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1. 发明专利

JP2009088509A Lithography apparatus and method of cleaning lithography apparatus 有权
标题翻译：光刻设备和清洗光刻设备的方法
公开(公告)号：JP2009088509A
公开(公告)日：2009-04-23
申请号：JP2008240097
申请日：2008-09-19
申请人： Asml Netherlands Bv , エーエスエムエルネザーランズビー.ブイ.
发明人： KADIJK EDWIN CORNELIS , AKKER JEROEN VAN DEN , ANSTOTZ DAVID LUCIEN
IPC分类号： H01L21/027 , G03F7/20 , H01L21/68
CPC分类号： G03F7/70341
摘要： PROBLEM TO BE SOLVED: To provide a lithography apparatus and a method of cleaning such apparatus. SOLUTION: The immersion lithography apparatus reduces contamination of immersion liquid due to topcoat fragments of a substrate or an upper face of a substrate table, resists, residual particles, and the like; and accordingly, focusing defects are reduced; and as a countermeasure which prolongs life expectancy of components of the immersed lithography apparatus, an inlet is provided to supply cleaned liquid in a space between an object such as the substrate positioned on the substrate table and the substrate table. COPYRIGHT: (C)2009,JPO&INPIT
摘要翻译：要解决的问题：提供一种光刻设备和清洁这种设备的方法。解决方案：浸没式光刻设备减少了由于基板的面漆碎片或基板台的上表面，抗蚀剂，残留颗粒等引起的浸没液体的污染; 因此减少了聚焦缺陷; 并且作为延长浸入式光刻设备的部件的预期寿命的对策，提供入口以将清洁的液体供应在诸如位于基板台上的基板和基板台之间的空间中。版权所有（C）2009，JPO＆INPIT

2. 发明专利

JP2007266603A Lithographic device and method of manufacturing device 有权
标题翻译：光刻设备及其制造方法
公开(公告)号：JP2007266603A
公开(公告)日：2007-10-11
申请号：JP2007072118
申请日：2007-03-20
申请人： Asml Netherlands Bv , エーエスエムエルネザーランズビー.ブイ.
发明人： KEMPER NICOLAAS R , LAMBERTUS DONDERS SJOERD NICOL , OTTENS JOOST JEROEN , VAN DER HOEVEN JAN CORNELIS , KADIJK EDWIN CORNELIS , SERGEI SHULEPOV
IPC分类号： H01L21/027 , G03F7/20
CPC分类号： G03B27/42 , G03F7/70341 , G03F7/70716
摘要： PROBLEM TO BE SOLVED: To provide an exposure device capable of removing an immersion liquid in the edge of a substrate in immersion exposure. SOLUTION: A drain 10 is provided around an outer edge of a substrate W arranged such that a gap 15 exists between the substrate W and a substrate table WT. In this drain 10, the pressure of gas within a chamber 70 is maintained to be equal to the pressure of gas outside of the substrate table WT (i.e., the pressure of ambient gas.) This means the fact that, in a usual operation, substantially no gas flow which passes the gap 15 is present during a period when the gap 15 is not covered with a liquid supply system and one or more gas flow devices of the liquid supply system blow the gas away through the gap 15. COPYRIGHT: (C)2008,JPO&INPIT
摘要翻译：要解决的问题：提供一种能够在浸没曝光中去除衬底边缘中的浸没液体的曝光装置。解决方案：在衬底W的外边缘周围设置漏极10，衬底W的外缘布置成使得在衬底W和衬底台WT之间存在间隙15。在这个排水管10中，室70内的气体的压力保持等于衬底台WT外面的气体压力（即环境气体的压力）。这意味着在通常的操作中，在间隙15没有被液体供应系统覆盖的时间段内，基本上没有通过间隙15的气流存在，并且液体供应系统的一个或多个气体流动装置通过间隙15吹走气体。版权所有（C）2008，JPO＆INPIT

3. 发明专利

JP2012134527A Lithography apparatus and method of cleaning lithography apparatus 有权
标题翻译：光刻设备和清洗光刻设备的方法
公开(公告)号：JP2012134527A
公开(公告)日：2012-07-12
申请号：JP2012038121
申请日：2012-02-24
申请人： Asml Netherlands Bv , エーエスエムエルネザーランズビー.ブイ.
发明人： KADIJK EDWIN CORNELIS , AKKER JEROEN VAN DEN , ANSTOTZ DAVID LUCIEN
IPC分类号： H01L21/027
CPC分类号： G03F7/70341
摘要： PROBLEM TO BE SOLVED: To provide a lithography apparatus and a method of cleaning such an apparatus.SOLUTION: An immersion lithography apparatus reduces contamination of immersion liquid due to topcoat fragments of a substrate W or an upper surface of a substrate table WT, resists, residual particles, and the like, and thus reduces focusing defects. As a measure to extend life expectancy of components of the immersion lithography apparatus, an inlet 122 is provided to supply cleaned liquid into a space between an object such as the substrate W positioned on the substrate table WT and the substrate table WT.
摘要翻译：要解决的问题：提供一种光刻设备和清洁这种设备的方法。解决方案：浸没式光刻设备减少了由于衬底W的顶涂片或衬底台WT的上表面，抗蚀剂，残留颗粒等引起的浸没液的污染，从而减少了聚焦缺陷。作为延长浸没式光刻设备的组件的预期寿命的措施，提供入口122以将清洁的液体供应到诸如位于衬底台WT上的衬底W的对象和衬底台WT之间的空间中。版权所有（C）2012，JPO＆INPIT

4. 发明专利

JP2012114469A Lithographic apparatus 有权
标题翻译： LITHOGRAPHIC设备
公开(公告)号：JP2012114469A
公开(公告)日：2012-06-14
申请号：JP2012055739
申请日：2012-03-13
申请人： Asml Netherlands Bv , エーエスエムエルネザーランズビー.ブイ.
发明人： DE JONG FREDERIK E , BEEMS MARCEL HENDRIKUS MARIA , VAN DEN BRINK MARINUS AART , JACOBS JOHANNES HENRICUS WILHELMUS , ANTONIUS LEENDERS MARTINUS HENDRIKUS , LEVACIA LEON MARTIN , VAN DER MEULEN FRITS , OTTENS JOOST JEROEN , ZAAL KOEN JACOBUS J M , JOHANNES DROSTE RICHARD BERNARDUS , DE KLERK JOHANNES W , WANTEN PETER FRANCISCUS , VAN DER HOEVEN JAN CORNELIS , KADIJK EDWIN CORNELIS , DE JONG MARTEIJN , ANSTOTZ DAVID LUCIEN
IPC分类号： H01L21/027 , G03F7/20
CPC分类号： G03F7/70875 , G03F7/70341 , G03F7/70716
摘要： PROBLEM TO BE SOLVED: To provide a lithographic apparatus in which liquid can be drained through a gap between, for example, an edge of an object and a substrate table on which the object is disposed.SOLUTION: A liquid immersion lithographic apparatus includes a drain configured to drain liquid through a gap between an edge of a substrate and a substrate table on which the substrate is supported. The drain comprises: means for feeding the liquid to the drain regardless of a position of the substrate table; and/or means for saturating gas in the drain. These means reduce fluctuation of heat loss due to evaporation of the liquid in the drain.
摘要翻译：要解决的问题：提供一种光刻设备，其中液体可以通过例如物体的边缘和其上放置物体的基板台之间的间隙排出。解决方案：液浸式光刻设备包括被配置为通过衬底的边缘和衬底台之间的间隙排出液体的漏极，衬底台被支撑在衬底台上。排水口包括：无论基板台的位置如何，将液体供给到排水口的装置; 和/或用于在排水管中使气体饱和的装置。这些意味着减少由于排水管中液体的蒸发导致的热损失的波动。版权所有（C）2012，JPO＆INPIT

5. 发明专利

JP2011205128A Lithographic apparatus 有权
标题翻译： LITHOGRAPHIC设备
公开(公告)号：JP2011205128A
公开(公告)日：2011-10-13
申请号：JP2011129964
申请日：2011-06-10
申请人： Asml Netherlands Bv , エーエスエムエルネザーランズビー.ブイ.
发明人： KEMPER NICOLAAS R , LAMBERTUS DONDERS SJOERD NICOLAAS , OTTENS JOOST JEROEN , VAN DER HOEVEN JAN CORNELIS , KADIJK EDWIN CORNELIS , SERGEI SHULEPOV
IPC分类号： H01L21/027
CPC分类号： G03B27/42 , G03F7/70341 , G03F7/70716
摘要： PROBLEM TO BE SOLVED: To make liquid to be removed from a gap between the edge of an object and a substrate table on which the object is placed.SOLUTION: For example, in the embodiment of the drain pipe 10 of the lithographic projection apparatus, the inflow of gas into the drain pipe is reduced in a period the liquid is absent at all in a drain pipe 10. In an embodiment, a passive liquid removal mechanism is provided so that the gas pressure in the drain pipe is the same as the ambient gas pressure. In another embodiment, a flap is prepared to close a chamber during the removing of liquid is not needed.
摘要翻译：要解决的问题：使液体从物体的边缘与放置有物体的基板台之间的间隙移除。解决方案：例如，在平版印刷设备的排水管10的实施例中，在排水管10中完全不存在液体的期间，气体进入排水管的流入减少。在一个实施例中，提供了一种被动液体移除机构，使排水管中的气体压力与环境气体压力。在另一个实施例中，在不需要去除液体的过程中制备一个瓣来关闭一个室。

6. 发明专利

JP2008300829A Lithographic apparatus, and device manufacturing method 有权
标题翻译： LITHOGRAPHIC设备和设备制造方法
公开(公告)号：JP2008300829A
公开(公告)日：2008-12-11
申请号：JP2008136199
申请日：2008-05-26
申请人： Asml Netherlands Bv , エーエスエムエルネザーランズビー.ブイ.
发明人： DE JONG FREDERIK E , BEEMS MARCEL HENDRIKUS MARIA , VAN DEN BRINK MARINUS AART , JACOBS JOHANNES HENRICUS WILHE , ANTONIUS LEENDERS MARTINUS HEN , LEVASIER LEON MARTIN , VAN DER MEULEN FRITS , OTTENS JOOST JEROEN , ZAAL KOEN JACOBUS J M , JOHANNES DROSTE RICHARD BERNAR , DE KLERK JOHANNES W , WANTEN PETER FRANCISCUS , VAN DER HOEVEN JAN CORNELIS , KADIJK EDWIN CORNELIS , DE JONG MARTEIJN , ANSTOTZ DAVID LUCIEN
IPC分类号： H01L21/027
CPC分类号： G03F7/70875 , G03F7/70341 , G03F7/70716
摘要： PROBLEM TO BE SOLVED: To provide a lithographic apparatus in which liquid can be drained through a gap between, for example, an edge of an object and a substrate table on which the object is set. SOLUTION: The liquid immersion lithographic apparatus has a drain formed for draining the liquid through the gap between an edge of a substrate and the substrate table on which the substrate is supported. The drain is provided with a means which feeds the liquid to the drain irrespective of a position of the substrate table and/or a means which saturates gas in the drain. These means reduce fluctuation in heat loss due to evaporation of the liquid in the drain. COPYRIGHT: (C)2009,JPO&INPIT
摘要翻译：要解决的问题：提供一种光刻设备，其中液体可以通过例如物体的边缘和设置有物体的基板台之间的间隙排出。解决方案：液浸式光刻设备具有用于排出液体通过衬底的边缘和其上支撑衬底的衬底台之间的间隙的排水口。排水管设置有将液体供给到排水管的装置，而不管衬底台的位置和/或在排水管中使气体饱和的装置。这些意味着减少由于排水管中的液体的蒸发导致的热损失的波动。版权所有（C）2009，JPO＆INPIT

7. 发明专利

JP2010212728A Lithographic apparatus 有权
标题翻译： LITHOGRAPHIC设备
公开(公告)号：JP2010212728A
公开(公告)日：2010-09-24
申请号：JP2010118223
申请日：2010-05-24
申请人： Asml Netherlands Bv , エーエスエムエルネザーランズビー.ブイ.
发明人： KEMPER NICOLAAS R , LAMBERTUS DONDERS SJOERD NICOLAAS , OTTENS JOOST JEROEN , VAN DER HOEVEN JAN CORNELIS , KADIJK EDWIN CORNELIS , SERGEI SHULEPOV
IPC分类号： H01L21/027
CPC分类号： G03B27/42 , G03F7/70341 , G03F7/70716
摘要： PROBLEM TO BE SOLVED: To precisely remove liquid in an immersion exposure device. SOLUTION: Embodiments of a drain 10 in a lithographic projection apparatus are described that have, for example, a feature which reduces inflow of gas into the drain during a period when no liquid is present in the drain 10. In one example, a passive liquid removal mechanism is provided such that the pressure of gas in the drain 10 is equal to the ambient gas pressure and in another embodiment a flap is provided to close off a chamber during times when no liquid needs removing. COPYRIGHT: (C)2010,JPO&INPIT

8. 发明专利

JP2010010677A Lithography equipment and method of operating the same 有权
标题翻译： LITHOGRAPHY设备及其操作方法
公开(公告)号：JP2010010677A
公开(公告)日：2010-01-14
申请号：JP2009145234
申请日：2009-06-18
申请人： Asml Netherlands Bv , エーエスエムエルネザーランズビー.ブイ.
发明人： KADIJK EDWIN CORNELIS , KRUIJSWIJK STEFAN GEERTE
IPC分类号： H01L21/027 , G03F7/20
CPC分类号： G03F7/70341
摘要： PROBLEM TO BE SOLVED: To provide lithography equipment in which the possibility of the formation of bubbles in, for example, a recessed portion is reduced and is desirably minimized substantially. SOLUTION: A substrate table is configured and disposed to hold a substrate having an edge feature. A projection system is configured to project a radiation beam with a pattern onto the substrate. A fluid treatment system is configured and disposed to supply a flow of liquid into a space between the projection system and the substrate table and retain at least a part of the liquid in a space. A positioner is configured to position the substrate on the substrate table such that the edge feature is located downstream of the substrate in the flow of liquid. COPYRIGHT: (C)2010,JPO&INPIT
摘要翻译：要解决的问题：提供其中在例如凹陷部分中形成气泡的可能性减小并且希望最小化的光刻设备。解决方案：衬底台被配置和设置成保持具有边缘特征的衬底。投影系统被配置为将具有图案的辐射束投射到基板上。流体处理系统被配置和设置成将液体流提供到投影系统和衬底台之间的空间中并将至少一部分液体保持在空间中。定位器被配置为将衬底定位在衬底台上，使得边缘特征位于液体流中的衬底的下游。版权所有（C）2010，JPO＆INPIT

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