external device 101 from a vessel filled with the halogen-containing gas at high pressure includes a supply pipe 4 for connecting the vessel 1 and the external device 101, and a supply valve 3 which is arranged at the supply pipe 4, and supplies the halogen-containing gas from the vessel 1. A curved pipe 52 in which a curvature radius of a gas flow passage is ≤10 cm is arranged at least at part of the downstream of the supply valve 3 of the supply pipe 4.
摘要翻译：要解决的问题：为了抑制将含卤素气体导向外部装置的导入阀的阀室的温度上升，并且抑制阀室内部的表面腐蚀导入阀，以及导入阀中使用的密封材料的劣化。解决方案：一种从含有含卤素气体的高压容器向外部装置101供给含卤素气体的含卤素气体供给装置包括用于连接容器1和外部的供给管4 装置101和供给阀3，其设置在供给管4处，并从容器1供给含卤素气体。气体流路的曲率半径≤10cm的曲线管52配置在至少在供应管4的供应阀3的下游的一部分。版权所有（C）2012，JPO＆INPIT

3. 发明专利

JP2011127144A Apparatus for generating fluorine gas 有权
标题翻译：用于产生氟气的装置
公开(公告)号：JP2011127144A
公开(公告)日：2011-06-30
申请号：JP2009284184
申请日：2009-12-15
申请人： Central Glass Co Ltd , セントラル硝子株式会社
发明人： MIYAZAKI TATSUO , YAO AKIFUMI , TOKUNAGA ATSUSHI
IPC分类号： C25B9/00 , C25B1/24
摘要： PROBLEM TO BE SOLVED: To roughly refine fluorine gas in a simple structure without requiring to stop an electrolytic cell in the process of rough refining of fluorine gas. SOLUTION: An apparatus for generating fluorine gas is provided, including: an electrolytic cell 1 segmented into a first gas chamber 11a where fluorine gas generated on an anode 7 is introduced and a second gas chamber 12a where hydrogen gas generated on a cathode 8 is introduced; and a rough-refining device 50 roughly refining hydrogen fluoride gas by condensing hydrogen fluoride gas, which is vaporized from a molten salt in the electrolytic cell 1 and mixed into the main product gas. The rough-refining device 50 includes: a hydrogen fluoride reservoir 51 capable of reserving hydrogen fluoride condensed while the main product gas passes; and a cooling device 52 cooling the hydrogen fluoride reservoir 51 at a temperature higher than the melting point of hydrogen fluoride. The hydrogen fluoride reservoir 51 includes a condensation cell 54 having a vapor phase portion where the main product gas passes and a discharge cell 55 discharging the hydrogen fluoride to the outside by supplying a carrier gas into the hydrogen fluoride liquid, wherein the liquid phase portions of the condensation cell 54 and the discharge cell 55 are connected, while the vapor phase portions 54a, 55a are separated from each other. COPYRIGHT: (C)2011,JPO&INPIT
摘要翻译：要解决的问题：在粗略精炼氟气的过程中，不需要停止电解槽，就能简单地粗略地精炼氟气。解决方案：提供一种产生氟气的装置，包括：分解成在阳极7上产生的氟气引入的第一气室11a中的电解槽1和在阴极上产生氢气的第二气室12a 8引入; 以及粗炼装置50通过冷凝从电解槽1中的熔融盐蒸发并混合到主产物气体中的氟化氢气体粗略地精炼氟化氢气体。粗炼装置50包括：氟化氢储存器51，其能够在主产物气体通过时保留冷凝的氟化氢; 以及在高于氟化氢熔点的温度下冷却氟化氢储存器51的冷却装置52。氟化氢储存器51包括具有主要产物气体通过的气相部分的冷凝单元54和通过向氟化氢液体中供应载气而将氟化氢排放到外部的放电单元55，其中液相部分冷凝池54和放电单元55连接，同时气相部分54a，55a彼此分离。版权所有（C）2011，JPO＆INPIT

4. 发明专利

JP2011127143A Apparatus for generating fluorine gas 有权
标题翻译：用于产生氟气的装置
公开(公告)号：JP2011127143A
公开(公告)日：2011-06-30
申请号：JP2009284177
申请日：2009-12-15
申请人： Central Glass Co Ltd , セントラル硝子株式会社
发明人： MIYAZAKI TATSUO , YAO AKIFUMI , TOKUNAGA ATSUSHI
IPC分类号： C25B9/00
摘要： PROBLEM TO BE SOLVED: To effectively use hydrogen fluoride condensed in the process of crudely refining of fluorine gas. SOLUTION: An apparatus for generating fluorine gas is provided, including: an electrolytic cell 1, which includes a first gas chamber 11a where a main product gas essentially comprising fluorine gas generated on an anode 7 is introduced and a second gas chamber 12a where a byproduct gas essentially comprising hydrogen gas generated on a cathode 8 is introduced, both chambers segmented on a molten salt liquid surface; a hydrogen fluoride supply source 40 reserving hydrogen fluoride to be supplied to the electrolytic cell 1; and a crudely refining device 50 roughly refining fluorine gas by condensing hydrogen fluoride gas which is vaporized from the molten salt in the electrolytic cell 1 and mixed into the main product gas. The crudely refining device 50 includes: a hydrogen fluoride reservoir 51 capable of reserving hydrogen fluoride condensed while the main product gas passes; a cooling device 52 condensing the hydrogen fluoride gas in the main product gas by cooling the hydrogen fluoride reservoir 51 at a temperature equal to or higher than the melting point of hydrogen fluoride; and a recovering equipment 53 conveying and recovering the hydrogen fluoride reserved in the hydrogen fluoride reservoir 51 to the electrolytic cell 1 or the hydrogen fluoride supply source 40. COPYRIGHT: (C)2011,JPO&INPIT
摘要翻译：要解决的问题：在氟气粗炼的过程中有效地使用浓缩的氟化氢。解决方案：提供一种产生氟气的装置，包括：电解槽1，其包括第一气室11a，其中引入在阳极7上产生的基本上包含氟气的主要产物气体，第二气室12a 其中引入基本上包含在阴极8上产生的氢气的副产物气体，两个腔室分段在熔融盐液体表面上; 储存供给电解槽1的氟化氢的氟化氢供给源40; 粗炼装置50通过将从电解槽1中的熔融盐蒸发的氟化氢气体冷凝并混合到主要产物气体中来大致精炼氟气。粗炼装置50包括：氟化氢储存器51，其能够在主产物气体通过时储存氟化氢; 冷却装置52，其通过在等于或高于氟化氢的熔点的温度下冷却氟化氢储存器51来冷凝主产物气体中的氟化氢气体; 以及将氟化氢储存器51中保留的氟化氢输送并回收到电解槽1或氟化氢供给源40的回收设备53.（C）2011，JPO＆INPIT

5. 发明专利

JP2011117032A Fluorine gas generating apparatus 有权
标题翻译：氟燃气发生装置
公开(公告)号：JP2011117032A
公开(公告)日：2011-06-16
申请号：JP2009274676
申请日：2009-12-02
申请人： Central Glass Co Ltd , セントラル硝子株式会社
发明人： YAO AKIFUMI , MIYAZAKI TATSUO , NAKAMURA YOSUKE , NAKAHARA KEITA , TOKUNAGA ATSUSHI
IPC分类号： C25B9/00
CPC分类号： C25B1/245
摘要： PROBLEM TO BE SOLVED: To provide a fluorine gas generating apparatus capable of effectively using components other than fluorine gas collected in a step of refining fluorine gas. SOLUTION: The fluorine gas generating apparatus includes: an electrolytic tank 1 in which a first gas chamber 11a with main raw gas mainly consisting of fluorine gas generated at an anode 7 immersed in molten salt being led thereto, and a second gas chamber 12a with a byproduct gas mainly consisting of gaseous hydrogen generated at a cathode 8 immersed in molten salt being led thereto are separated from each other on the molten salt level; and a refining device 16 for collecting gaseous hydrogen fluoride mixed in the main raw gas vaporized from the molten salt in the electrolytic tank 1 and generated from the anode 7 and refining gaseous fluorine. The refining device 16 has collection apparatuses 50, 54 which convey the collected hydrogen fluoride to the electrolytic tank 1 and collect it therein. COPYRIGHT: (C)2011,JPO&INPIT
摘要翻译：解决的问题：提供一种能够有效地利用在精炼氟气的工序中收集的氟气以外的成分的氟气发生装置。解决方案：氟气发生装置包括：电解槽1，其中主要原料气体主要由在浸没在熔融盐中的阳极7产生的氟气的第一气体室11a引导到第一气室11a，第二气室 12a，其中主要由阴极8产生的气态氢组成的副产物气体浸没在熔融盐中，在熔融盐水平上彼此分离; 以及精炼装置16，其用于收集从在电解槽1中从熔融盐蒸发而从阳极7产生的主要原料气中混合的氟化氢，并精炼出氟化物。精炼装置16具有将收集的氟化氢输送到电解槽1并收集在其中的收集装置50,54。版权所有（C）2011，JPO＆INPIT

6. 发明专利

JP2010242127A Fluorine gas generation device 有权
标题翻译：氟气发生装置
公开(公告)号：JP2010242127A
公开(公告)日：2010-10-28
申请号：JP2009089444
申请日：2009-04-01
申请人： Central Glass Co Ltd , セントラル硝子株式会社
发明人： MORI ISAMU , YAO AKIFUMI , MIYAZAKI TATSUO
IPC分类号： C25B9/00 , C25B1/24 , C25B15/08
CPC分类号： C25B1/245 , C25B15/08
摘要： PROBLEM TO BE SOLVED: To provide a fluorine gas generation device capable of stably supplying a fluorine gas to an external device. SOLUTION: In the fluorine gas generation device provided with purification devices 16 that remove hydrogen fluoride gas mixed in a primary product fluorine gas that vaporizes from a molten salt and is generated at an anode 7, at least two purification devices 16 are arranged in parallel, and are provided with gas inflow sections 61a into which the primary product fluorine gas, containing hydrogen fluoride gas, flows and cooling devices 70a that cool the gas inflow sections 61a so that the hydrogen fluoride gas mixed in the primary product fluorine gas solidifies while fluorine gas passes through the gas inflow sections 61a, on the basis of detection results from an accumulation detector 86a that detects the accumulation state of hydrogen fluoride in the gas inflow sections 61a, a control device switches over from one purification device 16 to the other, so that fluorine gas is directed to the purification device 16 that had been on standby, while hydrogen fluoride is discharged from the gas inflow section 61a of the purification device 16 that is stopped by the switchover, and fluorine gas is provided to the gas inflow section 61a thereof, thereby putting the stopped purification device 16 in a standby state. COPYRIGHT: (C)2011,JPO&INPIT
摘要翻译：解决的问题：提供能够将氟气稳定地供给到外部装置的氟气生成装置。解决方案：在具有净化装置16的氟气生成装置中，除去从熔融盐蒸发并在阳极7产生的一次产物氟气中混合的氟化氢气体，排列有至少两个净化装置16 平行地设置有气体流入部61a，含有氟化氢气体的一次产物氟气流入其中，冷却装置70a冷却气体流入部61a，使得混合在一次产物氟气中的氟化氢气体固化同时氟气通过气体流入部61a，根据检测到气体流入部61a中的氟化氢的累积状态的累积检测器86a的检测结果，控制装置从一个净化装置16切换到另一个，从而使氟气导入到待机状态的净化装置16，同时氟化氢被排出通过切换停止的净化装置16的气体流入部61a，向气体流入部61a设置氟气，从而将停止的净化装置16置于待机状态。版权所有（C）2011，JPO＆INPIT

7. 发明专利

JP2013203571A Method and apparatus for producing fluorine gas 审中-公开
标题翻译：生产氟气的方法和装置
公开(公告)号：JP2013203571A
公开(公告)日：2013-10-07
申请号：JP2012072680
申请日：2012-03-28
申请人： Central Glass Co Ltd , セントラル硝子株式会社
发明人： MORI ISAMU , YAO AKIFUMI , KITA TAKUYA , UMEZAKI TOMONORI , MIYAZAKI TATSUO
IPC分类号： C01B7/20
CPC分类号： C01B7/20
摘要： PROBLEM TO BE SOLVED: To provide a method and an apparatus for producing fluorine gas by which a large amount of fluorine gas is produced safely from a compound between fluorinated halogens.SOLUTION: A method for producing fluorine gas comprises: a step [1] to generate fluorine gas and a compound gas XFbetween lowly fluorinated halogens (wherein, X is a halogen except fluorine; and n is an integer of 3-7) by exciting a compound gas XFbetween highly fluorinated halogens (wherein, X is a halogen except fluorine; and n is an integer of 3-7); and a step [2] to collect the compound gas between the lowly fluorinated halogens.
摘要翻译：要解决的问题：提供从氟化卤素之间的化合物安全地产生大量氟气的氟气的制造方法和装置。解决方案：一种制备氟气的方法包括：步骤[1]至通过在高氟化卤素（其中，X是除氟之外的卤素）上激发化合物气体XF，在低氟卤素（其中，X是氟以外的卤素，n是3-7的整数）中产生氟气和复合气体XF; n为3-7的整数）; 以及在低氟卤素之间收集复合气体的步骤[2]。

8. 发明专利

JP2011208276A Apparatus for generating fluorine gas 审中-公开
标题翻译：用于产生氟气的装置
公开(公告)号：JP2011208276A
公开(公告)日：2011-10-20
申请号：JP2011020868
申请日：2011-02-02
申请人： Central Glass Co Ltd , セントラル硝子株式会社
发明人： MIYAZAKI TATSUO , YAO AKIFUMI , KITA TAKUYA
IPC分类号： C25B9/00
CPC分类号： C25B1/245 , B01D53/0423 , B01D53/0446 , B01D53/685 , B01D2256/26 , B01D2257/2047 , C25B15/08
摘要： PROBLEM TO BE SOLVED: To provide an apparatus for generating fluorine gas, the apparatus preventing clogging in a purification apparatus that adsorbs and removes hydrogen fluoride, and capable of stably supplying high-purity fluorine gas.SOLUTION: The apparatus for generating fluorine gas includes a purification apparatus 20 adsorbing and removing hydrogen fluoride with an adsorbent, the hydrogen fluoride mixed into a fluorine gas vaporized from a molten salt in an electrolytic tank 1 and generated from a positive electrode 7. The purification apparatus 20 includes: a cylindrical member through which a main product gas containing the fluorine gas generated in the electrolysis tank 1 passes; a temperature regulator that regulates the temperature of the cylindrical member; and an adsorbent holder provided inside the cylindrical member. The adsorbent holder is provided so as to form a space to secure a flow passage of the main product gas inside the cylindrical member.
摘要翻译：要解决的问题：提供一种产生氟气的装置，该装置能够防止吸附和除去氟化氢并能够稳定地供应高纯度氟气的净化装置中的堵塞。解决方案：用于产生氟气的装置包括：净化装置20用吸附剂吸附除去氟化氢，将氟化氢混入从电解槽1中的熔融盐中蒸发而从正极7产生的氟气中。净化装置20包括：筒状构件，含有在电解槽1中产生的氟气的主要产物气体通过; 温度调节器，其调节圆柱形构件的温度; 以及设置在筒状构件内的吸附剂保持体。吸附剂保持器设置成形成用于将主要产品气体的流动通道固定在圆筒形构件内部的空间。

9. 发明专利

JP2011149051A Fluorine-gas-generating apparatus 有权
标题翻译：氟气发生装置
公开(公告)号：JP2011149051A
公开(公告)日：2011-08-04
申请号：JP2010011010
申请日：2010-01-21
申请人： Central Glass Co Ltd , セントラル硝子株式会社
发明人： YAO AKIFUMI , TOKUNAGA ATSUSHI
IPC分类号： C25B9/00 , C25B15/02
CPC分类号： C25B1/245 , C25B9/00 , C25B15/02 , C25B15/08
摘要： PROBLEM TO BE SOLVED: To provide a fluorine-gas-generating apparatus which can be safely stopped at emergency shutdown, and can be restarted promptly.
SOLUTION: The fluorine-gas-generating apparatus 100 has an emergency shutdown facility which works at the emergency shutdown. The emergency shutdown facility includes: an alternative-gas supply facility 201 which can supply a coolant in a purifier 16 as an alternative gas in place of a carrier gas that is shut off by the closure of a shut-off valve 47 for the carrier gas, which is accompanied by the loss of a driving source with the emergency shutdown of the fluorine-gas-generating apparatus 100; an alternative-carrier-gas shut-off valve 209 which switches between the supply and the shutoff of the alternative gas to a hydrogen-fluoride supply passage 41; and an instrument-gas supply facility for the emergency shutdown, which has an instrument-gas shut-off valve that enables an instrument gas to be supplied to the hydrogen-fluoride supply passage by opening itself when the driving source has been lost at the emergency shutdown of the fluorine-gas-generating apparatus 100. When the fluorine-gas-generating apparatus 100 has stopped at the emergency shutdown, the alternative-carrier-gas shut-off valve 209 opens in response to the supply of the instrument gas and the alternative gas is supplied to the hydrogen-fluoride supply passage 41.
COPYRIGHT: (C)2011,JPO&INPIT
摘要翻译：要解决的问题：提供一种在紧急停机时可以安全停止的氟气发生装置，并且可以及时重启。解决方案：氟气发生装置100具有在紧急关闭时起作用的紧急停机设备。紧急关闭设施包括：替代气体供应设备201，其可以提供净化器16中的冷却剂作为替代气体，代替通过关闭用于载气的截止阀47关闭的载气伴随着氟气生成装置100的紧急关闭而导致的驱动源的损失; 替代气体截止阀209，其在替代气体的供应和关闭之间切换到氟化氢供应通道41; 以及用于紧急关闭的仪器气体供应设备，其具有仪器气体截止阀，其能够在驱动源在紧急情况下丢失时将仪器气体通过自身打开而供给到氟化氢供给通道当氟气产生装置100在紧急关闭时停止时，替代载气切断阀209响应于仪器气体的供给而打开，并且替代气体供应给氟化氢供应通道41.版权所有（C）2011，JPO＆INPIT

10. 发明专利

JP2010245226A System for in-situ mixing and diluting fluorine gas 有权
标题翻译：用于现场混合和稀释氟气的系统
公开(公告)号：JP2010245226A
公开(公告)日：2010-10-28
申请号：JP2009091285
申请日：2009-04-03
申请人： Central Glass Co Ltd , セントラル硝子株式会社
发明人： KIKUCHI AKIO , MORI ISAMU , YAO AKIFUMI , MIYAZAKI TATSUO , NAKAHARA KEITA
IPC分类号： H01L21/31 , H01L21/205 , H01L21/3065
CPC分类号： C01B7/20 , B01F3/028 , B01F15/0408 , G05D11/132
摘要： PROBLEM TO BE SOLVED: To provide a fluorine gas supply system with which fluorine gas generated by a fluorine gas generator is stably supplied in a large amount to a semiconductor processing device in a precise concentration.
SOLUTION: The fluorine gas supply system is configured to introduce mixed gas stored in a buffer tank 5 into gas introduction piping 4 before the mixed gas is adjusted in the buffer tank 5 and then circulate the mixed gas, and also to adjust the flow rate of an inert gas supply source 2 in response to an obtained fluorine concentration by providing a monitor device 13 which measures the fluorine concentration in the mixed gas.
COPYRIGHT: (C)2011,JPO&INPIT

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