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1. 发明专利

JP2009088530A Lithographic apparatus, stage apparatus, and method of manufacturing device 有权
标题翻译：平面设备，阶段装置和制造装置的方法
公开(公告)号：JP2009088530A
公开(公告)日：2009-04-23
申请号：JP2008250641
申请日：2008-09-29
申请人： Asml Netherlands Bv , エーエスエムエルネザーランズビー.ブイ.
发明人： OTTENS JOOST JEROEN , BIJVOET DIRK-JAN , VAN DER ZOUW GERBRAND , DE JONG FREDERIK E
IPC分类号： H01L21/027 , H01L21/68
CPC分类号： G03F7/70725 , G03F7/70783 , G03F9/7003
摘要： PROBLEM TO BE SOLVED: To provide a lithographic device with a chuck constructed to hold a substrate table, to provide a stage device on which an object is arranged, and to provide a method of manufacturing a device. SOLUTION: Disclosed is the lithography device which includes: an illumination system constructed to adjust a radiation beam; a supporter constructed to support a patterning device capable of generating a pattern imparted emitted beam by giving a pattern on a cross section of an emitted beam; a substrate table constructed to hold a substrate; a projection system constructed to project the pattern imparted radiation beam to a target part of the substrate; a chuck constructed to hold the substrate table; a positioning device for displacing the chuck in use; and a control unit constructed to control the positioning device. The control unit drives the positioning device to excite the chuck by substantially dynamical force that enables deformation of the chuck before positioning the patterning device. COPYRIGHT: (C)2009,JPO&INPIT
摘要翻译：要解决的问题：为了提供一种平版印刷设备，其具有构造成保持基板台的卡盘，以提供其上布置物体的平台装置，并提供制造装置的方法。解决方案：公开了光刻设备，其包括：构造成调整辐射束的照明系统; 支撑件，其被构造成支撑能够通过在发射光束的横截面上给出图案来产生赋予发射光束的图案的图案形成装置; 构造成保持基板的基板台; 投影系统，被构造成将图案赋予的辐射束投射到基板的目标部分; 夹持构造成夹持衬底台的卡盘; 用于在使用中移动卡盘的定位装置; 以及构造成控制定位装置的控制单元。控制单元驱动定位装置以通过在定位图案形成装置之前能够使卡盘变形的基本动力来激发卡盘。版权所有（C）2009，JPO＆INPIT

2. 发明专利

JP2008300829A Lithographic apparatus, and device manufacturing method 有权
标题翻译： LITHOGRAPHIC设备和设备制造方法
公开(公告)号：JP2008300829A
公开(公告)日：2008-12-11
申请号：JP2008136199
申请日：2008-05-26
申请人： Asml Netherlands Bv , エーエスエムエルネザーランズビー.ブイ.
发明人： DE JONG FREDERIK E , BEEMS MARCEL HENDRIKUS MARIA , VAN DEN BRINK MARINUS AART , JACOBS JOHANNES HENRICUS WILHE , ANTONIUS LEENDERS MARTINUS HEN , LEVASIER LEON MARTIN , VAN DER MEULEN FRITS , OTTENS JOOST JEROEN , ZAAL KOEN JACOBUS J M , JOHANNES DROSTE RICHARD BERNAR , DE KLERK JOHANNES W , WANTEN PETER FRANCISCUS , VAN DER HOEVEN JAN CORNELIS , KADIJK EDWIN CORNELIS , DE JONG MARTEIJN , ANSTOTZ DAVID LUCIEN
IPC分类号： H01L21/027
CPC分类号： G03F7/70875 , G03F7/70341 , G03F7/70716
摘要： PROBLEM TO BE SOLVED: To provide a lithographic apparatus in which liquid can be drained through a gap between, for example, an edge of an object and a substrate table on which the object is set. SOLUTION: The liquid immersion lithographic apparatus has a drain formed for draining the liquid through the gap between an edge of a substrate and the substrate table on which the substrate is supported. The drain is provided with a means which feeds the liquid to the drain irrespective of a position of the substrate table and/or a means which saturates gas in the drain. These means reduce fluctuation in heat loss due to evaporation of the liquid in the drain. COPYRIGHT: (C)2009,JPO&INPIT
摘要翻译：要解决的问题：提供一种光刻设备，其中液体可以通过例如物体的边缘和设置有物体的基板台之间的间隙排出。解决方案：液浸式光刻设备具有用于排出液体通过衬底的边缘和其上支撑衬底的衬底台之间的间隙的排水口。排水管设置有将液体供给到排水管的装置，而不管衬底台的位置和/或在排水管中使气体饱和的装置。这些意味着减少由于排水管中的液体的蒸发导致的热损失的波动。版权所有（C）2009，JPO＆INPIT

3. 发明专利

JP2007110130A Method and arrangement for predicting thermally-induced deformations of substrate, and semiconductor device 有权
标题翻译：用于预测基板和半导体器件的热诱导变形的方法和装置
公开(公告)号：JP2007110130A
公开(公告)日：2007-04-26
申请号：JP2006278442
申请日：2006-10-12
申请人： Asml Netherlands Bv , エーエスエムエルネザーランズビー.ブイ.
发明人： MENCHTCHIKOV BORIS , DE JONG FREDERIK E
IPC分类号： H01L21/027 , G03F7/20
CPC分类号： G03F7/70633 , G03F7/70341 , G03F7/70425 , G03F7/70783 , G03F7/70875
摘要： PROBLEM TO BE SOLVED: To provide a method for correcting thermally-induced field deformations of a lithographically exposed substrate. SOLUTION: First, a model is provided to predict thermally-induced field deformation information of a plurality of fields of the substrate. The pre-specified exposure information used to configure an exposure of the fields is then modified based on the thermally-induced deformation information as predicted by the model. Finally a pattern is exposed onto the fields in accordance with the pre-specified exposure information as modified. The predicting of thermally-induced field deformation information by the model includes predicting of deformation effects of selected points on the substrate. It is based on a time-decaying characteristic as energy is transported across substrate, and a distance between the selected points and an edge of the substrate. COPYRIGHT: (C)2007,JPO&INPIT
摘要翻译：要解决的问题：提供一种用于校正光刻曝光的基底的热诱导场变形的方法。解决方案：首先，提供一种模型来预测衬底的多个场的热诱导场变形信息。然后基于由模型预测的热诱导变形信息来修改用于配置场的曝光的预定曝光信息。最后，根据修改的预先指定的曝光信息，将图案暴露在场上。通过模型预测热诱导场变形信息包括预测基底上选定点的变形效应。它基于时间衰减特性，因为能量被传送到基板上，并且所选择的点与基板的边缘之间的距离。版权所有（C）2007，JPO＆INPIT

4. 发明专利

JP2007088455A Lithography method 有权
标题翻译： LITHOGRAPHY方法
公开(公告)号：JP2007088455A
公开(公告)日：2007-04-05
申请号：JP2006237516
申请日：2006-09-01
申请人： Asml Netherlands Bv , エーエスエムエルネザーランズビー.ブイ.
发明人： ZAAL KOEN JACOBUS JOHANNES MAR , DE KORT ANTONIUS J , DE JONG FREDERIK E , GOORMAN KOEN , MENCHTCHIKOV BORIS , PEN HERMEN F
IPC分类号： H01L21/027 , G03F9/00
CPC分类号： G03F7/70633 , G03F7/70341 , G03F7/7045 , G03F7/70458
摘要： PROBLEM TO BE SOLVED: To solve a problem of an overlay error by substrate cooling action connected with the vaporization of high refractive index liquid which exists on a substrate. SOLUTION: In the calibration of overlay property, position error data of a first set is obtained by carrying out the exposure of a first substrate (S1) during a first test exposure sequence using a test structure of the first set and measuring the test structure (S2). Then, the identical substrate (S3) is exposed to the test structure of a second set identical to the first set during a second test exposure sequence using a second course which is equivalent to the first course but in which movement is caused in a reverse direction state. The error data of the second set is obtained by measuring the structure of the second set (S4). Influence by wafer cooling can be removed by using these two data sets. COPYRIGHT: (C)2007,JPO&INPIT
摘要翻译：要解决的问题：通过与存在于基板上的高折射率液体的蒸发相关的基板冷却动作来解决重叠误差的问题。解决方案：在叠加属性的校准中，通过使用第一组的测试结构在第一测试曝光序列期间执行第一衬底（S1）的曝光来获得第一组的位置误差数据，并且测量测试结构（S2）。然后，在第二测试曝光序列期间，将相同的基板（S3）暴露于与第一组相同的第二组的测试结构，该测试结构使用等同于第一过程的第二过程，但是在相反方向上发生移动州。通过测量第二组的结构（S4）获得第二组的误差数据。通过使用这两个数据集可以消除晶片冷却的影响。版权所有（C）2007，JPO＆INPIT

5. 发明专利

JP2012151490A Lithographic apparatus, stage apparatus and device manufacturing method 有权
标题翻译：平面设备，阶段设备和设备制造方法
公开(公告)号：JP2012151490A
公开(公告)日：2012-08-09
申请号：JP2012063528
申请日：2012-03-21
申请人： Asml Netherlands Bv , エーエスエムエルネザーランズビー.ブイ.
发明人： OTTENS JOOST JEROEN , BIJVOET DIRK-JAN , VAN DER ZOUW GERBRAND , DE JONG FREDERIK E
IPC分类号： H01L21/027 , H01L21/68
CPC分类号： G03F7/70725 , G03F7/70783 , G03F9/7003
摘要： PROBLEM TO BE SOLVED: To provide a lithographic apparatus including a chuck constructed to hold a substrate table, a stage apparatus for positioning an object, and a device manufacturing method.SOLUTION: The lithographic apparatus comprises: an illumination system IL configured to condition a radiation beam; a support MT constructed to support a patterning device MA which is capable of imparting the radiation beam with a pattern in its cross-section to form a patterned radiation beam; a substrate table WT constructed to hold a substrate W; a projection system PS configured to project the patterned radiation beam onto a target portion of the substrate; a chuck constructed to hold the substrate table WT; a positioning device for, in use, displacing the chuck; and a control unit configured to control the positioning device. The control unit is arranged to drive the positioning device to excite the chuck by a substantially dynamic force to enable deformation of the chuck.
摘要翻译：要解决的问题：提供一种包括夹持基板台的卡盘，用于定位物体的平台装置和装置制造方法的光刻设备。解决方案：光刻设备包括：被配置为调节辐射束的照明系统IL; 构造成支撑图案形成装置MA的支撑件MT，其能够在其横截面中赋予辐射束图案以形成图案化的辐射束; 构造成保持衬底W的衬底台WT; 投影系统PS被配置为将图案化的辐射束投影到基板的目标部分上; 构造成夹持衬底台WT的卡盘; 用于在使用中移动卡盘的定位装置; 以及控制单元，被配置为控制所述定位装置。控制单元布置成驱动定位装置以通过基本上动态的力来激励卡盘，以使卡盘变形。版权所有（C）2012，JPO＆INPIT

6. 发明专利

JP2012114469A Lithographic apparatus 有权
标题翻译： LITHOGRAPHIC设备
公开(公告)号：JP2012114469A
公开(公告)日：2012-06-14
申请号：JP2012055739
申请日：2012-03-13
申请人： Asml Netherlands Bv , エーエスエムエルネザーランズビー.ブイ.
发明人： DE JONG FREDERIK E , BEEMS MARCEL HENDRIKUS MARIA , VAN DEN BRINK MARINUS AART , JACOBS JOHANNES HENRICUS WILHELMUS , ANTONIUS LEENDERS MARTINUS HENDRIKUS , LEVACIA LEON MARTIN , VAN DER MEULEN FRITS , OTTENS JOOST JEROEN , ZAAL KOEN JACOBUS J M , JOHANNES DROSTE RICHARD BERNARDUS , DE KLERK JOHANNES W , WANTEN PETER FRANCISCUS , VAN DER HOEVEN JAN CORNELIS , KADIJK EDWIN CORNELIS , DE JONG MARTEIJN , ANSTOTZ DAVID LUCIEN
IPC分类号： H01L21/027 , G03F7/20
CPC分类号： G03F7/70875 , G03F7/70341 , G03F7/70716
摘要： PROBLEM TO BE SOLVED: To provide a lithographic apparatus in which liquid can be drained through a gap between, for example, an edge of an object and a substrate table on which the object is disposed.SOLUTION: A liquid immersion lithographic apparatus includes a drain configured to drain liquid through a gap between an edge of a substrate and a substrate table on which the substrate is supported. The drain comprises: means for feeding the liquid to the drain regardless of a position of the substrate table; and/or means for saturating gas in the drain. These means reduce fluctuation of heat loss due to evaporation of the liquid in the drain.
摘要翻译：要解决的问题：提供一种光刻设备，其中液体可以通过例如物体的边缘和其上放置物体的基板台之间的间隙排出。解决方案：液浸式光刻设备包括被配置为通过衬底的边缘和衬底台之间的间隙排出液体的漏极，衬底台被支撑在衬底台上。排水口包括：无论基板台的位置如何，将液体供给到排水口的装置; 和/或用于在排水管中使气体饱和的装置。这些意味着减少由于排水管中液体的蒸发导致的热损失的波动。版权所有（C）2012，JPO＆INPIT

7. 发明专利

JP2009302531A Lithography apparatus and method of manufacturing device 审中-公开
标题翻译：平面设备及其制造方法
公开(公告)号：JP2009302531A
公开(公告)日：2009-12-24
申请号：JP2009132700
申请日：2009-06-02
申请人： Asml Netherlands Bv , エーエスエムエルネザーランズビー.ブイ.
发明人： AARTS IGOR MATHEUS PETRONELLA , GEERKE JOHAN HENDRIK , VAN DER PASCH ENGELBERTUS ANTO , DE JONG FREDERIK E , VAN DE GRIFT MARC
IPC分类号： H01L21/027 , G03F7/20
CPC分类号： G03F9/7076 , G03F7/70516 , G03F7/70616 , G03F9/7011 , G03F9/7019 , H01L21/02271
摘要： PROBLEM TO BE SOLVED: To provide a calibration method for calibrating a stage position of a lithography apparatus. SOLUTION: This detection method detects a property of an extended pattern formed by at least one line generally extending in a first direction. The extended pattern is formed on a substrate W or on a substrate table WT and preferably extends over a length at least 50 times wider than a width of the line. The extended pattern is focus sensitive. The detection method includes moving the substrate table WT in the first direction and measuring along the first direction the property of the extended pattern. The property may be a result of a physical property of the extended pattern in a second direction at a right angle to the first direction. A next step allows a calibration of a substrate table position to be derived from the measured position of the extended pattern. COPYRIGHT: (C)2010,JPO&INPIT
摘要翻译：要解决的问题：提供用于校准光刻设备的台位置的校准方法。解决方案：该检测方法检测由通常沿第一方向延伸的至少一条线形成的延伸图案的特性。延伸图案形成在衬底W上或衬底台WT上，并且优选地延伸超过线宽度的至少50倍的长度。扩展模式是对焦点敏感。检测方法包括沿第一方向移动衬底台WT并沿着第一方向测量延伸图案的特性。该特性可以是延伸图案在与第一方向成直角的第二方向上的物理性质的结果。下一个步骤允许从扩展图案的测量位置导出衬底台位置的校准。版权所有（C）2010，JPO＆INPIT

8. 发明专利

JP2007180535A Lithographic device, method for manufacturing device and method for calibrating the lithographic device 有权
标题翻译：光刻设备，制造设备的方法和用于校准光刻设备的方法
公开(公告)号：JP2007180535A
公开(公告)日：2007-07-12
申请号：JP2006338021
申请日：2006-12-15
申请人： Asml Netherlands Bv , エーエスエムエルネザーランズビー.ブイ.
发明人： ZAAL KOEN JACOBUS J M , JACOBS JOHANNES HENRICUS WILHE , LOOPSTRA ERIK R , OTTENS JOOST JEROEN , DE JONG FREDERIK E
IPC分类号： H01L21/027 , G03F7/20
CPC分类号： G03F7/70716 , G03F7/70341
摘要： PROBLEM TO BE SOLVED: To provide a lithographic device for projecting an image of a desired pattern via a liquid onto a substrate. SOLUTION: The device is provided with: a plurality of substrate holders, each adapted to hold at least one substrate and having a conduit therein for transporting a temperature-control fluid; a fluid supply system adapted to supply a temperature-control fluid of a substantially predetermined temperature; and a flow-rate controller adapted to control the flow rate of the temperature-control fluid in each substrate holder so that the flow rate in a first one of the plurality of substrate holders will differ from the flow rate in a second one among the plurality of substrate holders. COPYRIGHT: (C)2007,JPO&INPIT
摘要翻译：要解决的问题：提供一种通过液体将期望图案的图像投影到基板上的光刻设备。解决方案：装置设置有：多个基板保持器，每个基板保持器适于保持至少一个基板并且具有用于输送温度控制流体的导管; 适于提供基本上预定温度的温度控制流体的流体供应系统; 以及流量控制器，其适于控制每个基板保持器中的温度控制流体的流量，使得多个基板保持器中的第一个中的流量与多个基板保持器中的第二个中的流量不同的基板支架。版权所有（C）2007，JPO＆INPIT

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