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1. 发明专利

JPH1017547A INITIATOR FOR OPTICAL POLYMERIZATION 失效
公开(公告)号：JPH1017547A
公开(公告)日：1998-01-20
申请号：JP19153196
申请日：1996-07-02
申请人： CHISSO CORP
发明人： KATO TAKASHI , MASAKI YOSHINORI , SATO HIDEO
IPC分类号： C07C409/38 , C07C409/40 , C08F4/28 , C08F4/36
摘要： PROBLEM TO BE SOLVED: To obtain the new subject derivative having a specific substituent and high polymerization activity, excellent in solubility in unsaturated monomers and useful as an initiator for optical polymerizations. SOLUTION: This initiator for optical polymerizations is a derivative expressed by formula I [R1 and R2 are each a 4-15C tertiary alkyl or tertiary alarkyl; R3 and R4 are each H, a 1-10C alkyl, alkoxy, a halogenated methyl, a halogen, cyano, nitro, a 2-20C dialkylamino; (m) is 0-2 and (n) is 1-3.], e.g. 3,4,4'-tri(t-butylperoxycarbonyl)benzophenone, etc. The compound is obtained by synthesizing a benzophenonecarboxylic acid derivative of formula II, bringing the carboxylic acid derivative to a carboxylic acid chloride of formula III by using thionyl chloride, phosphorus pentachloride, phosgen, etc., and reacting the acid chloride with a hydroperoxide in the presence of a basic compound such as sodium hydroxide or triethylamine.

2. 发明专利

JPH08234191A COLOR FILTER LIGHT SHIELDING FILM 失效
公开(公告)号：JPH08234191A
公开(公告)日：1996-09-13
申请号：JP6522095
申请日：1995-02-27
申请人： CHISSO CORP
发明人： MASAKI YOSHINORI , KAWABATA HIROSHI , KOBAYASHI KATSUHIKO , SATO HIROYUKI , FUKUMURA TAKANORI
IPC分类号： G02F1/1335 , H01L31/042
摘要： PURPOSE: To obtain light shielding films having excellent resolution at a low cost with simple production stages by forming these films into two-layered structures composed of an upper layer which consists of a photosensitive resin consisting essentially of carbon black and a lower layer which consists of a photosensitive resin without contg. a light shieldable material. CONSTITUTION: A light shieldable material which consists essentially of the carbon black, has good dispersibility and sufficient adhesive power and is easily developable with water or aq. alkaline soln. is used as the photosensitive resin of the lower layer. Such material includes a photosensitive resin, acrylic resin and their ester, copolymers consisting of their ester and styrene, etc., a photosensitive resin consisting of photopolymerizable compds. having at least >=2 ethylenic unsatd. bonds and a photopolymn. initiator, etc. A material with which sufficient sensitivity is obtd. by exposing in the air and which is easily developable with the water and the aq. alkaline soln. is used as the photosensitive resin of the upper layer. The color filter light shielding films are made of the two- layered structures composed of the lower layer which consists of the photosensitive resin dispersed with the light shieldable material and the upper layer which consists of the photosensitive resin without contg. the light shieldable material.

3. 发明专利

JPH1068814A COLOR FILTER FORMING MATERIAL 失效
公开(公告)号：JPH1068814A
公开(公告)日：1998-03-10
申请号：JP24265896
申请日：1996-08-26
申请人： CHISSO CORP
发明人： KATO TAKASHI , MASAKI YOSHINORI , KAWABATA HIROSHI , SATO HIDEO
IPC分类号： G03F7/004 , C08F4/00 , G02B5/20 , G02F1/1335 , G03F7/027 , G03F7/031
摘要： PROBLEM TO BE SOLVED: To obtain a color filter forming material having excellent heat resistance, light resistance and moisture resistance and showing little decrease in transmittance by heat in a simple production process by constituting a photosensitive resin compsn. of an alkali-soluble resin, a compd. having ethylene type unsatd. double bonds and a specified photopolymn. initiator. SOLUTION: This photosensitive resin compsn. consists of an alkali soluble resin, a compd. having at least one ethylene type unsatd. double bond, and a photopolymn. initiator. The photopolymn. initiator consists of one or a combination of two or more kinds of halomethyl group-contg. aromatic compds. expressed by formula. In formula. X is -CO-, -CH2 -, -CH=CH-, -O-, -S-, etc., R1 , R2 are independently halomethyl, dihalomethyl, trihalomethyl groups, R3 , R4 are independently hydrogen atoms, 1 to 10C alkoxy group, carboxyl group, carboxylate groups, etc., and (m), (n) are integers satisfying 1

4. 发明专利

JPH05158237A POLYIMIDE TYPE PHOTOSENSITIVE COVER COAT AGENT 失效
公开(公告)号：JPH05158237A
公开(公告)日：1993-06-25
申请号：JP35032591
申请日：1991-12-09
申请人： CHISSO CORP
发明人： MASAKI YOSHINORI , KUNIMUNE KOICHI , MAEDA HIROTOSHI
IPC分类号： C08L79/08 , C08F2/48 , G03F7/004 , G03F7/027 , G03F7/031 , G03F7/037 , G03F7/038 , H01L21/027 , H05K3/28
摘要： PURPOSE:To obtain the photosensitive cover coat agent for forming an insulating protective film superior in compatibility, sensitivity, heat resistance, tight adhesiveness, electric characteristics, and flexibility by mixing a specified polymer and specified compounds, and the like in a specified mixing proportion. CONSTITUTION:This cover coat agent comprises the polymer A having repeating units represented by formula I, the compound B having >=2 acryloyl or methacryloyl groups in one molecule, the compound C represented by formula III in an amount of 0.01-0.80mol equivalent of the compound B and in a B+C amount of 20-200weight% of A, and further, a photopolymerization initiator or a sensitizer in an amount of 0.5-20weight% of A. In formulae I and II, R is a group of formula II; R is a divalent organic group; Z is a divalent aliphatic or aromatic group; R is H, a univalent organic group or a group specified in characteristics; and R is H or -Z-R . The insulating protective film for a printed circuit plate board having the above characteristics can be obtained by treating this agent mixture by the known methods.

5. 发明专利

JPH02109051A POSITIVE PHOTORESIST COMPOSITION 失效
公开(公告)号：JPH02109051A
公开(公告)日：1990-04-20
申请号：JP26375088
申请日：1988-10-18
申请人： CHISSO CORP
发明人： MAEHARA HIROSHI , MASAKI YOSHINORI , YOSHIZAWA SATORU
IPC分类号： G03F7/022 , G03F7/023
摘要： PURPOSE:To improve sensitivity of a positive photoresist, to arrange a sectional shape of a pattern to be perpendicular to a substrate and to eliminate generation of sludge residue by using specified two kinds of photosensitive agents and a specified novolak resin. CONSTITUTION:The positive photoresist compsn. contains a component(A) of photosensitive agents and a novolak resin(B) wherein the component(A) is a mixture of 1,2-naphthoquinonediazide-5-sulfonic ester of 2,3,4-trihydroxy benzophenone(A1) having >=95% degree of esterification and 1,2- naphthoquinonediazide-5-sulfonic ester of 2,3,4,4'-tetrahydroxy benzophenone(A2). 1-3wt.% A2 is contained basing on 100wt.% A1, and

6. 发明专利

JPH01283556A POSITIVE TYPE PHOTORESIST COMPOSITION 失效
公开(公告)号：JPH01283556A
公开(公告)日：1989-11-15
申请号：JP11413888
申请日：1988-05-11
申请人： CHISSO CORP
发明人： MAEHARA HIROSHI , MASAKI YOSHINORI , YOSHIZAWA SATORU
IPC分类号： G03C1/72 , G03F7/022
摘要： PURPOSE:To improve the preserving stability, and to prevent the deterioration of the definition and the heat-resisting property, etc., of the title composition by incorporating a specified mixture as a quinone diazide compd. in the positive type photoresist composition contg. the quinone diazide compd. and an alkaline soluble resin. CONSTITUTION:The positive type photoresist composition contains a composite photosensitive component, and the component is composed of 1,2-naphthoquinone diazide-5-sulfonate of 2,3,4-trihydroxybenzophenone (photosensitive agent A) and said ester (photosensitive agent B) which is different from the photosensitive agent A. The photosensitive agent A is obtd. by esterification occurring between 2,3,4-trihydroxybenzophenone and 1,2-naphthoquinone diazide-5-sulfonic acid, and has the degree of esterification of >=95%. Thus, the preserving stability of the composition is improved, and the deterioration of the definition and the heat-resisting property of the composition is prevented.

7. 发明专利

JPH09178934A COLOR FILTER FORMING MATERIAL 失效
公开(公告)号：JPH09178934A
公开(公告)日：1997-07-11
申请号：JP35023895
申请日：1995-12-22
申请人： CHISSO CORP
发明人： MASAKI YOSHINORI , KAWABATA HIROSHI , KOBAYASHI KATSUHIKO , SATO HIROYUKI , FUKUMURA TAKANORI
IPC分类号： G03F7/028 , G02B5/20 , G02F1/1335
摘要： PROBLEM TO BE SOLVED: To obtain a color filter forming material excellent in heat, light and moisture resistances and causing slight reduction of transmissivity especially due to heat in a simple producing process. SOLUTION: This color filter forming material contains a photosensitive resin, a pigment and a solvent. The photosensitive resin consists of an alkali- soluble resin, a compd. having one or more ethylenically unsatd. double bonds and a photopolymn. initiator which is one or more kinds of compds. represented by formula, wherein R is optionally halogen-substd. 2-15C alkyl, phenyl, etc., and each of R and R is optionally halogen-substd. 1-6C alkyl or alkoxy, phenyl, etc.

8. 发明专利

JPH09178923A COLOR FILTER FORMING MATERIAL 失效
公开(公告)号：JPH09178923A
公开(公告)日：1997-07-11
申请号：JP35023995
申请日：1995-12-22
申请人： CHISSO CORP
发明人： MASAKI YOSHINORI , KAWABATA HIROSHI , KOBAYASHI KATSUHIKO , SATO HIROYUKI , FUKUMURA TAKANORI
IPC分类号： G03F7/033 , C09B67/22 , C09C1/00 , G02B5/20 , G02F1/1335
摘要： PROBLEM TO BE SOLVED: To ensure satisfactory dispersibility of red, green and blue pigments and to obtain red, green and blue color filter forming materials having satisfactory transmissivity and shelf stability by treating each of the pigments with an aliphatic alcohol or amine. SOLUTION: Red, green and blue color filter forming materials separately contain red, green and blue pigments besides a photosensitive resin and a solvent. Each of the pigments consists of two or more kinds of pigments and at least one of these pigments has been treated with 5-25C aliphatic alcohol or amine. The 5-25C aliphatic alcohol is, e.g. octanol or nonalol. The 5-25C aliphatic amine is, e.g. octylamine or nonylamine. The alcohol or amine is preferably used by 0.5-10 pts.wt. based on the amt. of the pigment.

9. 发明专利

JPH08136725A COLOR FILTERING SHIELD FILM 失效
公开(公告)号：JPH08136725A
公开(公告)日：1996-05-31
申请号：JP29893594
申请日：1994-11-07
申请人： CHISSO CORP
发明人： MASAKI YOSHINORI , KAWABATA HIROSHI , KOBAYASHI KATSUHIKO , SATO HIROYUKI , FUKUMURA TAKANORI
IPC分类号： G02B5/20 , G02F1/1335
摘要： PURPOSE: To produce a shield film low in cost and excellent in shielding property and resolution with a simple production process in a color filter for liq. crystal display element by using a specified black dye. CONSTITUTION: The shield film consists of a photosensitive resin and a tetrakisazo based black dye, and the black dye is expressed by formula I. In the formula I, Each of A-D is a benzen ring which may have a substd. group, X is hydrogen atom or an alkali metal. As a preferable form, a compd. expressed by formula II is used as the black dye. In the formula II, X is hydrogen atom or an alkali metal, Y is hydrogen atom, methyl group, methoxy group and a halogen atom and Z is hydrogen atom or methyl group. Though as the photosensitive resin, anyone which can be colored with the black dye may be used, but the photosensitive resin to be used to the color filter having a dyeable group is preferably exemplified. Usually, this photosensitive resin is dissolved in an optional suitable solvent and used as an photosensitive system.

10. 发明专利

JPH02115848A POSITIVE TYPE PHOTORESIST COMPOSITION 失效
公开(公告)号：JPH02115848A
公开(公告)日：1990-04-27
申请号：JP27011488
申请日：1988-10-26
申请人： CHISSO CORP
发明人： MASAKI YOSHINORI , MAEHARA HIROSHI , YOSHIZAWA SATORU
IPC分类号： G03F7/023 , C08G8/00 , C08G8/10
摘要： PURPOSE:To enhance resolution of a composition and to render the sectional form of a pattern perpendicular to a substrate by incorporating a specified quinonediazido compound and a specified novolak resin. CONSTITUTION:The composition comprises 2,3,4-trihydroxybenzophenone 1,2- naphthoquinonediazido-5-sulfonate and a cresol-formaldehyde novolak resin (A) having a weight average molecular weight of 8,000-25,000 obtained by condensing 45-65wt.% m-cresol, 20-40wt.% p-cresol, 0-15wt.% o-cresol, and 10-25wt.% xylenols (containing 50-100wt.% 2,4-xylenol), with formaldehyde.

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