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1. 发明专利

JP2001139848A COLORED COMPOSITION, PHOTOCURABLE COLORED COMPOSITION, COLOR FILTER AND LIQUID CRYSTAL DISPLAY ELEMENT 失效
公开(公告)号：JP2001139848A
公开(公告)日：2001-05-22
申请号：JP32539099
申请日：1999-11-16
申请人： CHISSO CORP
发明人： FUKUMURA TAKANORI , SATO HIROYUKI , WATANABE EIJI , OOIZUMI FUMITAKA
IPC分类号： G02B5/20 , C08F2/30 , C08F2/44 , C08F2/50 , C08F290/06 , C08K5/00 , C08K5/101 , C08L71/00 , C08L101/12 , C09D4/02 , C09D5/00 , C09D7/12 , C09D201/00 , G02F1/1335 , G09F9/00
摘要： PROBLEM TO BE SOLVED: To provide a colored composition which has a high color purity and gives a coating film excellent in storage stability, a photocurable colored composition not only having these advantages but also hardly leaving development residue, a color filter using the same and a liquid crystal display element. SOLUTION: The colored composition comprises a solvent (A), a colorant (B) and surfactants (C), and at least one of the surfactants (C) has a hexafluoropropene structure, and is preferably a fluoroalkyl polyoxyethylene ether bearing a hexafluoropropene structure. The photocurable colored composition comprises a solvent (A), a colorant (B), surfactants (C), an alkali-soluble resin (D), a multifunctional monomer (E) and a photopolymerization initiator (F), and at least one of the surfactants (C) is a compound bearing a hexafluoropropene structure, preferably a fluoroalkyl polyoxyethylene ether bearing a hexafluoropropene structure. The color filter is manufactured using this photocurable colored composition. The liquid crystal display element is manufactured using this color filter.

2. 发明专利

JP2000181063A RESIN COMPOSITION FOR COLOR FILTER 失效
公开(公告)号：JP2000181063A
公开(公告)日：2000-06-30
申请号：JP2495999
申请日：1999-02-02
申请人： CHISSO CORP
发明人： SATO HIROYUKI , FUKUMURA TAKANORI , OOIZUMI FUMITAKA , MATSUSHIMA TOSHINORI , MASAKI YOSHINORI
IPC分类号： G03F7/004 , C08F220/28 , G02B5/20 , G02F1/1335 , G03F7/033
摘要： PROBLEM TO BE SOLVED: To obtain a resin composition for a color filter having high adhesiveness to a glass substrate, giving an appropriate shape of a pattern edge and producing no scum in development. SOLUTION: This resin composition contains (A) a random copolymer obtained by copolymerizing one or more compounds of formula 1 and other vinyl monomer, (B) a radiation sensitive compound and (C) a colorant. In the formula, R1 is H or methyl, R2 is 1-5C alkyl and (n) is an integer of 0-5.

3. 发明专利

JPH0588377A PHOTOSENSITIVE RESIN DEVELOPER 失效
公开(公告)号：JPH0588377A
公开(公告)日：1993-04-09
申请号：JP27668791
申请日：1991-09-27
申请人： CHISSO CORP
发明人： SATO HIROYUKI , FUKUMURA TAKANORI , NAGAIE TETSUYA , KOBAYASHI KATSUHIKO , KAWABATA HIROSHI
IPC分类号： G03F7/32 , H01L21/027 , H01L21/30
摘要： PURPOSE:To obtain a developer for a water-soluble resin without the developing performance hardly deteriorated even after repeated developments. CONSTITUTION:One or more kinds selected from the aq. solns. of the following groups A and B are mixed in the weight ratio of A:B=1:0.01 to 0.01:1 to obtain a developer for a photosensitive resin. The group A consists of the aq. solns. of NaOH, KOH, Na2CO3, K2CO3, (CH3)4NOH and NH3. The group B consists of dil. hydrochloric acid or the aq. solns. of NaCl, KCl, NaHCO3, KHCO3, borax, boric acid, glycin, NH4Cl, Na2HPO4, etc. The developing time is not significantly varied even after repeated developments, and the developer can be used many times under the same conditions.

4. 发明专利

JP2003149801A COLOR RESIST COMPOSITION 审中-公开
公开(公告)号：JP2003149801A
公开(公告)日：2003-05-21
申请号：JP2002021299
申请日：2002-01-30
申请人： CHISSO CORP
发明人： FUKUMURA TAKANORI , MOMOSE KEIICHI , HORIUCHI SHINGO , SATO HIROYUKI
IPC分类号： G03F7/004 , C08F2/44 , C08F220/28 , C08F290/06 , C08F291/00 , G02B5/20 , G03F7/028 , G03F7/033
摘要： PROBLEM TO BE SOLVED: To provide a color resist composition which achieves high color purity in a thin film, satisfies uniformity in coating, photo-curability, developability, pattern shape, storage stability, etc., and is suitable for use as a color filter material for a liquid crystal display. SOLUTION: In the color resist composition comprising a polymer binder (A), a compound (B) having an unsaturated double bond, a photopolymerization initiator (C), a colorant (D), a pigment dispersant and/or additive (E) and a solvent (F), the weight ratio of D to (A+B+C+E) is 0.7-2.0, the weight ratio of B to A is 0.5-2.0, the weight ratio of C to B is 0.1-2.0, the weight ratio of E to D is 0.1-1.0 and the weight ratio of (A+B+C+D+E) to (A+B+C+D+E+ F) is 0.1-0.4.

5. 发明专利

JP2001181348A THERMO- OR PHOTO-SETTING COMPOSITION 失效
公开(公告)号：JP2001181348A
公开(公告)日：2001-07-03
申请号：JP36888499
申请日：1999-12-27
申请人： CHISSO CORP
发明人： SATO HIROYUKI , FUKUMURA TAKANORI , OOIZUMI FUMITAKA
IPC分类号： G03F7/027 , C08F2/48 , C08F20/10 , C08F290/00 , C09D4/00 , C09J4/00 , G02B5/20 , G03F7/40
摘要： PROBLEM TO BE SOLVED: To provide a thermo- or photo-setting composition having higher safety and stability in substitution for conventional thermo-setting compositions made from acrylates that give unfavorable influences on the human body such as skin irritation. SOLUTION: A thermo- or photo-setting composition contains one or more of unsaturated compounds described in the following formulas (A) to (C): (A) the unsaturated compound having not more than 500,000 of weight-average molecular weight being represented by general formula (1); R1-CH=CH-CH= CH-COO}1 R2} (1) (B) the unsaturated compound having not more than 500,000 of weight-average molecular weight being represented by general formula (2); R1-CH=CH-CH=CH-COO-CH2-CH(OH)-CH2-}m R3} (2), and (C) the unsaturated compound being represented by general formula (3); R1-CH=CH-CH= CH-COO-(R4-O-)n-R5 (3). In the above formula, R1 is a hydrogen atom or a 1-12C alkyl group; R2 is a monovalent organic group; R3 is an m-valent organic group; R4 is a hydrogen atom or -OC-CH=CH-CH=CH-R1; l and m are each independently an integer of not less than 1; and n is an integer of 1-30.

6. 发明专利

JP2000169512A PHOTOPOLYMERIZATION INITIATOR COMPOSITION 失效
公开(公告)号：JP2000169512A
公开(公告)日：2000-06-20
申请号：JP34640498
申请日：1998-12-07
申请人： CHISSO CORP
发明人： SATO HIROYUKI , FUKUMURA TAKANORI , OOIZUMI FUMITAKA
IPC分类号： C07C409/38 , C08F4/36 , G02B5/20
摘要： PROBLEM TO BE SOLVED: To obtain a highly sensitive composition which can cause cure upon irradiation with light by using a polymer having a specified degree of polymerization and obtained by radically polymerizing a vinyl monomer in the presence of a polymerization initiator being an organic peroxide having a benzophenone structure. SOLUTION: Used is a polymer having a weight-average molecular weight of 1,000-100,000 as measured by GPC using a solvent being DMF. In the formula, R1 and R2 are each a 4-15C alkyl or a 9-15C aralkyl; R3 and R4 are each H or a 1-30C organic group; 0

7. 发明专利

JPH10120965A RESIN COMPOSITION FOR SILICON WAFER PROTECTION FILM 失效
公开(公告)号：JPH10120965A
公开(公告)日：1998-05-12
申请号：JP29118296
申请日：1996-10-14
申请人： CHISSO CORP
发明人： SATO HIROYUKI , FUKUMURA TAKANORI , OOIZUMI FUMITAKA
IPC分类号： C09D129/04 , H01L21/304
摘要： PROBLEM TO BE SOLVED: To obtain a resin composition capable of forming a coating film optimum for the surface protection of a silicon wafer and easily removable after polishing by dissolving or dispersing a polyvinyl alcohol in a solvent. SOLUTION: A polyvinyl alcohol(PVA) having a saponification degree of >=90mol%, preferably >=98mol% is dissolved or dispersed in a solvent (preferably, water methanol, propylene glycol, etc.). The molecular weight of the PVA is preferably 3×10 to 0.3Pa.s in terms of viscosity measured by a Hoeppler viscometer as a 4wt.% aqueous solution at 20 deg.C. The amount of the solvent is preferably 90-97wt.%. The alkali resistance of the composition can be improved by adding a compound having double bond such as styrene and epoxy acrylate in an amount of 1-20wt.% based on PVA. The addition of a surfactant improves the peelability and that of a leveling agent such as silicone-based, fluorine-based or polymeric agent improves the film-forming property.

8. 发明专利

JPH08234191A COLOR FILTER LIGHT SHIELDING FILM 失效
公开(公告)号：JPH08234191A
公开(公告)日：1996-09-13
申请号：JP6522095
申请日：1995-02-27
申请人： CHISSO CORP
发明人： MASAKI YOSHINORI , KAWABATA HIROSHI , KOBAYASHI KATSUHIKO , SATO HIROYUKI , FUKUMURA TAKANORI
IPC分类号： G02F1/1335 , H01L31/042
摘要： PURPOSE: To obtain light shielding films having excellent resolution at a low cost with simple production stages by forming these films into two-layered structures composed of an upper layer which consists of a photosensitive resin consisting essentially of carbon black and a lower layer which consists of a photosensitive resin without contg. a light shieldable material. CONSTITUTION: A light shieldable material which consists essentially of the carbon black, has good dispersibility and sufficient adhesive power and is easily developable with water or aq. alkaline soln. is used as the photosensitive resin of the lower layer. Such material includes a photosensitive resin, acrylic resin and their ester, copolymers consisting of their ester and styrene, etc., a photosensitive resin consisting of photopolymerizable compds. having at least >=2 ethylenic unsatd. bonds and a photopolymn. initiator, etc. A material with which sufficient sensitivity is obtd. by exposing in the air and which is easily developable with the water and the aq. alkaline soln. is used as the photosensitive resin of the upper layer. The color filter light shielding films are made of the two- layered structures composed of the lower layer which consists of the photosensitive resin dispersed with the light shieldable material and the upper layer which consists of the photosensitive resin without contg. the light shieldable material.

9. 发明专利

JP2005105264A Thermosetting resin composition and hardened film 有权
标题翻译：热固性树脂组合物和硬化膜
公开(公告)号：JP2005105264A
公开(公告)日：2005-04-21
申请号：JP2004261841
申请日：2004-09-09
申请人： Chisso Corp , チッソ株式会社
发明人： FUKUMURA TAKANORI , SATO HIROYUKI , ITAMI SETSUO , WATANABE EIJI
IPC分类号： G02B5/20 , C08G59/46 , G02F1/1335
摘要： PROBLEM TO BE SOLVED: To prepare a hardened film excellent in solvent resistance, acid resistance, chemical resistance such as resistance to alkalis, water resistance, thermal resistance, adhesion to substrates such as glass, transparency, scratch resistance, coating property, flatness, resistance to light, and excellent in properties related to foreign matters, and to obtain a thermosetting resin composition giving the hardened film. SOLUTION: The resin composition comprising a polyester amic acid obtained by reacting a tetracarboxylic acid dianhydride, a diamine and a polyhydroxy compound as indispensable components, an epoxy resin, a hardener for the epoxy resin and a solvent, wherein the composition comprises 20-400 pts.wt. of the epoxy resin per 100 pts.wt. of the polyester amic acid, and 15-60 pts.wt. of the epoxy hardener per 100 pts.wt. of the epoxy resin. COPYRIGHT: (C)2005,JPO&NCIPI
摘要翻译：要解决的问题：制备耐溶剂性，耐酸性，耐碱性等耐化学性，耐水性，耐热性，对玻璃等基材的粘合性，透明性，耐刮擦性，涂布性，平坦度，耐光性，与异物相关的特性优异，得到赋予硬化膜的热固性树脂组合物。解决方案：包含通过使四羧酸二酐，二胺和多羟基化合物作为不可缺少的组分反应获得的聚酯酰胺酸的树脂组合物，环氧树脂，环氧树脂的固化剂和溶剂，其中组合物包含20 -400磅的环氧树脂每100重量份的聚酯酰胺酸，和15-60重量份。的环氧固化剂每100重量份的环氧树脂。版权所有（C）2005，JPO＆NCIPI

10. 发明专利

JP2001163951A PHOTOCURABLE COLORED COMPOSITION 失效
公开(公告)号：JP2001163951A
公开(公告)日：2001-06-19
申请号：JP35445199
申请日：1999-12-14
申请人： CHISSO CORP
发明人： SATO HIROYUKI , WATANABE EIJI , FUKUMURA TAKANORI , OOIZUMI FUMITAKA
IPC分类号： G03F7/004 , C08G59/14 , C08G59/40 , C09D4/00 , C09D11/02 , C09D11/033 , C09D11/037 , G02B5/20 , G02F1/1335 , G03F7/027
摘要： PROBLEM TO BE SOLVED: To provide a photocurable colored compositon for a color filter, which gives no developing residue and high sputtering resistance, and to provide the color filter using the composition and a liquid crystal display element using the color filter. SOLUTION: In the photocurable colored composition comprising (A) a polymer binding agent, (B) a solvent, (C) a coloring agent, (D) a photopolymerization initiator and (E) a radical polymerizable monomer, the composition is characterized in that the polymer binding agent comprises a mixture of an alkali-soluble resin having an acid value of 20-200 and a weight-average molecular weight of 1,000-100,000 with a polymer having a weight-average molecular weight of 1,000-100,000 and containing 40-100 mole % of a radical polymerizable monomer unit having an epoxy group and an unsaturated double bond in the same molecule, a weight ratio of their mixing (the former : the latter) being 98:2-30:70, and the color filter is formed using the composition and the liquid crystal display element is produced using the color filter.

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